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SURFACE AND INTERFACE ANALYSIS, VOL. 25, 481 (1997) Preface This proceedings volume contains a collection of papers presented at the “2nd Workshop on Development and Industrial Application of Scanning Probe Microscopy (SXM 2)Ï which was held on 16È18 September 1996 in Vienna, Austria. Following the Ðrst workshop held in October 1994 in Mułnster, Germany, the continued high interest in the SXM series was again docu- mented by over 160 participants and 10 manufacturers who attended SXM 2. During the 3 days of the workshop, a total of 52 oral contributions and 30 posters were presented. Fifteen per cent of the contributions came from industry. Six invited lecturers reported on subjects such as scanning probe microscopy in semiconductor technology, STM on metals, true atomic resolution with AFM, scanning force microscopy of polymers, nano- tribological investigations with scanning force microscopy and high resolution near-Ðeld optical microscopy. In general, the broad variety of topics is also documented by the contributed papers, including up-to-date instrumental developments from a variety of manufacturers. The very positive response we have received for SXM 2 can be seen as a clear vote for the continuation of this workshop series with SXM 3 which will take place in 1998 in Basel, Switzerland. In this respect, the organizers wish to thank all those who have contributed to a successful course of the workshop. We are very conÐdent that it will continue to be successful in the future and serve as a valuable forum for the European SXM community. GERNOT FRIEDBACHER Vienna University of Technology HARALD FUCHS University of Muł nster HANS-JOACHIM GUŃ NTHERODT University of Basel ( 1997 by John Wiley & Sons, Ltd. SURFACE AND INTERFACE ANALYSIS, VOL. 25, 481 (1997)

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SURFACE AND INTERFACE ANALYSIS, VOL. 25, 481 (1997)

Preface

This proceedings volume contains a collection of papers presented at the“2nd Workshop on Development and Industrial Application of ScanningProbe Microscopy (SXM 2)Ï which was held on 16È18 September 1996 inVienna, Austria.

Following the Ðrst workshop held in October 1994 in Mu� nster,Germany, the continued high interest in the SXM series was again docu-mented by over 160 participants and 10 manufacturers who attendedSXM 2. During the 3 days of the workshop, a total of 52 oral contributionsand 30 posters were presented. Fifteen per cent of the contributions camefrom industry. Six invited lecturers reported on subjects such as scanningprobe microscopy in semiconductor technology, STM on metals, trueatomic resolution with AFM, scanning force microscopy of polymers, nano-tribological investigations with scanning force microscopy and highresolution near-Ðeld optical microscopy. In general, the broad variety oftopics is also documented by the contributed papers, including up-to-dateinstrumental developments from a variety of manufacturers.

The very positive response we have received for SXM 2 can be seen as aclear vote for the continuation of this workshop series with SXM 3 whichwill take place in 1998 in Basel, Switzerland. In this respect, the organizerswish to thank all those who have contributed to a successful course of theworkshop. We are very conÐdent that it will continue to be successful in thefuture and serve as a valuable forum for the European SXM community.

GERNOT FRIEDBACHERVienna University of Technology

HARALD FUCHSUniversity of Mu� nster

HANS-JOACHIM GU� NTHERODTUniversity of Basel

( 1997 by John Wiley & Sons, Ltd. SURFACE AND INTERFACE ANALYSIS, VOL. 25, 481 (1997)