Preliminary Technical Program · A Comprehensive Technical Program Vacuum coating technology plays a vital role in the success of several industries. The Traditional Program Sessions

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Technical Program: April 16–21, 2011

• ManufacturingandTechnologyforThinFilmPhotovoltaics• CoatingAdvancesanditsImpactontheFutureoftheVacuumCoatingIndustry

Featuring two Symposia:

JoinusasweexploretheSymposiatopicsasintegralpartsofourtraditionalTechnicalProgram,two-dayExhibitandEducationProgram.

SVC TechCon | Chicago 2011

New! for the 2011 TechCon Exhibit

Register Now for the 2011 TechCon in Chicago!

On-lineboothRegistrationSystemandReal-timeExhibitHallFloorPlanhasbeendesignedtoelevatetheExhibitExperienceforAttendeesandExhibitors

April 16-21, 2011 • Hyatt Regency Chicago

PreliminaryTechnical Program

Technical Program • Exhibit • Tutorial Courses

Traditional Sessions:• VacuumWebCoating• CoatingsforCleantechEnergyConversion,

StorageandRelatedProcesses• TribologicalandDecorativeCoating• EmergingTechnologies• HighPowerImpulseMagentronSputtering• OpticalCoating• LargeAreaCoating

• VacuumProcessesandCoatingsforHealthCareApplications

• PlasmaProcessing• Heuréka!Post-DeadlineRecentDevelopments• BusinessTopicsSession• VendorInnovatorsShowcase• TechnicalPosterPresentations

Tutorial Courses: April 16–21, 2011Featuring26practicalproblem-solvingtutorialsdevelopedbytheSVCandtaughtbysomeofthemost

respectedprofessionalsinthevacuumcoatingindustry...seepage15forthePreliminaryTutorialRoster

Society of Vacuum Coaters » 2011 TechCon Preliminary Program �

Conference Overview2011

�

We look forward to welcoming you to the 54th Annual SVC TechCon in Chicago, IL. This year, in addition to the key traditional technical sessions, SVC has added two new Symposia, which address photovoltaic manufacturing and PVD coating advances and its future outlook.

Symposium on Manufacturing and Technology for Thin Film PhotovoltaicsSVCwilllookatfuturephotovoltaicmarketsandgrowth,governmentprogramsdevelopinggreenrenewabletechnology,andfundingformanufacturingplants.OurSymposiumwillalsocoverthevariousthinfilmphotovoltaictechnologiesandexplorethelatestmanufacturingprocessesandequipment.AttendtheSymposiumKeynotePresentation,asWinfriedHoffmann,VP,EuropeanPhotovoltaicIndustryAssociation,willhighlightThinFilmPVasafuturemajortechnologytosupplyelectricity.

Symposium on Coating Advances and its Impact on the Future of the Vacuum Coating IndustryThisSymposiumwillgiveourindustryandscientificcommunityguidanceastowhatthefuturemayholdasvacuumcoatingapplicationschangeandmarketsgrow.Wewillidentifynewmarketsthatarepoisedforgrowth,marketsseeingdeclineanddistinguishmarketleadersbothfromacorporateandresearchpointofview.Emergingvacuumprocessesandnon-vacuumcoatingtechnologieswillbecomparedwithexistingPVDandothervacuum-basedprocesses.TheoutcomewillprovidedirectionforourindustryandtheSocietyasawhole.OurSymposiumKeynotespeakerGünterBräuer,FraunhoferInstituteforSurfaceEngineeringandThinFilmsIST,willfocusonthemilestonesandfuturechallengesofmagnetronsputtering.

A Comprehensive Technical ProgramVacuum coating technology plays a vital role in the success of several industries. The Traditional Program Sessions feature a strong line-up of key speakers on the advances of coatings across a vari-ety of applications, including: Optical Coating, Tribological and Decorative Coating, Clean Tech-nology, and Processes and Coatings for Health Care Applications. In our broader process and science-oriented sessions, we illuminate developments in Plasma Processing, High Power Impulse Magnetron Sputtering (HIPIMS), and Emerging Technologies. Production-based sessions include Large Area Coating and Vacuum Web Coating. We continue to accept abstracts for late-breaking topics to present at the evening Heuréka! Session and our ever-growing Poster Session, providing presenters with the unique opportunity to discuss their latest work on a one-to-one basis with at-tendees. Due to the importance of business in the vacuum coating field, SVC is once again offering a Business Topics Session designed to give guidance to our attendees, exhibitors and entrepreneurs interested in improving the way they do business.

Network with Colleagues and ClientsThere is no better way to make connections within our technology and industry than by face-to-face interaction with other professionals. SVC believes that strong networking is an important pillar of our conference. Attend any of the several Networking Events SVC is offering throughout the five-day conference, formulated to inspire conversation and interaction with colleagues and clients.

What’s New in Vacuum Coating? The Intersection of Technology and BusinessThe SVC Equipment Exhibition in Chicago has been enhanced to incorporate new business-friendly events, crafted to provide learning, networking and business opportunities for all TechCon participants throughout the entire two-day Exhibit. In addition to a global collec-tion of manufacturers and suppliers of vacuum deposition equipment, analytical equipment and components, SVC will provide valuable networking opportunities inside the Exhibit Hall to allow more interaction between those seeking information on our technology and those who can offer solutions. Read more about the 2011 Exhibit on page 28.

Problem-Solving Education ProgramA strong commitment to education is part of SVC’s charter. Twenty-six tutorials, taught by specialists in the topic, will be presented during the TechCon, allowing both novice and experienced vacuum coaters the ability to broaden their understanding of the applica-tions of vacuum coating. A full list of the Tutorials offered in 2011 is found on page 15.

Join Our World Class Conference SVC is quickly becoming the keystone orga-nization for coating technology. We hope you will attend the SVC TechCon and meet our family of professionals and manufacturers. Further details are available at www.svc.org, at [email protected] or contact 505/856-7188.—CarlLampert,SVCTechnicalDirector,707/794-0333,[email protected]

WolfgangDecker,VASTFILMSLtd.(724/827-8827;[email protected])istheProgramChair.ScottWalton,U.S.NavalResearchLaboratory(202/767-7531;[email protected])istheAssistantProgramChair.LadislavBárdos,UppsalaUniversity,Sweden(46/18-4713034;[email protected])isthePastProgramChair.

�505/856-7188 Fax 505/856-6716 » E-mail [email protected] » Web Site www.svc.org

Technical Program2011


Table of ContentsConferenceOverview. . . . . . . . . . . . . . . . .2PlenaryAddress. . . . . . . . . . . . . . . . . . . . .3KeynoteSpeakers. . . . . . . . . . . . . . . . . . 4,62011TechnicalProgram. . . . . . . . . . . 4-14DonaldM.MattoxTutorialProgram. 5,13TechnologyForumBreakfasts. . . . . . . . . . 7AWizard’sGuidetoUnderstanding

VacuumandVacuumCoating. . . . . . . . 8SVCFoundation5KFunRunandWalk. 8SVCFoundationScholarshipStudent . . 12“MeettheExperts”Corner . . . . . . . . . . . 132011SVCExhibitandTarget

Marketing . . . . . . . . . . . . . . . . . . . . . . . 28CorporateSponsors. . . . . . . . . . . . . . . . . 29EducationProgramSchedule . . . . . . . . . 15TutorialCoursesandInstructors . . . 16-27SVCOnLocationEducation

Program. . . . . . . . . . . . . . . . . . . . . . 20-21SVCNetworkingEvents. . . . . . . . . . . . . . 27ConferenceRegistrationInformation30-312011TechConSponsors. . . . . . . . . . . . . . 32

SATURDAYEducation Program Full Day Tutorials 8:30 a.m. - 4:30 p.m.

Vacuum Systems, Materials and Operation Introduction to Physical Vapor Deposition Practical Aspects of Optical Coatings Thin Film Growth and Microstructure

Evolution

Weekend at a GlanceSUNDAYEducation Program

Sputter Deposition (Day 1 of 2) Optical Coating Design and Monitoring Plasma Modification of Polymer Materials

and Plasma Web Treatment High Power Impulse Magnetron Sputtering Introduction to Photovoltaic Materials and

Photovoltaics

Special Events SVC Foundation Golf Tournament - TBD Young Members Group/Mentors Program

4:30 p.m. – 5:30 p.m. Opening Ceremonies, Awards Presentations,

Annual Business Meeting 7:00 p.m. Plenary Address Welcome Reception 8:45 p.m.

Stereoscopic 3D Sunday Evening, April 17, after the Opening Ceremonies, Awards Presentations and Annual Business Meeting at 7:00 p.m.

PresentedbyMikeRobinson,RealD,Boulder,CORealD will be introduced first, describing its role in the resurgence of stereoscopic cinema. Stereoscopy will then be described as the means by which cinema viewers experience 3D. A detailed presentation of the latest stereoscopic display technologies will follow, highlighting specific instanc-es where dichroic coatings have been utilized. The remainder of the talk will describe the relationship between ‘natural’ and two-view stereoscopic 3D. Image capture and replay geometries highlight current issues with stereo content creation and the remainder of the talk will analyze these issues to give best live-capture and computer rendering practices.

MikeRobinsonhasaBachelorsandDoctorateinPhysicsfromtheUniversityofOxford,UK.HestayedonatOxfordfortwoadditionalyearsasthePlesseyResearchFellowbeforemovingtoBoulder,Coloradoin1988.AsaResearchAssistantProfessorattheUniversityofColoradoheworkedonLiquidCrystalDevicesandOpticalComputingSystems.In1990hereturnedtoOxfordtoworkatSharpLaboratoriesofEuropewherehespecial-izedindigitalprojectors.Aftersevenyears,hemovedbacktoBouldertojoinColorLink,a“spin-off”fromtheUniversityofColoradothatdevelopedandmanufacturedretarderbasedpolarizationfilters.AtColorLinkhewasresponsibleforprojectionTVsystems,patentingseveralsystemanddevicedesignsthatwerecommercial-izedbyJVC,Sony,Hitachiandothers.ColorLinkwasboughtbyRealDthreeandahalfyearsago,andthoughhisprimaryresponsibilityisnowinthedevelopmentofconsumerdisplaytechnologiessuchas3DTVs,asChiefScientistheisactivelyinvolvedinallofRealD’sresearchactivities.

SuNdAy EVENiNg PlENARy AddRESS

SVC Young Members Group/Mentors ProgramSunday Afternoon, April 17, 2011 • 4:30 p.m. to 5:30 p.m.A mentoring program is being offered at the 2011 TechCon for Young Members and students, and is designed to enable participants to engage in one-on-one discussions with volunteer men-tors from industry and academia within various sectors of the vacuum coating community.The mentoring program will provide a “bridge” between Young Members, students and mentors within the Society, and will facilitate a venue for connecting with those working in specific areas of vacuum coating, thus enhancing their overall TechCon experience. The program will be the focus of a special session on Sunday afternoon, April 17, 2011, from 4:30 p.m. to 5:30 p.m.For more information on the Young Members Group and Mentors Program, visit the Web Site at www.svc.org and explore the Students and Young Members button. A list of mentors, includ-ing their professional affiliation and area of expertise, is available for anyone seeking to make connections prior to attending the TechCon in Chicago.



■ Monday Morning, April 18Technology Forum Breakfast7:00 a.m. – 8:15 a.m.Facilitator-led round table discussions provide an opportunity for information, conversation and interaction on specific subjects. See page 7 for topics and facilitators.

Keynote Presentation8:30 a.m. - 9:15 a.m.Thin Films in PV Solar Electricity: Contribution to a Future Mainstream Electricity ProviderPresentedbyWinfriedHoffmann,VicePresi-dent,EuropeanPhotovoltaicIndustryAssocia-tion(EPIA),Brussels,BelgiumSee abstract and biographical sketch on this page.

Symposium on Manufacturing and Technology for Thin Film PhotovoltaicsModerators: Carl Lampert, StarScience, Wolf-gang Diehl, FraunhoferInstituteforSurfaceEngineeringandThinFilmsIST,Germany, and Michael Andreasen, VacuumEdge

ContributedbytheOptical Coating TAC9:30 a.m. SPV-1 Thin Film Photovoltaics: Challenges and OpportunitiesD. Levi, National Center for Photovoltaics, National Renewable Energy Laboratory, Golden, CO10:10 a.m. SPV-2 High Efficiency Rotatable Sputtering Targets for CIGS Thin Film Photo-voltaicsJ. Heindel, A. Kastner, M. Schlott, A. Seapan, and C. Simons, W.C. Heraeus GmbH, Hanau, Germany10:30 a.m. SPV-3 Novel Near-Net Geometric Approach to Increase Utilization of Planar CIG TargetsJ. Hisert and T. Acchione, Indium Corpora-tion, Clinton, NY10:50 a.m. – 11:10 a.m. – Break

ContributedbytheVacuum Web Coating TAC11:10 a.m. SPV-4 High Efficiency Flexible CIGS and CdTe Solar Cells and Modules for Roll-to-Roll ManufacturingA.N. Tiwari, Laboratory for Thin Films and Photovoltaics, EMPA - Swiss Federal Labora-tories for Science and Technology, Dübendorf, Switzerland and Flisom AG, Dübendorf, Switzerland

Symposium on Manufacturing and Technology for Thin Film PhotovoltaicsMonday Morning, April 18 at 8:30 a.m.

Thin Films in PV Solar Electricity: Contribution to a Future Mainstream Electricity ProviderPresentedbyWinfriedHoffmann,VicePresident,EuropeanPhotovoltaicIndustryAssociation(EPIA),Brussels,BelgiumThin film technologies based on physical vapour and plasma enhanced chemical vapour deposition (PVD and PECVD) have been developed for a number of high-tech industries over the last decades. Prominent examples are the semiconductor and display industry, as well as large area architectural glass and flexible substrates deposition. For all these

products, a characteristic cost and price decrease was observed which is nicely described in the respective well known Price Experience Curve. Analysing the Price Experience Curve for PV crystalline silicon modules over the last 30 years, it will become evident that cost efficient PV thin film technologies or thin films in conjunction with wafer based crystalline Si are a prereq-uisite to meet the anticipated cost and price goals for the upcoming decade. In this time frame the generation cost of PV electricity will first demonstrate grid parity with conventional retail electricity prices and towards 2020 reach generation cost with peak power stations and later be competitive with clean coal power stations. This will provide evidence that PV has the power to become one of the major energy providers in the future and will contribute significantly to meet the goal of 100% global end energy by only renewable technologies beyond 2050. This will be the rationale why we will see a huge increase of appropriate thin film technologies in the years to come.Dr.HoffmanngraduatedwithadegreeinphysicsandhisPhDthesisisinbiophysics.Hejoinedthephotovol-taicR&DgroupforthinfilmsolarcellsofNUKEMin1979andtookoveritsleadershipin1985.HeinitiatedthejointventurebetweenNUKEMandDaimler-BenzAerospacetoform“AngewandteSolarenergie-ASEGmbH”in1994whereheservedasManagingDirector.InOctober2002,theRWESCHOTTSolarGmbHwasformed,whereheservedasChairmanoftheBoard.SCHOTTacquiredRWESolutionsin2005andthecompanywasrenamedSCHOTTSolarGmbH,wherehewasaMemberoftheManagementCommittee.In2007hejoinedAppliedMaterialstobecomeChiefTechnologyOfficerandVicePresidentoftheSolarBusinessGroupandmemberoftheManagementBoardofAppliedMaterialsGmbH.HeiscurrentlyVicePresidentoftheEuropeanPhotovoltaicIndustryAssociation(EPIA)andmemberoftheScientificBoardoftheFraunhoferInstituteforSolarEnergy(FhG-ISE)andtheSupervisoryBoardoftheInstituteforSolarEnergyResearchinHameln(ISFH)aswellastheHelmholtzCentreBerlin.

KEyNOTE SPEAKER

MoRNiNgTechnical Sessions

Keynote Presentation 8:30 a.m. Symposium on Manufacturing and

Technology for Thin Film Photovoltaics Tribological and Decorative Coating Plasma Processing

Special Events Technology Forum Breakfast

7:00 a.m. – 8:15 a.m.

AFTERNooNTechnical Sessions

Donald M. Mattox Tutorial 12:30 p.m. Keynote Presentation 1:30 p.m. Symposium on Coating Advances and its

Impact on the Future of the Vacuum Coating Industry

Tribological and Decorative Coating Large Area Coating High Power Impulse Magnetron Sputtering

(HIPIMS) Heuréka! (Evening)

Special Events “Meet the Experts” 12:15 p.m. – 1:15 p.m.

Monday at a Glance

Education Program - Full Day Tutorials 8:30 a.m. - 4:30 p.m. Sputter Deposition (Day 2 of 2) Sputter Deposition onto Flexible Substrates Numerical Methods for Optical Coatings Characterization of Thin Films



11:50 a.m. SpecialPresentationF. Pan, Vice President, Chinese Vacuum Soci-ety and Professor, Tsinghua University, Beijing, People’s Republic of China

Tribological and Decorative CoatingModerators: Jolanta Klemberg-Sapieha, ÉcolePolytechniquedeMontréal,Canada and Renato Bonetti, IonBondAG,Switzerland

9:30 a.m. T-1 Applications of Rolling Ele-ment Bearings with Vacuum-Deposited Tribo-logical CoatingsG. Doll, The Timkin Company, Canton, OH10:10 a.m. T-2 W-Cr-C-N Nanocomposite Thin-Film Coatings via Reactive Magnetron SputteringSponsored Student PresentationM.J. Walock, Department of Physics, Uni-versity of Alabama at Birmingham, Birming-ham, AL and Laboratoire Bourguignon des Matériaux et Procédés, CER Arts et Métiers ParisTech of Cluny, Cluny, France; I. Rahil, Laboratoire Bourguignon des Matériaux et Procédés, CER Arts et Métiers ParisTech of Cluny, Cluny, France; Y. Zou, Department of Physics, University of Alabama at Birming-ham, Birmingham, AL; C. Nouveau, Labora-toire Bourguignon des Matériaux et Procédés, CER Arts et Métiers ParisTech of Cluny, Cluny, France; and A.V. Stanishevsky, Department of Physics, University of Alabama at Birming-ham, Birmingham, AL10:30 a.m. T-3 High Rate Deposition of Hard a-C:H Coatings Using Microwave Enhanced Plasma CVDI. Bialuch and K. Bewilogua, Fraunhofer Insti-tute for Surface Engineering and Thin Films IST, Braunschweig, Germany; and M. Günther, S. Peter, and F. Richter, Technical University of Chemnitz, Chemnitz, Germany10:50 a.m. – 11:10 a.m. – Break11:10 a.m. T-4 Improved Fretting Wear Resis-tance of Carbon-Carbon Composites by Infil-tration of Atomic Layer Deposited Tetragonal ZrO2 and ZnO/Al2O3/ZrO2 Nanolaminate CoatingsH. Mohseni and T.W. Scharf, Department of Materials Science and Engineering, University of North Texas, Denton, TX11:30 a.m. T-5 Duplex a-C:H:Si Coatings of Inner Surfaces by Means of DC-PACVD C. Forsich and S. Heim, Department of Materi-als and Engineering, University of Applied Sciences, Wels, Austria; and T. Müller, Rübig GmbH & Co KG Anlagentechnik, Wels, Austria

11:50 a.m. T-6 New Rapid Metallizer for Fully Automated PVD-Metallization in the Packag-ing IndustryB. Gebhardt, K.-D. Steinborn, T. Steinborn, G. Buschbeck, and M. Falz, VTD Vakuumtechnik Dresden GmbH, Dresden, Germany

Plasma ProcessingModerator: Scott Walton, U.S.NavalReserachLaboratory

9:30 a.m. P-1 Diagnostics of Low and At-mospheric Pressure Plasmas by Means of Mass SpectrometryJ. Benedikt, D. Ellerweg, and A. von Keudell, Ruhr University Bochum, Bochum, Germany10:10 a.m. P-2 Studying Low Temperature TiO2 PA-ALD Process with Optical Emission Spectroscopy S. Lehti, T.O. Kääriäinen, and D.C. Cameron, ASTRaL, Lappeenranta University of Technol-ogy, Mikkeli, Finland10:30 a.m. P-3 Hollow Cathode Plasma Acti-vation in Reactive Gas AtmosphereB. Zimmermann and F. Fietzke, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany; and W. Moeller, Forschingszentrum Dresden-Rossen-dorf, Dresden, Germany10:50 a.m. – 11:10 a.m. – Break11:10 a.m. P-4 The Angular Distribution of the Arriving Metal Flux during Magnetron Sputter DepositionSponsored Student PresentationK. Van Aeken and W. Leroy, University of Gh-ent, Ghent, Belgium; M. Horkel, Technische Universitaet Wien, Wien, Austria; D. Depla, University of Ghent, Ghent, Belgium; and C. Eisenmenger-Sittner, Technische Universitaet Wien, Wien, Austria

11:30 a.m. P-5 Applied PIC-MC Simulation for Process Analysis and DevelopmentM. Siemers, A. Pflug, C. Schwanke, and B. Szyszka, Fraunhofer Institute for Surface En-gineering and Thin Films IST, Braunschweig, Germany

■ Monday Afternoon, April 18“Meet the Experts” Corner12:15 p.m. - 1:15 p.m.Get the answers to your vacuum coating prob-lems. See page 13 for details.

The Donald M. Mattox Tutorial Program12:30 p.m. – 1:10 p.m.See sidebar for details

Donald M. Mattox Tutorial Program Monday Afternoon, April 1812:30 p.m. - 1:10 p.m.

Materials Science and Materials Chemistry for Large-Scale Electrochemical Energy Storage Presented by Jun Liu, Pacific NorthwestNationalLaboratory,Richland,WA

This talk aims to discuss important cross-cutting, fun-damental materials science and materials chemistry challenges that are applicable to a range of technologies encountered in elec-

trochemical storage. This talk will attempt to highlight the critical materials prob-lems using specific examples and results from recent efforts to reduce the cost and improve the performance of electrochemi-cal energy storage devices. Specifically, this talk discusses 1) the characterization and understanding of the complex solution chemistry and redox reactions in concen-trated, aggressive electrolyte solutions, 2) approaches to develop new battery designs and new chemistry combinations to reduce the cost, and 3) limitations and challenges of the electrode materials, nanoporous materials and ion selective membranes. In addition, the paper discusses the prospect of emergent technologies with ultralow costs on new energy storage materials and mechanisms.JunLiu’sbackgroundisincolloidalandsurfacescience,materialsprocessing,andhigh-resolu-tionelectronmicroscopyandheholdsaPh.D.inMaterialsScienceandEngineeringfromtheUniversityofWashington,Seattle.Someofhisresearchactivitiesincludedevelopingnovelfunctionalmaterials,self-assemblyofsyntheticmaterialsandhybridmaterials/devicesinvolvingactivebiomolecules,developingafundamentalunderstandingforlarge-scalefabricationofnanomaterials,controllednucleationandgrowth,catalyticscience,chemicalandbiosensing,targetedandcontrolleddrugrelease.Dr.Liu’sresearchhashadanimpactonthedirectionofnanosci-enceresearch.Hisresearchincludes“cuttingedge”programsrangingfromfundamentalstudiesofmolecularlyorganizednanostructuralmaterials,toself-organizationofcomplexproteins,tothedevelopmentofuniquematerialsaimedatapar-ticularapplication.Dr.LiuisaLaboratoryFellowatPNNLandleadsthesynthesistaskwithinthecatalysisinitiative.



Keynote Presentation1:30 p.m. - 2:10 p.m.Magnetron Sputtering and its Applications – Milestones and Future ChallengesPresentedbyGünterBräuer,FraunhoferInsti-tuteforSurfaceEngineeringandThinFilmsIST,Braunschweig,GermanySee abstract and biographical sketch on this page.

Symposium on Coating Advances and its Impact on the Future of the Vacuum Coating IndustryModerators: Ric Shimshock, MLDTechnolo-giesLLC, Carl Lampert, StarScience and Wolf-gang Diehl, FraunhoferInstituteforSurfaceEngineeringandThinFilmsIST,Germany

ContributedbytheVacuum Web Coating TAC2:30 p.m. SCA-1 Technical Gap Analysis of Vacuum Coated Materials for Flexible OLED

IPN, Saltillo, Mexico; and J. Reyes-Gomez, V. Ibarra-Junquera, L. Valladares-Vadillo, and H. Gonzalez-Ramirez, University of Colima, Colima, Mexico

ContributedbytheAtmospheric Plasma Technologies Group4:50 p.m. SCA-5 Study of a PECVD Process Using Homogeneous Dielectric Barrier Dis-charges at Atmospheric PressureN. Gherardi, L. Maëchler, I. Enache, N. Naudé, and H. Caquineau, Université de Toulouse, Toulouse, France; and F. Massines, Tecnosud, Rambla de la Thermodynamique, Perpignan, France

Tribological and Decorative CoatingModerators: Klaus Bewilogua, FraunhoferInstituteforSurfaceEngineeringandThinFilmsIST,Germany and Allan Matthews, TheUniver-sityofSheffield,UnitedKingdom2:10 p.m. T-7 Deposition of TiCx and W-C:H Layers with Rates of 100 nm/sJ.-P. Heinss, O. Zywitzki, and T. Modes, Fraun-hofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany2:30 p.m. T-8 Development of High Perfor-mance Circular Plasma Sources for the De-position of Tribological Coatings and Process Up-Scaling by Integration of Two SourcesS. Ulrich, J. Ye, M. Stüber, and H. Leiste, Karlsruhe Institute of Technology (KIT), Eggenstein-Leopoldshafen, Germany; and R. Tietema and T. Krug, Hauzer Techno Coating BV, Venlo, The Netherlands2:50 p.m. T-9 Enhancing Gear Life with Nanocomposite Coatings Deposited by Arc Evaporative PVDL. Chen and P. Hatto, Ionbond Ltd., Consett, United Kingdom; and M. Vaidhianathasamy and B. Shaw, Newcastle University, Newcastle Upon Tyne, United Kingdom3:10 p.m. – 3:30 p.m. - Break3:30 p.m. T-10 Industrial Ta-C Coating Tech-nology by Laser-Arc-Module System Com-bined with a Novel Filtering UnitH.-J. Scheibe, Fraunhofer Institute for Mate-rial and Beam Technology IWS, Dresden, Germany; M. Falz and M. Holzherr, VTD Vakuumtechnik Dresden GmbH, Dresden, Germany; M. Leonhardt, A. Leson, and C.-F. Meyer, Fraunhofer Institute for Material and Beam Technology IWS, Dresden, Germany; and K. Steinborn, VTD Vakuumtechnik Dres-den GmbH, Dresden, Germany3:50 p.m. T-11 The Role and Value of Low Friction Coatings in Sheet Metal Forming Ap-plicationsB. Janoss and C. Flattery, Ionbond North America, Madison Heights, MI

Symposium on Coating Advances and its Impact on the Future of the Vacuum Coating IndustryMonday Afternoon, April 18 at 1:30 p.m.

Magnetron Sputtering and its Applications – Milestones and Future ChallengesPresentedbyGünterBräuer,FraunhoferInstituteforSurfaceEngineeringandThinFilmsIST,Braunschweig,GermanyThe planar magnetron cathode was introduced in 1974. Magnetron sput-tering has become the most important technology for the deposition of thin films when excellent performance is required. Today it is one of the key processes for manufacturing of innovative products: like all kinds of discs for data storage and entertainment, flat displays, smart windows or

thin film solar cells. The magnetron cathode combines the advantages of economic deposition even on large areas and the ability to coat very temperature sensitive plastic substrates. The long term stable deposition of highly insulating films on large areas at high growth rates, the stabi-lization of reactive processes in an unstable transition regime of the plasma discharge, and the improvement of target material utilization have been the main challenges to be solved during the past three decades. One of the main tasks in the near future will be the exploration of highly ionized plasmas and their benefits for even better film quality. High Power Impulse Magnetron Sputtering has already proven its potential in the field of tribological and optical coatings. In particular, precision optics needs dense films without any defects. New attempts to increase the sputter yield and thus film growth rate are “Sputter Yield Amplification” or sputtering from hot targets. A novel process introduced as serial co-sputtering provides yield amplification as well as improved stability for reactive deposition processes. The presentation will outline milestones of the past 40 years and describe some of the new developments.GünterBräuerstudiedphysicsattheUniversityofGießen,wherehereceivedhisdoctoratedegreein1984.HejoinedLeybold-HeraeusasamemberoftheR&Ddepartmentforthinfilmtechnology.Formanyyearshewasengagedinthedevelopmentofmagnetronsputterprocesses.HewasappointedheadofR&Din1992andVicePresidentofLeyboldSystemsGmbHin1995.Since1999,Dr.BräuerisprofessorattheTechnicalUniversityofBraunschweigteachingthinfilmtechnology.HeisheadoftheUniversityInstituteforSurfaceTechnologyaswellastheFraunhoferInstituteforSurfaceEngineeringandThinFilms(IST).FormanyyearshehasbeeninvolvedintheorganizationofconferenceslikethePSEandtheICCG.Since2006heisChairmanoftheBoardofaGermannetworkofcompetenceentitled“INPLAS”or“IndustrialPlasmaSurfaceTechnology”.

KEyNOTE SPEAKER

Display and Lighting ApplicationsR. Ma and J.J. Brown, Universal Display Cor-poration, Ewing, NJ3:10 p.m. – 3:30 p.m. - Break

ContributedbytheVacuum Processes and Coatings for Health Care Applications TAC3:30 p.m. SCA-2 Creating Nanosurfaces and their Implications for the Medical Device IndustryT.J. Webster, School of Engineering and De-partment of Orthopaedics, Brown University, Providence, RI4:10 p.m. SCA-3 Impact of Thin Film Coat-ings on the Performance of Highly Energy-Ef-ficient WindowsL. Boman, J. Meade, C. Stoessel, and R. Wipfler, Southwall Technologies Inc., Palo Alto, CA4:30 p.m. SCA-4 Titanium Nitride Species Synthesized by the HYSYCVDC. Villa Velazquez, University of Colima, Colima, Mexico; M.I. Pech-Canul, Centro Investigacion y de Estudios Avanzados del



4:10 p.m. T-12 Super-Hard, Ultra-Thick Nanocomposite Coating for Severe Environ-mentsR. Wei, Southwest Research Institute, San Antonio, TX4:30 p.m. T-13 Erosion Resistant MAX Phase CoatingsC. Leyens and O. Schroeter, Technische Uni-versität Dresden, Dresden, Germany; A. Maier and R. Basu, Brandenburgische Technische Universität Cottbus, Cottbus, Germany; and A. Flores Renteria, Technische Universität Dresden, Dresden, Germany4:50 p.m. T-14 Tribological Properties of CrZr-Si-N Coatings at Elevated Temperatures Y.-S. Kim and S.Y. Lee, Department of Materi-als Engineering, Korea Aerospace Univer-sity, KoYang-Si, South Korea; and T.Y. Kim, D.Y. Lee, and W.Y. Choo, POSCO Technical Research Laboratories, Gwangyang-Si, South Korea5:10 p.m. T-15 CVD-Technology and Machinery - Tribological Applications - Its Potential for High Temperature ApplicationsR. Bonetti, H. Strakov, and A. Scott, Ionbond AG, Olten, Switzerland

Large Area CoatingModerators: Michael Andreasen, VacuumEdge and Johannes Strümpfel, VONAR-DENNE,Germany2:10 p.m. L-1 Multi-Point Spectral Optical Monitoring for the Next DecadeB. Barney, NVision Instruments, Inc., Santa Cruz, CA2:30 p.m. L-2 High Rate EB-PVD in In-dustrial Applications: Evaporation from Hot Crucibles versus Water Cooled Crucibles J. Faber, E. Reinhold, and T. Niederhausen, VON ARDENNE, Dresden, Germany2:50 p.m. L-3 A New Generation of Plasma-Based Electron Beam Sources for High-Rate PVD and Non-Thermal Materials ProcessingG. Mattausch, P. Feinäugle, S. Schmidt, and F.-H. Rögner, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany3:10 p.m. – 3:30 p.m. - Break3:30 p.m. L-4 ITO Revisited: A Study of Coating Properties Obtained with Sintered Ceramic Rotary Targets Aiming at Display Ap-plicationsP. Lippens, Umicore Thin Film Products, Olen, Belgium; and M. Haldemann, Umicore Thin Film Products, Balzers, Principality of Liechtenstein3:50 p.m. L-5 Recent Advances Deposit-ing Nb2O5 Thin Films by Sputtering Ceramic NbOX Targets R. Nyderle, R. Blüthner, and T. Prüssner,

Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany4:10 p.m. L-6 Reactive Aluminium-Doped Zinc Oxide Deposition Using Asymmetric Linked Dual Rotatable MagnetronM. Audronis, V. Bellido-Gonzalez, R. Brown, B. Daniel, and D. Monaghan, Gencoa Ltd., Liverpool, United Kingdom4:30 p.m. L-7 A Room Temperature, Low Stress Bonding Process to Reduce the Impact of Use Stress on a Sputtering Target Assembly T. Acchione and J. Hisert, Indium Corpora-tion, Clinton, NY4:50 p.m. L-8 Erosion Groove and Vapor Distribution Simulation of Linear Magnetron Sputtering CathodesS.M. Elliott, Thin Film Consulting, Longmont, CO; J. Simkin, Cobham Technical Services, Oxford, United Kingdom; and E.K. White, Thin Film Consulting, Longmont, CO5:10 p.m. L-9 The Superiority of DC Power Supplies Over Pulse DC Power Supplies for TCO MaterialsP. Ozimek, W. Glazek, and P. Rozanski, HUETTINGER Electronic Sp. z o.o., Zielonka, PolandLFT-1 Factors in Arc Parameter Selection on Large Scale Deposition Processes Guaranteed Flexible Time PresentationD. Carter and H. Walde, Advanced Energy Industries, Inc., Fort Collins, CO

High Power Impulse Magnetron Sputtering (HIPIMS)Moderators: Jolanta Klemberg-Sapieha, ÉcolePolytechniquedeMontréal,Canadaand Ralf Bandorf, FraunhoferInstituteforSurfaceEngi-neeringandThinFilmsIST,Germany

2:10 p.m. HP-1 Reactive HiPIMS Processes for Optical Coatings; Dielectric Coatings Deposited by HIPIMS ProcessesM. Vergöhl, S. Bruns, O. Werner, R. Bandorf, and G. Bräuer, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunsch-weig, Germany2:50 p.m. HP-2 Comparative Study of Nb and Nb2O5 Coatings Prepared by HiPIMS Us-ing Different Pulse Shape CharacteristicsM. Hala, J. Capek, O. Zabeida, J. E. Klemberg-Sapieha, and L. Martinu, École Polytechnique de Montréal, Montréal, Canada3:10 p.m. – 3:30 p.m. - Break3:30 p.m. HP-3 High-Rate Reactive Deposi-tion of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron SputteringJ. Vlcek, J. Rezek, and J. Lazar, Department of Physics, University of West Bohemia, Plzen, Czech Republic

Technology Forum Breakfast Topics and SpeakersMonday, April 187:00 a.m. – 8:15 a.m.Coatings for Thin Film PhotovoltaicsWolfgang Diehl, FraunhoferInstituteforSurfaceEngineeringandThinFilmsIST,GermanyHigh-Power Impulse Magnetron Sputtering (HIPIMS) Ralf Bandorf, FraunhoferInstituteforSurfaceEngineeringandThinFilmsIST,GermanyTransparent Conductive Oxides (TCO) for Thin Film Photovoltaics, Displays, Transparent Electronics and More Clark Bright, 3MCompanyOptical Coating Design H. Angus Macleod, ThinFilmCenterInc.Process Modeling Bernd Szyszka, FraunhoferInstituteforSurfaceEngineeringandThinFilmsIST,GermanyTribological Coatings Allan Matthews, UniversityofSheffield,UnitedKingdom and Bill Sproul, ReactiveSputtering,Inc.

Tuesday, April 197:00 a.m. – 8:15 a.m.Atmospheric Plasma Technologies Hana Baránková and Ladislav Bárdos, UppsalaUniversity,SwedenCleantech Energy Conversion and Storage Carl Lampert, StarScience and Ric Shimshock, MLDTechnologies,LLCDiamond-Like Carbon (DLC) Coatings Klaus Bewilogua, FraunhoferInstituteforSurfaceEngineeringandThinFilmsIST,Germany, Gerry van der Kolk, IonBondNetherlandsb.v.,TheNetherlands, and Thomas Schuelke, Fraunhofer,USAFabrication and Performance of Optical Coatings Ludvik Martinu, ÉcolePolytechniquedeMontréal,Canada, and Bryant Hichwa, SonomaStateUniversity(retired)Gas/Moisture Permeation Barrier Layers Mariadriana Creatore, EindhovenUniversityofTechnology,TheNetherlandsMagnetron Sputtering David Glocker, IsofluxIncorporatedPlasma Processing and Biomaterials Paul Gagnon,Corning,Inc.

Society of Vacuum Coaters » 2011 TechCon Preliminary Program 8


3:50 p.m. HP-4 Properties of TiAlCN/VCN Nanoscale Multilayer Coatings Deposited by Reactive High Power Impulse Magnetron Sputtering (HIPIMS) TechnologySponsored Student PresentationG.K. Kamath and A.P. Ehiasarian, Sheffield Hallam University, Sheffield, United Kingdom; I.Petrov, University of Illinois at Urbana-Champaign, Urbana, IL; and P.Eh. Hovsepian, Sheffield Hallam University, Sheffield, United Kingdom4:10 p.m. HP-5 CrN and Cr2N PVD Coatings for Coining Dies ApplicationsJ. Fernández, J.A. García, R. Rodríguez, and R. Martínez, Asociación de la Industria Navarra, Cordovilla, Spain4:30 p.m. HP-6 Successful Industrial Appli-cation of HIPIMS+ TechnologyF. Papa, A. Campiche, R. Tietema, and T. Krug, Hauzer Techno Coating BV, Venlo, The Netherlands4:50 p.m. HP-7 Highly Ionised Gas Flow Sputtering for Deposition of Magnetic Thin FilmsR. Bandorf, D. Loch, and G. Bräuer, Fraun-hofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany5:10 p.m. HP-8 P-type CuO Deposited on Polyethylene Terephthalate Substrate Using High Power Impulse Magnetron SputteringY.-H. Chen, L.-C. Chang, M.-Y. Hsiao, and J.-L. He, Department of Materials Science and Engineering, Feng Chia University, Taichung, Taiwan

■ Monday Evening, April 18Heuréka! Post Deadline Recent Developments Session5:45 p.m.Moderators: Hana Baránková and Ladislav Bárdos, UppsalaUniversity,SwedenSVC will continue to accept abstracts for the Heuréka! Session through March 1, 2011.

■ Tuesday Morning, April 19Technology Forum Breakfast7:00 a.m. – 8:15 a.m.Facilitator-led round table discussions provide an opportunity for information, conversation and interaction on specific subjects. See page 7 for topics and facilitators.

Symposium on Manufacturing and Technology for Thin Film PhotovoltaicsModerators: Geoff Ringer, 3MCorporateResearchLaboratory and James McShane, JoyMiningMachinery

ContributedbytheVacuum Web Coating TAC8:30 a.m. SPV-5 Web Coating of Flexible CIGS on Polyimide SubstrateK. Otte, A. Rahm, and A. Braun, Solarion AG, Leipzig, Germany9:10 a.m. SPV-6 Vertically Aligned Solar Cells for Transparent Conductor Free Roll to Roll Solar Cell ManufacturingP.D. Lane, Carbonlite Converting Equipment Ltd., Littleborough, United Kingdom; A.A.R. Watt, Department of Materials, University of Oxford, Oxford, United Kingdom; and A.J. Topping, MFN Technology Limited, Abing-don, United Kingdom9:30 a.m. SPV-7 Evaluation of Atmospheric Plasma Surface Modification for Continuous Processing of Solar CellsR.A. Wolf, Enercon Industries Corporation, Menomonee Falls, WI9:50 a.m. SPV-8 Atomic Layer Deposition on Polymers for Ultralow Water Vapor Transmis-sion RatesSponsored Student PresentationJ.A. Bertrand and S.M. George, Departments of Chemistry and Chemical Engineering, University of Colorado, Boulder, CO

Learn and Remember...

A Wizard’s Guide to Understanding Vacuum and Vacuum CoatingTuesday, April 19, 20118:30 a.m. – 11:30 a.m. • Cost is $40.00Your Vacuum Wizard is Don McClure, Acuity Consulting and Training

This half-day event is based on an extensive set of engaging tabletop demonstra-tions. Many of the demonstrations use a transparent vacuum chamber, so attendees can “see” the principles of

vacuum coating in action. The goals of this event are to make selected concepts related to vacuum and vacuum coating seen and remembered. This in turn provides a path to deeper understanding. Attendees will be offered highly accessible and thought pro-voking demonstrations and/or descriptions of the essential elements and principles of vacuum, vacuum processing and vacuum coating. The presentation is suitable for both non-technical and technical attendees. The only prerequisite is curiosity about our amazing world.This presentation provides the attendee with memorable experiences related to:• pressureandvacuum• vacuumpumps(themanywaysa

vacuumwizardproduces“good”vacuumlevels)

• vacuummeasurementmethods(howvacuumwizardsknowthevacuumlevelinacontainer)

• veryhightemperatures(andthemagicofmakingcoatingsbyevaporation)

• verylowtemperatures(andthemagicofcryopumping)

• howmaterialschangefromsolidtoliquidtogasandback(morevacuumcoatingmagic)

• whatthe“meanfreepath”is(andwhyvacuumwizardscare)

• whylowpressuresareneededtomakepurecoatings(andwhythe“low”pres-suresneededcanbesodifferentindiffer-entapplications)

There is a small fee of $40 to attend this Special Event. The number of attendees is limited so that everyone can see the demonstrations. Preregister using the SVC On-line TechCon registration form.

Sixth Annual 5K Fun Run and WalkTo Benefit the SVC Foundation Scholarship Program

Join friends and colleagues for the Sixth Annual 5K Fun Run and Walk in Chicago on Tuesday morning, April 19, 2011 at 6:00 a.m.The registration fee of $25 includes a T-shirt (the fee is not tax-deductible). All proceeds benefit the SVC Foundation, which awards scholarships to students working in the field of vacuum coating technology.The SVC Foundation is also sponsors for the 5K Run and Walk. Sponsors have their company name and

logo printed on the back of the official T-shirt. Please contact Wolfgang Decker at [email protected] for more information on sponsoring this important fundraising event.

9505/856-7188 Fax 505/856-6716 » E-mail [email protected] » Web Site www.svc.org


10:10 a.m. – 10:30 a.m. - BreakModerators: Bernd Szyszka and Volker Sittinger, FraunhoferInstituteforSurfaceEngineeringandThinFilmsIST,Germany

ContributedbytheCoatings for Cleantech Energy Conversion, Storage and Related Processes TAC10:30 a.m. SPV-9 Technological Trends in Thin Film Si and CIGS Photovoltaic TechnologyR. Schlatmann, Competence Center Thin Film and Nanotechnology for Photovoltaics, Helmholz Zentrum Berlin, Berlin-Adlershof, Germany11:10 a.m. SPV-10 Influence of Process Parameter and Magnetic Field Strength on DC Magnetron Sputtered ZnO:Al Films from Ceramic TargetsV. Sittinger, W. Dewald, W. Werner, and B. Szyszka, Fraunhofer Institute for Surface En-gineering and Thin Films IST, Braunschweig, Germany11:30 a.m. SPV-11 ZnO:Al for CIGS Solar Modules Deposited by Reactive Sputtering from Rotatable MagnetronV. Linss, J. Strümpfel, and T. Fleischer, VON ARDENNE, Dresden, Germany; R. Menner, T.M. Friedlmeier, and W. Wischmann, ZSW, Stuttgart, Germany; and T. Niesen, S. Visbeck, and J. Palm, AVANCIS, München, Germany11:50 a.m. SPV-12 The Effects of Process Power on Arc Rate and Nodule Formation dur-ing Sputtering of Aluminum-Doped Zinc OxideK. Nauman, Advanced Energy Industries, Inc., Fort Collins, CO

Plasma ProcessingModerator: Mariadriana Creatore, EindhovenUniversityofTechnology,TheNetherlands8:30 a.m. P-6 Frequency Probe Measure-ments in Processing PlasmasD.R. Boris, S.G. Walton, M. Baraket, E.H. Lock, and R.F. Fernsler, Plasma Physics Division, U.S. Naval Research Laboratory, Washington, DC8:50 a.m. P-7 Optimization of Plasma Characteristics in Plasma-Assisted Atomic Layer Deposition: Effect on Film Structure and Process Enhancement Prospects T.O. Kääriäinen, S. Lehti, M.-L. Kääriäinen, and D.C. Cameron, ASTRaL, Lappeenranta University of Technology, Mikkeli, Finland

9:10 a.m. P-8 Deposition of Functional Plasma Polymers by Control of Film Growth ConditionsD. Hegemann, EMPA, Swiss Federal Laborato-ries for Materials Science and Technology, St. Gallen, Switzerland

9:50 a.m. P-9 Functionalization of Graphene for Biomaterials Applications Using Electron Beam-Generated PlasmasM. Baraket and S.G. Walton, Plasma Phys-ics Division, U.S. Naval Research Laboratory, Washington, DC; R. Stine, C.R. Tamanaha, and P.E. Sheehan, Chemistry Division, U.S. Naval Research Laboratory, Washington, DC; and J.T. Robinson, Electronics Division, U.S. Naval Research Laboratory, Washington, DC10:10 a.m. – 10:30 a.m. – BreakModerator: Gregory Clarke, PilkingtonTech-nologyManagementLtd.,UnitedKingdom10:30 a.m. P-10 Properties of Piezoelectric AlN Layers Deposited by Reactive Pulse Mag-netron SputteringH. Bartzsch, M. Gittner, D. Glöss, and P. Frach, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany10:50 a.m. P-11 Effect of Pre-Treatments on the Adhesion Properties of Zn-Mg Films Syn-thesized by Closed Field Unbalanced Magne-tron SputteringY.S. Kim and S.Y. Lee, Department of Materials Engineering, Korea Aerospace University, Ko Yang-Si, South Korea; and T.Y. Kim, D.Y. Lee, and W.Y. Choo, POSCO Technical Research Laboratories, Gwangyang-Si, South Korea11:10 a.m. P-12 Development in Sputtering Deposition Technology Applicable to Cutting ToolsA.P. Kulkarni, Vishwakarma Institute of


Symposium on Manufacturing and Technology for Thin Film Photovoltaics

Plasma Processing Vacuum Processes and Coatings for Health

Care Applications High Power Impulse Magnetron Sputtering

(HIPIMS) Emerging Technologies

Special Events 5K Fun Run and Walk 6:00 a.m. Technology Forum Breakfast

7:00 a.m. – 8:15 a.m.

Tuesday at a Glance

Education Program

AFTERNooNTechnical Sessions

Donald M. Mattox Tutorial 1:00 p.m. Coatings for Cleantech Energy Symposium on Coating Advances and its

Impact on the Future of the Vacuum Coating Industry

Poster Session 3:30 p.m. – 6:00 p.m.

Special Events “Meet the Experts” 12:15 p.m. – 1:15 p.m. Lake Cruise Networking Event (Evening)

Exhibit Exhibit 12:00 p.m. – 6:00 p.m. Reception in the Exhibit Hall at 5:00 p.m.

Practical Aspects of Vacuum Technology: Operation and Maintenance of Production Vacuum Systems (Full Day)

Properties and Applications of Tribological Coatings (AM)

Reactive Sputter Deposition (Full Day) Introduction to Plasma Processing

Technology (PM) Introduction to Thin Film Photovoltaic

Technologies (PM)

Information Technology, Pune, India; and V.G. Sargade, B. Ambedkar, G. Joshi, and V. Rao, Technological University Lonere, Raigad, India11:30 a.m. P-13 Phase, Stress, Morphology, Texture of Plasma-Enhanced Deposition of Ta on the Interior Surfaces of Cylindrical StructureS.L. Lee, M. Todaro, and M. Riley, U.S. Army ARDEC-Benét Laboratories, Watervliet, NY; R. Wei, Southwest Research Institute, San Antonio, TX; R. Chistykov and B. Abraham, Zond, Inc./Zpulser, LLC, Mansfield MA; and J. Lin, W. Sproul, and J. J. Moore, Colorado School of Mines, Golden, CO

Vacuum Processes and Coatings for Health Care ApplicationsModerator: David Glocker, IsofluxIncorporated

8:30 a.m. HC-1 Surface Technologies to En-hance Biomaterial PerformanceB.D. Ratner, University of Washington, Seattle, WA9:10 a.m. HC-2 Plasma-Based Approach to Promote the Covalent Attachment of Biomol-ecules to Polymers S.G. Walton and E.H. Lock, Plasma Physics Division, U.S. Naval Research Laboratory, Washington, DC; S.H. North, George Mason University, Fairfax, VA; and C.R. Taitt, Center



for Bio/Molecular Science and Engineering, U.S. Naval Research Laboratory, Washington, DC9:30 a.m. HC-3 Treatment Options for Cell Culture Products in the Bio-Medical IndustryP.E. Gagnon, M. Wang, and A. Tanner, Corn-ing, Inc., Kennebunk, ME; and A. Fadeev, Corning, Inc., Corning, NY 9:50 a.m. HC-4 New Titan-Oxide Films with Oriented Growth and their Photocatalytical and Antibacterial PropertiesZ. Michalcik, P. Spatenka, N. Martin, and M. Horokova, Technical University of Liberec, Liberec, Czech Republic10:10 a.m. – 10:30 a.m. – Break

High Power Impulse Magnetron Sputtering (HIPIMS)Moderators: Jolanta Klemberg-Sapieha, ÉcolePolytechniquedeMontréal,Canadaand Ralf Bandorf, FraunhoferInstituteforSurfaceEngi-neeringandThinFilmsIST,Germany

HiPiMS/Vacuum Web Coating Moderator: Nicolas Schiller, FraunhoferInsti-tuteforElectronBeamandPlasmaTechnologyFEP,Germany11:30 a.m. HP-12 Roll-To-Roll Sputter De-position of Transparent Conducting In4Sn3O12 onto Flexible Polymer Substrates Using DC Sputtering and HiPIMSSponsored Student PresentationP. Butler and H.E. Assender, Department of Materials, University of Oxford, Yarnton, United Kingdom; and P.J. Kelly, Manchester Metropolitan University, Manchester, United Kingdom11:50 a.m. HP-13 AZO Coatings Deposited by Reactive HiPIMS for Modified TCO Properties on Polymeric WebSponsored Student PresentationP.M. Barker, P.J. Kelly, and G.T. West, Man-chester Metropolitan University, Manchester, United Kingdom; J.W. Bradley, University of Liverpool, Liverpool, United Kingdom; and H.E. Assender, University of Oxford, Oxford, United Kingdom

Emerging TechnologiesModerators: Chris Stoessel, SouthwallTech-nologiesand Clark Bright, 3MCompany8:30 a.m. E-1 New Method of Regulation of Sputtering Deposition of Cathode-Target in a Magnetron Sputtering SystemV.V. Zhurin, Colorado Advanced Technology, Fort Collins, CO; and P.A. Tsygankov and N.G. Elistratov, Bauman Moscow State Technical University, Moscow, Russia8:50 a.m. E-2 A Novel RF Plasma Power Sup-ply ApproachR. Merte, P. Wiedemuth, M. Glück, and T. Kirchmeier, HÜTTINGER Elektronik GmbH, Freiburg, Germany9:10 a.m. E-3 Carbon Containing Ceram-ics Deposited by Physical Vapour Deposition MethodsV. Vishnyakov and J. Colligon, Dalton Research Institute, Manchester Metropolitan University, Manchester, United Kingdom9:30 a.m. E-4 Exterior UV Curable Topcoat for Physical Vapor Deposition ApplicationsJ.R. Smith and K. Wagner, Red Spot Paint & Varnish Co., Inc., Evansville, IN9:50 a.m. E-5 A New Protective Removable Treatment for Antique Metallic Handworks Realized by Plasma Assisted TechnologiesC. Misiano, P. Matarazzo, and M. Pezzilli, Romana Film Sottili, Anzio, Italy; E. Angelini, Politecnico di Torino, Torino, Italy; and G. Ingo CNR Montelibretti, Rome, Italy10:10 a.m. – 10:30 a.m. – Break10:30 a.m. E-6 Polymeric Barrier Coatings via Initiated Chemical Vapor Deposition

Donald M. Mattox Tutorial Program Tuesday Afternoon, April 191:00 p.m. - 1:40 p.m.The Coming Revolution in Medicine: Repair, Restore, Regenerate

Presented by Buddy Ratner, UniversityofWashington,Seattle,WAFor thousands of years, palliative treatment, addressing only the symp-toms, was a key theme in medicine. Now, tissue engineering has demon-strated the potential to repair and replace damaged tissues and organs. This talk will focus on developments in tissue engineering and regenera-tive medicine that will shift medical practice. For the past 60 years, we have done acceptably with synthetic biomaterials (pacemakers, hip joints, heart valves, etc). These synthetics produce a reaction in the body that is fibrotic and avascular – quite far from true healing and regeneration. We have developed a synthetic biomaterial scaffold that indeed “heals” in the

body producing a normal restoration of many tissues. Scaffolds are an important strategy in tissue engineering that serve to guide anatomical shape, generate sites for cell attachment, direct cell growth and differentiation and provide an environment for tissue formation. Ultimately, these scaffolds must biodegrade leaving behind only functional tissue. However, they cannot de-grade before they have fulfilled their tissue-organizational function. Scaffolds can be pre-seeded with cells prior to implantation, or can be implanted without cells. Most synthetic scaffolds, without cellular pre-conditioning, will lead to a fibrotic, avascular outcome after implantation. The novel scaffold technology that will be addressed here, sphere-templated materials, permits implantation without cells, but leads to implant site reconstruction and organized tissue. These scaffolds become heavily infused with macrophage cells during healing. We believe the materi-als are harnessing the macrophages for healing and regeneration. The ability to do this could be a key element in this new medical paradigm and could have impact on aging and quality of life.BuddyD.RatnerreceivedhisPh.D.(1972)inPolymerChemistryfromthePolytechnicInstituteofBrooklynandhasbeenattheUniversityofWashingtonsince1972.HeiscurrentlytheDirectoroftheUniversityofWashingtonEngineeredBiomaterials(UWEB21)EngineeringResearchCenter.HeholdstheMichaelL.andMyrnaDarlandEndowedChairinTechnologyCommercializationandisProfessorofBioengineeringandChemicalEngineeringattheUniversityofWashington.Dr.RatnerisafellowoftheAmericanInstituteofMedicalandBiologicalEngineering(AIMBE),theAmericanVacuumSociety,theAmericanAssociationfortheAdvancementofScience,theBiomedicalEngineeringSociety(BMES)andtheInternationalCollegeofFel-lowsBiomaterialsScienceandEngineering.HeisapastpresidentoftheSocietyforBiomaterials.HeservedaspresidentofAIMBEin2002-2003.In2003hewaselectedPresidentoftheTissueEngineeringSocietyofNorthAmerica.In2002,RatnerwaselectedamemberoftheNationalAcademyofEngineering,USA.HeservesontheNationalAdvisoryCounciloftheNationalInstituteofBioimagingandBioengineering,NIH(2009-2013).

10:30 a.m. HP-9 Time-Resolved Ion Energy Distribution Functions in a HiPIMS Plasma Using a Retarding Field AnalyzerSponsored Student PresentationP. Poolcharuansin and J.W. Bradley, Depart-ment of Electrical Engineering and Electron-ics, University of Liverpool, Liverpool, United Kingdom10:50 a.m. HP-10 Understanding Deposition Rate Loss in High Power Impulse Magnetron SputteringD. Lundin, Linköping University, Linköping, Sweden; N. Brenning, M. Raadu, and C. Huo, Royal Institute of Technology, Stockholm, Sweden; C. Vitelaru, G. Stancu, and T. Minea, Université Paris Sud-XI, Orsay, France; and U. Helmersson, Linköping University, Linköping, Sweden11:10 a.m. HP-11 HiPIMS Process Optimiza-tion through the Control of the Magnetic Field J. Capek, M. Hala, O. Zabeida, J.E. Klemberg-Sapieha, and L. Martinu, École Polytechnique de Montréal, Montréal, Canada



T. Parker, J.D. Demaree, and D. Baechle, U.S. Army Research Laboratory, Aberdeen Proving Ground, MD10:50 a.m. E-7 Single Sided Ultra-Barrier Oxide Films on Flexible Substrates, Deposited Using High Speed Atomic Layer Deposition Based on Substrate TranslationE.R. Dickey and W.A. Barrow, Lotus Applied Technology, Hillsboro, OR

11:10 a.m. E-8 Atomic Layer Deposition for Continuous Roll-to-Roll ProcessingS.M. George and P.R. Fitzpatrick, Departments of Chemistry and Chemical Engineering, University of Colorado, Boulder, CO 11:50 a.m. E-9 Continuous ALD Deposition on Moving Flexible Polymer SubstratesP.S. Maydannik, T.O. Kääriäinen, and K. Lahtinen, ASTRaL, Lappeenranta University of Technology, Mikkeli, Finland; P. Johans-son and J. Kuusipalo, Paper Converting and Packaging Technology, Tampere University of Technology, Tampere, Finland; and D.C. Cameron, ASTRaL, Lappeenranta University of Technology, Mikkeli, Finland

■ Tuesday Afternoon, April 19

SVC Exhibit Opens!12:00 p.m. – 6:00 p.m.

Don’t Miss the Only Exhibit Dedicated to Vacuum Coating Technologies

“Meet the Experts” Corner12:15 p.m. - 1:15 p.m.Get the answers to your vacuum coating prob-lems. See page 13 for details.

The Donald M. Mattox Tutorial Program1:00 p.m. – 1:40 p.m.See page 10 for details.

Coatings for Cleantech Energy Conversion, Storage and Related ProcessesModerators: Carl Lampert, StarScience and Claes Granqvist, UppsalaUniversity,Sweden1:50 p.m. CT-1 Thermochromics and Nano-thermochromics: New Options for Energy Efficient FenestrationS.-Y. Li, G.A. Niklasson, and C.G. Granqvist, Ångström Laboratory, Uppsala University, Uppsala, Sweden2:10 p.m. CT-2 The Effects and Optimisation of O2 Partial Pressure During Electron-Beam Deposition on the Structure and Electrochro-mism of NiO Thin Films

M. Neeves and F. Placido, University of the West of Scotland, Paisley, United Kingdom

Symposium on Coating Advances and its Impact on the Future of the Vacuum Coating IndustryModerators: Bryant Hichwa, SonomaStateUniversity(retired) and Wolfgang Decker, VASTFILMS,Ltd.

ContributedbytheLarge Area Coating TAC1:50 p.m. SCA-6 Review and Initial Results of Thin-Film PV Process Development Integra-tion Activities at NRELT. Gessert, National Renewable Energy Labo-ratory, Golden, CO

ContributedbytheTribological and Decorative Coating TAC2:30 p.m. SCA-7 PACVD - The Sleeping Gi-ant of Coating Technology - Actual Status of Industrial PACVD Furnaces and New Coatings for Low Temperature ProcessesT. Müller, A. Gebeshuber, and R. Kullmer, Rübig GmbH & Co KG, Wels, Austria; and D. Heim and C. Forsich, University of Applied Sciences, Wels, Austria

ContributedbytheOptical Coating TAC3:10 p.m. SCA-8 High Stability Optical Coat-ings by Employing Gradient Index DesignsK. Starke, Cutting Edge Coatings GmbH, Han-nover, Germany; and D. Ristau, Laser Zentrum Hannover e.V., Hannover, Germany

Poster Presentations3:30 p.m. – 6:00 p.m. in the Exhibit HallSVC will continue to accept abstracts for the Poster Session through March 1, 2011Poster-1 Dispersion-Free Reflective Phase Retarder for Few-Cycle Femtosecond PulsesG. Tempea, Femtolasers Produktions GmbH, Wien, AustriaPoster-2 Excitations in Si at CaCO3 Core-Shell Quantum DotsU.L. Fulco and E.L. Albuquerque, Department of Biophysics, Universidade Federal do Rio Grande do Norte, Natal, BrazilPoster-3 Excitons in Si/Ge NanocrystalsE.L. Albuquerque, Department of Biophysics, Universidade Federal do Rio Grande do Norte, Natal, Brazil; and L.R. da Silva, Department of Physics, Universidade Federal do Rio Grande do Norte, Natal, BrazilPoster-4 Technical, Design, and Performance Review of a New ECR-PECVD ReactorSponsored Student Presentation

R. Dabkowski, P. Wilson, J. Wojcik, and P. Mascher, Department of Engineering Physics and Centre for Emerging Device Technologies, McMaster University, Hamilton, CanadaPoster-5 Optimizing Thermal Vacuum De-position Uptime by Increasing Evaporation Source Material Pack DensityJ. Hisert and B. Jackson, Indium Corporation, Clinton, NYPoster-6 Synthesis and Characterization of Silver Films for Antibacterial ApplicationsC. Walker, E. Cortes, and C. Gallagher, Depart-ment of Physics and Astronomy, Rowan Uni-versity, Glassboro, NJ; R. Krchnavek, Depart-ment of Electrical and Computer Engineering, Rowan University, Glassboro, NJ; G.A. Caputo, Department of Chemistry and Biochemistry, Rowan University, Glassboro, NJ; R. Ostrum, Bone and Joint Institute, Cooper Univer-sity Hospital, Camden, NJ; and J. Hettinger, Department of Physics and Astronomy, Rowan University, Glassboro, NJPoster-7 Linear Ion Source for Steel Sheet Surface EtchingD.-G. Kim, S.-H. Lee, and J.-K. Kim, Korea Institute of Materials Science, Changwon, Republic of KoreaPoster-8 High Speed Magnetron Sputtering by a Hollow Cathode DischargeS.H. Lee, D.-G. Kim, and J.-K. Kim, Korea Institute of Materials Science, Changwon, Republic of KoreaPoster-9 PIC-MC Simulations of High Power Plasma DischargesC. Schwanke, M. Siemers, A. Pflug, and B. Szyszka, Fraunhofer Institute for Surface En-gineering and Thin Films IST, Braunschweig, GermanyPoster-10 End-Hall Ion Source with Shielded Hot Filament CathodeV.V. Zhurin, Colorado Advanced Technology LLC, Fort Collins, CO; and E.V. Klyuev and A. Sidorov, Research Institute and Enterprise, Podolsk, RussiaPoster-11 A Comparative Study of Impact Testing Techniques and Results for Carbon Based CoatingsJ. Eichler, Materials Science and Engineering Department, University of Sheffield, Sheffield, United Kingdom; J. Lowndes, Ion Coat Ltd., Sheffield, United Kingdom; and A. Leyland and A. Matthews, Materials Science and Engi-neering Department, University of Sheffield, Sheffield, United KingdomPoster-12 Application Challenge of Noble Metal Sputtered Film SurfaceH. Jiang, Bayer HealthCare, Mishawaka, INPoster-13 Corrosion Properties of Magnetron Sputtered Zn-Mg Coatings on Mild Steel PlateY.S. Kim and S.Y. Lee, Korea Aerospace Uni-versity, Kyung Ki-do, South Korea; T.Y. Kim

Society of Vacuum Coaters » 2011 TechCon Preliminary Program 1�


and W.Y. Choo, POSCO Technical Research Laboratories, Gwangyang-si, Republic of Ko-rea; and S.Y. Lee, Andong National University, Andong-si, Republic of KoreaPoster-14 A Fluidized-Bed Sputter Deposition System for Coating MicroparticlesD. Baechle, T. Parker, D. Demaree, J. Hirvonen and E. Wetzel, Materials and Manufacturing Science Division, U.S. Army Research Labora-tory, Aberdeen Proving Ground, MDPoster-15 The Effects of Substrate Defects and Particles on ALD Barrier Layer Water Vapor Transmission PerformanceW. Barrow and E. Dickey, Lotus Applied Tech-nology, Hillsboro, ORPoster-16 Evaluation of Coating Stress in Evaporated Hafnia and Silica Multilayer FilmsFoundation Student Scholarship PresentationP. Kupinski, J. Oliver, A. Rigatti, J. Dougherty, and R. Hand, Laboratory for Laser Energetics, University of Rochester, Rochester, NYPoster-17 Tribological and Mechanical Properties of Multilayer TiN/CrXN Coatings Deposited by Reactive Magnetron SputteringF. Sequeda, Laboratorio de Recubrimientos Duros y Aplicaciones Industriales, Universidad del Valle, Cali, Colombia; F. Correa, Labora-torio de Recubrimientos Duros y Aplicacio-nes Industriales, Universidad del Valle, Cali, Colombia and Grupo de Ciencia e Ingeniera de Materiales, Universidad Autónoma de Oc-cidente, Cali, Colombia; M.F. Cano, Laborato-rio de Recubrimientos Duros y Aplicaciones Industriales, Universidad del Valle, Cali, Colombia; and J.M. González, A. Ruden, and J.S. Restrepo, Laboratorio de Recubrimientos Duros y Aplicaciones Industriales, Universi-dad del Valle, Cali, Colombia and Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Coyoacan, Mexico

Poster-18 Analysis of Friction and Wear Mechanisms on Hard Coatings Deposited by Reactive Magnetron Sputtering M.F. Cano, Laboratorio de Recubrimientos Duros y Aplicaciones Industriales, Universidad del Valle, Cali, Colombia; J.S. Restrepo, Labo-ratorio de Recubrimientos Duros y Aplicacio-nes Industriales, Universidad del Valle, Cali, Colombia and Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Coyoacan, Mexico; and J.M. González, A. Ruden, and F. Sequeda, Labora-torio de Recubrimientos Duros y Aplicacio-nes Industriales, Universidad del Valle, Cali, ColombiaPoster-19 Tribological and Corrosion Proper-ties of CrN/Cr Bilayers Obtained by Reactive Magnetron Sputtering TechniqueJ.M. González, A.U. Paladines, A. Ruden, C.A. Barbosa, J.S. Restrepo, M.I. Serna, and F. Sequeda, Laboratorio de Recubrimientos Duros y Aplicaciones Industriales, Universidad del Valle, Cali, ColombiaPoster-20 The Effect of Surface Treatments and Processing on High Performance Gas Barrier Materials for Electronics ApplicationsReturning 2010 Sponsored StudentH. Suttle, Department of Materials, Univer-sity of Oxford, Oxford, United Kingdom; A.J. Topping, MFN Technology Limited, Abing-don, United Kingdom; and H.E. Assender, Department of Materials, University of Oxford, Oxford, United Kingdom

Lake Cruise Networking EventFeaturing a buffet dinner and live entertainment. Cost: $89.00 per person6:15 p.m. First bus departure from the Hyatt

Regency Chicago to Navy Pier7:00 p.m. Boarding begins9:30 p.m. Boat returns to Navy Pier

■ Wednesday Morning, April �0Symposium on Manufacturing and Technology for Thin Film PhotovoltaicsModerators: Ludvik Martinu, ÉcolePolytech-niquedeMontréal,Canada and Carl Lampert, StarScience

8:30 a.m. SPV-13 Photovoltaics Past, Present, Future K. Zweibel, Institute for the Analysis of Solar Energy, George Washington University, Wash-ington, DC9:10 a.m. SPV-14 Nanoparticles/Intermedi-ate Reflective Layer Approach for Light Trap-ping in Silicon Tandem Solar CellsM. Creatore, M.V. Ponomarev, H.T. Beyene, and M.C.M. van de Sanden, Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Netherlands

ContributedbytheLarge Area Coating TAC 9:30 a.m. SPV-15 Current Trends in Thin Film SolarJ. Pilkenton, AGC Solar, Brussels, Belgium10:10 a.m. - 10:30 a.m. Break

SVC Exhibit Opens!10:00 a.m. – 5:00 p.m.

Attend the Business Topics Session, Innovators Showcase and the Beer Blast!

Business Topics10:30 a.m. – 12: 10 p.m. in the Exhibit HallThe Business Topics Session addresses the unique challenges that face our constituents and provides forward-looking solutions to common difficulties encountered by businesses in the vacuum coating industry.Moderators: Frank Zimone, AngstromSci-ences and David Sanchez, WilliamsAdvancedMaterials

10:30 a.m. BT-1 Strategic Planning – Why Bother? J. Romero, StrategyWorks, Inc., Albuquerque, NM11:10 a.m. BT-2 Managing Risk and Maximiz-ing ROI on R&D Investment with a Stage-Gate ProcessJ.O. McGeever, Technology Assessment Inter-national, Inc., Rolling Meadows, IL11:30 a.m. BT-3 Technical Standards for Ensuring Consistency, Reliability and Perfor-mance of Vacuum CoatingsP. Hatto, Ionbond Ltd., Consett, United King-dom; and M. Gee, National Physical Labora-tory, Materials Division, Teddington, United Kingdom


Symposium on Manufacturing and Technology for Thin Film Photovoltaics

Business Topics Vacuum Web Coating Optical Coating

Wednesday at a Glance

Education Program

AFTERNooNSpecial Events

“Meet the Experts” 12:15 p.m. – 1:15 p.m.

Exhibit Exhibit 10:00 a.m. – 5:00 p.m. Vendor Innovators Showcase

12:30 p.m. – 3:30 p.m. Beer Blast 3:30 p.m. – 5:00 p.m.

Sputter Deposition in Manufacturing (Full Day) Troubleshooting for Thin Film Deposition

Processes (Full Day) Nanostructures: Strategies for

Self-Organized Growth (AM)

ITO and Other Transparent Conductive Coatings: Fundamentals, Deposition, Properties, and Applications (Full Day)

Industrial Ion Sources (PM)

1�505/856-7188 Fax 505/856-6716 » E-mail [email protected] » Web Site www.svc.org


“Meet the Experts” CornerEach year, we feature a variety of experts from within the vacuum coating com-munity who help provide solutions to your vacuum coating challenges. Join the experts for a productive exchange of ideas and constructive conversation about com-mon problems posed by attendees. A list of experts and topics of discussion will be available in future TechCon publications and announcements.Monday, Tuesday and Wednesday 12:15 p.m. – 1:15 p.m.

11:50 a.m. BT-4 Manufacturing Factory Safety – The Impact on Operations S.M. Simons and H.I. Foster, California Code Compliance Inc., Saratoga, CA

Vacuum Web CoatingModerators: Greg Tullo, SEAssociates,Inc. and Akiya Jones, AveryDennison

8:30 a.m. W-1 Strategies for Developing Thin Film Encapsulation for Organic ElectronicsS. Graham, Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, GA 9:10 a.m. W-2 Vacuum Roll-to-Roll Tech-nologies for the Making of Transparent Barrier FilmsN. Schiller, J. Fahlteich, M. Fahland, S. Straach, S. Günther, and W. Schönberger, Fraunhofer Institute for Electron Beam and Plasma Tech-nology FEP, Dresden, Germany9:30 a.m. W-3 Barrier Properties of High Barrier Coating on Polymer Web by PE-CVD Roll CoaterT. Okimoto and H. Tamagaki, Kobe Steel, Ltd., Takasago, Japan9:50 a.m. W-4 Roll-to-Roll Atomic Layer Deposition Technology for Moisture Barriers on Flexible SubstratesM. Söderlund, P. Soininen, and S. Sneck, Beneq, Vantaa, Finland10:10 a.m. – 10:30 a.m. – Break10:30 a.m. W-5 Increasing Li-S Battery Cycle Life and Improving Safety through Application of a Variety of Coating TechniquesJ. Affinito, Y. Mikhaylik, and C.S. Kelley, Sion Power Corporation, Tucson, AZ10:50 a.m. W-6 Surface Microstructure Modi-fication of Vacuum Web Coated Metallized Layer through Plasma and Heat TreatmentA. Sarkar and S. Sarkar, EPCOS India Pvt. Ltd., Nashik, India; and A. Dhar, IIT Kharagpur, Kharagpur, India11:10 a.m. W-7 The Effect of Annealing upon Electromagnetic Interference Shielding Ef-fectiveness and Adhesion of Carbon Nanofiber Reinforced Polymer Substrates Coated with Thin Metallic FilmsT. Shimizu, T. Pansing, D. Mihut, and K. Lozano, The University of Texas Pan American, Edinburg, TX11:30 a.m. W-8 Optical and Magneto-Optical Properties of Thin Metallic Films and Clusters on PET SubstratesK. Schmidegg and V. Rinnerbauer, Hueck Folien Ges.m.b.H., Baumgartenberg, Austria; and L.D. Sun, M. Hohage, and P. Zeppenfeld, Institut für Experimentalphysik, Johannes Kepler Universität, Linz, Austria11:50 a.m. W-9 Dynamic VHF-PECVD Tech-

nique for Flexible Substrate Coating B. Leszczynska, C. Strobel, and M. Albert, Dresden University of Technology, Semicon-ductor and Microsystems Technology Labora-tory, Dresden, Germany; T. Zimmermann, Forschungszentrum Jülich, Institut für Ener-gieforschung - Photovoltaik, Jülich, Germany; J. Kuske, Forschungs- und Applikationslabor Plasmatechnik GmbH Dresden, Dresden, Ger-many; and J.W. Bartha, Dresden University of Technology, Semiconductor and Microsystems Technology Laboratory, Dresden, Germany

Optical CoatingModerator: Detlev Ristau, LaserZentrumHannovere.V.,Germany8:30 a.m. O-1 Pitfalls in the Characterization of Optical Thin FilmsH.A. Macleod and C. Clark, Thin Film Center, Inc., Tucson, AZ8:50 a.m. O-2 Monte Carlo Analysis of Random Thickness Errors in Triple Bandpass Coating DesignsD. Fuller and W. Hasan, FLIR Systems Inc., Precision Optics Division, Wilsonville, OR9:10 a.m. O-3 Properties and Problems of Extended Zone High Reflectance CoatingsC. Clark and H.A. Macleod, Thin Film Center Inc., Tucson, AZ9:30 a.m. O-4 AR Coatings for Optical Lenses Based on Plasma Etched MelamineU. Schulz, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany; H. Mändl and R. Nottebohm, Agfa-Gevaert HealthCare GmbH, München, Germa-ny; and C. Gödeker and N. Kaiser, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany9:50 a.m. O-5 Highly Durable DLC Coatings for Plastic Transparencies and OpticsJ.E. Yehoda, J. Taylor, and F.M. Kimock, Morgan Technical Ceramics – Diamonex, Allentown, PA 10:10 a.m. – 10:30 a.m. – BreakModerator: Angus Macleod, ThinFilmCenter,Inc.

10:30 a.m. O-6 Optical Property Degradation of the Hubble Space Telescope’s Wide Field Camera-2 Pick Off MirrorK.M. McNamara, Astromaterials Research & Exploration Science, NASA, Washington, DC; D.W. Hughes, Goddard Space Flight Center, Greenbelt, MD; H.V. Lauer and P.J. Burkett, Johnson Space Center, Houston, TX; and B.B. Reed, Goddard Space Flight Center, Greenbelt, MD11:10 a.m. O-7 Electrochromic Interference Filters for Optical Security DevicesB. Baloukas, J.-M. Lamarre, and L. Martinu, École Polytechnique de Montréal, Montréal, Canada11:30 a.m. O-8 Deposition of Optical Coat-ings on Plastics Using Poly-para-xylyleneT. Neubert, A. Gaida, and M. Vergoehl, Fraun-hofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany11:50 a.m. O-9 Optimization and Deposition of Wide-Angle Broadband Antireflective Coat-ingsJ. Zhang, H. He, M. Fang, and Z. Fan, Shanghai Institute of Optics and Fine Mechanics, Chi-nese Academy of Science, Shanghai, People’s Republic of China

■ Wednesday Afternoon, April �0“Meet the Experts” Corner12:15 p.m. - 1:15 p.m.Get the answers to your vacuum coating prob-lems. See page 13 for details.

Vendor Innovators ShowcaseThe Vendor Innovators Showcase presentations will begin in the Exhibit Hall starting at 12:30 p.m. Presentation times will be announced in the Final Program. SVC will continue to accept Vendor Innovators Showcase abstracts through March 1, 2011.Moderators: Jason Hrebik, AngstromSciencesand Marcel Anaya, DHFTechnicalProducts

SVC Exhibit Beer Blast!3:30 p.m. – 5:00 p.m.

SVC acknowledges VON ARDENNE for their sponsorship of the Beer Blast.

■ Thursday Morning, April �1Manufacturing Market Transformation Forum Manufacturers are challenged with a variety of changes in the U.S. and international markets for goods and services. This Forum will consist of both U.S. government and international industry representatives looking ahead to help open up markets and increase domestic and



1�

international manufacturing competitiveness. This forum is open to all participants with a special invitation to exhibitors who would like to participate in this dynamic forum.Forum Organizers:Carl Lampert, StarScienceandMichael Andreasen,VacuumEdge10:10 a.m. – 10:30 a.m. – Break

Symposium on Coating Advances and its Impact on the Future of the Vacuum Coating IndustryModerators: Roel Tietema, HauzerTechnoCoatingBV,TheNetherlands and Carl Lampert, StarScience10:30 a.m. SCA-9 Sustainability of Indium and Gallium Supplies in the Face of Emerging MarketsM.D. Murphy, Indium Corporation of Amer-ica, Utica, NY; and C. Mikolajczak, Indium Corporation of America, Turin, Italy

ContributedbytheTribological and Decorative Coating TAC10:50 a.m. SCA-10 Hard Coatings as a Design Element for Highly Stressed Engine ComponentsY. Musayev and T. Hosenfeldt, Schaeffler Tech-nologies GmbH & Co. KG, Herzogenaurach, Germany

Vacuum Web CoatingModerators: Mark Roehrig, 3MCompany and Paulo Raugei, GalileoVacuumSystems,Inc.8:30 a.m. W-10 Atmospheric Pressure-to-Vacuum Transition Modules for Web ProcessingV. Cannella and R. Crucet, Energy Conversion Devices, Rochester Hills, MI; and B. Dotter, United Solar Ovonic, Troy, MI8:50 a.m. W-11 Target Life KWatt-hrs vs. Target Depth Study on Multipurpose Roll to Roll Web CoatersK.P. Barnes, Multek Flexible Circuits, Inc., Northfield, MN

9:10 a.m. W-12 Vacuum Web Coating Ac-tivities in JapanH. Tamagaki, Kobe Steel, Ltd., Takasago, Japan9:50 a.m. W-13 Roll-Coater Applications for Energy and EnvironmentD.J. Mount, ULVAC Technologies, Inc., Methuen, MA10:10 a.m. – 10:30 a.m. – Break10:30 a.m. W-14 High Performance Roll-to-Roll ITO Refractive Index Matched to Optically Clear Adhesive Coating Films for Projected-Capacitive Touch Sensors Applica-tionsF. Li, Multek Flexible Circuits, Inc., Northfield, MN10:50 a.m. W-15 Fabrication of Stochastic Nanostructures on Polymer Webs for AR-Ef-fect Using Roll-to-Roll EquipmentW. Schönberger, Technische Universität Dres-den, Dresden, Germany; M. Fahland, Fraun-hofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany; P. Mun-zert, and U. Schulz, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany; and G. Gerlach, Technische Universität Dresden, Dresden, Germany11:10 a.m. W-16 The Power of Simple Models to Test the ‘What if ’ Questions for Complex Processes such as Roll-to-Roll Vacuum Depo-sitionM.J. McCann, McCann Science, Chad’s Ford, PA; S. Abbott, TCNF, Ipswich, United Kingdom; D.P. Jones, Emral Ltd., Yarm, United Kingdom; and C.A. Bishop, C.A. Bishop Consulting Ltd., Near Loughborough, United Kingdom11:30 a.m. W-17 Evaporated Aluminum on Polyester: Optical, Electrical, and Barrier Properties as a Function of Thickness D. McClure, Acuity Consulting and Training, Siren, WI; and N. Copeland, General Vacuum Equipment Ltd., Lancashire, United Kingdom 11:50 a.m. W-18 High Accuracy Measure-ment of High Moisture Barrier

S. Kanai, N. Yamagishi, C. Ookawara, and S. Yoshida, Mitsubishi Plastics Inc., Ushiku, Japan

Optical CoatingModerator: Karen McNamara, NASA

8:30 a.m. O-10 Optical Thin Films with High Laser Stability D. Ristau, Laser Zentrum Hannover e.V., Han-nover, Germany9:10 a.m. O-11 The Commissioning of a New ECR-PECVD Reactor and Characterization of Ce-Doped and Un-Doped Silicon Oxynitride Thin FilmsSponsored Student Presentation R. Dabkowski, P. Wilson, J. Wojcik, and P. Mascher, Department of Engineering Physics and Centre for Emerging Device Technologies, McMaster University, Hamilton, Canada9:30 a.m. O-12 Optical Films with HCS Ion Source and Ion Assisted DepositionV.V. Zhurin, Colorado Advanced Technology LLC, Fort Collins, CO; and E.V. Klyuev and A. Sidorov, Research Institute and Enterprise, Podolsk, Russia9:50 a.m. O-13 Advantages and Advance-ments in Biased Target Deposition for Optical Thin FilmsA.J. Cooper, S. Antrazi, and C. Nunes, 4Wave Inc., Sterling, VA10:10 a.m. – 10:30 a.m. – BreakModerator: George Dobrowolski, NationalResearchCouncilofCanada(retired),Canada10:30 a.m. O-14 Optimizing Sweep Pattern Design E-Beam Deposited High Precision Optical CoatingsE. Speyerer and M. Gevelber, Department of Mechanical Engineering, Boston University, Boston, MA; and D. Radgowski, Cyber Materi-als LLC, Boston, MA10:50 a.m. O-15 High Performance Optical Coatings Deposited Using Closed Field Mag-netron SputteringJ. Martin and D.R. Gibson, Applied Multilayers Inc., Hayward, CA11:10 a.m. O-16 Process Control in Sputter-ing and magPECVD of Inorganic and Hybrid Coatings for Optical ApplicationsP. Frach, H. Bartzsch, D. Glöss, and K. Taeschner, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany11:30 a.m. O-17 Characterisation and Com-parison of Diamond-Like Carbon Thin Films Deposited by RF-PECVD and Pulsed-DC Hol-low Cathode PECVDR. Birney and F. Placido, Thin Film Centre, University of the West of Scotland, Paisley, United Kingdom


Manufacturing Market Transformation Forum Symposium on Coating Advances and its Impact on the Future of the Vacuum Coating Industry Vacuum Web Coating Optical Coating

Thursday at a Glance

Education Program Diamond Like Carbon Coatings – From Basics to Industrial Realization (AM) Alternative Transparent Conductive Oxides (TCOs) to ITO (AM) Atmospheric Plasma Technologies (AM) Manufacture of Precision Evaporative Coatings (AM)

2011 TechCon Education ProgramApril 16-21, 2011

SVC Preliminary Tutorial RosterYou do not have to register for the TechCon or be a member of SVC to attend tutorials.

Anyone can take advantage of the practical problem-solving tutorials developed by the SVC. Taught by some of the most respected professionals in the vacuum coating industry, these tutorials cover every aspect of vacuum coating. Twenty-six tutorials will be offered, including four new tutorials. Tutorials complement the technical conference sessions and Exhibit. Discounted fees are available for students. For detailed information, visit the education section of the SVC Web Site at www.svc.org. Register on-line or contact the SVC at 505/856-7188 or byE-mail to [email protected].

Vacuum Systems, Materials and Operation (O’Hanlon) An Introduction to Physical Vapor Deposition (PVD) Processes (Shah) Practical Aspects of Optical Coatings (Morton) Thin Film Growth and Microstructure Evolution (Greene)

Sputter Deposition (Greene) - Day 1 of 2-Day TutorialOptical Coating Design and Monitoring (Willey) Plasma Modification of Polymer Materials and Plasma Web Treatment (Grace) High Power Impulse Magnetron Sputtering (Ehiasarian & Anders) NEW! Introduction to Photovoltaic Materials and Photovoltaics (Martin)

Sputter Deposition (Greene) - Day 2 of 2-Day TutorialSputter Deposition onto Flexible Substrates (McClure) Numerical Methods for Optical Coatings (Dobrowolski) Characterization of Thin Films (Christensen) .

Practical Aspects of Vacuum Technology: Operation and Maintenance of Production Vacuum Systems (Langley)Introduction to Plasma Processing Technology (Baránková & Bárdos) Half Day p.m.Reactive Sputter Deposition (Greene) Properties and Applications of Tribological Coatings (Matthews) Half Day a.m.NEW! Introduction to Thin Film Photovoltaic Technologies (Sittinger) Half Day p.m.

Sputter Deposition in Manufacturing (Glocker)Troubleshooting for Thin Film Deposition Processes (Ash)ITO and Other Transparent Conductive Coatings: Fundamentals, Deposition, Properties, and Applications (Bright) NEW! Nanostructures: Strategies for Self-Organized Growth (Greene) Half Day a.m.NEW! Industrial Ion Sources (Zhurin) Half Day p.m.

Diamond Like Carbon Coatings – from Basics to Industrial Realization (Schuelke, Van de Kolk, and Bewilogua) Half Day a.m.Alternative Transparent Conductive Oxides (TCOs) to ITO (Bright) Half Day a.m.Atmospheric Plasma Technologies (Baránková & Bárdos) Half Day a.m.Manufacture of Precision Evaporative Coatings (Oliver) Half Day a.m.

Tutorial Classification SystemThe tutorial codes are intended to provide the prospective attendee with some guidance as to whether the emphasis in the tutorial is primarily on vacuum technology (V code), or vacuum deposition coating processes and technology (C code), or other miscellaneous top-ics (M code). The tutorial number is intended to indicate the level of tutorial specialization—the lower numbers refer to tutorials that are basic or introductory in nature, and the higher numbers refer to tutorials that offer a more specialized treatment of a specific topic. Tutorials are full day (8:30 a.m. to 4:30 p.m.) unless otherwise noted.

For details on all tutorials in the SVC portfolio, including the tutorial description, topical outline, tutorial syllabus and biographical sketches of the instructors, explore the Education button

on the new SVC Web Site at www.svc.org

EDUCATION PROGRAM SCHEDULE April 16Saturday

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V-204C-103C-302C- 311

April 18Monday

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C-203C-211C-303C-322

April 19Tuesday

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V-207C-210C-315C-328C-330

April 20Wednesday

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C-208C-212C-304C-318C-329

April 21Thursday

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C-320C-321C-324C-326

April 17Sunday

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C-203C-301C-314C-323C-327


Tutorial Courses2011

V-204 » Vacuum Systems, Materials and OperationSaturday, April 16 8:30 a.m.—4:30 p.m.Tutorial fee: $670 (includestextbook) Student fee: $190This tutorial course is intended for those who wish to learn how diffusion and cryo pump systems operate, how to choose materials for vacuum use, and how to pump water vapor properly during the rough pumping cycle. At the end of this tutorial, a participant should be able to explain the operation of diffusion, and cryo pumped systems; understand how materials are chosen for use in vacuum, and how to rough pump water vapor without producing condensation.Topical Outline:

IntroductionRotary mechanical pumpsDiffusion pumps and systemsCryogenic pumps and systemsMaterials suitable for vacuum useMethods for rough pumping water vapor

Attendees in this tutorial receive the text, A User’s Guide to Vacuum Technology, 3rd edition, John O’Hanlon (John Wiley & Sons, 2003).Instructor: John F. O’Hanlon, ProfessorEmeritusofElectricalandCom-puterEngineering,UniversityofArizonaJohn F. O’Hanlon isProfessorEmeritusofElectricalandComputerEngineering,theUniversityofArizona.HeretiredfromIBMResearchDivisionin1987,wherehewasinvolvedinthin-filmdeposition,vacuumprocessing,anddisplaytechnology.HeretiredfromUAin2002,wherehedirectedtheNSFInd./Univ.CenterforMicro-contaminationControl.Hisresearchfocusedonparticlesinplasmas,cleanrooms,andultrapurewatercontamination.HeistheauthorofAUser’sGuidetoVacuumTechnology,3rdedition.(JohnWiley&Sons,2003).Also available through the SVC on Location Education Program

C-103 » An Introduction to Physical Vapor Deposition (PVD) ProcessesSaturday, April 16 8:30a.m.—4:30 p.m.Tutorial fee: $670 (includestextbook) Student fee: $190Physical vapor deposition (PVD) processes are atomistic deposition processes in which material vaporized from a source is transported in the form of a vapor through a vacuum or low-pressure gaseous environ-ment to the substrate, where it condenses and film growth takes place. PVD processes can be used to deposit films of compound materials by the reaction of depositing material with the ambient gas environment or with a codeposited material. This tutorial will discuss and compare the four basic PVD techniques: vacuum evaporation, sputter deposition, arc vapor deposition, and ion plating. Vacuum evaporation uses thermal vaporization as a source of depositing atoms; sputter deposition uses physical sputtering as the vaporizing source; arc vapor deposition uses a high-current, low-voltage arc for vaporization; and ion plating uses concurrent or periodic energetic particle bombardment to modify the film growth. The parameters used for each technique will be discussed along with their advantages, disadvantages, and applications. This is an entry-level tutorial to acquaint the students with various PVD processes used for “surface engineering.”Topical Outline:

Introduction: deposition environments (vacuum and plasma), film formation, film structures, reactive deposition, factors affecting film propertiesVacuum evaporation and vaporization, evaporation and sublimation, deposition chambers, vaporization sources (resistive and e-beam), evaporation materials, fixture design, process parameters, monitoring and control, advantages and disadvantages, applications

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Sputter deposition and physical sputtering, plasmas (dc, rf, magnetron, and pulsed dc), sputtering target configurations, reactive sputter deposi-tion, sputtering materials, process parameters, monitoring and control, advantages and disadvantages, applicationsArc vapor deposition and vacuum and plasma arcs, properties of arcs, generation and “steering” of arcs, arc sources, reactive arc deposition, process parameters, monitoring and control, advantages and disadvan-tages, applicationsIon plating and bombardment effects, bombardment configurations, reac-tive ion plating, ion plating vaporization sources and evaporation, sput-tering and arc process parameters, monitoring and control, advantages and disadvantages, applicationsPVD deposition systems and configurations (batch, load-lock, and in-line), pumping options

The tutorial fee includes the text, Handbook of Physical Vapor De-position (PVD) Processing, 2nd edition, Donald M. Mattox (William Andrew Publishing 2010).Instructor: S. Ismat Shah, UniversityofDelawareS. Ismat Shah graduatedfromtheUniversityofIllinoisatUrbana-Champaignin1986fromtheDepartmentofMaterialsScienceandEngineering.HeworkedfortheDuPontCompanyasseniorStaffScientistfor12yearsbeforejoiningtheUniversityofDelawarein1999,wherehehasajointappointmentintheDepartmentofMateri-alsScienceandEngineeringandtheDepartmentofPhysicsandAstronomy.Hehasbeeninvolvedinthefieldofthinfilmsandnanostructuredmaterialsfor22years.Hehasover174publicationsinthefieldandsixpatentsawarded.HeistheChairoftheSVCEducationCommittee.Heteachesthefirston-linecourseofferedbytheSVC,incollaborationwiththeUniversityofDelaware,onVaporDepositionProcesses.Also available through the SVC on Location Education Program

C-302 » Practical Aspects and Characterization of Optical CoatingsSaturday, April 16 8:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial covers methods for depositing optical thin film materials and the parameters to control to achieve desired properties. Various deposition source types will be presented with strong emphasis on physi-cal vapor deposition (sputtering and evaporation). Both qualitative and quantitative methods for characterizing thin films will be presented.Topical Outline:

Methods for depositing thin films and for calculating performanceMeasuring optical thin films and calculating optical properties (n and k)Dispersion models for optical thin filmsComparison of characterization techniquesEffect of deposition parameters on optical propertiesIon-assisted depositionThin film material properties for dielectric and metal filmsReview of optical properties for other selected materials

Instructor: Dale E. Morton, DentonVacuum,LLC(retired) Dale E. Morton hasretiredastheProcessR&DManageroftheHighVacuumEquipmentDivisionofDentonVacuum,LLC.HealsowasProductManagerforthecoldcathodeionsourceproductline.Hehas35yearsofexperienceindesignandprocessdevelopmentforopticalthinfilmapplicationswithastrongemphasisonthecharacterizationoftheopticalpropertiesofthinfilmmaterials.HeisapastdirectoroftheSVC(1994to2000)andisaformerOpticalCoatingTACChair(1993to1995)andProgramChair(1997to1999)fortheSVCAnnualTechnicalConference.Also available through the SVC on Location Education Program

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Saturday, April 16

1�505/856-7188 Fax 505/856-6716 » E-mail [email protected] » Web Site www.svc.org


C-311 » Thin Film Growth and Microstructure EvolutionSaturday, April 16 8:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial is intended for engineers, technicians, and others involved with the vapor deposition of thin films by sputtering, evaporation, MBE, CVD, GS-MBE, etc., and who need to obtain a better understanding of the effects of operating parameters on the properties of metal, semicon-ductor, and dielectric films and alloys. The tutorial is concentrated on the development of a detailed atomic-scale understanding of the primary experimental variables and surface reaction paths controlling nucle-ation/growth kinetics and microstructural evolution during vapor-phase deposition of thin films. The goal is to develop an appreciation of the advantages and disadvantages of competing growth techniques and to learn how to design better and more efficient film growth processes to achieve required properties.Thin-film technology is pervasive in many advanced fields of modern technology including microelectronics, optics, magnetics, hard and cor-rosion-resistant coatings, micromechanics, etc. Progress in each of these areas depends upon the ability to selectively and controllably deposit thin films (thickness ranging from tens of Ångstroms to micrometers) with specified physical properties. This, in turn, requires control—often at the atomic level—of film microstructure and microchemistry.Essential fundamental aspects, as well as the technology of thin-film nucleation and growth from the vapor phase (evaporation, MBE, sput-tering, and CVD) are discussed in detail and highlighted with “real” examples. The tutorial begins with an introduction on substrate surfaces: structure, reconstruction, and adsorption/desorption kinetics. Nucle-ation processes are treated in detail using insights obtained from both in situ (RHEED, LEED, STM, AES, EELS, etc.) and post-deposition (TEM and AFM) analyses. The primary modes of nucleation include two-di-mensional (step flow, layer-by-layer, and two-dimensional multilayer), three-dimensional, and Stranski-Krastanov. The fundamental limits of epitaxy will be discussed.

Experimental results and simulations will be used to illustrate processes controlling three-dimensional nucleation kinetics, island coalescence, clustering, secondary nucleation, column formation, preferred orienta-tion, and microstructure evolution. The effects of low-energy ion-irradia-tion during deposition, as used in sputtering and plasma-CVD, will be discussed with examples. The Tutorial course concludes with a detailed discussion of the origins, mechanisms, and control strategies, of intrinsic and extrinsic stresses in thin films.Topical Outline:

The role of the substrate in mediating growth kineticsThe nucleation processFilm growth modesEpitaxyThe development and control of film stress (strain engineering)Nucleation and growth of strain-mediated self-organized structuresPolycrystalline film growth, texture, and microstructure evolutionStructure-zone models of film microstructureThe role of low-energy ion/surface interactions during film growthThe relationship between film growth parameters and film properties

Instructor: Joe Greene, D.B.WillettProfessorofMaterialsScienceandPhysics,UniversityofIllinoisJoe Greene istheD.B.WillettProfessorofMaterialsScienceandPhysics,theTageErlanderProfessorofMaterialsPhysicsatLinkopingUniversity,aChairedProfessorattheNationalTaiwanUniversityofScienceandTechology,andPastDirectoroftheFrederickSeitzMaterialsResearchLaboratoryattheUniversityofIllinois.Thefocusofhisresearchhasbeenthedevelopmentofanatomic-levelunderstandingofadatom/surfaceinteractionsduringvapor-phasefilmgrowthinordertocontrollablymanipulatemicrochemistry,microstructure,andphysicalproperties.Hisworkhasinvolvedfilmgrowthbyallformsofsputterdeposition(MBE,CVD,MOCVD,andALE).HewasPresidentoftheAmericanVacuumSocietyin1989,aconsultantforseveralresearchanddevelopmentlaboratories,andavisitingprofessoratseveraluniversities.RecentawardsincludereceiptoftheAristotleAwardfromSRC(1998),theAdlerAwardfromtheAmericanPhysicalSociety(1998),FellowoftheAmericanVacuumSociety(1993)andtheAmericanPhysicalSociety(1998),andtheTurnbullPrizefromtheMaterialsResearchSociety(1999).HewaselectedtotheUSNationalAcademyofEngineeringin2003.HeistheEditor-in-ChiefofThinSolidFilms.Also available through the SVC on Location Education Program

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Saturday, April 16

Registration is Now open!Book Your Rooms Early at the Hyatt Regency Chicago on the Riverwalk

There is added anticipation for the 2011 TechCon, since it will be hosted by the Hyatt Regency Chicago on the Riverwalk, one of the most desirable venues for so many of our potential attendees, exhibitors and visitors.

• Registration for the TechCon and the Hotel Reserva-tion System is now open

• The SVC Group room rate is $199.00 (single & double plus taxes)

• Book Early at the Hyatt Regency Chicago so that the SVC room rate can be locked in before the hotel is sold out.

• The cancellation policy is 14 days instead of 30 days in 2011. If you book a room and need to cancel send an E-mail to [email protected]. No doubt SVC will have a list of individuals waiting for a cancel-lation as happened in 2008, and names can be changed if done at the same time as a cancellation is made.

Don’tmissaminuteoftheTechCon!Stayon-siteattheHyattRegencyChicagoontheRiverwalkforonly$199.00pernight.DiscoverthedifferencebetweenahotelandaHyattwhenyoustayattheincomparabledowntownChicagohotel.Setwithintheepicenterofthecity,thisAAAFourDiamondHyattRegencyisconvenientlycon-nectedtoIllinoisCenterandwithinminutesoftheMagnificentMile.

RegisterfortheTechConandreserveyourroomattheHyattRegencytoday!

www.svc.org



C-203 » Sputter Deposition (two – day course)Sunday and Monday, April 17–18 8:30 a.m.—4:30 p.m.Tutorial fee: $895 Student fee: $190This tutorial covers fundamental mechanisms associated with genera-tion of glow discharges, sputtering, and energetics of target and substrate processes. Operation and system design will be discussed for dc, rf, magnetron (both magnetically balanced and unbalanced), pulsed dc, and ion beam sputtering. The advantages and disadvantages of these different modes of operation will be examined from the point of view of controlling film properties. Emphasis is placed on developing a sufficient understanding of sputter deposition to provide direction in designing new processes. Present and future trends in sputter deposition also will be addressed.Topical Outline:

Processes controlling film growth and propertiesThe role of energetic particles in controllably modifying these processesTarget sputtering effectsNature and energy of sputtered atomsDiode, triode, magnetron, and ion beam systemsdc, HIPIMS, pulsed dc, mid-frequency ac, and rf power for targets and substratesReactive sputtering of conducting and dielectric layersAlloy sputtering

Instructor: Joe Greene, D.B.WillettProfessorofMaterialsScienceandPhysics,UniversityofIllinoisFor Joe Greene’s profile, see C-311 (Saturday)Also available through the SVC on Location Education Program

C-301 » Optical Coating Design and MonitoringSunday, April 17 8:30 a.m.—4:30 p.m.Tutorial fee: $620 (includestextbooks) Student fee: $145This tutorial covers optical coating design principles and techniques from both classical approaches and other different viewpoints. Methods for the design and execution of monitoring strategies to produce desired coating results are described. The sensitivities, possibilities, and limitations of most control techniques are described.Topical Outline:

Fundamentals of thin film optics from various points of viewThe use of graphical methods for understanding and designing optical coatingsA Fourier viewpoint of optical coatingsPractical monitoring and control of thin film growthError compensation and degree of controlSensitivity to errors and monitoring strategies

The tutorial fee includes two textbooks: Practical Design of Optical Thin Films, Ronald R. Willey, 2007; and Practical Monitoring and Control of Optical Thin Films, Ronald R. Willey, 2007 (both published by Willey Optical Consultants).Instructor: Ronald R. Willey, Consultant,WilleyOpticalRonald R. Willey graduatedfromtheMITinopticalinstrumentation,hasanM.S.fromFIT,andover35yearsofexperienceinopticalsystemandcoatingdevelop-mentandproduction.Heisveryexperiencedinpracticalthinfilmsdesign,processdevelopment,andtheapplicationofindustrialDesignOfExperimentsmethodology.Heistheinventorofarobustplasma/ionsourceforopticalcoatingapplications.HeworkedinopticalinstrumentdevelopmentandproductionatPerkin-ElmerandBlockAssociates.HedevelopedautomaticlensdesignprogramsatUnitedAircraft

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ResearchLaboratories.HeformedWilleyCorporationin1964andservedawidevarietyofclientswithconsulting,development,prototypes,andproduction.In1981hejoinedMartinMariettaAerospaceandwasDirectoroftheOpticalComponentCenterwherehewasresponsibleforopticalfabrication,coating,andassembly.HejoinedOptoMechanikin1985wherehewasresponsibleforthedevelopmentofallnewtechnologies,newinstruments,andproductionengineering.HewasaStaffSci-entistatHughesDanburyOpticalSystems.Heholdsfourpatentsandhaspublishedmanypapersandabookonopticalcoating,opticaldesign,andeconomicsofopticaltolerances.HeisafellowoftheOpticalSocietyofAmericaandSPIEandapastDirectoroftheSocietyofVacuumCoaters.Henowisaconsultantintheabove-listedtechnicalareas.Also available through the SVC on Location Education Program

C-314 » Plasma Modification of Polymer Materials and Plasma Web TreatmentSunday, April 17 8:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95Plasma treatments are used in the web coating and roll conversion industries to tailor polymer surfaces while preserving their bulk proper-ties. This tutorial is intended for engineers, scientists, and technicians who would like to gain a better understanding of the influence of plasma process factors on treatment performance, as well as the practical issues related to process robustness, process speed, and ease of scale-up. While much of the tutorial deals with treatment of polymer webs, the key con-cepts presented are applicable to polymer surfaces in general and plasma treatment of materials in general.Topical Outline:

A basic introduction to plasmas including discussion of species distribu-tions, the structure of glow-discharge plasmas, electrical breakdown of gases, and mechanisms of sustaining a plasma.Discussion of industrial applications of plasmas for polymer surface modification including wettability control & printing, bonding & adhe-sion, nucleation of films, control of biointeraction with surfaces, and control of gas-film interactions.Description of a variety of plasma treatment technologies and the impor-tance of controlling the industrial treatment environment.The interaction of plasmas with polymer surfaces.The basics of polymer surface analysis along with examples of surface analytical techniques applied to plasma treated polymers including X-ray photoelectron spectroscopy, static secondary ion mass spectrometry, and high-resolution electron energy loss spectroscopy. Also included is discussion of adhesion, wetability, etc.Practical aspects of plasma web treatment including treatment dose, process factors and their roles, practical treatment efficiency, process verification, and process stability issues.Mechanisms of surface modification in the context of a site balance model.

Instructor: Jeremy M. Grace, SeniorPrincipalScientist,EastmanKodakCompanyJeremy M. GraceiscurrentlyaseniorprincipalscientistattheEastmanKodakcom-pany.AtKodak,hehasworkedintheareasofplasmasurfacemodification,thin-filmadhesion,sputterdeposition,andorganicvapordeposition.Hehaswrittenseveralpatentsandjournalarticlesintheareaofplasmamodificationofpolymers.HeisamemberoftheSocietyofVacuumCoatersandtheAmericanVacuumSociety,andservedaschairoftheUpstateNewYorkChapteroftheAVS(UNY-VAC)from1998-2000.Also available through the SVC on Location Education Program

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Sunday, April 17



C-323 » High Power Impulse Magnetron SputteringSunday, April 17 8:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial is intended for engineers, technicians, students, and oth-ers interested in high power impulse magnetron sputtering (HIPIMS). With HIPIMS we mean a pulsed sputtering process where the power density on the sputtering target is greatly enhanced (about two orders of magnitude) over the average power density. Hence, the word “impulse” is adopted to signify a low duty cycle of operation.Some basic understanding or experience with plasmas and materials is desirable but not required. The tutorial starts with a brief introduction to basic plasma and sheath physics. The operation of dc magnetrons is explained to provide the foundation for the understanding of the time-dependent processes in pulsed systems, and especially those of HIPIMS discharges.High power density leads to significant ionization of the sputtered material, enabling effective surface modification via ion etching and ion assistance to film growth. The interface to the substrate can be engi-neered and the film texture can be influenced using the HIPIMS plasma in combination with an appropriate bias. Topical Outline:

HIPIMS - An IntroductionStationary plasmas, sheaths, dischargeThe dc magnetron processesIon surface modification: etching and film growth, energetic condensa-tionPulsed plasmas and sheathsHigh Power Impulse Magnetron Sputtering: the dischargePlasma characterization and plasma diagnosticsSubstrate biasing: etching / growth assistInterface engineering by using HIPIMS plasmasDeposition and coatings by HIPIMSHardwareApplications

Instructors: André Anders, PlasmaApplicationsGroup,LawrenceBerke-leyNationalLaboratory,and Arutiun P. Ehiasarian, SheffieldHallamUniversity-UnitedKingdomAndré Anders isaSeniorScientistandtheLeaderofthePlasmaApplicationsGroupatLawrenceBerkeleyNationalLaboratory,Berkeley,California.HestudiedphysicsinPoland,Germany,andRussia.HeholdsanM.S.(1984)andPh.D.degree(1987)inphysicsfromHumboldtUniversity,Berlin.HeworkedattheAcademyofSciences,(East)Berlin,untilhemovedtoBerkeley,California,in1992.Hisresearchincludescoatingsbysputteringandcathodicarcs,plasmaimmersionionimplantation,andplasmaandionsourcedevelopment.Hehasauthored/co-authoredthreebooks,over250papersinrefereedjournals,andholdsseveralpatents.HeservesasAssociateEditorfortheJournalofAppliedPhysics,onseveralinternationaladvisorycommit-tees,andontheEditorialBoardsofAppliedPhysicsLetters,theJournalofAppliedPhysics,andSurfaceandCoatingsTechnology.HewaselectedFellowofAPS,IEEEandIoP(UK)andreceivedtheChattertonAward(1994),twoR&D100Awards(1997,2009),andthe2010MeritAwardoftheIEEENuclearandPlasmaSocieties.Arutiun P. Ehiasarian joinedtheNanotechnologyCentreforPVDResearchatSheffieldHallamUniversity,UKin1998whereheobtainedhisPhDinPlasmaSci-enceandSurfaceEngineering.HisresearchwithinNTCPVDhasconcentratedondevelopmentofplasmaPVDtechnologiesforsubstratepretreatmentpriortocoatingdepositiontoimproveadhesion,depositionofcoatingswithdensemicrostructure,low-pressureplasmanitridingandhybridprocessesofplasmanitriding/coating

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deposition.Hehasexperiencewithcathodicvacuumarcdischarges,dcandpulsedmagnetrondischarges,andradio-frequencycoilenhancedmagnetronsputtering.Heutilizesplasmadiagnosticssuchasopticalemissionspectroscopy(OES),electrostaticprobes,energy-resolvedmassspectroscopyandatomicabsorptionspectroscopy.Materialscharacterizationincludeshigh-resolutionTEM,STEM,STEM-EDS,SEM,andXRDaswellasmechanicaltestingavailableatNTCPVD.Arutiunisoneofthepioneersofhighpowerimpulsemagnetronsputtering(HIPIMS)technologyandhisworkinthefieldhasbeenacknowledgedwiththeR.F.BunshahAward(2002),theTecVacPrize(2002)andtheHüttingerIndustrialAccolade.Heisanauthorofmorethan50publications,10invitedlectures,3patentsand1bookchapterinthefieldofPVDandHIPIMS.Also available through the SVC on Location Education Program

C-327 » Introduction to Photoactive Materials and Photovoltaics New!Sunday, April 17 8:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95In addition to traditional semiconductors, photovoltaics technology now encompasses thin films, organic materials, low dimensional materials, nanotubes and biomaterials. This course provides an introduction to the basic principles of photoconductivity and photoactivation, solar cell operation, photovoltaic devices, photocatalytic materials and the wide range of photovoltaic technologies and systems. Principles of photocon-ductivity and solar cell operation will be presented using basic solid state physics and graphic examples. Specific examples addressed are silicon so-lar cells, amorphous thin film silicon cells, Gratzel (dye sensitized) cells, organic cells and multijunction cells. This course will address current PV cell structures and power systems and the factors that are prevent-ing them from achieving theoretical efficiencies. Solar concentrators and industrial PV systems will also be presented. Finally, future directions will be addressed Topical Outline

Energy from the sun and heat sourcesSemiconductor band structurePhotoconductivity mechanismsSolar cell parametersMaterialsBulk semiconductor cellsThin film solar cellsDye sensitized solar cellsPhotocatalytic materialsOrganic solar cellsPhotovoltaic power systemsSolar concentratorsAdvanced materials and designsFuture directions

Instructor: Peter Martin, ColumbiaBasinThinFilmSolutionsLLCPeter MartinworkedatPacificNorthwestLaboratory(PNNL)forover29yearswherehecurrentlyholdsanEmeritusLaboratoryFellowappointmentAtPNNLhedevelopedthinfilmcoatingsforenergy,biomedical,spaceanddefenseapplications.HeiscurrentlyPresidentofColumbiaBasinThinFilmSolutionsLLCandrecentPastPresidentofSVC.Hehaswrittenover400technicalpublications,threeR&D100Awards,twoFederalLaboratoryConsortiumawards,andvotedBattelle2005InventoroftheYear.HehasoverthirtyUSpatents,andteachesshortcoursesonSmartMaterialsandEnergyMaterialsandApplications.

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Sunday, April 17

Society of Vacuum Coaters » 2011 TechCon Preliminary Program �0


C-211 » Sputter Deposition onto Flexible SubstratesMonday, April 18 8:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial is intended for engineers, scientists, and others who are interested in sputter deposition onto polymer substrates in a roll-to-roll format. This tutorial will emphasize practical aspects of the topics, and the treatment will be descriptive with little mathematics used. There will be time dedicated to problem solving; bring your questions and problems and leave with new solutions and/or new directions.Topical Outline:

Markets for sputter-coated web productsVacuum technology for sputter web coatingSubstrate characteristicsWeb handling, web winding, and web cooling issuesThe sputter coating processProcess and product monitoring methodsCurrent topics in sputter web coating

Additionally, the notes provide extensive information and references to sputtering (written at several levels) and a comprehensive bibliography on sputter web coating.Instructor: Donald J. McClure,AcuityConsultingandTrainingDonald J. McClure foundedAcuityConsultingandTrainingtocontinuehisloveaffairwithvacuumcoatingandvacuumwebcoatinginparticular.Donretiredfrom3M’sCorporateResearchLaboratoryafterspendingtwentyfiveyearsworkingonabroadrangeofproductsandprojectsthatutilizedvacuumrollcoatingandprocess-ing.HeservedtheSocietyofVacuumCoatersinmanyrolesincludingPresidentandSecretary.Hehasofferedhiscoursesonthe“BasicsofVacuumWebCoating”and“SputterDepositionontoFlexibleSubstrates”formanyyears.Hispresentation,“AWizard’sGuidetoVacuumandVacuumCoating,”hasreceivedravereviewsfromattendees.HewastheSVC’s2004NathanielSugermanAwardrecipient.Also available through the SVC on Location Education Program

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C-303 » Numerical Methods for Optical CoatingsMonday, April 18 8:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95After a brief general introduction, the performance of classical optical coatings, such as antireflection coatings, reflectors, cutoff filters, band pass filters, polarizers, and beam splitters, is reviewed and compared to that of filters based on different physical principles. In the next part of the course, various numerical methods are outlined that can be used for the design of multilayer coatings for various challenging applications. Re-finement techniques are discussed that can be used to enhance the per-formance of reasonable starting designs. Various synthesis methods are described that do not require a starting design. These latter techniques include the comprehensive search, gradual evolution, minus filter, the flip-flop, needle, refractive index step, and the inverse Fourier transform methods. All are illustrated by examples. Solutions to some interesting problems found with these design methods are presented. Numerical methods are also very useful at various stages of the actual manufac-ture of multilayer systems. Results obtained with completely automatic deposition systems are described in which the computer software not only controls the deposition, but also evaluates at various stages the per-formance of the partial multilayer. On this basis it then makes run-time adjustments to the remaining layers of the thin film system to reduce the effect of errors that have been made thus far. The present state of the art of design and manufacture is illustrated with the results submitted to the Manufacturing Problems held at the last few meetings of the OSA’s Opti-cal Interference Coatings conferences. Finally, non-optical requirements for coating systems are discussed to show how they impact on the design of the optical multilayers. A more detailed list of topics discussed in the course than the one given below will be found in the Detailed Course Syllabus on the SVC Web Site.Topical Outline:

General introductionReview of basic optical filtersMaterials used in multilayer systemsSpecifications of multilayer systemsNumerical design of multilayer systemsRefinement methods

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Monday, April 18

SVC On Location Education Program Bring the Experts to Your Facility and Educate Your Team at a Reasonable Cost!

SVC—Your Best Resource for On-Location Education on Vacuum Coating TechnologiesA strong commitment to education is part of SVC’s Charter. When you decide to bring tutorials to your facility, you can be assured of high-quality, practical tutorials taught by recognized industry experts. Tutorials are de-signed for the novice as well as for the seasoned professional.

The SVC On-Location Education Program—Bring the Experts to Your Facility and Educate Your Team at a Reasonable Cost!This program provides cost-effective training by eliminating time away from work, travel expenses, and individual tutorial attendance fees. The SVC offers tutorials to organizations subject to instructor availability and certain other conditions. Contact SVC for tutorial availability, pricing information and to schedule one or more courses at your location. It is a great bargain in this economic climate.

Improve your skills, broaden your knowledge, and increase your productivity with the SVC On Location Education Program.



Synthesis methodsCommercial thin film design programsSome interesting problems solved with numerical methodsComputer assisted manufacture of multilayersManufacture with real-time re-optimizationOIC Manufacturing problemsReal time optimization with etchingMeeting non-optical requirements for optical coatings

Instructor: J.A. (George) Dobrowolski, NationalResearchCouncilofCanada(retired)J.A. (George) Dobrowolski iscurrentlyaguestworkerattheNationalResearchCouncilofCanada.Hismaininterestsareopticalfilters,ingeneral,andthedevelop-mentoftheoreticalmethodsforthedesignandconstructionofopticalmultilayersystems,inparticular.Healsoisinterestedinthedevelopmentofvariousnewtech-nologicalandconsumer-orientedapplicationsofopticalcoatings.Heistheauthororco-authorofabout150publications,eighthandbookarticles,and28patentsinthefieldofopticalthinfilms.Hereceivedthe1987JosephFraunhoferAward,the1996DavidRichardsonMedaloftheOpticalSocietyofAmerica,andthe1997MedalofAchievementinIndustrialandAppliedPhysicsoftheCanadianAssociationofPhysi-cists.In2005hewasawardedtheSVCNathanielSugermanAward.Dobrowolskiistheco-inventoroftheopticalthinfilmsecuritydevicesusedonallCanadianbanknotesof$5andhigherdenomination.Also available through the SVC on Location Education Program

C-322 » Characterization of Thin FilmsMonday, April 18 8:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial examines the broad range of techniques available to charac-terize thin film materials. We examine the range of properties of interest and how thin film properties may differ from bulk properties. Generic differences between counting and spectroscopic techniques are present-ed. Available “probes” are identified.The main emphasis of the tutorial is an overview of a wide range of char-acterization techniques. We examine imaging techniques such as Optical microscopy, Scanning electron microscopy (SEM), Transmission electron microscopy (TEM), and Scanning probe microscopies (STM, AFM …). We also explore techniques, which provide information about struc-

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Monday, April 18

tural properties including X-ray diffraction (XRD), Stylus profilometry, Quartz crystal monitors (QCM) and density measurements.The tutorial examines techniques, which explore chemical properties such as Auger electron spectroscopy (AES), Energy Dispersive Analysis of X-rays (EDAX), X-ray Photoelectron Spectroscopy (XPS, ESCA), Secondary Ion Mass Spectrometry (SIMS), and Rutherford Backscatter-ing (RBS). AES is used as a prototype to examine quantitative analysis of spectroscopic data. Characterization techniques for optical properties such as ellipsometry and optical scattering are also considered. Many of these chemical and optical techniques can also provide information about structural properties.Techniques for determining electrical and magnetic properties are also discussed. These include resistance / four point probe, Hall effect, mag-neto-optical Kerr effect and ferromagnetic resonance. The emphasis here is on materials characterization as opposed to device characterization.The tutorial concludes with an examination of techniques used to explore mechanical properties such as stress-curvature measurements, friction testing, micro/nano indentation and adhesion tests.Topical Outline: Overview of wide range of characterization techniques for thin films including:

Mechanical properties (stress, friction, micro/nano indentation, adhe-sion…)Imaging (microscopies: optical, SEM, TEM, AFM …)Structural properties (XRD, profilometry, QCM …)Chemical properties (AES, EDAX, XPS, SIMS, …)Electrical/magnetic properties (resistance, Hall effect, Kerr effect …)

Instructor: Tom Christensen, UniversityofColorado-ColoradoSpringsTom Christensen isaProfessorintheDepartmentofPhysicsattheUniversityofColoradoatColoradoSprings.HereceivedhisB.S.inphysicsfromtheUniversityofMinnesotain1979andhisM.S.andPh.D.degreesinAppliedPhysicsfromCornellUniversity.AfterseveralyearsasamemberofthetechnicalstaffatSandiaNationalLaboratoriesinAlbuquerquehejoinedtheUniversityofColoradofacultyin1989.Hehasworkedwithvacuumtechnology,thinfilmtechnologyandsurfacecharacter-izationsince1980andhastaughtlocalAVSshortcoursessince1992.Also available through the SVC on Location Education Program

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Bring the Experts to Your Facility and Educate Your Team at a Reasonable Cost!

“Fantastic job! This tutorial very much related to the real world. This class was excellent and gave many ideas

to implement on the plant floor.”— Toma Ljulj, Emrick Plastics (V-207)

“There was a wonderful balance betweenvarious industry uses as well as new ideas

which could be used across various process types.”— Kevin Moreau, Elcan Optical Technologies (C-306)

For an up-to-date list of tutorial descriptions and instructor biographical sketches, visit www.svc.org and explore the “Education” button on the main page.

For technical questions regarding the tutorial content, contact the SVC Administrative Office at [email protected], or 505/856-7188.

Joe Greene, D.B.WillettProfessorofMaterialsScienceandPhys-ics,UniversityofIllinois,teachesmultipletutorialcoursesintheSVCOnLocationEducationProgram.

Society of Vacuum Coaters » 2011 TechCon Preliminary Program ��


V-207 » Practical Aspects of Vacuum Technology: Operation and Maintenance of Production Vacuum SystemsTuesday, April 19 8:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial is designed to teach the basic fundamentals of vacuum technology to technicians, equipment operators, line process operators, and maintenance personnel. This tutorial will address how to use and maintain an existing vacuum effectively, not how to design a system. The introduction will consist of a very basic explanation of what a vacuum is and how it is attained and proceeds to an explanation of the three gas flow regimes (i.e., viscous, transition, and molecular flow). This is followed by a description of the types of pumps used in the viscous flow region (e.g., mechanical displacement pumps, venturi/suction pumps, and sorption pumps). Types of high vacuum pumps are next discussed; these include diffusion pumps, turbopumps, and cryopumps. Presented next is a guide for selecting a pressure gauge which includes a descrip-tion of various types of gauges and details their useful pressure range and measurement precision.The next section deals with the care and maintenance of pumps and vacuum systems, including both compressible “rubber” gasket and metal gasket systems. The unique role that water plays in both pumpdown from atmosphere and in outgassing is addressed, and techniques to ameliorate its harmful effects will be presented. The effects of other unique “bad ac-tors” are also discussed. Many useful charts and tables will be presented and explained.Participants are requested to present any problems or difficulty that they may be experiencing with their vacuum systems for discussion. This makes for very interesting examples, and the problem might actually be solved.Topical Outline:

Introduction to vacuumExplanation of the three gas flow regimesViscous flow pumpsHigh vacuum pumpsGuide for selecting a pressure gaugeCare and maintenance of pumps and vacuum systems, including both compressible “rubber” gasket and metal gasket systemsEvaluating system performance: pumpdown rate and leak-up rateLeak detection and correctionCleaning and conditioning of vacuum components and systemOperation of vacuum systems: crossover pressure, interlocks, and safetyApplications of vacuum systems for vacuum coatingPumpdown and outgassingDescriptions of other vacuum related tutorials presented by SVC

Instructor: Robert (Bob) A. Langley, OakRidgeScientificConsultantsRobert (Bob) A. Langley retiredfromOakRidgeNationalLaboratoryin1994andSandiaNationalLaboratoriesin1999.Hehasperformedresearchinthefieldsofatomicandmolecularphysics,solidstatephysics,materialscience,vacuumsci-enceandtechnology,upperatmosphericphenomena,fusionpowerresearch,andhigh-energyaccelerators,publishedover130scientificpapersandisaFellowoftheAmericanVacuumSociety.HeobtainedhisBS,MSandPhDinphysicsatGeorgiaTechandacceptedvisitingacademicpositionsatPrincetonUniversityandUniversityofNewCastle,Australia.HeisassociateeditorofVacuumTechnologyandCoatingmagazine,teachesvacuumrelatedcoursesfortheAmericanVacuumSocietyandtheSocietyofVacuumCoaters,servedontheBoardofDirectorsoftheAVS,andatpres-entconsultsonvacuumscienceandtechnology,andmicrowavematerialprocessing. Also available through the SVC on Location Education Program

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C-210 » Introduction to Plasma Processing Technology (half day)Tuesday, April 19 1:00 p.m.—4:30 p.m.Tutorial fee: $395 Student fee: $70The goal of the tutorial is to show the link and provide understanding of relations between coating application, coating (or modified surface) properties, selection criteria on process characteristics, selection criteria on plasma parameters, and method design. It is possible to predict how the process parameters will be reflected in the coating and in the oppo-site direction, requirements on the coating properties can imply how the process should be designed.Topical Outline:

Plasma-assisted technologies, general attributesUseful criteria, basic relations and limits for plasma, classification of plasmasGeneration of gas discharge plasma, plasma diagnosticsGeneration of vapor species, transport through medium, diffusion, condensation at the surfaceConsequences of the deposition process on film propertiesFundamentals of radical and ion-assisted plasma chemistryHomogeneous and heterogeneous plasma-assisted reaction in deposition of filmsExamples of novel plasma processesLimits and new trendsHybrid plasma processes

Instructors: Hana Baránková, AssociateProfessor,AngstromLaboratory,UppsalaUniversity, and Ladislav Bárdos, AssociateProfessor,UppsalaUniversity-SwedenHana Baránková isProfessorattheAngstromLaboratory,UppsalaUniversityandDirectoroftheinterdisciplinaryprogram/centeronenvironmentalapplicationsofplasma.ShereceivedherPhDfromtheCzechAcademyofScience.Herprimaryin-terestsareinnovationincoatingtechnology,developmentofplasmasources,plasmaprocessingandplasmatreatmentofsurfacesandgases.Shehaspublishedover140scientificpapersandconferencecontributionsandholdsseveralindustrialpatentsonplasmasystems.Sheisaninventorofmetastableassisteddepositionandco-inven-toroftheLinearArcDischarge(LAD)source,theMagnets-in-MotionconceptinplasmasourcesandFusedHollowCathodeandHybridHollowElectrodeActivatedDischarge(H-HEAD)coldatmosphericplasmasources.HanaBaránkováhasbeenserving6yearsontheSVCBoardofDirectors,andasTACChairofEmergingTech-nologiesovertheyears.SheisSecretaryofSVC,organizerofAtmosphericPlasmaTechnologiessessionandHeurékasessionsandmemberoftheEducation,StrategicPlanning,InternationalRelations,Scholarship,andStudentSponsorshipCommit-tees.Hanais2006MentorAwardrecipientforthedevelopmentofnumerousnovelplasmasources.Sheactsasaconsultantandisaco-founderoftwocompanies,BBPlasmaHBandBBPlasmaDesignAB.Ladislav BárdosisProfessoratUppsalaUniversityinSwedenandResearchleaderofthePlasmagroupattheAngstromlaboratory.HereceivedhisPhDin1978fromtheCzechAcad.Sci.andaDoctorofSciencedegreefromCharlesUniversityinPraguein1995.In1984hewasawardedtheCzechoslovakStatePrizeforoutstand-ingresearchresultsintheplasmadepositionofthinfilms.Hehasmorethan25yearsofexperienceinthefieldofappliedplasmaphysicsandthinfilms.Hehaspublishedover200scientificpapersandconferencecontributions,designedseveralplasmasourcesforindustryandhas15Czech,7Swedishandseveralinternationalpatents.Herunsaconsultingcompanyinplasmasourcesandprocessingtechnology.Hispri-maryinterestsaremicrowaveplasmas,includingdownstreamECRandsurface-wavegeneration,andparticularlytheradiofrequencygeneratedhollowcathodesandhybridsourcesatbothlowandatmosphericpressures.LadBardosisProgramChairfor2009and2010SVCTechCons,iscurrentlyservingontheSVCBoardofDirectorsandisTACchairofaspecialsessionHeurékaattheSVCTechConandamemberoftheSVCPublicationsandStrategicPlanningCommittees.Also available through the SVC on Location Education Program

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Tuesday, April 19

��505/856-7188 Fax 505/856-6716 » E-mail [email protected] » Web Site www.svc.org


C-315 » Reactive Sputter DepositionTuesday, April 19 8:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial covers the fundamental mechanisms and technology of high rate reactive sputter deposition of conducting and insulating thin films. Following a brief introduction to reactive sputtering, including discussion of basic issues, target choices, and system configurations, we examine the effects of reactive gas addition on target surface and glow discharge processes which control film growth rates. Deposition ap-proaches used in reactive sputtering – dc, rf, magnetron, pulsed dc, and ion beam – are discussed and compared. Process control strategies (e.g.: flow, partial pressure, and target voltage, and multi-loop control) and their implementation are described in detail using numerous examples. The advantages and disadvantages of these different modes of opera-tion are examined from the point of view of controlling film properties. Emphasis is placed on developing a sufficient understanding of reactive sputter deposition to provide direction in designing new processes. The effects of energetic particle irradiation (positive and negative ions and fast neutrals) on film properties are also discussed. Present and future trends in reactive sputter deposition are addressed.Topical Outline:

Introduction to reactive sputter deposition of conducting and insulating thin filmsTarget processes during reactive sputteringGlow discharge volume processes during reactive sputteringDeposition technologies used in reactive sputtering (dc, rf, magnetron, pulsed dc, ion beam)Process control strategiesParticle irradiation effects during film growthFilm propertiesComputer-based modeling

Instructor: Joe Greene, D.B.WillettProfessorofMaterialsScienceandPhysics,UniversityofIllinoisFor Joe Greene’s profile, see C-311 (Saturday)Also available through the SVC on Location Education Program

C-328 » Properties and Applications of Tribological Coatings (half-day)Tuesday, April 19 8:30 a.m.—12:00 p.m.Tutorial fee: $395 Student fee: $70This tutorial is intended for design engineers, materials scientists, and coatings developers who have a need to specify and develop coatings for tribological applications (i.e., those in which wear must be reduced or prevented and/or friction minimized). The coatings also may need to have corrosion-resistant properties to operate in arduous conditions. The tutorial begins with a description of the mechanics of friction and wear and discusses the problems of selecting coatings for optimal tribological performance. An overview of the main processes for producing tribo-logical coatings is given, emphasizing plasma assisted vacuum deposition methods. Tribological test methods also are overviewed, including tests for adhesion and mechanical properties. Coatings developed for en-hanced tribological properties are described, and information is provided on some applications for these coatings.

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Topical Outline: Wear mechanisms and theories (adhesion, abrasion, erosion, fatigue, corrosion, etc.) Tribological and mechanical test methods (e.g., pin on disc, abrasive wheel, scratch adhesion, microhardness, etc.) Coating processes and selection Benefits of ceramic coatings by PVD methods Information on tribological coatings (e.g., metal nitrides, carbides, oxides, superlattices, multilayers, nanocomposites, DLC, etc., plus hybrid and duplex processes)Applications information (e.g., metal cutting and forming, molding, bearings, pumps, auto parts, etc.)

Instructor: Allan Matthews, UniversityofSheffield-UnitedKingdomAllan Matthews isProfessorofSurfaceEngineering,andHeadoftheDepartmentofEngineeringMaterialsattheUniversityofSheffield,UK.Hehasbeenworkingonplasma-assistedPVDprocessesforabout30years.Hespenthisearlycareerintheaerospaceindustryandsubsequentlycarriedoutresearchintoenhancedplasma-basedcoatingandtreatmentprocessesaswellastestandevaluationmethods.Heholdseightpatentsinthesefieldsandhasauthoredorco-authoredover330publica-tions,includingthebook,CoatingsTribology(Elsevier,2009).HeisaSVCBoardMemberandaformerChairoftheExecutiveCommitteeoftheAdvancedSurfaceEngineeringDivisionoftheAVS.HeisaformerChairman,SymposiumCommitteememberandProceedingsEditorfortheICMCTFConference.HeamemberandpastChairoftheBritishVacuumCouncilandaCo-EditoroftheElsevierjournal,SurfaceandCoatingsTechnology.Also available through the SVC on Location Education Program

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Tuesday, April 19

C-330 » Introduction to Thin Film Photovoltaic Technologies (half-day) New!Tuesday, April 19 1:00 p.m.—4:30 p.m.Tutorial fee: $395 Student fee: $70This course focuses on PV thin film technologies like Cu(In,Ga)(Se,S)2, CdTe an the amorphous and microcrystalline silicon solar cells which are nowadays mainly introduced. Starting point is a market overview followed by the basic designs of these solar cell types and their efficiency potentials. Especially the different manufacturing technologies are intro-duced focusing the different production and process steps of each solar cell type.Topical Outline:

Market situation Cell design of thin film solar cellsResearch activities Production and process technologies for thin film solar cells

Instructor: Volker Sittinger, SeniorScientist,FraunhoferInstituteforSur-faceEngineeringandThinFillmsIST,GermanyVolker Sittinger isaseniorscientistatFraunhoferInstituteforSurfaceEngineeringandThinFilms(IST)intheLargeAreaCoatingdepartment.Heworksonmagne-tronsputteringforphotovoltaicapplications.FormerlyhewasascientificassistantattheInstituteofSolarEnergyResearchGmbH(ISFH).VolkerSittingerreceivedhisdoctoraldegreeinopticalandelectricalcharacterisationofelectrodepositedCuInSe2solarcellsfromtheUniversityofOldenburgin2003andstudiedphysicsattheUniversityofKarlsruhe.

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C-208 » Sputter Deposition in ManufacturingWednesday, April 20 8:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial emphasizes issues of practical importance to those us-ing sputtering as a manufacturing process. It is intended for engineers, scientists, and technicians who would like an understanding of the factors that influence product throughput, coating quality, and process robustness and reliability. The primary focus will be on the use of planar magnetrons of various shapes, but other sources will be covered as well. The relationships between the sputtering conditions and important film properties—such as microstructure, composition, stress, adhesion and the resulting mechanical, electrical, and optical characteristics—will be discussed. New developments that are finding their way into practical ap-plications also will be highlighted. No prior formal training in sputtering is required to appreciate the tutorial content.Topical Outline:

A Brief introduction to basic vacuum technologySputtering plasmas and the nature of the sputtering processEstimating deposition rates and rate limiting factorsCathode geometries and associated film thickness profilesFilm composition and compositional uniformityFilm nucleation and growthEffects of substrate temperature and energetic particle bombardmentBiased sputtering and the use of unbalanced magnetronsSources of substrate heatingrf sputtering of dielectrics from insulating targetsThe dc, pulsed dc, and ac reactive sputtering of dielectricsProcess control methods for reactive sputteringArcing, disappearing anodes, and other process stability issuesIon beam sputteringHigh Power Pulsed Magnetron Sputtering (HPPMS or HIPIMS)

Instructor: David Glocker, IsofluxIncorporated David Glocker isCEOofIsofluxIncorporated,amanufacturerofmagnetronequip-ment,whichhefoundedin1993.Hehasmorethan20years’experienceinthinfilmresearch,development,andmanufacturingandhastakenanumberofnewprocessesfromlaboratory-scalefeasibilitystudiesthroughsuccessfulproduction.Heisaninventororco-inventorof25U.S.patentsandanauthorofmorethan25researchpapersintheareasofsputtersourcedesign,plasmasandplasmacharacteristics,sourcesofsubstrateheatinginsputtering,andthecontrolofsputteringprocessesandsputteredfilmproperties.Healsoistheco-editorofTheHandbookofThinFilmProcessTechnology,amajorreferenceworkinthefield.Also available through the SVC on Location Education Program

C-212 » Troubleshooting for Thin Film Deposition ProcessesWednesday, April 20 8:30a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95Vacuum deposited thin films are used for optical coatings, electrically-conductive coatings, semiconductor wafer fabrication, and a wide variety of other uses. They may be deposited on glass, plastic, semiconductors, and other materials. Usually, a vacuum deposition process produces durable, adherant films of good quality. But what do you do when things go wrong? Not all films can be deposited on all substrate materials. Sometimes films peel off or crack. Other times they are cloudy, absorb-ing, scattering, or have other unacceptable properties.This tutorial will teach you about techniques and tools that can be used to identify the source of the problems, correct the process, and get back into production. It will also help in learning how to develop new pro-cesses and products. The tutorial is designed for process engineers and technicians, quality control personnel, thin film designers, and mainte-nance staff.

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Topical Outline: Mechanical, electrical, and optical properties of thin filmsProcess parameters that affect film propertiesGauge and instrument calibrationProperties of substrate surfacesMeasurement of film stressDetection of contaminationIntroduction to surface analysis techniques (Auger, ESCA, SIMS, FTIR)Substrate preparation and cleaning

Instructor: Gary S. Ash, President,CastleBrookCorporationGary S. Ash isPresidentofCastleBrookCorporation,Dartmouth,MA.Thecompanyprovidestechnicalandmanagementconsultingservicesforthevacuumandcryogenicsindustry.Hehashadmorethan35yearsofexperienceinvacuumsystems,pumpsandothercomponents,depositionprocessesrangingfromevapo-rationtosputteringtomolecularbeamepitaxy.Engineeringexperienceincludesequipmentandprocessdesign,manufacturingprocessdevelopment,materialsandfailureanalysis,andapplicationssupport.Inaddition,hehashadextensiveexperi-enceinproductstrategy,development,andmanufacturingplanningforindustrialproductsandservices.HewaspreviouslyemployedbytheCTI-CryogenicsdivisionofHelixTechnologyCorporation,ASTeX,RIBERdivisionofInstrumentsSA,OpticalCoatingLaboratoryInc.,SpectrumSystemsdivisionofBarnesEngineeringCo.,AAICorporation,andAmericanElectronicLaboratories.HeholdsBSandMSdegreesinelectricalengineeringfromCornellUniversityandaPhDinopticalphysicsfromHeriot-WattUniversity,Edinburgh,Scotland.Also available through the SVC on Location Education Program

C-304 » ITO and Other Transparent Conductive Coatings: Fundamentals, Deposition, Properties, and ApplicationsWednesday, April 20 8:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial is intended for scientists, engineers, technicians, and others, interested in understanding the deposition and properties of transparent conductive coatings (TCCs). The major topic of the tutorial is indium tin oxide, ITO. Deposition by dc magnetron sputtering is emphasized although all common deposition processes are described. Specific ex-amples of the ITO properties achieved with evaporation, reactive and ce-ramic target sputtering deposition processes are shown. Post-deposition processing also is discussed. A methodology is described for developing an ITO (or any TCC) deposition process in your own equipment. Typical ITO properties are compared with those achieved by optically enhanced metals TCC (alternative TCO to ITO are mentioned but not discussed in detail – see C-321). The selection and design of a TCC to meet the re-quirements of a particular application are presented. Some knowledge of basic thin film coatings and interference optics is assumed, although key basics will be reviewed. The tutorial will briefly cover the basic physics and fundamentals of conductivity. A prior introductory solid state phys-ics tutorial would be helpful but is not required. Time will be available for questions concerning your process problems.Topical Outline:

Basic physics of transparent conductive coatings (TCCs)Major deposition methods for TCCsControl of TCC Film PropertiesSelection of deposition method and process conditionsTCC performance in applicationsManufacturing issuesOptional topics— Thin film optics— Metal Nitride TCC

Instructor: Clark Bright, SeniorStaffScientist&GroupTechnicalLeader,3MCorporation

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Wednesday, April 20



Clark Bright isaSeniorStaffScientistandGroupTechnicalLeaderwith3MCorporation.Heisdirectingthedevelopmentandscale-upofprocessesforvacuumdepositionofmultilayerorganicandinorganicthinfilmproducts.HepreviouslywasVicePresidentatPresstek,Inc.,anditsDeltaVTechnologysubsidiary,wherehedirectedtheR&Doftransparentconductiveoxides,barriercoatings,polymermulti-layer(PML)technology,andcustomvacuumcoatingequipment.WhileatSouthwallTechnologies,asDirectorofProductDevelopmentheledthedevelopmentofawebcoatingprocessforsputterdepositingadurable,conductive(ITO),multilayeranti-reflectioncoatingonplasticfilmusedonCRTcomputermonitors.Hehaspublishedandpresentednumerouspapersonopticalcoatingsandholds11patentsinthefield.Also available through the SVC on Location Education Program

C-318 » Nanostructures: Strategies for Self-Organized Growth (The Materials Science of Small Things)Wednesday, April 20 8:30 a.m.—12:00 p.m.Tutorial fee: $395 Student fee: $70

Learn about the primary classical and quantum effects which controllably alter the properties of increasingly small nanostructures.Understand the mechanisms controlling self-assembly and self-organiza-tion during nanostructure growth.Learn how to better design nanostructure growth processes.

The study of nanotechnology is pervasive across widespread areas includ-ing microelectronics, optics, magnetics, hard and corrosion resistant coatings, mechanics, etc. Progress in each of these fields depends upon the ability to selectively and controllably deposit nanoscale structures with specified physical properties. This, in turn, requires control -- often at the atomic level -- of nanostructure, nanochemistry, and cluster nano-organization.Deceasing size scales of solid clusters can result in dramatic property changes due to both “classical” effects associated with changes in average bond coordination and, as cluster sizes become of the order of the spatial extent of electron wavefunctions, quantum mechanical effects. The course will start with examples including reduced melting points, higher vapor pressures, increased optical bandgaps, decreased magnetic hyster-esis, and enhanced mechanical hardness. Essential fundamental aspects, as well as the technology, of nanostructure formation and growth from the vapor phase will be discussed and highlighted with “real” examples using insights obtained from both in-situ and post-deposition analyses.Nanostructure case studies include:

examples of template, size, and coarsening effects: self-assembled Si/Si(001), Cu/Cu(001),TiN/TiN(001), TiN/TiN(111) nano-clusters,examples of controlled template plus strain effects: self-organized Ge wires on Si(111), Ge wires on Si(187 72 81), Au chains on Si(553), InAs metal wires on GaAs(001), insulated metal wires on Si(111), quantum dot engineering: formation, shape transformations, and order-ing in self-organized SiGe/Si(001); InAs/GaAs(001), CdSe/ZnSe(001), PbSe/PbEuSe(111), Ag/Pt(111), and MnN/Cu(001) quantum dots,examples of 3D nanostructures:(Ti,Ce)N/SiO2, TiBx/SiO2, and d-TaN/g-Ta2N/SiO2.

Topical Outline: The course provides an understanding of:

the classical and quantum effects controlling the dramatic property changes observed in nanostructures as a function of cluster size and dimension (3D – 2D – 1D)self-assembly and self-organization during film growththe role of the substrate template and defect structures in mediating growth kineticsthe use of film stress to controllably manipulate nanostructureother mechanisms (including surface segregation, surfactant effects, low-energy ion bombardment, cluster coarsening, etc) for controlling nanostructuresthe design of nanostructures with specified properties.

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Scientists and engineers involved in deposition, characterization, or manufacturing/marketing of nanostructures and nanostructure deposi-tion equipment.Instructor: Joe Greene, D.B.WillettProfessorofMaterialsScienceandPhysics,UniversityofIllinoisFor Joe Greene’s profile, see C-311 (Saturday)

C-329 » Industrial Ion Sources (half-day) New!Wednesday, April 20 1:00 p.m.—4:30 p.m.Tutorial fee: $395 Student fee: $70Ion sources for over 40 years became one of the best tools for thin film deposition technology. The ion sources allow obtaining thin films that impossible to do with other ways such as physical vapor deposition uti-lizing thermal heating of depositing material, magnetron sputtering. Ion beams can make new materials with designed fine properties.The ion source according to general definition is a device for obtaining directed flow of ions. The main application of ion sources described in this Tutorial course is related to material processing: cleaning, etch-ing various targets and surfaces, deposition of thin films on substrates, obtaining new combination of materials that in some cases can be done only with ion beams; ion assisted deposition (IAD), and biased target deposition (BTD).This Tutorial course about Industrial Ion Sources was prepared to help not only users but also for designers-developers of such devices. In this course data will be provided that is necessary for everyday work with such ion sources. In addition advice on how to extract certain features such as ion beam current and energy to provide the best possible results will be discussed. A comprehensive description of Industrial Broad Beam Ion Sources, also called as Hall-Current Ion Sources will be covered – that includes a discussion of the basic operating parameters in opti-mum regimes, some technological processes, and most well-known and some hidden problems.Topical Outline:

Gridded ion sourcesGridless industrial broad beam ion sourcesMain operational parametersRegime of non-self-sustained discharge and its importanceIon source and vacuum chamberOscillations and instabilities in ion sources. Influence on main opera-tional parametersOperation of ion sources with reactive gasesCathodes for Ion SourcesRadiation from ion source. Ion Beam and Hot Filament radiationIon beam contamination from various parts of ion sources, cathodesNew methods of low energy utilizationIon beam figuring machine and technologyVarieties of end-Hall ion sourcesLinear ion sourcesNontraditional ion sourcesIon sources problems and solutionsAbout standardization of ion sources

Instructor: Viacheslav V. Zhurin, ColoradoAdvancedTechnologyLLCViacheslav V. Zhurin isaninternationally-recognizedspecialistinElectricPropul-sionandBroadBeamIonSources.During1970-1980’shepresentedReviewPapersaboutElectricPropulsionachievementsinSovietUnionandRussia.Inearly1970’sheworkedatDepartmentofAeronautics,CaliforniaInstituteofTechnologyfortwoyears.BeforecomingtoUSAin1991hewasinseveralAcademyofScienceResearchInstitutesasaHeadofLaboratories,DepartmentsandDeputyDirector.Since1991heisinUSAandworkingonElectricPropulsionandIonandPlasmaSources.HewasatKaufman&RobinsonInc.(1991-2004)andVeecoInstruments(2004-2005).Hepublishedover100scientificarticlesonfluiddynamicsandshockwaves,explo-sions,thrusters,ionsources,low-energybeams,thinfilmdepositions;heisauthorof14USpatents.

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Wednesday, April 20



C-320 » Diamond Like Carbon Coatings – from Basics to Industrial Realization (half-day)Thursday, April 21 8:30 a.m.—12:00 p.m.Tutorial fee: $395 Student fee: $70This tutorial is recommended for engineers and R&D staff members, who are involved in specifying new designs and surface treatments for components and tools. The application of Diamond Like Carbon, often in combination with pre-treatments like plasma nitriding and polishing, allows much improved wear resistance (abrasive, adhesive, fatigue) and to reduction of friction forces. Under the umbrella name of DLC, various classes of coatings have been developed, where each class of coatings has its own deposition technology and coating characteristics.The industrial applications are presently mainly in components for e.g. automotive, aerospace, general machine building.Topical Outline:

Basics and standardization Classification of different DLC’sDLC’s in comparison to diamond filmsStructure of hydrogen free and hydrogenated DLC’sMechanical properties of DLC’sTribological behaviour of DLC’sCarbon based coating systemsTechnology and processes PVD processes for deposition of hydrogen free DLC filmsPlasma assisted CVD processes for preparation of a-C:H and modified a-C:H:X coatingsHybrid processesDuplex processesSputter deposition of metal containing a-C:H:Me coatingsSputter deposition of metal free a-C:H coatingsImproved coating adhesion by interlayer systemsIndustrial applications Contact modes and wear mechanismsCoating design for specific wear mechanismsIndustrial DLC applicationsIndustrial deposition methodsRepresentative industrial examplesNear future expectations

Instructors: Klaus Bewilogua, FraunhoferInstituteforSurfaceEngineeringandThinFilmsIST,Germany, Thomas Schuelke, FraunhoferUSA, and Gerry van der Kolk, IonbondNetherlandsb.v.,TheNetherlandsKlaus BewiloguastudiedphysicsattheTechnicalUniversityinDresden,Germany,andcompletedhisthesisin1973.InthefollowingtimehewasresearchassistantattheTechnicalUniversityinChemnitz,Germany,whereheworkedonstructureanalysesofamorphousmaterialsandontheplasmaassisteddepositionofhardcoat-ings.1983hequalifiedforlecturer.In1990KlausBewiloguajoinedtheFraunhoferInstituteforSurfaceEngineeringandThinFilmsinBraunschweig,Germany.AsheadofadepartmentheisresponsibleforR&Dinthefieldofhardcoatings,especial-lydiamond-likecarbonandcubicboronnitride.Thomas SchuelkeholdsM.Sc.andPh.D.degreesinphysicsandhasworkedfortheFraunhoferSocietyforover16years.Hegainedindustrialexperienceinthesemi-conductorindustry.CurrentlyhemanagesFraunhoferUSA’sactivitiesinadvancedindustrialcoatingtechnologies.HisteamperformsappliedR&Dprojectsforindustryandgovernmentwithafocusoncarbon-basedmaterials.Gerry van der Kolk hasstudiedphysicsandhasreceivedhisPh.DatDelftUniver-sity.HisworkingexperienceispartlyR&DinNuclearReactorPhysics(DelftReactorInstitute),thinfilms(PhilipsResearch)andpartlyinequipmentmanufacturing(for-merdirectorofHauzer).HispresentpositionisChiefTechnologyOfficerofIonbond.Also available through the SVC on Location Education Program

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C-321 » Alternative Transparent Conductive Oxides (TCOs) to ITO (half-day)Thursday, April 21 8:30 a.m.—12:00 p.m.Tutorial fee: $395 Student fee: $70This tutorial is intended for scientists, engineers, technicians, and oth-ers, interested in understanding the options and issues in selecting an alternative n-type TCO to indium tin oxide, ITO. Potential alternatives other than TCO such as organic conductors and nanomaterials are not discussed. Emerging TCO alternatives for cost sensitivity applications, performance driven applications and the many cases in which a compro-mise between cost and performance must be made, are discussed Typical ITO properties are summarized and compared with those achieved by emerging TCO coatings. A methodology is developed for selecting the alternative TCO coating to meet the requirements of a particular applica-tion.It is strongly recommended that SVC tutorial, C-304 “ITO and Other Transparent Conductive Coatings: Fundamentals, Deposition, Properties and Applications” be taken prior to this tutorial. Some knowledge of in-troductory solid state physics, the fundamentals of conductivity, thin film optical interference coatings and common vacuum deposition methods also is assumed.Topical Outline:

IntroductionPerformance expectations – ITO baselineTCO replacement candidatesCost OR performance driven application?Cost AND performance application – CompromiseE/O Summary of Some Alternative TCO MaterialsAlternative TCO performance

Instructor: Clark Bright, SeniorStaffScientist&GroupTechnicalLeader,3MCorporationFor Clark Bright’s profile, see C-304 (Wednesday)Also available through the SVC on Location Education Program

C-324 » Atmospheric Plasma Technologies (half-day)Thursday, April 21 8:30 a.m.—12:00 p.m.Tutorial fee: $395 Student fee: $70Atmospheric plasma technologies is a rapidly growing area in plasma-as-sisted technologies. However, the atmospheric plasma requires a special design of plasma sources to ensure non-equilibrium, i.e. non-thermal plasma in a number of applications in coating and surface treatment. Technologies using the atmospheric pressure plasma sources bring about fast processes, but it is important to be aware of limits given by atmospheric plasma properties and plasma chemical reactions. This introduction tutorial course addresses the most important principles and applications of non-thermal atmospheric plasma. Topical Outline:

Cold atmospheric plasma sources - principles, problems to solveCorona and Dielectric Barrier Discharges (DBD)Atmospheric pressure plasma jetsFused Hollow cathodesMicrowave atmospheric plasmasAtmospheric plasma with/in liquidsApplications of the atmospheric plasmaAdvantages and limits of the atmospheric plasma sources

Instructors: Hana Baránková, AssociateProfessor,AngstromLaboratory,UppsalaUniversity, and Ladislav Bárdos, AssociateProfessor,UppsalaUniversity–SwedenFor instructor profiles, see C-210 (Tuesday)Also available through the SVC on Location Education Program

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thursday, April 21


C-326 » Manufacture of Precision Evaporated Coatings (half-day)Thursday, April 21 8:30 a.m.—12:00 p.m.Tutorial fee: $395 Student fee: $70This tutorial provides detailed information on how to establish and im-prove evaporative coating processes for precision optical coatings. Design considerations for coating chambers, such as source placement, substrate fixturing, control of film thickness uniformity, and thickness monitors will be discussed. Trade-offs in the selection of source materials, means of controlling film structure, and the influence on the performance of the coated component will be considered. Process details will be approached with a focus on practicality; film properties must be measurable and sys-tem designs must be practical and cost-effective. These process concepts are readily implemented in standard evaporation systems, providing significant improvements in existing coating facilities.Topical Outline:

Chamber components for an evaporation system Deposition monitoring and control Optical monitoringAdvanced methods for quartz crystal monitoringThin-film uniformity concepts and calculations Source placementSubstrate rotation and fixturingAnalysis and selection of system gearingDesign of uniformity masks to correct film thickness variationsStress in optical coatings Theoretical basis for film stressMeasurements of stress in thin filmsProcess design to minimize stresses in optical coatings

Instructor: Jim Oliver, VacuumInnovations,LLCandUniv.ofRochesterLLEJim Oliver isfounderandownerofVacuumInnovations,LLCandisaresearchengineerattheUniversityofRochester’sLaboratoryforLaserEnergetics.AgraduateoftheUniversityofRochester’sInstituteofOptics,hisworkhasfocusedonprocessde-signandmodelingforprecisionevaporatedcoatings.Thin-filmuniformitycontrolisofparticularinterest,havingdevelopedadvanceddistributionmodelsandplanetaryrotationsystems.HealsoteachesopticalcoatingdesignattheInstituteofOpticsaswellasattheInstitute’sannualthinfilmsummerschoolprogram.

•••••••••••••

Networking Events at the �011 TechCon in ChicagoPlan to take advantage of the many opportunities that are available to meet and interact in relaxed settings during the 2011 TechCon in Chicago.

Network at Social Functions (includedintheTechConregistrationfee!)

• Welcome Reception for TechCon registrants and exhibitors• Exhibit Hall Reception, Lunch and Beer Blast • Technology Forum Breakfasts

Lake Cruise Networking EventTuesday Evening, April 19, 2011 • 7:00 p.m. – 9:30 p.m.

Cost per person: $89(includesdinnerbuffet,enter-tainmentandtransportation)Join friends and colleagues aboard the Kanan Luxury Ship. Enjoy live entertain-ment and a buffet din-ner while cruising Lake Michigan. Whether relaxing

inside, surrounded by leather appointed luxury, or on one of the ship’s four decks, every guest will be treated to breathtaking views of Chicago’s magnificent skyline. Purchase your tickets for this unique networking event when registering for the TechCon.

Technology Forum Breakfast Table TopicsFacilitator-led round-table discus-sions provide an opportunity for informal discussion and interac-tion on specific topics. See page 7.

“Meet the Experts” CornerThe “Meet the Experts” Corner will once again provide an informal setting for conference registrants to obtain answers to their vacuum coating problems. A team of experts will be available to answer ques-tions relating to general thin film deposition issues.

SVC Young Members Group/Mentors ProgramSunday Afternoon, April 17, 2011 • 4:30 p.m. to 5:30 p.m.The mentoring program will provide a “bridge” between Young Mem-bers, students and mentors within the Society, and will facilitate a venue for connecting with those working in specific areas of vacuum coating, thus enhancing their overall TechCon experience. See page 3.

SVC Foundation Golf TournamentSunday Afternoon, April 17, 2011

You do the golfing while we do the giving. Tournament pro-ceeds will be donated to the SVC Foundation and used to award scholarships to students working in the field of vacuum coating technology.Indicate your interest in par-ticipating in the Foundation

Golf Tournament when registering for the TechCon. Opportunities also exist for sponsorships that will highlight your company.If you have questions regarding this SVC Foundation fundraising event, contact Pam Luecke at 605-578-1339 • [email protected] or Steve Sedlak at 248-681-5235 • [email protected]


Exhibit & Target Marketing2011

New for 2011 Exhibitors and Vistiors!

Professional Development Opportunities, Networking Events and Features that Merge Technology and BusinessThe SVC Exhibit in Chicago will be enhanced in 2011 to incorporate new business-friendly events, crafted to provide learning, networking and business opportunities for all TechCon participants throughout the entire two-day Exhibit.

• A special TechCon Sponsorship Program offers significant market-ing opportunities

• Free Wireless Internet throughout the Exhibit Hall• Special Presentations in the Exhibit Hall• Business Topics Session• Vendor Innovators Showcase• Technical Poster Presentations• Cyber Café for attendees and exhibitors to use in the Exhibit Hall • Reception, lunch, and specialty breaks provided in the Exhibit Hall • Beer Blast to create a grand finale to the Exhibit on Wednesday• Lake Cruise Networking Event on Tuesday evening

Sponsorship and Promotional Opportunities at the TechConRecognized as THE premier event by engineers, manufacturers, tech-nologists, scientists, and business professionals working in the vacuum coating industry internationally, the SVC TechCon and Exhibit is a wise investment of your conference and marketing dollars.

• Select one of the TechCon Sponsorships. Sponsors will be widely recognized in all SVC publications and on signage at the TechCon.

Easy On-line Booth Registration SystemOur new Interactive Exhibit Registration System and real-time Exhibit Hall floor plan allows exhibitors to complete their booth registration on-line. When booth assignments have been made, your exhibit booth location and contact information will be added to an interactive floor plan that will be accessible to potential attendees. You will then be able to add your Exhibitor Profile, select your product categories, and take advantage of upgrades.

Benefits for Exhibit VisitorsExhibit visitors can use this searchable floor plan to create a list of exhibitors to visit and develop a personalized color-coded floor plan using the following features:

• Multiple Search Criteria - Exhibitor Name, Keyword or Product Category • Real-time Alphabetical Listing of Exhibitors• Interactive Floor Plan• Integrated Messaging System - Request appointments with exhibitors• Map It - Ability to highlight a booth on the floor plan and use color coding to plan time in the

Exhibit• Access the SVC Exhibit via the Internet on your computer or smart phone.• Personalized Visitor Login

Non-exhibiting companies are also en-couraged to participate in these sponsor-ships.• SVC publishes a 50-word profile for each exhibiting company in the Tech-Con Exhibit Guide (TEG), which will be mailed to prospective TechCon and Exhibit attendees in early March 2011. Reserve ad space in the 2011 TEG as part of your SVC marketing program.• Upgrade your on-line profile on the

Interactive Exhibit Floor Plan system by adding a logo and link to your web site, press releases to your company profile page, and a banner ad to the Exhibit Registration Web Site.

• Participate in the Vendor Innovators Showcase. These 10-min-ute presentations are perfect for introducing new products, new equipment, or a new process. Presenters in the Vendor Innovators Showcase do not pay a TechCon presenter registration fee. Go to www.svc.org and submit your abstract using the On-line Abstract Submission page.

Reserve Your Exhibit Space Now!Use the easy On-line Reservation System featuring a new electronic Ex-hibitor interface that provides an in-depth Exhibitor profile and product search feature, plus a real-time exhibit layout.

This new system provides added value for exhibiting companies, including:

• Company Name• Booth Number• Appointment Manager - Allows attendees to set appointments with

exhibitors• Exhibitor Profile• Contact Information• Product Categories - Choose from the comprehensive list of tech-

nology specific sub-categories that apply to your business and help exhibit visitors find your company

• Personalized Exhibitor Representative Login

Exhibitors can also choose upgrades that enhance pre-conference marketing activity, including:

• VISIT US NOW company logo and link• Banner Ads on the Exhibit Registration web site with URL link of

your choice• Press Releases that can highlight news, products and show specials.

Companies participating in the TechCon Sponsorship Program will be entitled to upload unlimited press releases as part of the sponsor benefits.

�9505/856-7188 Fax 505/856-6716 » E-mail [email protected] » Web Site www.svc.org �9505/856-7188 Fax 505/856-6716 » E-mail [email protected] » Web Site www.svc.org

SVC Corporate Sponsors3MCompanyAdvancedEnergyIndustries,Inc.AgilentTechnologiesAngstromSciences,Inc.Applied MaterialsAustinScientific,AnOxfordInstrumentsCompanyBekaertAdvancedCoatingsNVBrooks Automation, Inc.CeramTecNorthAmerica*CoatingMaterials,DivisionOfTicoTitanium,Inc.CPFilms, Inc.DarlyCustomTechnology,Inc.Denton Vacuum, LLCDynavacEdwardsFerrotec(USA)CorporationFil-Tech,Inc.Galileo Vacuum Systems, Inc.GemchCo.,Ltd.GeneralPlasma,Inc.*GENERAL Vacuum Equipment, Ltd.GfEMaterialsTechnology,Inc.GoodfellowCorporationHauzerTechnoCoatingBVHenzeBoronNitrideProductsGmbHHeraeusMaterialsTechnologyLLCHidenAnalytical,Inc.*HuettingerElectronic,Inc.IndiumCorporation*INFICONIonbondLLCJDSUAdvancedOpticalTechnologiesGroupJeolLtd.KurtJ.LeskerCompanyLeybold Optics USA, Inc.MaterialsScienceInternational,Inc.MaterialsScience,Inc.MDCVacuumProducts,LLCMEWASANorthAmericaInc.*MidwestTungstenService,Inc.MilmanThinFilmSystemsPVTLtd.MitsubishiPlastics,Inc.MKS Instruments, Inc.MustangVacuumSystems,LLCNANOVEA/DivisionofMicroPhotonics,Inc.Nor-CalProducts,Inc.Pfeiffer VacuumPlasmaterials,Inc.*ProcessMaterials,Inc.Providence Metallizing Company, Inc.PVTPlasmaUndVakuumTechnikGmbHR.D.MathisCompanySAGE industrial sales, inc.SingulusTechnologies,Inc.Soleras Ltd.Southwall TechnologiesSputteringComponents,Inc.*Sumitomo(SHI)CryogenicsofAmerica,Inc.SystemControlTechnologies(SCT)TelemarkThermionicsVacuumProductsThinFilmCenter,Inc.TorayPlastics(America),Inc.UCComponentsInc.UmicoreThinFilmProductsVacuCoat Technologies, Inc.VacuumEngineeringandMaterialsCo.,Inc.VacuumProcessTechnology,LLCVAT,Inc.VergasonTechnology,Inc.VONARDENNE,GermanyWilliamsAdvancedMaterials,Inc.YeagleTechnology,Inc.Bold indicatesCharterCorporateSponsor*indicatesnew2009/2010/2011CorporateSponsors

invite Visitors to your Booth in the Exhibit HallIntroducing a NEW WAY to market your company’s presence at the SVC TechCon Exhibit and provide potential customers with free admission to the Exhibit.

SVC is implementing a new policy for the 2011 TechCon Exhibit in Chicago. Exhibit Visitors will be charged a registration fee of $20 (advance registration) or $35 (on-site registration). Your Exhibitor Promotional Code can provide customers with a fee waiver when they register in advance using the SVC On-Line Registration system.

Exhibit Visitors are invited to participate in the following programs and receptions in the Exhibit Hall:

Exhibiting Companies at the 54th Annual TechCon (as of December 15, 2010)

2011 SVC ExhibitHyatt Regency Chicago on the Riverwalk

Chicago, IllinoisTuesday, April 19 • 12:00 p.m. to 6:00 p.m.

Wednesday, April 20 • 10:00 a.m. to 5:00 p.m.

A&N CorporationAdvanced Energy Industries, Inc.Advanced Technology & Materials

Co., Ltd.Agilent TechnologiesAlcatel Vacuum ProductsAlicat Scientific, Inc.Angstrom Sciences, Inc.ARi Industries, Inc.AVS - The Science and Technology

SocietyBeamTec GmbHBekaert Advanced Coatings N.V.BellowsTech, LLCBeneqBronkhorst USA, Inc.Brooks Automation, Inc.Brooks InstrumentCoastal Instruments, Inc.COMVATCSM Instruments, Inc.Dark Field Technologies, Inc.Darly Custom Technology, Inc.Denton Vacuum, LLCDHF Technical ProductsDuniway Stockroom CorporationDynaVacEBARA Technologies, Inc.EB SourcesEdwardsEvatecFerrotec (USA) CorporationFil-Tech, Inc.Filmetrics, Inc.Fraunhofer FEPGencoa Ltd.General Plasma, Inc.GENERAL Vacuum Equipment Ltd.GfE Materials Technology, Inc.GNB CorporationH.C. StarckHauzer Techno Coating BVHeraeus Materials Technology LLCHuettinger Electronic, Inc.

HVA, LLC.Indium CorporationINFICONInland Vacuum Industries, Inc.IntlvacIPT Ion and Plasma Sources GmbHJ.A. Woollam Co., Inc.Kashiyama USA, Inc.Kaufman & Robinson, Inc.KDFKorea Vac-Tec Co., Ltd.Kurt J. Lesker CompanyLeybold Optics USA, Inc.Materials Science, Inc.MC Power SystemsMDC Vacuum Products, LLCMeivac IncMEWASA North America, Inc.Midwest Tungsten Service, Inc.MKS Instruments, Inc.Mustang Vacuum Systems, LLCNanoveaNikko MetalsNiles Electronics, Inc.Nor-Cal Products, Inc.Nu-Tech Precision Metals, Inc.OptiLayer, Ltd.Pfeiffer VacuumPHPK TechnologiesPhysics TodayPhytron, Inc.Plansee SEPlasmaterials, Inc.Precision Plus Vacuum PartsProcess Materials, Inc.ProTech MaterialsPTB Sales, Inc.PVT Plasma and Vacuum

Technologies LLCR.D. Mathis CompanyRigaku Vacuum ProductsRocky Brook Associates, Inc.Rocky Mountain Vacuum Tech, Inc.SAGE industrial sales, inc.

SCI Engineered Materials, Inc.Semiconsoft, Inc.Semicore Equipment, Inc.Sidrabe, Inc.Sierra Applied Sciences, Inc.Soleras Ltd.Solvix SASputtering Components, Inc.Sumitomo (SHI) Cryogenics of

America, Inc.Super Conductor Materials, Inc.SVC FoundationSycon Instruments, Inc.System Control TechnologiesTecport Optics, Inc.TelemarkThermionics Vacuum ProductsTRIBOtechnicTuthill Vacuum & Blower SystemsUC Components, Inc.Ultra Pure Applied Materials Co., Ltd.Ulvac Technologies, Inc.Umicore Thin Film ProductsVacuum Engineering & Materials

Co., Inc.Vacuum Plus Manufacturing, Inc.Vacuum Process Technology, Inc.Vacuum Research CorporationVapor Technologies, Inc.VAT, Inc.Veeco Instruments, Inc.Vergason Technology, Inc.VG Scienta, Inc.VON ARDENNEWieland Edelmetalle & Technologie

GmbHWilliams Advanced Materials

Tuesday, April 19 • 12:00 PM – 6:00 PM• Complimentary refreshments breaks• Poster Session (3:30 PM – 6:00 PM)• Exhibitor Reception (5:00 PM –6:00 PM)

Wednesday, April 20 • 10:00 AM – 5:00 PM• Complimentary refreshments breaks• Business Topics Session/Innovators

Showcase (10:30 AM – 3:30 PM)• Beer Blast (3:30 PM – 5:00 PM)

SVC has provided every exhibiting company with their own Exhibitor Promotional Code. Please send this code to an unlimited number of visitors to provide them with a fee waiver!


If you are unable to register on-line, please contact SVC to request a registration form. 1. Personnel from an Exhibiting Company Individuals from Exhibiting companies who wish to register for

the TechCon or Tutorials have a special path to follow using the On-line Registration System. It is strongly recommended that Ex-hibit booth contacts ask their booth personnel to individually register for the TechCon using the On-line Registration System, since there are opportunities to register for other events (such as the Tuesday evening Networking Event) and/or purchase other products.

2. Conference Registrant (includingpresentersandexhibitors)Com-plete the on-line registration form including the payment section.

3. Invited Presenter ONLY (alreadyapprovedbytheProgramChairs) No fee is required but it is necessary to complete the on-line registra-

tion form. A special registration link is provided.4. Manufacturer’s Reps—A fee of $100.00 is required. Complete the

on-line registration form including the payment section.5. Students—Use the paths designated for Students or Tutorial Course

Registrant Only

Registration for Tutorial CoursesYou do not have to register for the TechCon or be a member of SVC to attend the Tutorial Courses.On the SVC Web Site each title is linked to the Tutorial Course descrip-tion, topical outline, detailed syllabus and biographical sketch of each instructor.1. Tutorial Registration Discounts of 50% Offered for Unemployed

SVC Members and Non-MembersThe current economic climate has left many industry profession-als without jobs, and the SVC Education Committee has stepped forward to implement a policy that will support the future of our members and the vacuum coating community. (SVC will need a copy of your letter of discharge.)

2. Discounts Offered to Multiple Registrants from one companySVC is offering a 25% discount on each Tutorial registration for the second or more employee in a company who enrolls in any Tutorial (Note: this discount does not apply to the Student rate).

Note: For any of the discounts listed above, you will need to pay the full Tutorial Registration fees on the On-line Registration system. Then you will send an E-mail to [email protected] and request the discounted fee. Discounts will be refunded after the TechCon. SVC reserves the right to cancel any Tutorial. If a Tutorial is cancelled, registrants will be notified and a full refund of tuition will be made.The fees for the Tutorials are the same for SVC Members and Non-Mem-bers; however, full-time student fees are substantially lower (SVC will need a copy of your student ID card).

General Conference Information• Special reduced TechCon registration fees apply to students, Young

Members and Member/Non-Member presenters.• Register early! Individual tutorial fees and conference registration

fees are $100 higher than the fees in this Preliminary Program after March 25, 2011 (this does not apply to students or the Young Members Group).

Cancellation Policy• Only Conference registration and tutorial cancellations received on or

before March 16, 2011, will be refunded. Refunds will be made upon receipt of a written notice, less a $25 service fee for the TechCon and each individual tutorial. No refunds will be made for cancellations received after March 16, 2011.

Membership Issues—Please Note!You must pay your 2011 Membership Dues before you can register at the “Member Rate” for the 2011 TechCon.

Companions ProgramSee Companions Program details on the Web Site.

Special NeedsIf you have disability or dietary needs, please contact SVC with the details.

On-Site RegistrationSVCRegistrationislocatedintheGrandBallroomFoyerareaintheEastTower(GoldLevel)oftheHyattRegencyChicago• Saturday, April 16 7:15 a.m.–10:00 a.m. • Tuesday, April 19 7:15 a.m.–5:00 p.m.• Sunday, April 17 7:15 a.m.–8:00 p.m. • Wednesday, April 20 7:15 a.m.–5:00 p.m.• Monday, April 18 7:15 a.m.–6:00 p.m. • Thursday, April 21 7:30 a.m.–12:30 p.m.

Conference Registration Fees • TechCon Registration fees include the following social/networking

events:o Welcome Reception on Sunday, April 17 at 8:45 p.m.o Reception in the Exhibit Hall on Tuesday, April 19 at 5:00 p.m.o Luncheon in the Exhibit Hall on Wednesday, April 20 at 12:00 p.m.o Technology Forum Breakfasts on Monday and Tuesday, April 18 and

April 19 at 7:00 a.m.• All Conference registrants receive a copy of the CD-ROM for the

2007–2011 Conference Proceedings to be released in the Fall of 2011.• SVC membership in 2011 is provided to those paying the Non-Member

Conference fee.

2011

The On-line Registration process at www.svc.org will guide you through the registration steps

Conference Registration

On-line Conference and Hotel Registration is OpenThe SVC Group room rate at the Hyatt Regency Chicago on the

Riverwalk is $199.00 (single & double + taxes).

Be sure to book at the Hyatt Regency Chicago so the SVC room rate can be locked in before the hotel is sold out. See page 17 for additional information.

Conference Registration Information

› Renew Your Membership for 2011 or Join SVC On-Line Member‡ Non-MemberAttendeeRegistration (through 3/25/11/after 3/25/11) (through 3/25/11/after 3/25/11)

❏ Full Conference . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$565 .00/$665 .00 . . . . . . . . . . $695 .00/$795 .00

❏ Full Conference (Unemployed) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$130 .00/$130 .00 . . . . . . . . . . $130 .00/$130 .00

❏ Invited Presenter . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$0 .00 . . . . . . . . . . . . . . . . . . . $0 .00

❏ Presenter in Technical Sessions . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$395 .00/$495 .00 . . . . . . . . . . $495 .00/$595 .00 Note: Presenter Rate does not apply to co-authors

❏ Media Personnel . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$0 .00 . . . . . . . . . . . . . . . . . . . $0 .00

❏ Student Conference . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$65 .00 . . . . . . . . . . . . . . . . . $115 .00

❏ Student Presenter in Technical Sessions . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$40 .00 . . . . . . . . . . . . . . . . . . $90 .00

❏ Young Members Group Conference . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$225 .00 . . . . . . . . . . . . . . . . . $275 .00

❏ Young Members Group Presenter in Technical Sessions . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$140 .00 . . . . . . . . . . . . . . . . . $195 .00

❏ Tutorial Course(s) Only . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . See Fees Below . . . . . . . . . . . See Fees Below

❏ Exhibit Visitor Only (Exhibit Visitors can get fee waived using an Exhibitor Promotional Code) . . . . . . . . . . . . . . . . . . . . . . .$20 .00 . . . . . . . . . . . . . . . . . . $20 .00‡Member Fee applies only to those who have paid their 2011 Membership Dues.

› Renew Your Membership for 2011 or Join SVC On-Line Member‡ Non-MemberExhibitorRegistration (through 3/25/11/after 3/25/11) (through 3/25/11/after 3/25/11)

❏ Exhibitor Booth Personnel . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$0 .00 . . . . . . . . . . . . . . . . . . . .$0 .00

❏ Exhibitor with Full Conference Registration . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$565 .00/$665 .00 . . . . . . . . . . $695 .00/$795 .00❏ Exhibitor Presenter in Technical Sessions . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$395 .00/$495 .00 . . . . . . . . . . $495 .00/$595 .00

❏ Manufacturer’s Representative . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .$100 .00 . . . . . . . . . . . . . . . . . .$100 .00

SpecialEventsattheTechCon❏ Vacuum Wizard Program (Tuesday morning) . . . . . . . . . . . . . . . . . . . . . . . . . . . $40 .00

❏ SVC Foundation 5K Run (Tuesday morning) includes a T-shirt . . . . . . . . . . . . . $25 .00

❏ SVC Foundation Golf and Give Tournament (Sunday afternoon) . . . . . . . . . . . TBD Check the box above to indicate your interest and receive more information

❏ Welcome Reception (Sunday evening) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .No fee

❏ Lake Cruise Networking Event (Tuesday evening) includes dinner, entertainment and transportation . . . . . . . . . . . . . . $89 .00 per person

SVC Foundation5K Run/Walk

Lake CruiseNetworking

Event

Use this worksheet to prepare for completing your on-line conference registration at www.svc.org.If you are unable to use the on-line registration, please contact SVC at [email protected] to request a registration form.

Tutorial Courses Offered at the 2011 TechCon: It is NOT necessary to register for the Conference in order to attend a tutorial course or visit the Exhibit . SVC reserves the right to cancel any tutorial . If a tutorial is cancelled, registrants will be notified and a full refund of tuition will be made .Discounts Offered to Multiple Registrants from one company and Unemployed SVC Members and Non-Members. See page 30 for details.All tutorial course fees are $100 higher after March 25, 2011 (this increase does not apply to students) . * Indicates that a textbook is included with these courses.

Saturday, April 16 Reg/Student❏ V-204* Vacuum Systems, Materials and Operation . . . . . . . . . . . . . . . . . . . . . $670/$190❏ C-103* An Introduction to Physical Vapor Deposition (PVD) Processes . . . . . . . $670/$190❏ C-302 Practical Aspects and Characterization of Optical Coatings . . . . . . . . . . $570/$95❏ C-311 Thin Film Growth and Microstructure Evolution . . . . . . . . . . . . . . . . . . $570/$95

Sunday, April 17 Reg/Student❏ C-203 Sputter Deposition (Day 1 of 2-Day Tutorial) . . . . . . . . . . . . . . . . . . . . $895/$190❏ C-301* Optical Coating Design and Monitoring . . . . . . . . . . . . . . . . . . . . . . . . $620/$145❏ C-314 Plasma Modification of Polymer Materials and Plasma Web Treatment . . $570/$95❏ C-327 NEW! Introduction to Photovoltaic Materials and Photovoltaics . . . . . . . $570/$95

(Half-day a .m .)

Monday, April 18 Reg/Student❏ C-203 Sputter Deposition (Day 2 of 2-Day Tutorial) . . . . . . . . . . . . . . . . . . . . see above❏ C-211 Sputter Deposition onto Flexible Substrates . . . . . . . . . . . . . . . . . . . . . $570/$95❏ C-303 Numerical Methods for Optical Coatings . . . . . . . . . . . . . . . . . . . . . . . $570/$95❏ C-322 Characterization of Thin Films . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . $570/$95

Tuesday, April 19 Reg/Student❏ V-207 Practical Aspects of Vacuum Technology: Operation and . . . . . . . . . . . . $570/$95

Maintenance of Production Vacuum Systems

Tuesday, April 19 (continued) Reg/Student❏ C-210 Introduction to Plasma Processing Technology (Half-day p .m .) . . . . . . . . $395/$70❏ C-315 Reactive Sputter Deposition . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . $570/$95❏ C-328 Properties and Applications of Tribological Coatings (Half-day a .m .) . . . . $395/$70❏ C-330 NEW! Introduction to Thin Film Photovoltaic Technologies (Half-day p .m .) . . $395/$70

Wednesday, April 20 Reg/Student❏ C-208 Sputter Deposition in Manufacturing . . . . . . . . . . . . . . . . . . . . . . . . . . $570/$95❏ C-212 Troubleshooting for Thin Film Deposition Processes . . . . . . . . . . . . . . . $570/$95❏ C-304 ITO and Other Transparent Conductive Coatings: Fundamentals,

Deposition, Properties, and Applications . . . . . . . . . . . . . . . . . . . . . . . . $570/$95❏ C-318 Nanostructures: Strategies for Self-Organized Growth (Half-day a .m .) . . . $395/$70❏ C-329 NEW! Industrial Ion Sources (Half-day p .m .) . . . . . . . . . . . . . . . . . . . . . . $395/$70

Thursday, April 21 Reg/Student❏ C-320 Diamond Like Carbon Coatings – Basics to Industrial Realization . . . . . $395/$70

(Half-day a .m .)❏ C-321 Alternative Transparent Conductive Oxides (TCOs) to ITO (Half-day a .m .) . $395/$70❏ C-324 Atmospheric Plasma Technologies (Half-day a .m .) . . . . . . . . . . . . . . . . . . $395/$70❏ C-326 NEW! Manufacture of Precision Evaporative Coatings (Half-day a .m) . . . . . $395/$70

Tutorial Courses Offered at the 2011 TechCon

TechConSponsors

G o l d - S i lv E R - B R o N z E S p o N S o R SGold - $3,000 › Vacuum Research Corporation

Silver- $1,400 › Agilent Technologies › General Plasma, Inc. › Heraeus Materials Technology LLC › R.D. Mathis Company › Vacuum Engineering & Materials Co., Inc.

Bronze - $800 › EBARA Technologies, Inc. › General Vacuum Equipment, Ltd. › MEWASA North America, Inc. › Hauzer Techno Coating

S p E C i A l E v E N T A N d S p E C i A lT y i T E M S p o N S o R S

Badgelanyards SOLD! › Telemark

HotelSplashpage SOLD! › Zpulser, LLC

RegistrationSplashpage SOLD! › Brooks Automation, Inc.

RegistrationToteBags SOLD! › Brooks Automation, Inc. › Denton Vacuum, LLC › DHF Technical Products › DynaVac

BottledWater SOLD! › DHF Technical Products

SpecialtyCoffeeStationSponsor- $2,000 › Sponsorships available

CleantechSymposium- $1,000 › Sponsorships available

RelaxationStation- $750 › Sponsorships available

BeerBlastSponsorSOLD! › VON ARDENNE, Germany

ExhibitorloungeSponsorSOLD! › Physics Today

USBFlashdriveSponsor SOLD! › INFICON

lakeCruiseNetworkingEvent- $1,200 › Vacuum Research Corporation

www.physicst day.orgwww.physicst day.org

AddSvCtoyour2011MarketingprogramTolearnmoreaboutadvertisingandsponsorshipopportunities,visitwww.svc.orgorcall505/856-7188

2011Thank you to our 2011 TechCon Sponsors!

Sponsorships are still available for the 54th Annual SVC TechCon in Chicago, Illinois, April 16–21, 2011. Choose from one of our Level Sponsorships or a special event or specialty item sponsorship to raise corporate awareness, promote new products and services, and enhance exhibit participation. You do not need to be an exhibiting company to participate in the Sponsor Program. Official sponsors are recognized during their sponsored event, and also with prominent on-site signage, on the SVC Web Site, in the SVC Bulletin, the Preliminary and Final Technical Programs, and TechCon Exhibit Guide.

Documents

Preliminary Technical Program · A Comprehensive Technical Program Vacuum coating technology plays a vital role in the success of several industries. The Traditional Program Sessions