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Supporting Information
Preparation of Alumina-Supported
Intermetallic Compounds
Shinya Furukawa,*,† Kenichi Ozawa,‡ Takayuki Komatsu*,‡
†Department of Chemistry and Materials Science, ‡Department of Chemistry, Tokyo Institute of Technology,
2-12-1-E1-10 Ookayama, Meguro-ku, Tokyo 152-8551, Japan
E-mail: [email protected], Tel: +81-3-5734-2602, Fax: +81-3-5734-2758
E-mail: [email protected], Tel: +81-3-5734-3532, Fax: +81-3-5734-2758
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Figure S1. (a) Raw XRD pattern of Pd–Pb/Al2O3 (Pd/Pb = 3), (b) bare Al2O3 and
(c) difference between (a) and (b).
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Figure S2. Peak separation of XRD patterns of Pt–Co/Al2O3 (Pt/Co = 3).
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Figure S3. Peak separation of XRD patterns of Pt–Cu/Al2O3 (Pt/Cu = 1).
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Figure S4. Peak separation of XRD patterns of Pt–Sn/Al2O3 (Pt/Sn = 3).
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Figure S5. Peak separation of XRD patterns of Pd–Pb/Al2O3 (Pd/Pb = 3).
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Table S1. Summary of reduction potential of metal precursor and resulted relative peak intensity. noble metal base metal ΔE / V IMN
precursor redox couple E1/2 / V ref. precursor redox couple E1/2 / V ref. H2 LiBH4
PtCl62– PtCl6
2–/PtCl42– 0.726 [1] Cu2+ Cu2+/Cu(0) 0.339 [2] 0.387 100 100
PtCl62– PtCl6
2–/PtCl42– 0.726 [1] Co2+ Co2+/Co(0) –0.282 [2] 1.008 46 100
PtCl62– PtCl6
2–/PtCl42– 0.726 [1] Sn2+ Sn2+/Sn(0) –0.141 [2] 0.867 46 63
PtCl62– PtCl6
2–/PtCl42– 0.726 [1] SnCl6
2– SnCl42–/Sn(0) –0.286 [3] 1.012 40 47
PdCl42– PdCl4
2–/Pd(0) 0.600 [1] Pb2+ Pb2+/Pb(0) –0.126 [2] 0.726 72 88 [Pt(NH3)4]2+ [Pt(NH3)4]2+/Pt(0) 1.400 [4] Cu2+ Cu2+/Cu(0) 0.339 [2] 1.061 27 62
[Pt(NH3)4]2+ [Pt(NH3)4]2+/Pt(0) 1.400 [4] Co2+ Co2+/Co(0) –0.282 [2] 1.682 0 59 [Pt(NH3)4]2+ [Pt(NH3)4]2+/Pt(0) 1.400 [4] Sn2+ Sn2+/Sn(0) –0.141 [2] 1.541 16 59 [Pt(NH3)4]2+ [Pt(NH3)4]2+/Pt(0) 1.400 [4] SnCl6
2– SnCl42–/Sn(0) –0.286 [3] 1.686 27 40
Pd2+ Pd2+/Pd(0) 0.915 [2] Pb2+ Pb2+/Pb(0) –0.126 [2] 1.041 19 80
[1] Atkins, P. W.; Shriver, D. F. Inorganic chemistry; 4th ed.; W.H. Freeman: New York, 2006. [2] Bratsch, S. G. J. Phys. Chem. Ref. Data, 1989, 18, 1. [3] Kolthoff, I. M.; Johnson, R. A. Anal. Chem. 1951, 23, 574. [4] Elferink, F.; Leeuwenkamp, O. R.; Pinedo, H. M.; Van Der Vijgh, W. J. F. J. Electroanal. Chem. 1987, 238, 297.
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