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Plasmonic Nanolithography. EE235 Nanofabrication Jie Yao April 16, 2007. W. Srituravanich, et al, Nano. Lett. 4, 1085 (2004). 2 um. Z. Liu, et al, Nano. Lett. 5, 957, (2005). Light. Surface Plasmons. Higher resolution lithography. Plasmonic Lithography. Plasmonic Nanolithography. - PowerPoint PPT Presentation
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Plasmonic Nanolithography
EE235 Nanofabrication
Jie YaoApril 16, 2007
2 um
Z. Liu, et al, Nano. Lett. 5, 957, (2005)
W. Srituravanich, et al, Nano. Lett. 4, 1085 (2004)
Plasmonic NanolithographySurface plasmons (SPs) are collective free electron oscillations at a metal/dielectric interface
+ + + + + +
dielectric
metal1
2
E
Hy
kz
Kx Ez
zEz~e-|k
z|z
+ + + + + +
dielectric
metal1
2
E
Hy
kz
Kx Ez
zEz~e-|k
z|z
Main features of SPs
• Shorter wavelength (comparing with excitation light)• Evanescent wave enhancement• Bond to the surface• Propagation along the surface
• Shorter wavelength (comparing with excitation light)• Evanescent wave enhancement• Bond to the surface• Propagation along the surface
H. Raether, Surface Plasmons, (1988).
Higherresolution lithography
Light
Surface Plasmons
Plasmonic Lithography
Hole array lithography
W. Srituravanich, et al, Nano. Lett. 4, 1085 (2004)
Surface Plasmon Interference
GlassAl
|E|
Surface Plasmon Interference Nanolithography(SPIN)
PR
substrate
Z. Liu, et al, Nano. Lett. 5, 957, (2005)
Al 00.5(a)
λ0=365nm
2 um
PhotoresistAl
Quartz Quartz
PhotoresistAl
2 um
(b)
(c)
(d)
(e)
Period ~115 nm
Lithography Results (1D)
μm
(nm)~118nm
3μm
24
68
μm
(a) (b)
(c)
Lithography Results
Low reflectivity from the slit slit distance doesn’t affect the pattern quality
~60nm
2D SP Interference Lithography
(c)
(a)
(a’)
(b)
(b’)
(c)
(c’)
(d)
(d’)
• The interference pattern is determined by the arrangement of the SP sources
• The resolution is determined by the SP wavelength
Thank you
Questions?