NanoMAX: A hard x-ray nano probe beamline at MAX IV...NanoMAX: A hard x-ray nano probe beamline at MAX IV Ulf Johansson* a, Ulrich Vogt b, Anders Mikkelsen c aMAX IV Laboratory, Lund

NanoMAX: A hard x-ray nanoprobe beamline at MAX IV

Ulf Johansson*a, Ulrich Vogtb, Anders Mikkelsenc aMAX IV Laboratory, Lund University, Box 118, 221 00 Lund, Sweden

bBiomedical and X-Ray Physics, Department of Applied Physics, KTH/Royal Institute of Technology, Albanova University Center, 106 91 Stockholm, Sweden

cSynchrotron Radiation Research, Department of Physics, Lund University, Box 118, 221 00 Lund, Sweden

ABSTRACT We describe the design of the NanoMAX beamline to be built among the first phase beamlines of the MAX IV facility in Lund, Sweden. NanoMAX will be a hard X-ray imaging beamline providing down to 10 nm in direct spatial resolution, enabling investigations of very small heterogeneous samples exploring methods of diffraction, scattering, absorption, phase contrast and fluorescence. The beamline will have two experimental stations using Fresnel zone plates and Kirkpatrick-Baez mirror optics for beam focusing, respectively. This paper focuses on the optical design of the beamline excluding the experimental stations but also describes general ideas about the endstations and the nano-focusing optics to be used. The NanoMAX beamline is planned to be operational late 2016. Keywords: X-ray imaging, X-ray microscopy, X-ray optics, Nanoprobe, Synchrotron radiation, Ray tracing, MAX IV

1. INTRODUCTION

The new Swedish synchrotron radiation facility MAX IV is currently under construction in Lund in the south of Sweden. It will consist of a linear accelerator for full energy, top-up injections and two storage rings, one with 1.5 GeV and one with 3.0 GeV electron energy. The linear accelerator will also serve as the electron source for a short pulse facility and, in a possible future upgrade, a free electron laser. Eight initial beamlines have been funded and are planned to be operational in 2016. The NanoMAX beamline will be built at the 3 GeV storage ring, an ultra-low emittance ring ideally suited for this type of beamline. It is a hard X-ray imaging beamline for micro- and nano-beams and will enable imaging applications exploring absorption, diffraction, scattering, and fluorescence methods. This type of beamline opens up for new opportunities within a very broad range of research fields1, with the possibility to study nanoscale objects with atomic scale precision in realistic environments and in complex heterogeneous structures. As a result, one or more hard X-ray micro/nano imaging beamlines2-5 either have been constructed or are under construction at virtually all synchrotrons with sufficiently high brightness. In the design phase of the present beamline several of these other designs have been carefully studied. The NanoMAX beamline will feature two experimental stations. The first station will use zone plates to reach smallest focus sizes with the long term goal to achieve a direct 10 nm spatial resolution. The second station will use Kirkpatrick-Baez mirror optics with spot sizes down to 300 nm or better. The major components and characteristics of the beamline are depicted in figure 1 and table 1. Experimental features of the beamline will be implemented in a sequential fashion, to allow a high quality in available methods. The beamline commissioning will start early 2016 and first user experiments are expected to be possible late 2016.

X-Ray Nanoimaging: Instruments and Methods, edited by Barry Lai, Proc. of SPIE Vol. 8851, 88510L© 2013 SPIE · CCC code: 0277-786X/13/$18 · doi: 10.1117/12.2026609

Proc. of SPIE Vol. 8851 88510L-1

Downloaded From: http://proceedings.spiedigitallibrary.org/ on 09/03/2014 Terms of Use: http://spiedl.org/terms

1gle defining aperture E

Vertical!

k CVD diamond filter

y focusing mirror - 25.2

Horizontally focus

HorizontaL!m

ping mirror - 25.8 m

illy diffracting crystal rre

Secondar

sureding

onochroma[or - 28.0 m

y source aperture (SSA

IIIIIIIIIIIIenta) station 1ellite building

) - 51.0 m

Nano -focusing zoneSample position- Detector

Detc

plate - 84 m

Nano -focusing K

is. Sample

B- mirrors -94 mpositionactor

Figure 1. M Table 1. Ma

Energy raPhoton soBeamline

Monochr

Experime

Experime

Main exp

In this paper simulations a

2.1. Beamlin NanoMAX is2 shows a drchemistry labcontrol rooms Important forconditions in satellite buildefficient wayTemperature experimental The hutch is helps in main

Major componen

ain characteristiange ource e optics

omator

ental station 1

ental station 2

perimental meth

we first presand considerat

ne overall ou

s approximaterawing of theboratory to sus, one for each

r reliable opeoptics and ex

ding is reinfory of achievin

stability is ahutch is contconstructed in

ntaining a stab

nts of the Nano

ics of the Nano5 – 30 kIn-vacuTwo hoform a sCryogenSi(111) FocusinscanninFocusinSample

hods ScanninX-ray d

sent the presetions up to the

tline and infr

ly 100 meter le rooms and hupport users inh experimenta

eration of a bxperimental hurced by mixin

ng very low vlso very impotrolled to ± 0.n concrete an

ble temperatur

oMAX beamline

MAX beamlinekeV (3rd – 17th hum undulator,

orizontally deflesecondary sourcnically cooled crystals.

ng with Fresnel g in X, Y and r

ng with Kirkpascanning in X,

ng transmission diffraction (XRD

ent stage of the experimental

2. BE

rastructure

long, extendinhutches for thn sample prepal station and s

beamline withutches. The gng in concretvibration leveortant to min.1 K and specd built as a “he and clean co

e with two expe

e. harmonic from 1.5 meter magnecting mirrors ce, imaged by tdouble crystal

zone plates. Sprotation. atrick-Baez mir, Y and rotation

n X-ray microscD), X-ray fluore

he design of tl stations.

AMLINE D

ng into a satelhe beamline. parations. Thesome office sp

h the rather ground undernte in the soil els with the

nimize fluctuacial care is takhutch in a houonditions whe

erimental statio

undulator) netic length, fulfocus the photothe nano-focusinl monochromat

patial resolution

rror system. Sn. copy (STXM), uescence (XRF),

the beamline

DESIGN

llite building aThe satellite

e beamline hapaces.

extreme spatineath the 600 mto approximageological co

ations within hken to reduceuse” to passiv

en persons hav

ons.

l harmonic overon beam verticng optics. or in horizonta

n 30 – 50 nm, fi

patial resolutio

using absorption, Coherent diffr

and then we

adjacent to thebuilding has

as a 20 m lon

ial resolution mm thick con

ately 4 metersonditions prehours and dayheat sources

vely aid tempeve to enter the

erlap. cally and horizo

al diffraction g

final goal 10 nm

on < 300 nm

n and phase conraction imaging

present the d

e main ring bus a preparationg experimen

goal of 10 nncrete floor ofs depth. This esent at the Mays. The temp

and heat disserature stabili

e experimental

ontally to

geometry.

m. Sample

– 1 μm.

ntrast g (CDI)

detailed optics

uilding. Figuren room and atal hutch, two

nm are stablef the main andis a very cos

MAX IV siteperature in thesipation to airity. An airlockl hutch.

s

e a o

e d st e. e r. k



T

--_

Ili

1012

22.5 34.5

Shielded beam i.á

_

Optics hutch

49.5 52.5

51.0

ira

hoton energy

111111

0 5L

H I H

Ided beam tube 'ryfV

Chem'

N5th

Ventilatioi

Control room ontrol

\1

30

Figure 2. Fundulator,

2.2. Insertio The beamlinelength is 18 mThe length ofNanoMAX cperformance Figure 3 show

Figure 3. Pused by the

2.2. Front e White beam macceptance anfocusing optioptics hutch tabout 100 W

Floor plan for thalong the beam

on device

e will have anmm, KMAX is f the present ucan hold a fut

due to the spws a calculated

Photon flux frome beamline. The

end & white b

masks in the fngle. Movableics and to redthe maximum

W incident on

he NanoMAX bmline, are indica

n in-vacuum u1.92, minimu

undulator mayture undulatorpecifications od photon flux

m the undulatore spectrum was

beam filter

front end absoe slits in the fr

duce power lom allowed acce

n the first fo

beamline locateated in the draw

undulator withum gap is 4.0 my possibly be er constructionof the MAX Ispectrum6-7 to

r within 40x40 calculated with

orb a majorityront end are usad induced sl

eptance angle focusing mirro

ed in sector 3 owing.

h permanent mmm and totalexpanded to 2

n at a length oIV ring, whilo be expected

μrad2 acceptanh the software c

y of the powersed to optimizlope errors onis 40(H) x 40or. The beam

of the MAX IV

magnets suppl magnetic len

2.0 m, while thof up to 3.7 mle still being ad from the 1.5

nce angle. Note:code SPECTRA

r load from thze the photon n the white be0(V) μrad2 cormline uses th

3 GeV storage

lied by a commngth is 1.5 m. he straight secm. The presena proven, relimeter long un

: the first undulA6-7.

he undulator abeam accepta

eam optics. Afrresponding tohe 3rd harmon

e ring. Distance

mmercial vendoThe total pow

ction of the rinnt design williable undulatondulator.

lator harmonic

and reduce theance angle to tfter final coll

o a maximum onic and high

es from the

or. The periodwer is 5.9 kWng in-line with

give superioor technology

will not be

e photon beamthe used nanoimation in thepower load o

her harmonics

d W.

h r

y.

m -e f s



corresponding to a photon energy range of 5 – 30 keV. The first harmonic is attenuated with diamond CVD filters in front of the mirrors to reduce power load and power density on the mirrors and the monochromator crystals. It is possible to select filters with different thicknesses or run without filter. A common design for the front end is used for all beamlines at the 3 GeV ring. In addition to fixed masks and movable slits for power load reduction the front end includes safety shutters, beam diagnostics, bremsstrahlung collimation and an electron beam deflector.

2.3. Beamline mirrors The basic principle for the beamline optical design is the following. The undulator source is imaged into an intermediate point at 51 meter distance and simultaneously monochromated. This secondary source is in turn imaged by the nano-focusing optics; the KB-mirrors or the Fresnel zone plate. Two white beam mirrors are used to focus the source into a stigmatic image at 51 meter distance from the undulator, where the secondary source aperture (SSA) is located. The first mirror (VFM) deflects the photon beam horizontally and focuses the beam in vertical direction by sagittal focusing. The second mirror (HFM) also deflects the beam horizontally and focuses the beam in horizontal direction by meridional focusing. The VFM has a fixed curvature while the HFM is bendable with cylindrical shape. The HFM has three coating stripes, Si, Rh and Pt. With the Si coating high harmonic contribution is reduced at photon energies below 10 keV. Rh is used in the range 10 – 22 keV and Pt above 22 keV. The VFM has a Pt coating. Both mirrors are water cooled with clamping to the mirror sides or by interfacing with eutectic metal. The most important mirror parameters are listed in table 2. The geometry of deflecting the beam horizontally by both mirrors has some important advantages; the beam path is horizontal for the whole beamline; gravity does not act in the mirror meridional direction; slope errors influence the beam less in sagittal direction than in meridional direction. The latter is important because the undulator source size in vertical direction is only a few μm (FWHM). In horizontal direction the source size is about 100 μm, hence slope errors and vibrations in meridional direction are less apparent. Table 2. Specifications for the vertically and horizontally focusing mirrors.

Mirror VFM HFMMirror substrate Silicon Silicon Mirror shape Circular cylinder (sagittal) Circular cylinder (meridional) Grazing angle of incidence 2.7 mrad 2.7 mrad Optically active length 400 mm 400 mm Coating stripe Pt Si, Rh, and Pt Meridional slope error < 0.5 μrad rms < 0.5 μrad rms Sagittal slope error < 5 μrad rms < 5 μrad rms Micro roughness <0.2 nm rms <0.2 nm rms Radius 68.84 mm (sagittal), fixed shape 9443 meter (meridional), bendable shape Distance from source 25.2 m 25.8 m Distance to image plane 25.8 m 25.2 m

2.4. Monochromator A Si(111), cryo-cooled, fixed-beam, double-crystal monochromator (DCM) in horizontal diffraction geometry is following directly after the mirrors. We have chosen the horizontally deflecting design because we believe it improves beam stability. With this design small horizontal crystal vibrations do not significantly broaden the image of the source. Also the mechanical design can be made rigid and gravitational forces do not act in the diffraction direction. Drawbacks of the horizontal design are lower transmission in the 5 – 7 keV range and slightly worse energy resolution compared to a design with vertical diffraction geometry. However, with the relatively small size of the undulator source these drawbacks are less apparent. The most important parameters for the monochromator are listed in table 3.



Table 3. Most important parameters for the double crystal monochromator. Crystals Silicon (111) Direction of diffraction Horizontal, left on first crystal, right on second crystal, seen from above Operation Fixed beam offset, approximately 10 mm Energy range 5-30 keV Bragg angle range 23.3 – 3.7 ° Source distance 28 meter Max. absorbed power 35 W Max. absorbed power density 12 W / mm2 (at 5 keV)

The monochromator and the two mirrors are situated in the first optical hutch. Space is also reserved in this hutch for a possible future upgrade with a double multilayer monochromator (DMM). With a DMM the photon flux can be increased one to two orders of magnitude which can be advantageous for, e.g., X-ray fluorescence measurements on low-concentration samples. 2.5. Secondary source aperture The secondary source aperture (SSA) acts as a flexible source for the succeeding nano-focusing optics. The SSA consists of two pairs of slits, positioned 51 meters from the undulator source, where the vertical and horizontal opening can be set independently. By having this flexibility in defining the shape and size of the source the transverse coherence length can be tailored to match the Fresnel zone plates, KB-optics or other possible future optics, in order to reach spot sizes set by the diffraction limit. By opening the slits one can optimize for high flux conditions using enlarged spot sizes. The SSA is situated in a small temperature controlled optics hutch on the main ring floor. Together with the SSA a beam viewer and an X-ray beam position monitor (XBPM) is installed. The XBPM can be used to stabilize the beam position by regulating the pitch angle of the second crystal in the monochromator in a closed loop control. 2.6. Experimental stations NanoMAX has two experimental stations and scanning X-ray microscopy is the fundamental imaging mode. Both stations are located in a 20 meter long experimental hutch in the satellite building. The hutch may possibly be divided by a radiation wall to allow for measuring with the first station while preparation work is done in the second half. Alternatively, by not dividing the hutch a third experimental setup may be possible to build if future ideas arise. The design of the two experimental stations is in an early phase. We have arranged two workshops to collect requests from potential future users and from international experts on nano-probe beamlines. At this time we have the following conceptual ideas. The first experimental station, at approximately 33 meter distance from the SSA, uses Fresnel zone plates to achieve smallest possible focal spots. The realistic initial goal is to achieve a 30-50 nm spot within the energy range 5 – 12 keV. Zone plates will be developed and provided by a group from the Royal Institute of Technology in Stockholm. The long term goal is to achieve 10 nm spot size. Samples are scanned in X, Y for 2D mapping and also rotated for 3D mapping. Sample environments on this station have to be small because the available distance between optics and sample is in the mm to cm range and varies with photon energy. Thus for example in-situ sample environments have to be constructed in rather small dimensions. Such technologies have been successfully developed for a number of very different situations ranging from liquid cells8 for biology to heated gas cells for catalysis9. The second experimental station, at approximately 43 meter distance from the SSA, uses two plane-elliptical mirrors in Kirkpatrick-Baez configuration to achieve a spot size in the 100 – 1000 nm range. Compared to the first station, the distance between optics and sample is more generous allowing for more complex and large sample setups. We expect this station to be configured with users’ equipment rather frequently while for the FZP-station the setup will be more static and with a tighter integration between sample stage/environment and optics. Main experimental methods are nano-diffraction, X-ray absorption, X-ray phase-contrast, X-ray fluorescence. We also plan to explore coherent diffraction imaging (CDI) methods, e.g., ptychography in various forms.



2.0

1.5

1.0

0.5

0.0

0.5

84.0

83.4

87 8

82.2

81.6

81.0

I::.:

10

miI

ei

10.5

9.0

I7.5

6.0

4.5

3

3.0

1.5

Ijo 0.0

Ray tracing aSHadow) whelement analyinduced distoones presente 3.1. Heat lo The two mirrdistorted by pfilter the incithe temperatupower absorbmirrors are co The first monlargest distormaximum temenergies the Bcrystal tempecoating on theon both long Water cooling

Figure 4. Tis upwards

The temperat3.2 μrad bothbeam intensitresults show bendable the

and heat load hich integratesysis (FEA). M

ortions. In the ed for the beam

ad managem

rors VFM andpower load. Bdent power on

ure induced slobed by the mirooled on both

nochromator crtions occur amperature on Bragg angle derature. Abovee HFM but th sides to the g temperature

Temperature (le.

ture induced sh in the meridty is centeredthat most of tfocal distance

simulations hs and automatMASH is ver

simulations pmline under se

ment

d HFM togethBy carefully se

n the followinope errors arerrors is only a long sides at

crystal is absoat 5 keV whe

the crystal isdecreases resule 10 keV the e power densiliquid nitroge

es were tested

eft) and power d

slope errors ondional and sagd on the crystathe thermal ine can be adjus

3. OPTI

have been dontes the use ofry powerful inpresented beloection 2.

her with the fetting the anglng optics is ree smaller than

few watts androom tempera

orbing most ore the Bragg s 84 K and thlting in a largetotal power o

ity is still beloen temperaturand found not

density (right) o

n the crystal agittal directional and not subnduced focus ted to partly c

ICS SIMUL

ne with the sof Shadow11 fon simulating ow we have u

first crystal ofle defining apeduced. In thethe specified d handled by ature. A heat t

of the power angle is at m

he power dener illuminatedon the crystal ow the case at re of 77 K. At feasible.

on the first mon

are shown in fns, and occurbject to the lablurring at th

compensate fo

LATIONS

oftware packaor ray tracing beamline per

used paramete

f the monochrerture in the fe case of the tslope errors foside cooling wtransfer coeffi

and is also sumaximum, 23nsity is approxd footprint corr

is higher tha5 keV. In the

A heat transfer

nochromator cr

figure 5. The mr at 5 keV. It argest slope ehe SSA occursor the thermal

age MASH10 (and COMSO

rformance takers very close

romator are thfront end and btwo mirrors thfor the mirror mwith water. In icient of 0.3 W

ubject to the h.3º. Figure 4 ximately 12 Wresponding ton at 5 keV be thermal simu

r coefficient o

ystal at 5000 eV

maximum slopshould be no

errors located s between 5-7dent on the cr

(Macros for AOL multiphysiking into acco

to, but not id

he componentby using the Che FEA analymanufacturingthe thermal s

W/(Kcm2) was

highest poweshows this c

W/mm2. For o reduced powecause we useulations the crof 0.3 W/(Kcm

V. Photon beam

ope errors, peaoted that most

off center. T7 keV. By havrystal.

Automation oics12 for finiteount heat loaddentical, to the

ts that can geCVD diamond

ysis shows thag process. Theimulations the

s used.

r density. Thease where thehigher photon

wer density ande the Rh or Pystal is cooledm2) was used

m direction

ak-to-peak, aret of the usefuhe ray tracingving the HFM

f e d e

et d at e e

e e n d

Pt d

d.

e ul g

M



2.0

1.5

1.0

0.5

E nn

g

M

1H

LO

L.5

L.0

).5

).0

).5

P°7

4_

50 -100 -50

mil

rra0.8

0.4

100 1500.0

0.4

0.8

1.2

1.6

Figure 5. Ssagittal dire

3.2. Ray tra Figure 6 showThe spot sizethe photon enthe eye a 20(FWHM) valu

Figure 6. Irof a 20x20

We expect toroughness wiof the same sstations. By ucore part and After the secsource apertufigure 7. Theoptics but dosample.

Slope errors onection (right). P

acing results

ws intensity de is largest fornergy 8333 eV0x20 μm2 apeues for differe

rradiance on th μm2 aperture.

o see somewhill enlarge the size as the spusing an apertthus result in

condary sourcure and the KBe circle indicaoes not overfi

n the first crystPhoton beam di

distributions or 5000 eV dueV the spot sizeerture is indient photon ene

he secondary so

hat larger spospot. The ind

ot, height vibture substantistable beam i

ce aperture thB position 43 ates a 300 μmill extensively

al in the monorection is upwa

n the secondae to the heat ie is considerabcated as a reergies.

urce aperture fo

ot sizes on thdicated aperturbrations in theially smaller tintensity.

e beam is divmeters. The i

m diameter. Wy which is im

ochromator at 5ards.

ary source apeinduced slope bly smaller anectangle in th

for 5000 eV (lef

e SSA, especure size is not e beam will trthan the spot

vergent. The illumination a

We find that thmportant to av

5000 eV. Slope

erture for twoerror on the f

nd similar to whe images. Ta

ft) and 8333 eV

cially for the optimal in the

ranslate into isize the beam

zone plate poat these two pohe illuminationvoid losing va

e error in merid

photon energfirst monochr

what is seen foable 4 shows

V (right). The re

higher energie vertical direntensity fluctu

m passing the

osition is 33 mositions, for 5n extends ove

aluable intensi

dional direction

gies, 5000 eV romator crystaor higher eners full-width h

ectangle indicat

ies, because mection. If the atuations at theaperture will

meters from 5.0 and 25 keVer the whole nity in the fina

n (left) and

and 8333 eVal. Already fogies. To guidehalf-maximum

tes the size

mirror surfaceaperture size ise experimenta

consist of the

the secondaryV, is shown innano focusingal spot on the

V. r e

m

e s

al e

y n g e



600

400

200

600

400

200

F n

PP

i00 -400 -200

0 -400 -200Pl 1.0e-

á.0e -

100 6000.0e-

+06

+06

+06

+06

<+06 E

+06 i

+06

+06

+05

+00

:I-.

r

0 0 200LIM

í

-

`ti,J

.

..

1e+06

4e+06

le+06

Be+06

5e+06 E

2e+06

Oe+05

De+05

De+05

De+00

Table 4. Spsource size

Figure 7. Ircolumn: KBμm in diam

Photon fluxesbeen simulateundulator prpolarization e The curves insize of the zoadapted to theoperating at

pot sizes on thee and the optics

Photo5000 8333 1166725000Geom

rradiance at theKB-optics positiometer and corres

s incident on ted, see figure roperties, miretc.

n figure 8 are one plate it hae diameter of 10 keV and 3

e secondary souentrance and e

on energy (eV)

7 0

metric image

e nano-focusingon at 43 meter spond to the lar

the secondary8. The results

rror reflectivi

calculated wias to be illumthe zone plate

33 meter dista

urce aperture. Txit arms.

Horizontal 124 115 125 120 112

g optics positionfrom the SSA.

rgest foreseeabl

y source apertus have been caity, monochr

ith a SSA opeminated coheree and to the phance, the SSA

The aberration fr

size FWHM (μ

ns. Left column Top row: 5000

le zone plate or

ure, after the aalculated withromator trans

ening of 20 x ently. By adjuhoton energy.

A opening sho

free geometric s

μm) Vertica30 13 13 10 9.6

n: Zone plate p0 eV, bottom rothe approxima

aperture, and h ray tracing sismission, los

20 μm2. In ousting the SSA As an exampuld be set to

spot size is calcu

al size FWHM (

osition at 33 mow: 25000 eV. te acceptance a

at the FZP animulations in Mses due to p

rder to reach A opening theple, with a zon12 μm. The p

culated from the

(μm)

meter from the SThe white circl

area of the KB-o

nd KB-optics pMASH, takinpower load

the diffractioe coherence lene plate diamephoton flux in

e undulator

SSA. Right les are 300 optics.

positions haveng into accoun

deformations

on-limited spoength13 can beeter of 150 μmncident on the

e nt s,

ot e

m e



1

1.0_-

14

13

12

11

LO

5000 10000 X000

Photon en

20000

ergy (eV)

vident on SSA

ter SSA (20 um x 20 un

0 um diameter at zone

0 um diameter at KB-c

I1ti1®61IIIIIIII®IIII15111E1111

25000

1)

plate position

iptics position

30000

zone plate is,percent, the fl

Figure 8. PThe steps ibased on an

The NanoMAspatial resolustorage ring. The commiss

We would likrecommendatNanoMAX b

[1] Ice, G.

334(606[2] Somogy

Synchro[3] Schroer

FalkenbInstr. M

[4] MartíneS., Petithard X-10-18 (2

, with these pflux at the sam

Photon flux incin the curves on SSA opening

AX beamline ution with higThe beamline

sioning phase

ke to thank ctions from theeamline is fun

E., Budai, J. 60), 1234-123yi, A., Kewishotron Soleil," A, C. G., Boye

berg, G., WellMeth. In Phys. R

z-Criado, G., tgirard, S., Raray microprob

2012).

parameters, esmple will be in

ident on the seccur when chan

g of 20 x 20 μm

will be a vergh photon fluxe will have twowill start early

colleagues fore panel with ended by the K

D. and Pang9 (2011). h, C. M., PolAIP Conf. Proe, P., Feldkamenreuther, G. Res. A616, 93Tucoulou, R

ack, A., Sans,be beamline I

timated to 1xn the 1010 phot

condary sourcenging undulato2.

4.

ry competitivx taking advao experimentay 2016 and by

ACKNO

r valuable comexperts from A

Knut and Alice

RE

g, J. W. L., "

lack, F. and Moc. 1365, 57-6mp, J. M., Paand Reimers,

3-97(2010). ., Cloetens, P J. A., SeguraID22 of the E

x1012 photons/tons/s range at

e aperture, afteror harmonic alo

SUMMAR

e and versatilantage of the al stations alloy the end of 20

OWLEDGE

mments to theAPS, ESRF a

e Wallenberg f

REFERENCE

The Race to

Moreno, T., "60 (2011) atommel, J., S, N., "Hard X

., Bleuet, P., a-Ruiz, J., SuEuropean Syn

/s. If we assumt 10 keV.

r the aperture, aong the photon

RY

le hard X-rayextraordinary

owing for diffe016 we plan to

EMENT

e optical desiand Petra III thfoundation tog

ES

X-ray Micro

"The Scanning

Samberg, D., -ray nanoprob

Bohic, S., Cauhonen, H., Sunchrotron Rad

me the zone p

and at the FZP energy axis. Th

y imaging beay low emittanerent sample so be in operati

gn work. Esphat has reviewgether with tw

beam and Na

g Nanoprobe

Schropp, A.be at beamline

auzid, J., Kieffusini, J. and Viation Facility

plate efficienc

and KB-optics

he three lower

amline aimingnce of the MAsetups and dettion.

pecially we arwed the optica

welve Swedish

anobeam Scie

Beamline Na

, Schwab, A.e P06 at PETR

ffer, I., KosiorVillanova, J., y," J. Synchro

cy to be a few

s positions. curves are

g for a 10 nmAX IV 3 GeVtection modes

re grateful foal design. The

h universities.

ence," Science

anoscopium a

., Stephan, S.RA III," Nucl

r, E., Labouré"Status of the

otron Rad. 19

w

m V s.

r e

e

at

., l.

é, e

9,



[5] Winarski, R. P., Holt, M. V., Rose, V., Fuesz, P., Carbaugh, D., Benson, C., Shu, D. M., Kline, D., Stephenson, G. B., McNulty, I. and Maser, J., "A hard X-ray nanoprobe beamline for nanoscale microscopy," J. Synchrotron Rad. 19, 1056-1060 (2012).

[6] Tanaka, T. and Kitamura, H. "SPECTRA: a synchrotron radiation calculation code," J. Synchrotron Rad. 8, 1221-1228 (2001).

[7] [SPECTRA, http://radiant.harima.riken.go.jp/spectra/index.html]. [8] Song, Y., Hormes, J, and Kumar, C. S. S. R., "Microfluidic Synthesis of Nanomaterials," Small 4(6), 698–711

(2008). [9] Andersen, T., Jensen, R., Christensen, M. K., Pedersen, T., Hansen, O. and Chorkendorff, I., "High mass resolution

time of flight mass spectrometer for measuring products in heterogeneous catalysis in highly sensitive microreactors," Rev. Sci. Instrum. 83(075105), 1-5 (2012).

[10] Sondhauss, P., [X-ray Optics for the Short Pulse Facility, MAX-lab internal report January], MAX IV Laboratory, (2011).

[11] Lai, B. and Cerrina, F.,"Shadow – a synchrotron radiation ray tracing program," Nucl. Instr. Meth. In Phys. Res. A246, 337-341 (1986).

[12] [COMSOL Multiphysics, http://www.comsol.se/products/multiphysics]. [13] Attwood, D., [Soft X-rays and extreme ultraviolet radiation], Cambridge University Press, Cambridge United

Kingdom, 300-306 (1999).



Documents

NanoMAX: A hard x-ray nano probe beamline at MAX IV...NanoMAX: A hard x-ray nano probe beamline at MAX IV Ulf Johansson* a, Ulrich Vogt b, Anders Mikkelsen c aMAX IV Laboratory, Lund