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Plasmonic Nanolithogra phy EE235 Nanofabrication Jie Yao April 16, 2007

Plasmonic Nanolithography

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Plasmonic Nanolithography. EE235 Nanofabrication Jie Yao April 16, 2007. W. Srituravanich, et al, Nano. Lett. 4, 1085 (2004). 2 um. Z. Liu, et al, Nano. Lett. 5, 957, (2005). Light. Surface Plasmons. Higher resolution lithography. Plasmonic Lithography. Plasmonic Nanolithography. - PowerPoint PPT Presentation

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Page 1: Plasmonic Nanolithography

Plasmonic Nanolithography

EE235 Nanofabrication

Jie YaoApril 16, 2007

Page 2: Plasmonic Nanolithography

2 um

Z. Liu, et al, Nano. Lett. 5, 957, (2005)

W. Srituravanich, et al, Nano. Lett. 4, 1085 (2004)

Page 3: Plasmonic Nanolithography

Plasmonic NanolithographySurface plasmons (SPs) are collective free electron oscillations at a metal/dielectric interface

+ + + + + +

dielectric

metal1

2

E

Hy

kz

Kx Ez

zEz~e-|k

z|z

+ + + + + +

dielectric

metal1

2

E

Hy

kz

Kx Ez

zEz~e-|k

z|z

Main features of SPs

• Shorter wavelength (comparing with excitation light)• Evanescent wave enhancement• Bond to the surface• Propagation along the surface

• Shorter wavelength (comparing with excitation light)• Evanescent wave enhancement• Bond to the surface• Propagation along the surface

H. Raether, Surface Plasmons, (1988).

Higherresolution lithography

Light

Surface Plasmons

Plasmonic Lithography

Page 4: Plasmonic Nanolithography

Hole array lithography

W. Srituravanich, et al, Nano. Lett. 4, 1085 (2004)

Page 5: Plasmonic Nanolithography

Surface Plasmon Interference

GlassAl

|E|

Surface Plasmon Interference Nanolithography(SPIN)

PR

substrate

Z. Liu, et al, Nano. Lett. 5, 957, (2005)

Page 6: Plasmonic Nanolithography

Al 00.5(a)

λ0=365nm

2 um

PhotoresistAl

Quartz Quartz

PhotoresistAl

2 um

(b)

(c)

(d)

(e)

Period ~115 nm

Lithography Results (1D)

Page 7: Plasmonic Nanolithography

μm

(nm)~118nm

3μm

24

68

μm

(a) (b)

(c)

Lithography Results

Low reflectivity from the slit slit distance doesn’t affect the pattern quality

~60nm

Page 8: Plasmonic Nanolithography

2D SP Interference Lithography

(c)

(a)

(a’)

(b)

(b’)

(c)

(c’)

(d)

(d’)

• The interference pattern is determined by the arrangement of the SP sources

• The resolution is determined by the SP wavelength

Page 9: Plasmonic Nanolithography

Thank you

Questions?