Embed Size (px)
Citation preview
Negative electron resists for direct fabrication of devicesL. F. Thompson, L. E. Stillwagon, and E. M. Doerries Citation: Journal of Vacuum Science & Technology 15, 938 (1978); doi: 10.1116/1.569680 View online: http://dx.doi.org/10.1116/1.569680 View Table of Contents: http://scitation.aip.org/content/avs/journal/jvst/15/3?ver=pdfcov Published by the AVS: Science & Technology of Materials, Interfaces, and Processing Articles you may be interested in Fabrication of nanoscale ZnO field effect transistors using the functional precursor zinc neodecanoatedirectly as a negative electron beam lithography resist J. Vac. Sci. Technol. B 27, 3164 (2009); 10.1116/1.3245989 Applications of sawtooth doping superlattice for negativedifferentialresistance devices fabrication J. Vac. Sci. Technol. B 10, 60 (1992); 10.1116/1.586391 A practical electron beam direct writing process technology for submicron device fabrication J. Vac. Sci. Technol. B 5, 402 (1987); 10.1116/1.583913 Direct, electron lithographic fabrication of silicon devices and circuits J. Vac. Sci. Technol. 15, 960 (1978); 10.1116/1.569685 Negative Resistance and Hot Electrons J. Appl. Phys. 32, 1101 (1961); 10.1063/1.1736167
Redistribution subject to AVS license or copyright; see http://scitation.aip.org/termsconditions. Download to IP: 129.120.242.61 On: Sun, 30 Nov 2014 03:55:45
Redistribution subject to AVS license or copyright; see http://scitation.aip.org/termsconditions. Download to IP: 129.120.242.61 On: Sun, 30 Nov 2014 03:55:45
Redistribution subject to AVS license or copyright; see http://scitation.aip.org/termsconditions. Download to IP: 129.120.242.61 On: Sun, 30 Nov 2014 03:55:45
Redistribution subject to AVS license or copyright; see http://scitation.aip.org/termsconditions. Download to IP: 129.120.242.61 On: Sun, 30 Nov 2014 03:55:45
Redistribution subject to AVS license or copyright; see http://scitation.aip.org/termsconditions. Download to IP: 129.120.242.61 On: Sun, 30 Nov 2014 03:55:45
Redistribution subject to AVS license or copyright; see http://scitation.aip.org/termsconditions. Download to IP: 129.120.242.61 On: Sun, 30 Nov 2014 03:55:45
Redistribution subject to AVS license or copyright; see http://scitation.aip.org/termsconditions. Download to IP: 129.120.242.61 On: Sun, 30 Nov 2014 03:55:45
![Synthesis of non-chemically amplified 193nm photo-resists ...€¦ · was the major driving force for advances in semiconductor fabrication during 1980s and 1990s [3]. DNQ/Novolac](https://img.pdfslide.us/doc/110x75/60486d2c359f494acc756277/synthesis-of-non-chemically-amplified-193nm-photo-resists-was-the-major-driving.jpg)
