Properties of Photonic and Plasmonic Resonance Devices

Jae Woong Yoon, Kyu Jin Lee, Manoj Niraula, Mohammad Shyiq Amin,and Robert Magnusson

Dept. of Electrical Engineering, University of Texas – Arlington, TX 76019, United States

Outline

• Introduction• Guided-mode resonance bandpass filters.• Broadband omnidirectional Si grating absorbers.• Transmission resonances in metallic nanoslit arrays.• Gain-assisted ultrahigh-Q SPR in metallic nanocavity arrays.• Conclusion

2

Photonic Resonances in Periodic Thin Films

3

Thin-film interference

Guided mode by TIR

Guided-mode resonance

- Highly controllable with the pattern’s geometry.- Spectral engineering by blending of multiple guided modes.

Guided-Mode Resonances in Dielectric and Semiconductor Thin-Film Gratings

Low index-contrast gratings High index-contrast gratings

- High-Q, narrow band resonances.- Primarily reflection peaks.- Optical notch filters, biosensors, and so on.

- Both broadband + narrow-band effects.- Versatile spectral engineering.- Lossless mirrors/polarizers, flat microlenses, bandpass filters, broadband resonant absorbers, and so on.

[Wang and Magnusson, Appl. Opt. 32, 2606 (1993)] [Ding and Magnusson, Opt. Express 12, 5661 (2004)]

4

Bandpass Filters: Theoretical

1250 1275 1300 1325 13500.0

0.2

0.4

0.6

0.8

1.0

Tra

nsm

itta

nce

Wavelength (nm)

Multilayer

GMRnC

nS

I R

Air

SiO2T

nS

Λ fΛ

nF

dGdF

Air

nS

c-Si

d1

d2

n1

n2

R

T

I

nC

nS

Conventionalmultilayer

Single-layer GMRstructure

Major advantages- Simple fab. processes (involves less fabrication errors).- Stop-bands and pass-line are determined by geometry of the surface texture.

Air

SiO2

5

0 500 1000 1500 2000 2500 3000 35000

100

200

300

x-axis (nm)

z-a

xis

(n

m)

Air

SiO2

Air

SiO2

Surface profiles (AFM)

Design Fabricated Performance Parameters

- Pass-line (peak): 0.4 nm FWHM, 83% efficiency.

- Stop-band: < 1% over 100 nm bandwidth.

- Angular tunability = 6 nm/deg.

1200 1250 1300 1350 14000.0

0.2

0.4

0.6

0.8

1.0

Tra

nsm

itta

nce

(T

0)

Wavelength (nm)

Simulation

Measurement

1300 1304 13080.0

0.5

1.0

Bandpass Filters: Experimental

6

Broadband Omnidirectional Absorbers: Theoretical

340

nm

a-Si:H

SiO2

30 n

m20

00 n

m

15.5% fill factorL = 419 nm

Planar absorber

GMR absorber

0 0.2 0.4 0.6 0.8 1

0.3

0.4

0.5

0.6

0.7

0.8

0 30 60 90-30-60-90 0 30 60 90-30-60-90q (polar angle in deg.)

wa

ve

len

gth

(mm

)

TM (planar) TE (planar)

0

0.2

0.4

0.6

0.8

1

0.3

0.4

0.5

0.6

0.7

0.8

0.3

0.4

0.5

0.6

0.7

0.8

0 30 60 90 0 30 60 90 0 30 60 90 0 30 60 90

polar angle of incidence (q in deg.)

wa

vele

ng

th (m

m)

TM, f = 0 � TM, f = 30 � TM, f = 60 � TM, f = 90 �

(a)

TE, f = 0 � TE, f = 30 � TE, f = 60 � TE, f = 90 �

(b) (c) (d)

(e) (f) (g) (h)

7

Broadband Omnidirectional Absorbers: Theoretical

f = 90�60 �

30 �

0�q = 0�

60 �

30 �

90 �

330 �

300 �270 �

240 �

120 �

150 �

180 �

210 �

90 �60 �

30 �

0�

330 �

300 �270 �

240 �

120 �

150 �

180 �

210 �

90 �60 �

30 �

0�

330 �

300 �270 �

240 �

120 �

150 �

180 �

210 �

90 �60 �

30 �

0�

330 �

300 �270 �

240 �

120 �

150 �

180 �

210 �

0�

60 �

30 �

90 �

0�

60 �

30 �

90 �

0�

60 �

30 �

90 �

(a) TM

(c) TE

unpatternedsurface

patternedsurface

(b) TM

(d) TE

0 0.2 0.4 0.6 0.8 1

R0 R0R-1

Anti-Reflection EffectResonant Light Trapping

4530150 60 75 90

0.45

0.50

0.55

0.60

0.65

wa

vele

ng

th (m

m)

4530150 60 75 90

(a) TM, f = 0 � (b) TE, f = 0 �0.5

0.2

0.1

0.05

0.02

0.01

(c)

(d)

q (polar angle in deg.) q (polar angle in deg.)

(e)

(f)

0 25 0 110 14 0 3(c) (d) (e) (f)

0.40

8

1 mm 1 mm

(a) (c) (d)(b)

100 mm

unpatterned area

1D a-Si grating

1 inch

450 500 550 600 650 700 750 800

0.0

0.2

0.4

0.6

0.8

1.0

extinction from unpatterned area

TR

norm

aliz

ed p

ower

wavelength (nm)

extinction

(c)

theory (RCWA)

experiment

(b)(a)

integratingsphere

collimated white light

high N.A objective lens

143.6 �

R

sample

T

Broadband Omnidirectional Absorbers: Experiment

9

Surface Plasmon Resonances in Metallic Nanostructures

10

• Collective oscillation of surface free electrons.• Deep subwavelength confinement: - Metallic metamaterials. - Optical communication with nanoscopic objects. - Quantum optical effects.

• Highly lossy due to ohmic damping.• Primarily absorption and transmission

resonances. (↔ Photonic resonances)

Extraordinary Optical TransmissionNature 391 667; Phys. Rev. B 58 6779.

2

0.45 0.14 0.06

SPP

Destructivelyinterfere

11

Extraordinary Optical Transmission

Destructivelyinterfere

CM

Fabry-Perot resonance of slit guided mode

SPP resonance condition

Cao et al., Phys. Rev. Lett. 88 057403 (2002)

“Negative role of surface plasmons in the transmission of metallic gratings with very narrow slits”

12

1.00 1.05 1.10 1.15 1.20 1.25

1

10-2

10-4

1

10-2

10-4

Ta, Lossless

(eM'' = 0)

b, Lossy (eM'' = 0.01)

Analytic TheoryRCWA

d/L

1.06

l (L)

q = 4

q = 5

T10-6

10-6

Surface and Cavity Plasmonic Resonances in Metallic Nanoslit Arrays

110-510-6 10-4 10-3 10-2 10-1

d (L)0.2 0.4 0.6 0.8 1.0 1.2 1.4 0.2 0.4 0.6 0.8 1.0 1.2 1.4

q = 1 2 3 4 5

a T (RCWA) b T (Analytic Theory)

l(L

)

1.00

1.05

1.10

1.15

1.20

1.25

EH

Tx

y

z

tr in

SPP

CMt

t=tSP+tD

h in

hex

h in

rD+rSP=rinCM

SPP

Slit

Metal Metal

To External Planewave

13

Toward Ultrahigh-Q Metallic Nanocavity Resonances

0.0

0.1

0.2

0.3

0.0

0.5

1.0

1.5

2.0

|t|2

|Ez

/E0|2

0.0

0.2

0.4

0.6

0.8

T

600 650 700 750 800 850 900

0.0

0.2

0.4

0.6

0.8

T

wavelength (nm)

with optical gain in the dielectric host

q = 2q = 4

q = 5

q = 3 (missing)

(a)

(b)

(c)

surface excitation

dielectric 200 nm

Ag semi-inf inite

air

t

25 nm500 nm

airdielectric

Ag

air

200 nm

460 nm

200 nm

T

3.6104

0

PMMA

air

Ag

PMMA

air

lAR

600 650 700 750 800 850 9000.0

0.1

0.2

0.7

0.8

0.9

1.0

1.1

norm

aliz

ed p

ow

er

wavelength (nm)

100%

|rin|2

|t|2

k = 0

k = 2.2610 3

14

Conclusion

• Demonstrated optical bandpass filters and broadband absorbers based on high-index contrast subwavelength waveguide gratings.

• Explained complex resonance effects in metallic nanoslit arrays with a simple model of an optical cavity with Fano-resonant reflection boundaries.

• The theory predicts efficient room-T ultrahigh-Q plasmonic nanocavity resonances with the externally amplified intracavity feedback mechanism.

15

ACKNOWLEDGEMENTThis research was supported, in part, by the UT System Texas Nanoelectronics Research Superiority Award funded by the State of Texas Emerging Technology Fund as well as by the Texas Instruments distinguished University Chair in Nanoelectronics endowment. Additional support was provided by the National Science Foundation (NSF) under Award No. ECCS-0925774 and IIP-1444922.

Publications with these works:[1] J. W. Yoon, K. J. Lee, W. Wu, and R. Magnusson, “Wideband omnidirectional polarization-insensitive light absorbers made with 1D silicon gratings”, Adv. Opt. Mater. 2014; doi:10.1002/adom.201400273.[2] J. W. Yoon, J. H. Lee, S. H. Song, and R. Magnusson, “Unified theory of surafce-plasmonic enhancement and extinction of light transmission through metallic nanoslit arrays”, Sci. Rep. 4, 5683 (2014).[3] J. W. Yoon, S. H. Song, and R. Magnusson, “Ultrahigh-Q metallic nanocavity resonances with externally-amplified intracavity feedback”, Sci. Rep. 4, 7124 (2014).