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Probe Scrub TM HT Restore Probe Performance and Remove Bonded Debris For more informaon, please contact: Internaonal Test Soluons - 1595 Meadow Wood Lane - Reno, NV 89502 (USA) www.inest.net - mail: [email protected] - Phone: +1 775-284-9220 During wafer level test, parculates and other contaminants (e.g., process related organics, bond pad surface oxides, etc.) can accumulate on the contact surface and along the p length of canlevered probe ps (as shown in the figure). The rate and extent of contaminaon accumulaon depends on the sort environment cleanliness and the characteriscs of the bond pads. The buildup of resisve materials directly affects the contact resistance (C RES ) stability and magnitude. In all wafer sort operaons, low and stable C RES contact resistance is crical for maintaining high wafer yields and avoiding re-probe to confirm the first-pass sort results. To control C RES , on-line abrasive cleaning using alumina (aluminum oxide) lapping film (0.5, 1, 3, or 5-μm grit), a tungsten-carbide plate, or a ceramic block is used to physically remove contaminants from the probe contact surface. As the probes are repeatedly abraded, the ps are subjected to friconal shear stresses and p material is removed unl the probes are out of specificaon (p diameter size and/or planarity and alignment). Abrasive cleaning, albeit effecve in removing material from the p, does not collect debris from the p length. This debris, as well as the abrasive parcles from the cleaning pad, can adhere to the probes or become embedded into the contact surface. A theorecal explanaon for these phenomena is given by means of plasc deformaon due to the applied load and the Joule heang that causes the parcles to “micro-weld” to the probe contact surface. Probe Scrub TM HT is a mullayered cleaning medium constructed from a highly cross-linked polymer material (Probe Clean TM ) applied over a precision abrasive surface (Probe Lap TM ). Probe Scrub TM HT was developed specifically for removing contaminants from canlevered probes with flat ps and can be used for all types of probe needle materials (i.e., tungsten, rhenium tungsten, beryllium copper, and palladium–alloy). The material provides excellent results during room temperature probing operaons as well as under elevated temperature condions, or “hot chuck”, up to 125 O C. Inseron into Probe Scrub TM HT allows for a slight scrubbing acon on the abrasive substrate thereby removing embedded and bonded debris from the probe ps. As the probe p is removed from the material, the polymer layer traps the loose debris. The primary cleaning acon of the probe p contact surface occurs during as the ps scrub across the abrasive material. Addional overtravel (approximately 25 μm) is needed to properly clean the probe p surface and the cleaning is most effecve when probes each inseron occurs at a new locaon. Probe Scrub TM can be mounted on various substrates, wafers, and abrasion plates used for on-line and off-line probe cleaning. In the majority of applicaons, Probe Scrub TM HT is used as a direct replacement for on-line lapping film applicaons. FTIR and XPS elemental detecon methods have shown that no residuals are leſt on the probes or bond pads. Accumulated debris on the probe p generated during probing and cleaning. Probe Scrub TM , Probe Clean TM , and Probe Polish TM are registered trademarks of Internaonal Test Soluons.

Probe Scrub - International Test SolutionsProbe Scrub TM HT Restore Probe Performance and Remove Bonded Debris For more informaon, please contact: Interna §onal Test Solu §ons -

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Page 1: Probe Scrub - International Test SolutionsProbe Scrub TM HT Restore Probe Performance and Remove Bonded Debris For more informaon, please contact: Interna §onal Test Solu §ons -

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For more information, please contact:International Test Solutions - 1595 Meadow Wood Lane - Reno, NV 89502 (USA)www.inttest.net - mail: [email protected] - Phone: +1 775-284-9220

During wafer level test, particulates and other contaminants (e.g., process related organics, bond pad surface oxides, etc.) can accumulate on the contact surface and along the tip length of cantilevered probe tips (as shown in the figure). The rate and extent of contamination accumulation depends on the sort environment cleanliness and the characteristics of the bond pads. The buildup of resistive materials directly affects the contact resistance (CRES) stability and magnitude.

In all wafer sort operations, low and stable CRES contact resistance is critical for maintaining high wafer yields and avoiding re-probe to confirm the first-pass sort results. To control CRES, on-line abrasive cleaning using alumina (aluminum oxide) lapping film (0.5, 1, 3, or 5-μm grit), a tungsten-carbide plate, or a ceramic block is used to physically remove contaminants from the probe contact surface.

As the probes are repeatedly abraded, the tips are subjected to frictional shear stresses and tip material is removed until the probes are out of specification (tip diameter size and/or planarity and alignment). Abrasive cleaning, albeit effective in removing material from the tip, does not collect debris from the tip length. This debris, as well as the abrasive particles from the cleaning pad, can adhere to the probes or become embedded into the contact surface. A theoretical explanation for these phenomena is given by means of plastic deformation due to the applied load and the Joule heating that causes the particles to “micro-weld” to the probe contact surface.

Probe ScrubTM HT is a multilayered cleaning medium constructed from a highly cross-linked polymer material (Probe CleanTM) applied over a precision abrasive surface (Probe LapTM). Probe ScrubTM HT was developed specifically for removing contaminants from cantilevered probes with flat tips and can be used for all types of probe needle materials (i.e., tungsten, rhenium tungsten, beryllium copper, and palladium–alloy). The material provides excellent results during room temperature probing operations as well as under elevated temperature conditions, or “hot chuck”, up to 125OC.

Insertion into Probe ScrubTM HT allows for a slight scrubbing action on the abrasive substrate thereby removing embedded and bonded debris from the probe tips. As the probe tip is removed from the material, the polymer layer traps the loose debris. The primary cleaning action of the probe tip contact surface occurs during as the tips scrub across the abrasive material. Additional overtravel (approximately 25 μm) is needed to properly clean the probe tip surface and the cleaning is most effective when probes each insertion occurs at a new location.

Probe ScrubTM can be mounted on various substrates, wafers, and abrasion plates used for on-line and off-line probe cleaning. In the majority of applications, Probe ScrubTM HT is used as a direct replacement for on-line lapping film applications. FTIR and XPS elemental detection methods have shown that no residuals are left on the probes or bond pads.

Accumulated debris on the probe tip generated during probing and cleaning.

Probe ScrubTM, Probe CleanTM, and Probe PolishTM are registered trademarks of International Test Solutions.

Page 2: Probe Scrub - International Test SolutionsProbe Scrub TM HT Restore Probe Performance and Remove Bonded Debris For more informaon, please contact: Interna §onal Test Solu §ons -

For more information, please contact:International Test Solutions - 1595 Meadow Wood Lane - Reno, NV 89502 (USA)www.inttest.net - mail: [email protected] - Phone: +1 775-284-9220

For regular on-line cleaning, the probe tip contact areas are cleaned after ten (10) or less insertions into Probe ScrubTM HT; however, certain compounds and accumulated quantities of embedded material may require more and frequent cleaning iterations. Because each specific testing environment will dictate the cleaning frequency required for optimum yield, the exact “recipe” for properly cleaning probe cards must be determined individually for each user.

CASE STUDYIn some wafer environments, oxidized aluminum “tails” are created by the repeated scrubbing action of the flat probe tips against the bond pads. Typically, these “tails” form at the “heel” of the contact surface. As they grow, the “tails” propagate up the tip length (as shown in the first figure below). These “tails” will affect the CRES magnitude of the probe, may cause pin-to-pin shorts, and will eventually fall onto the wafer surface.

When the test current flow becomes constricted to the increasingly smaller regions intermetallic contact (known as “a-Spots”), localized Joule heating will occur. Due to this heating effect and applied pressure at full overtravel, the aluminum, organic residues, and tip material will interact. As a result, the aluminum attached to the probe surface becomes difficult to remove using non-destructive cleaning methods such as Probe CleanTM; Probe PolishTM; or dry brushing with IPA.

The second figure shows the tip probe after 100 insertions into the polymer layer ONLY. The length of “tail” has been removed and collected by the cleaning polymer; however, the aluminum that has bonded to the “heel” of the contact surface remains. The polymer layer of Probe ScrubTM HT is specially formulated to encapsulate hazardous particulates and prevent release of these harmful materials into the clean room environment. After the material has been used to clean and collect potentially hazardous materials from the probe, it must be properly disposed in appropriate waste containers according to OSHA recommended practices.

The non-alumina abrasive surface under the polymer layer is effective for removing the adherent from the probe contact surface. After ten (10) insertions, the bonded contaminants have been removed from the probe contact surface (as shown in third figure below) and the probe card is ready for use.

International Test Solutions recommends that the material is used regularly to remove debris and clean the probe contact surface. Probe card cleaning frequency varies according to the specific testing environment and some users have reported cleaning as frequently as every 50 die touchdowns while others clean periodi-cally at 4000 die touchdowns.

Contact International Test Solutions (ITS) directly or a local ITS distributor with your specific probe card cleaning requirements.

Aluminum „tail“ at the heel of the contact surface.

Probe ScrubTM, Probe CleanTM, and Probe PolishTM are registered trademarks of International Test Solutions.

„Tail“ was removed with Probe CleanTM but surface is not clean.

Bonded material removed from tip surface with Probe ScrubTM.