Simulation of Magnetically Confined Plasma for Etch Applications

Think Lean – Create Value

Computational Optimization of

Magnetically Enhanced CCP Plasma

Uniformity for Disk Etch Applications

Vladimir Kudriavtsev, Wenli Collison

Huong Nguyen, Pat Ward, Michael Barnes,

Mark Kushner

62nd Annual Gaseous Electronics Plasma Conference

GEC 09 - American Physical Society

October, 2009


Summary


Magnetic Field Line Uniformity Analogy

-improve magnetic line angle uniformity and desired cross-section and you will improveplasma uniformity

-best way to do it to increase magnet to substrate distance, however that weakens corresponding magnetic field


Two Configurations

Initial Optimized – Rev1

HM H

HM H

HM=62.5…125 mm, H=50 mmMagnet moves up/down

HM=125 mm, H=113 mmPlasma gap increases, ground to electrode area increased


CF4 Chemistry Model (HPEM)


K Pole Magscans

Close Distance 62.5 mm away

View from bottom

Magnetic steel enclosure

Magnets


Magnetized CCP

• 2-dimensional HPEM Hybrid Model of Ar Plasma

• Electron energy equation for bulk electrons

• Continuity, Momentum and Energy (temperature) equations

for all neutral and ion species.

• Poisson equation for electrostatic potential

•Gas phase reactions:

AR + E > AR* + E

AR + E > AR* + E

AR + E > AR^ + E + E

AR* + E > AR^ + E + E

AR* + AR* > AR^ + AR + E

AR* + E > AR + E

AR^ + AR > AR + AR^

•Surface reactions:

Ar* > Ar

Ar^ > Ar

Ar^-ion


ELECTRON ENERGY TRANSPORT

S(Te) = Power deposition from electric fields

L(Te) = Electron power loss due to collisions

ΦΦΦΦ = Electron flux

κκκκ(Te) = Electron thermal conductivity tensor

SEB = Power source source from beam electrons

( ) ( ) ( )

eee

EBeeeeeee

nDEqn

STTkT2

5TLTStkTn

2

3

∇⋅−⋅=Φ

+

∇⋅−Φ⋅∇−−=∂

∂

µ

κ/

( )isotropicA

mq

i

BBBBBBB

BBBBBBB

BBBBBBB

Bq

mAA

om

zzrzr

zrrz

zrrzr

mo

=+

=

++−+−

+++−

+−++

+

=

,/

1

22

22

22

22

νωα

ααα

ααα

ααα

αα

ν

θθ

θθθ

θθ

r

• All transport coefficients are tensors:

B field affected transport


PLASMA CHEMISTRY, TRANSPORT AND ELECTROSTATICS

• Continuity, momentum and energy equations are solved for each species

(with jump conditions at boundaries)

• Implicit solution of Poisson’s equation

( ) ( )

⋅∇⋅∆+=∆+Φ∇⋅∇ ∑∑

i

iqt-- i

i

iis Nqtt φρεr

EBiiii SSvN

t

N++⋅−∇= )(

r

∂

∂

( ) ( ) ( ) ( ) ii

i

iiiiiii

i

ii BvEm

NqvvNTkN

mt

vNµ

∂

∂⋅∇−×++⋅∇−∇=

rrrrrr

1

( ) ijjij

j

i

mm

jvvNN

m

ji

νrr

−−∑+

( ) 2

22

2

)()U(UQ E

m

qNNP

t

N

ii

iiiiiiiii

ii

ων

νε

∂

ε∂

+=⋅∇+⋅∇+⋅∇+

∑∑ ±−+

++j

jBijji

j

ijBijji

ji

ij

s

ii

ii TkRNNTTkRNNmm

mE

m

qN3)(32

2

ν


Initial Configuration

� CF4 gas 50sccm, 100mTorr, 100W CCP power.

� Magnet direction: Horizontal right. 125mm distance from substrate to magnet.

� Electron density.

R (cm)

Z(c

m)

-10 -5 0 5 10

-10

-5

0

5

10

E

2.6E+102.3E+102.0E+101.7E+10

1.4E+101.1E+108.0E+095.0E+09

2.0E+09

R (cm)

E

1.5 2 2.5 31E+10

1.5E+10

2E+10

2.5E+10

3E+10

3.5E+10

4E+10

E

1cm above the substrate





� F radical density.

R (cm)

Z(c

m)

-10 -5 0 5 10

-10

-5

0

5

10

F

1.1E+13

1E+13

9E+12

8E+12

7E+12

6E+12

5E+12

4E+12

3E+12

2E+12

1E+12





� Plasma potential.

R (cm)

Z(c

m)

-10 -5 0 5 10

-10

-5

0

5

10

P-POT

60

46

31

17

3

-11

-26

-40


Optimal Rev1


� Magnet: Horizontal right. 125mm from substrate to magnet, 113mm gap in plasma zone.

� Electron Density.

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

5.5E+105.0E+10

4.5E+104.0E+103.5E+103.0E+10

2.5E+102.0E+101.5E+101.0E+10

5.0E+09

1cm below the substrateR (cm)

E

1.5 2 2.5 32E+10

2.5E+10

3E+10

3.5E+10

4E+10

4.5E+10

5E+10

5.5E+10

6E+10

E


Optimal Rev1



� CF and CF2 densities.

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

CF2

2.4E+13

2.2E+13

2.0E+13

1.8E+131.6E+13

1.4E+13

1.2E+13

1.0E+13

8.0E+12

6.0E+124.0E+12

2.0E+12

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

CF

2.0E+13

1.8E+13

1.6E+13

1.4E+13

1.2E+131.0E+13

8.0E+12

6.0E+12

4.0E+12

2.0E+12


Optimal Rev1



� F radical density and plasma potential.

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

F

9.0E+12

8.0E+12

7.0E+12

6.0E+12

5.0E+124.0E+12

3.0E+12

2.0E+12

1.0E+12

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

P-POT

2010

0-10

-20-30

-40-50

-60-70


Comparison – Plasma Density Ne


� Decreasing the distance from magnet to substrate, while keep 113mm gap in plasma zone.

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

5.5E+105.0E+10

4.5E+10

4.0E+103.5E+10

3.0E+102.5E+10

2.0E+10

1.5E+101.0E+10

5.0E+09

125mm

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

5.50E+105.08E+10

4.67E+104.25E+10

3.83E+103.42E+10

3.00E+102.58E+102.17E+10

1.75E+101.33E+10

9.17E+095.00E+09

74mm92.5mm

113mm

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

5.50E+10

5.00E+104.50E+10

4.00E+10

3.50E+103.00E+10

2.50E+10

2.00E+10

1.50E+101.00E+10

5.00E+09

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

5.50E+10

5.05E+10

4.59E+104.14E+10

3.68E+10

3.23E+10

2.77E+102.32E+10

1.86E+10

1.41E+10

9.55E+095.00E+09

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

5.5E+10

4.7E+10

3.8E+10

3.0E+10

2.2E+101.3E+10

5.0E+09

136mm

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

4.5E+10

4E+10

3.5E+10

3E+10

2.5E+10

2E+10

1.5E+10

1E+10

5E+09

No magnet, 92.5mm

Rev.1 Config


Comparison – F radical number density



125mm

74mm92.5mm

113mm136mm

No magnet, 92.5mm

Rev.1 Config

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

F

1.5E+13

1.4E+13

1.3E+13

1.2E+13

1.1E+13

1E+13

9E+12

8E+12

7E+12

6E+12

5E+12

4E+123E+12

2E+12

1E+12

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

F

1.20E+13

1.10E+131.00E+13

9.00E+12

8.00E+127.00E+12

6.00E+12

5.00E+124.00E+12

3.00E+12

2.00E+121.00E+12

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

F

9.0E+12

8.0E+127.0E+126.0E+12

5.0E+124.0E+12

3.0E+122.0E+121.0E+12

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

F

1.1E+13

1E+13

9E+12

8E+12

7E+126E+12

5E+12

4E+12

3E+12

2E+12

1E+12

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

F

1E+13

9E+12

8E+127E+12

6E+125E+12

4E+12

3E+122E+12

1E+12

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

20

F

1.1E+131E+13

9E+128E+12

7E+126E+12

5E+124E+12

3E+122E+12

1E+12


Comparison – CF2 polymer number density



125mm

74mm92.5mm

113mm136mm

No magnet, 92.5mm

Rev.1 Config

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

CF2

2.6E+132.4E+132.2E+132E+131.8E+131.6E+13

1.4E+131.2E+131E+138E+126E+124E+12

2E+12

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

20

CF2

2.6E+13

2.4E+132.2E+13

2E+131.8E+13

1.6E+131.4E+13

1.2E+13

1E+138E+12

6E+124E+12

2E+12

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

CF2

2.4E+132.2E+13

2E+131.8E+13

1.6E+131.4E+13

1.2E+131E+138E+12

6E+124E+12

2E+12

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

CF2

2.4E+13

2.2E+13

2E+13

1.8E+13

1.6E+13

1.4E+13

1.2E+13

1E+13

8E+12

6E+12

4E+12

2E+12

R (cm)Z

(cm

)-10 -5 0 5 10

0

5

10

15

CF2

2.4E+132.2E+13

2.0E+131.8E+13

1.6E+131.4E+131.2E+13

1.0E+138.0E+12

6.0E+124.0E+122.0E+12

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

CF2

2.40E+132.20E+13

2.00E+131.80E+13

1.60E+131.40E+13

1.20E+13

1.00E+138.00E+12

6.00E+124.00E+12

2.00E+12


Comparison- Radial Profiles


� Decreasing the distance from magnet to substrate while keep 113mm gap in plasma zone.

� Electron density at 1cm below the substrate. R is from inner radius of substrate to outer radius of substrate.

125mm

distance from magnet to substrate

74mm92.5mm113mm

R (cm)

E

1.5 2 2.5 32E+10

2.5E+10

3E+10

3.5E+10

4E+10

4.5E+10

5E+10

E

R (cm)

E

1.5 2 2.5 32E+10

2.5E+10

3E+10

3.5E+10

4E+10

4.5E+10

5E+10

E

R (cm)

E

1.5 2 2.5 32E+10

2.5E+10

3E+10

3.5E+10

4E+10

4.5E+10

5E+10

E

R (cm)

E

1.5 2 2.5 32E+10

2.5E+10

3E+10

3.5E+10

4E+10

4.5E+10

5E+10

E

R (cm)

E

1.5 2 2.5 32E+10

2.5E+10

3E+10

3.5E+10

4E+10

4.5E+10

5E+10

E

136mm

74mm92.5mm113mm

R (cm)

E

0 0.5 1 1.5 2 2.5 3 3.5 40

5E+10

1E+11

1.5E+11

2E+11

2.5E+11

3E+11

E

R (cm)

E

0 1 2 3 40

5E+10

1E+11

1.5E+11

2E+11

2.5E+11

3E+11

E

R (cm)

E

0 1 2 3 40

5E+10

1E+11

1.5E+11

2E+11

2.5E+11

3E+11

E

R (cm)

E

0 1 2 3 40

5E+10

1E+11

1.5E+11

2E+11

2.5E+11

3E+11

E

125mm136mm

R (cm)

E

0 0.5 1 1.5 2 2.5 3 3.5 40

5E+10

1E+11

1.5E+11

2E+11

2.5E+11

3E+11

E


Uniformity Initial Configuration

Initial

AR

Uniformity

� R range: from inner edge of the substrate to the outer edge of the substrate.

Min Ne Max Ne Mean Ne

Uniformity%

(Stdev/Mean)

Uniformity%

(Max-Min)/2/Mean

Kpole_CF4 with magnet, 62.5mm distance,

50mm gap, 50sccm, 100mTorr, 100W, 300G 1.59E+10 2.37E+10 2.02E+10 13.6 19.3

Kpole_CF4 with magnet, 125mm distance,


Kpole_CF4 with magnet, 92.5mm distance,

80mm gap, 50sccm, 100mTorr, 100W, 90G . 3.24E+10 4.71E+10 3.90E+10 12.2 18.8

Kpole_CF4 with magnet, 125mm distance,

113mm gap, 50sccm, 100mTorr, 100W, 35G . 3.65E+10 4.58E+10 4.13E+10 6.96 11.3

Kpole_Ar with magnet, 62.5mm distance,


Kpole_Ar with magnet, 125mm distance,




AR

AR

Distance to magnet increased, uniformity gets worse

If gap is increased, uniformity gets better

If gap is increased & distance, uniformity gets betterR.1Opt


Uniformity Initial Configuration


Initial

AR

Uniformity


Uniformity%

(Stdev/Mean)

Uniformity%

(Max-Min)/2/Mean

Kpole_CF4, no magent, 125mm from magnet

to substrate, 50mm gap in plasma zone. 1.70E+10 2.41E+10 2.05E+10 10.4 17.3

Kpole_CF4 with magnet, 125mm from magnet


Kpole_CF4 with magnet, 125mm from magnet


Kpole_CF4 with magnet, 62.5mm from magnet


Kpole_Ar with magnet, 125mm from magnet to

substrate, 50mm gap in plasma zone. 1.35E+11 1.61E+11 1.54E+11 5.4 8.4

� 50sccm, 100mTorr, 100W CCP power.

No Mag


Uniformity – Rev 1 (CF4)



Uniformity%

(Stdev/Mean)

Uniformity%

(Max-Min)/2/Mean

Kpole_CF4 with magnet, 136mm

distance, 113mm gap, 50sccm,

100mTorr, 100W, 26G . 3.45E+10 3.76E+10 3.66E+10 2.73 4.3



100mTorr, 100W, 35G . 3.65E+10 4.58E+10 4.13E+10 6.96 11.3



100mTorr, 100W, 50G 3.44E+10 4.54E+10 4.02E+10 8.13 13.7

Kpole_CF4 with magnet, 92.5mm


100mTorr, 100W, 90G 3.18E+10 4.23E+10 3.60E+10 9.17 14.6



100mTorr, 100W, 190G 2.62E+10 4.04E+10 3.24E+10 13.6 21.9

Kpole_CF4 without magnet,

92.5mm distance, 113mm gap,

50sccm, 100mTorr, 100W 4.47E+10 4.89E+10 4.74E+10 2.94 4.5

Rev.1 Opt

No Magnet


Uniformity Rev 1 (CF4)

� R range: from 0 to the outer edge of the powered electrode.


Uniformity%

(Stdev/Mean)

Uniformity%

(Max-Min)/2/Mean

Voltage

drop(V)*



100mTorr, 100W, 26G . 2.97E+10 3.91E+10 3.63E+10 6.84 12.9 73.50



100mTorr, 100W, 35G . 3.25E+10 5.69E+10 4.37E+10 16.3 27.9 81.82



100mTorr, 100W, 50G 2.84E+10 6.39E+10 4.31E+10 21.5 41.2 81.3

Kpole_CF4 with magnet, 92.5mm


100mTorr, 100W, 90G 2.74E+10 2.09E+11 5.05E+10 82.6 179.88 83.4



100mTorr, 100W, 190G 2.20E+10 2.56E+11 4.89E+10 98.7 238.77 96.4

Kpole_CF4 without magnet,

92.5mm distance, 113mm gap,

50sccm, 100mTorr, 100W 4.08E+10 4.90E+10 4.69E+10 5.22 8.65 61.8

Rev.1 Opt

No Mag


� Plasma uniformity improves with increase in plasma gap

(chamber height) while keeping substrate to magnet

distance constant

� Plasma uniformity improves as magnet is moved away from

the substrate (for fixed chamber dimensions)

� Plasma uniformity without magnetic field enhancement is

higher

� Simultaneous increase in plasma chamber height (plasma

volume, ground area) with increase in substrate to magnet

distance produces sharp improvement in plasma uniformity

Summary


Phase II Optimization work

� Widen Kpole magnetic steel zone => expand source width

� Remove magnetic steel enclosure, expand magnetic field wider

� Remove powered electrode area in the center, to match disk geometry

Electrode (disk with the hole)

ceramic


Rev.1 Opt

++

Further K-Pole Optimization

� R is from inner radius of substrate to outer radius of substrate.


Uniformity%

(Stdev/Mean)

Uniformity%

(Max-Min)/2/Mean



100mTorr, 100W, 35G . 3.65E+10 4.58E+10 4.13E+10 6.96 11.3



100mTorr, 100W, 50G . Larger

magnetic steel. 3.09E+10 4.84E+10 3.94E+10 13.4 22.2



100mTorr, 100W, 30G . No

Magnetic steel. 3.30E+10 3.85E+10 3.60E+10 4.57 7.7



100mTorr, 100W, 50G 3.44E+10 4.54E+10 4.02E+10 8.13 13.7



100mTorr, 100W, 42G, no

magnetic steel. 3.50E+10 4.27E+10 3.95E+10 5.75 9.8

+


Rev.1 Opt


Uniformity%

(Stdev/Mean)

Uniformity%

(Max-Min)/2/Mean



100mTorr, 100W, 35G . 3.65E+10 4.58E+10 4.13E+10 6.96 11.3



100mTorr, 100W, 16G. Weaker B

field. 2.84E+10 3.40E+10 3.18E+10 6.18 8.9



100mTorr, 100W, 35G. No

powered electrode at the center. 4.59E+10 5.03E+10 4.86E+10 2.46 4.5

+

+++

� R is from inner radius of substrate to outer radius of substrate.

Further Source Optimization

Rev.2 Optimized


Angled magnets

Magnet Inclination Influence (different source)

current

Uniformity (Stdev/Mean)

0.00%

10.00%

20.00%

30.00%

40.00%

50.00%

60.00%

70.00%

80.00%

0 20 40 60 80 100 120 140 160 180

incline B angle

Uniformity (measure 1cm below substrate from R=0 to R=5cm)

New results for Hybrid ICP/CCP plasma source show significant effect of magnet inclination on plasma uniformity.

Explore effects of adjustable magnet inclination in Kpole source configuration with objective to tune uniformity without sacrificing plasma density


Conclusions

� Computational optimization of magnetically enhanced CCP plasma source was conducted, leading to progressive improvement of the source design, with plasma uniformity reduced from 26% down to 2.5%

� Two conceptual source chamber layouts were considered, with second being clearly more beneficial. This layout has increased plasma gap and ratio of ground area to electrode area and considerably weaker magnetic field near substrate.

� Further promise is shown due to electrode modification (removing electrode material in the center) and in adaptive adjustment of Kpole magnet angles (currently angle is zero).


Supplemental Materials

Ar Plasma Results


Experimental & Computational

Superposition (Ar plasma)

AR* speciesB field


50 mm top to substrate distance

5 mtorr

100 mtorr

Zone of plasma light collapses towards the electrode (sheath) as P increased

Summary• Ar gas 30sccm, 200W CCP power. 35Gauss under the center of

substrate.

• Magnet: Horizontal right. 125mm from substrate to magnet, 113mmgap in plasma zone.

5mTorr 100mTorr

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

2.2E+11

2E+11

1.8E+111.6E+11

1.4E+11

1.2E+11

1E+118E+10

6E+10

4E+102E+10

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

3E+11

2.8E+112.6E+11

2.4E+112.2E+11

2E+11

1.8E+111.6E+11

1.4E+111.2E+11

1E+118E+10

6E+10

4E+102E+10

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

AR*

1.60E+121.48E+121.37E+121.25E+121.14E+12

1.02E+129.08E+117.92E+116.77E+115.62E+114.46E+113.31E+11

2.15E+111.00E+11

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

AR*

1.00E+12

9.18E+11

8.36E+11

7.55E+116.73E+11

5.91E+11

5.09E+11

4.27E+11

3.45E+11

2.64E+11

1.82E+11

1.00E+11

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

3E+11

2.8E+11

2.6E+11

2.4E+11

2.2E+11

2E+11

1.8E+11

1.6E+111.4E+11

1.2E+11

1E+11

8E+10

6E+10

4E+10

2E+10

20mTorr

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

AR*

7E+11

6.5E+11

6E+115.5E+11

5E+11

4.5E+114E+11

3.5E+113E+11

2.5E+11

2E+111.5E+11

1E+11

5E+10

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

3.8E+11

3.6E+11

3.4E+11

3.2E+11

3E+112.8E+11

2.6E+11

2.4E+11

2.2E+11

2E+111.8E+11

1.6E+11

1.4E+11

1.2E+11

1E+118E+10

6E+10

4E+10

2E+10

50mTorr

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

AR*

8E+11

7.5E+117E+11

6.5E+116E+11

5.5E+115E+11

4.5E+114E+113.5E+11

3E+112.5E+11

2E+111.5E+11

1E+115E+10

3mTorr 10mTorr

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

2.00E+11

1.89E+11

1.78E+11

1.66E+11

1.55E+111.44E+11

1.33E+11

1.22E+11

1.11E+11

9.94E+108.82E+10

7.71E+10

6.59E+10

5.47E+10

4.35E+10

3.24E+102.12E+10

1.00E+10

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

AR*

7.50E+117.00E+116.50E+116.00E+115.50E+11

5.00E+114.50E+114.00E+113.50E+113.00E+112.50E+11

2.00E+111.50E+111.00E+115.00E+10

R (cm)

Z(c

m)

-10-50510

0

5

10

15

E

2.6E+11

2.4E+11

2.2E+112E+11

1.8E+11

1.6E+111.4E+11

1.2E+11

1E+118E+10

6E+10

4E+102E+10

R (cm)

Z(c

m)

-10-50510

0

5

10

15

AR*

7.5E+11

7E+116.5E+11

6E+11

5.5E+11

5E+114.5E+11

4E+11

3.5E+113E+11

2.5E+11

2E+11

1.5E+111E+11

5E+10

Summary (with magnet vs. no magnet)• Ar gas 30sccm, 200W CCP power. 35Gauss under the center of

substrate.


5mTorr 100mTorr

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

2.2E+11

2E+11

1.8E+111.6E+11

1.4E+11

1.2E+11

1E+118E+10

6E+10

4E+102E+10

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

3E+11

2.8E+112.6E+11

2.4E+112.2E+11

2E+11

1.8E+111.6E+11

1.4E+111.2E+11

1E+118E+10

6E+10

4E+102E+10

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

AR*

1.60E+12

1.48E+12

1.37E+121.25E+12

1.14E+12

1.02E+129.08E+11

7.92E+11

6.77E+115.62E+11

4.46E+11

3.31E+112.15E+11

1.00E+11

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

AR*

1.00E+12

9.18E+11

8.36E+11

7.55E+116.73E+11

5.91E+11

5.09E+11

4.27E+11

3.45E+11

2.64E+11

1.82E+11

1.00E+11

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

3E+11

2.8E+11

2.6E+11

2.4E+11

2.2E+11

2E+11

1.8E+11

1.6E+11

1.4E+11

1.2E+11

1E+11

8E+10

6E+10

4E+10

2E+10

20mTorr

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

AR*

7E+11

6.5E+11

6E+11

5.5E+11

5E+11

4.5E+11

4E+11

3.5E+11

3E+112.5E+11

2E+11

1.5E+11

1E+11

5E+10

with magnet no magnet with magnet no magnet with magnet no magnet

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

E

1.1E+111E+11

9E+10

8E+10

7E+10

6E+105E+10

4E+10

3E+10

2E+10

1E+10

R (cm)

Z(c

m)

-10 -5 0 5 10

0

5

10

15

AR*

7.5E+117E+11

6.5E+11

6E+115.5E+11

5E+114.5E+11

4E+11

3.5E+113E+11

2.5E+112E+11

1.5E+11

1E+115E+10

Summary(with magnet vs. no magnet)• Ar gas 30sccm, 200W CCP power. 35Gauss under the center of

substrate.



Uniformity%

(Stdev/Mean)

Uniformity%

(Max-Min)/2/Mean

Average

Te(ev)


113mm gap, 30sccm, 5mTorr, 200W, 35G. 7.74E+10 1.01E+11 9.07E+10 8.28 12.89 3.91


113mm gap, 30sccm, 5mTorr, 200W, no

magnet. 5.27E+10 5.84E+10 5.58E+10 3.32 5.12 3.96





magnet. #DIV/0!


113mm gap, 30sccm,100mTorr, 200W, 35G. 1.55E+11 1.92E+11 1.79E+11 6.65 10.48 1.73


113mm gap, 30sccm,100mTorr, 200W, no

magnet. #DIV/0!

Summary(with magnet vs. no magnet)• Ar gas 30sccm, 200W CCP power. 35Gauss under the center of

substrate.



Uniformity%

(Stdev/Mean)

Uniformity%

(Max-Min)/2/Mean

Average

Te(ev)





magnet. 5.27E+10 5.84E+10 5.58E+10 3.32 5.12 3.96





magnet. #DIV/0!


113mm gap, 30sccm,100mTorr, 200W, 35G. 1.55E+11 1.92E+11 1.79E+11 6.65 10.48 1.73


113mm gap, 30sccm,100mTorr, 200W, no

magnet. #DIV/0!


Electrode Voltage Ratio vs Electrode Area ratio for RF diode

xxx

Documents

Simulation of Magnetically Confined Plasma for Etch Applications