A plasma discharge generates positive ions (H+) and negative ions (O2-) from water vapor in the air. These

ions have the property of clustering around micro-particles, and thus, they surround harmful substances such asairborne mold fungi, viruses and allergens. At that point, a chemical reaction occurs on the cell membranesurface, and the ions are transformed into OH radicals, a powerfully active but unstable material, which robs theharmful substance of a hydrogen atom (H). As a result, the OH radicals inactivate the harmful substances bysevering the protein on the cell membrane, opening holes. The OH radicals instantly bond with the removedhydrogen (H), forming water vapor (H2O), and return to the air.

Working Mechanism for Plasmacluster Ions

The working mechanism for Plasmacluster Ions against bacteria, viruses and allergens is the positive andnegative ions surround them, and OH radicals generated from the ions damage their structure by fragmentingand decomposing proteins on their surfaces.

Working mechanismto suppress airbornebacteria

Working mechanismto suppress airborneviruses

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Working mechanismto suppress airborneallergens

Major Effects of Plasmacluster Ions

Deactivates allergenichouse dust

Removes mold fungifrom the air

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Inactivates activity ofairborne viruses

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