Seebeck Measurement Setup WrittenProposal

7/29/2019 Seebeck Measurement Setup WrittenProposal

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Senior Design I

ECE 4901

Fall 2009

Seebeck Measurement Setup

Written Proposal

Group Members:

Adam Cywar (Electrical Engineering)

Brian Crabtree (Electrical Engineering)

Nicholas Williams (Electrical Engineering)

Advisor:

Helena Silva

University of Connecticut

Department of Electrical and Computer Engineering


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Induction Heating

Induction heating is a novel heating method that works by applying a switching magnetic field

to a ferromagnetic material. The switching of the magnetic field is achieved by the application

of high frequency AC square waves to a coil, which causes rapid switching of the orientation of

the magnetic dipoles in the center of the coil. When the ferromagnetic material is in thepresence of the switching magnetic field, its magnetic dipoles rapidly change their polarity,

creating kinetic energy and thus heating the material. If the magnetic field lines intersect a non-

ferromagnetic material, they are reflected and no heating occurs. Induction heating is the most

optimum method of heating the sample because it can efficiently and safely provide high

temperatures with the advantage of controlled, localized heating. Figure W illustrates the

inductive heating process.

Figure W: A high frequency AC squarewave is applied to a coil to create oscillating magnetic fields at the

coil center. When a ferromagnetic material is in the presence of the magnetic field, its dipoles align

themselves with the switching magnetic field, creating kinetic energy and thus heat.

Solution

Technical SpecificationsVoltage 120 V, 60 Hz

Maximum AC Current 20 A

Maximum Unit Size 1 m3

Minimum Heating Requirement 750 C

Minimum Temperature Gradient 10 C

Maximum Wafer Size 8 in diameter

Minimum Wafer Size 1 cm2


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Minimum Voltage Measurement Accuracy 5 V

Thermocouple Type K type (-180 to 1300 C)

Cost $2000

The Seebeck measurement setup features an induction heater and a split ferromagnetic chuck

to create a temperature gradient on a sample of interest. The moveable chucks can be

separated to achieve a large temperature gradient, or they can be adjacent to achieve smaller

temperature gradients. A movable aluminum plate can be positioned under the chuck to block

magnetic fields where heating is unwanted. A semiconductor wafer rests on the chucks and is

probed with voltage probes and thermocouples on either side of it. Figures X and Y show side

and top views of the preliminary design.

Figure X: Preliminary design (side view)

Ferromagnetic Ferromagnetic

Aluminum

Inductive Heater

Raised

Platform

Raised

Platform

Semiconductor Sample

Probe

Positioner

Probe

Positioner


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Figure Y: Preliminary design (top view)

A National Instruments data acquisition card will be used to record voltage and temperature

information over time. This will enable real-time data plotting and analysis in a LabVIEW

interface. The proposed setup will allow for flexibility in the measurements.

Project Plan

Budget Estimate

Our budget is $2000. We have been provided micropositioners and a metal stand. We also have access

to the machine shop to build staging or fabricate structures. Other potential costs could include

voltage/thermocouple probe holders, probe tips, and additional positioners.

Item Quantity Price

Inductive heater 1 $80.00

Thermocouples 2 $33.65

Voltage probes 2 Provided

Micropositioners 5 Provided

LabVIEW software 1 Provided

LabVIEW hardware 1 $500.00

Machined parts 1 Provided

Total $647.30

Chuck

Probe

Positioner

Chuck

Semi-

conductor

Wafer

Raised

Platform

Raised

Platform

Probe

Positioner

Aluminum

Plate

Induction Heater


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Project Phases

September October November December January February March April May

Research/

Planning

Design

Order Parts

Preliminary

Testing

Build Prototype

Testing of

Prototype

Improve

Prototype

Finalize

Conclusion

The Seebeck coefficient is an important parameter in semi-conductor wafers and is in the

interest of most people that fabricate devices on semi-conductor wafers. The Seebeck

coefficient can only be experimentally determined since it is too difficult to calculate solely

from the process variables. Hence, it is useful to have a measurement setup that can quickly

and easily determine Seebeck coefficient.

Documents

Seebeck Measurement Setup WrittenProposal