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OUR STRENGTHS VON ARDENNE is your partner of choice if you are looking for systems with a modular design that can be easily tailored to your technology and productivity requirements. These modular process systems are ideally suited to be applied in research and development as well as for volume production. Even though the applications can vary greatly from customer to customer, VON ARDENNE has proven its strength in providing tailored solutions even for sophisticated demands.

With more than 40 years of experience in the manufacturing of coating equipment, both for industrial production and for research and development, VON ARDENNE is one of the leading providers of equipment and technologies in PVD thin-film technology and vacuum process technology. Thanks to this expertise, we have managed to supply over 400 vacuum coating systems to our customers all over the world.

APPLICATIONS

MEMS AND MOEMSMicroelectromechanical systems, or MEMS, are microscopic mechanical and electromechanical structures and devices. For customers who are active in this technology field, we offer equipment for the manufacturing of micromirror arrays for industrial applications. We also offer equipment solutions for creating microoptoelectromechanical systems - MOEMS.

SENSORSFor sensor applications, conductive and active layers as well as highly capsulating barrier layers can be deposited with our systems. By using masks in the deposition step, a raw structuring would be possible too.

Applications are sensor probes for position (GMR), pressure, temperature, resistance etc.

OLEDVON ARDENNE provides different systems for small-scale and mass production focusing on the deposition of the active layer with own organic evaporation sources. Furthermore, we can provide systems for metallization in combination with a mask structuring process. Beyond that, our systems can be used to create barrier systems.

The major applications for OLEDs are smaller displays, digital signage and lighting.

PHOTOVOLTAICS / ARCHITECTURAL GLASSFor the photovoltaics and architectural glass industry, we offer equipment for R&D purposes and for the optimization of existing layer stacks on mass production tools. Using our modular process systems at the R&D stage facilitates the transfer to bigger VON ARDENNE production equipment for high-volume production.

PRECISION OPTICSVON ARDENNE offers equipment solutions for the deposition of alternating layer systems with a high uniformity for wavelength-dependent functions of filters, non filters, reflectors and functional layers for anti-scratch applications.

MEDICAL APPLICATIONSWe provide coating systems that are able to coat three-dimensional objects with metallization layers or barrier systems. These machines benefit from a special substrate holder, and are suited for medical applications such as electrical contacts of heart catheters or the encapsulation of circuits.

EMERGING TECHNOLOGIESOur modular process systems can also be used to develop and manufacture future technologies such as fuel cells, thin-film batteries and electrothermal generators. They can also be used by the automotive industry for research tasks and the development of Low-E wind shields or head-up displays.

RESEARCH & DEVELOPMENTWe also provide systems for all basic research tasks that require sophisticated vacuum coating machines, based on our long-term experience as a supplier of research facilities in Germany and abroad.

IN-HOUSE TECHNOLOGY & APPLICATION CENTER

— Sample coatings of customer applications — Development of customized layer stacks — Product & process verification and optimization — Testing of new technologies and components

CLOSE PARTNERSHIP

VON ARDENNE entertains a close network of partners for even more profound R&D work and to identify future technologies. It consists of:

— Fraunhofer Institutes such as IPMS, FEP and ISE — Institutes of the Helmholtz Association (Jülich, Berlin) — Universities (Kiel, Dresden, Sheffield) — Companies such as FAP GmbH, scia Systems GmbH

PROFESSIONAL SIMULATION SUPPORT

We offer professional simulation technology to ensure best process quality with regards to plasma, heat and cooling. Furthermore, our simulation tools help demonstrate, develop and improve layer properties and define or optimize processes, details and the performance of our systems.

GLOBAL PROJECT EXPERIENCE

VON ARDENNE equipment is used in over 50 countries. We have established an installed base of hundreds of coating systems worldwide, ranging from small tools to equipment for large-area coating applications for several markets.

COMPREHENSIVE SERVICE PORTFOLIO

— VON ARDENNE services hubs around the world — On-site service (on request) — Remote access from our technology department (if required) — Regular technical and technological trainings offered — Spare & wear part warehouse close to customers — Lifecycle extension of wear parts

UPGRADES & RETROFITS As soon as your business is growing, your VON ARDENNE equipment will grow accordingly - thanks to its modular design and the upgrades we provide. We will also supply you with the necessary technology upgrades if you decide to change your applications.

Furthermore, when your equipment is ageing, we will retrofit your systems with new components, no matter if they are VON ARDENNE or third-party machines.

We are able to turn product property requirements into efficient and competitive coating solutions based on various modular assembly systems like batch, load-lock, cluster, inline or drum coater configurations.

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Based on the experience of more than 40 years in magnetron sputtering and over 50 years in evaporation, we have incorporated a broad scope of features into VON ARDENNE modular process systems.

Our modular process systems use all the important vacuum thin-film technologies. Beyond that, they can also apply various pre- and post-treatment methods. On top of that, there are many options for monitoring, handling and control. You can see all the key features of our systems in more detail below.

The success of our modular process systems is based on their highly flexible and broad configuration range, our technological experience and know-how, and on our in-house developed and manufactured key components.Depending on the required tool configuration, a VON ARDENNE system may include one or more of the listed components. Due to their modular design, the systems can also be upgraded or retrofitted with these components after the initial system installation.

KEY FEATURES KEY COMPONENTS

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Heating 1

Degassing 2

Etching (e-beam, glow discharge) 3

Aligner 4

PRE/POST TREATMENT

1 Manual or fully automated working

2 SECS / GEM interface

3 Comprehensive process data logging

4 User management

CONTROL

COATING PROCESSES

HANDLING

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MONITORING

VAprocos 2 1

Process emission monitor (PEM) 2

Pyrometer 3

Deposition rate monitoring & control 4

Temperature logger 5

LION ion sourceInverse sputter etcher

Cylindrical magnetron

VAprocos 2 process control system

Circular magnetron

Circular PECVD source

Glow discharge device

Rectangular magnetron

Wicon control software

Single substrate

Magazine

Mask

Substrate flip station

Automatic loading and unloading by industrial robots

Carrier return system

Cleanroom compatible

Other process technologies on requestEvaporation (thermal, E-beam)

Hot wire Sputtering with rotating magnet field

Plasma-enhanced chemical vapor deposition (PECVD)

Sputtering, planar

Atomic layer deposition (ALD) Sputtering, confocal

CS500 HIPIMS CLUSTER SYSTEM The CS500 uses state-of-the-art coating technology - so-called high-power impulse

magnetron sputtering (HIPIMS), which is able to deposit thin films with an extremely high density. It is especially designed for applications that require a high degree of precision such as coatings on glass to prevent glare or to produce more responsive smartphone screens and technology.

Load chamber — Magazine load lock for carriers

6-port transfer chamber — Vacuum robot

Pre-treatment chamber — Inverse sputter etcher

2 process chambers Hard substance and especially dense coatings

— Up to 4 focally arranged magnetrons each — Unbalanced high-power impulse magnetron

sputtering (HIPIMS) — Rotatable and vertically adjustable carrier platform — Substrate heating (up to 900 °C) — Quick gas inlet and distribution system — Monitoring systems (e.g. pyrometer)

CLUSTER SYSTEMS MODULAR, FLEXIBLE & COST-EFFECTIVE

REFERENCE SYSTEMSOur cluster systems are based on a platform with many modular units. Therefore, every tool may be configured according to the specific applications of our customers. On top of that, special features can be integrated to meet the demand of the customer. Thanks to this flexibility, VON ARDENNE cluster systems help our customers to reduce their cost of ownership.

LS500 THE COMPACT ALL-ROUNDER The very compact system can be applied for the deposition of layer systems in research

and development and in small-scale batch production.

The up to four magnetrons of the system enable a highly flexible operation with various layer systems. Furthermore, the LS500 is suited for separate or co-sputtering. As these features can be combined with further options such as BIAS and monitoring systems, the LS500 is a true all-rounder.

The substrates handling is wafer or carrier-based.

Load chamber — Single substrate or magazine

Process chamber Metals, oxides, alloys, e.g. barrier layers for medical applications (implants)

— Inverse sputter etcher — 4 focally arranged magnetrons — DC, DC pulsed, RF processes — Vertically adjustable, helium-cooled, rotatable

substrate holder, suited for RF BIAS — Heating or cooling system — Process emission monitor (PEM), pyrometer

TRANSFER CHAMBERS

LOAD CHAMBERS

POST-TREATMENT CHAMBERS

PRE-TREATMENT CHAMBERS

Single substrate module

Magazine moduleH2 passivation or flash module

PECVD ICP module

PROCESS CHAMBERS

E-beam evaporator

PECVD CCP module

Hot-wire module

Evaporation

Sputter module, 4-fold confocal

Sputter module, single, parallel

(R)IBE/S

Sputter module, 4-fold, parallel

6 ports

8 ports

4 ports

CS400 MEMS CLUSTER SYSTEM The CS400 is especially suited for the deposition of highly reflective layer systems for MEMS

and MOEMS (micro(opto)electromechanical systems). These layer systems are, for instance, micromirror arrays tailored for industrial applications. Thanks to the cluster design of the CS400, several consecutive layers can be deposited in-situ, without removing the substrate from the vacuum.

The system enables coatings with exceptionally high precision with regards to layer quality. It also enables a long-term stable process and a quick sputter pressure control system.

2 load chambers — Wafer magazine load locks

8-port transfer chamber — Vacuum robot and integrated aligner and cooler

Pre-cleaning chamber

5 process chambers Metallization, highly reflective, anti-reflection (AR) and cover layers

— 300 mm high-power magnetrons with high uniformity and target utilization

— DC, DC pulsed and RF processes — Gas inlet and distribution system

Cleaning or etching module

The systems have a modular design and consist of stand-alone sections with process components arranged on mounting flanges. This allows for numerous configurable design options according to customer requirements.

The coating process can be executed with non-moving substrates (e.g. PECVD or evaporation processes) or oscillating substrates with continuously passing carriers. The coating cycles will vary strongly depending on the processes and the chosen equipment. All modules are suitable for 24/7 operation. In order to achieve highest productivity, the systems feature automatic (un)loading of the substrates, carrier return systems as well as SECS/GEM data interfaces for fab automation.

INLINE SYSTEMS HORIZONTAL OR VERTICAL

HIGH-PRODUCTIVITY TOOLS

REFERENCE SYSTEMSFor the processing of larger substrates at a higher productivity, VON ARDENNE provides several inline coating systems. We have delivered and installed such inline systems both in vertical and horizontal design. They are used for medium-scale production and for layer optimization by customers running our larger coating equipment, as the resulting process parameters can be easily transferred.

VISS CONTINUOUS SPUTTER SYSTEM This system is designed as a truly continuous system for layer development under near-

production conditions. However, it can also be used as a production tool for cold and hot reactive and non-reactive deposition processes.

2 loading stations — For one carrier

2 load lock chambers — Integrated heating module

Pre-treatment chamber — LION ion beam etching component — Electron beam hollow cathode — Heating module

Process chamber Al, CZT, MoOxNy, ZnTe - semiconductor materials, metals - contact materials

— 8 magnetrons, either planar or rotatable — DC, DC pulsed, RF processes — Heating modules — Gas inlet and distribution system — Highly precise temperature guidance — PEM for reactive processes — Cool trap

VISS SINGLE-END SPUTTER SYSTEM This system is suited for the large-area deposition of optical single or multiple metal

or metal oxide layers. Thanks to its modular design, it can be equipped with a multitude of features.

The substrates are transported through the system with a carrier, which is vertically tilted by -7°. This arrangement reduces the contamination with particles and enables that the substrates can be loaded without touching their front side.

Loading and unloading station — Robot loading for one carrier

Entry/exit load lock chamber — Vacuum bypass line for fast evacuation

Pre-treatment chamber — Inverse sputter etcher

Process chamber Metals and oxides for optical applications

— 4 planar magnetrons — DC, RF processes — Gas inlet system

HISS HORIZONTAL OLED SYSTEM This system is a production tool for manufacturing OLED (organic light emitting diodes)

displays. A feature that makes this machine unique is the structured deposition with the help of two different masks. These masks are exchanged inside the vacuum. The system uses VON ARDENNE linear organic evaporation sources with inert material feed. The system is loaded and unloaded fully automatically and features a sophisticated carrier return system.

2 loading and unloading stations — Robot loading — Mask positioning system

2 entry/exit load lock chambers — Integrated aligner and cooler

5 buffer chambers — To guarantee high productivity

2 process chambers OLED materials, contact metals

— Evaporation sources for organic and metallic deposition

— Co-evaporation — Carrier and substrate centering — Quartz rate, temperature, position

monitoring

Carrier return system — In inert atmosphere

Loading station [operated under air]

Coating chambers

Exit load lock chamber

Entry load lock chamber

Unloading station [operated under air]

Pre-treatment chamber

The loading station is where the system is loaded manually with a carrier loaded with substrates or where substrates are placed on carriers, either manually or with the help of a robot. Alternatively, a magazine loading station for several carriers can be used.

The coating chambers are modularly configured and consist of a variable number of different process stations, depending on the customer requirements. Therefore, the modules can be connected in series accordingly. The available coating processes are sputtering and PECVD. Furthermore, thermal and electron

The exit load lock chamber enables the unloading of the carrier without venting the process chambers of the system.Optionally, it can be fitted with a cooling module.

The unloading station is where the system is unloaded manually or by using a robot system.

Alternatively, a magazine unloading station for several carriers can be used or the station can be combined with a carrier return system.

The entry load lock chamber allows for the loading of the carrier without venting the process chambers of the system.Optionally, it can be equipped with a heating module or a bypass to reduce pumping time.Alternatively, a combined fore-vacuum/ high-vacuum load lock with integrated pre-treatment can be used.

The pre-treatment chamber can be fitted with an glow discharge device, inverse sputter etcher, LION ion source or a hollow cathode.

beam evaporation can be applied in our horizontally configured systems.The process chambers can be used for reactive, partly-reactive, and non-reactive AC, DC or DC pulse deposition processes. For that, either standard VON ARDENNE planar single magnetron sputter sources, double

arrangements of planar magnetrons or rotatable magnetron sputter sources are used.

Additionally, heaters and cool traps can be integrated, or monitoring systems for controling the process or the deposited layer behavior.

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DRUM COATING SYSTEMSCOMPACT, LOW-COST & PRODUCTIVE

REFERENCE SYSTEMSDrum coating systems have several advantages: They offer a quite high productivity and a compact footprint. They are also an affordable investment. Especially for alternating multilayer deposition, these systems are very powerful tools. In combination with pre-treatment, heating and cooling features and an inline deposition monitoring, a broad scope of applications can be targeted. We have highlighted two installed versions for you below.

UPGRADE FOR HIGHER PRODUCTIVITY POSSIBLE

— Automatic loading/unloading — Optical monitoring/process control — PEM

BS1200 SINGLE-CHAMBER DRUM COATING SYSTEM This system is designed as a single-chamber system for processing of up to

200 mm x 600 mm or 8-inch substrates by means of magnetron sputtering in DC processes.

The substrates are accommodated in carriers. These carriers are arranged at the outside of a cylindrical basket. The basket rotates around a vertical axis within a vacuum chamber (rotary basket).

A large door is used to load or unload the carrier with the substrates in and out of the process chamber. The door can be opened from a cleanroom while the system itself is installed in a gray room. Optionally, a loading/ unloading station can be integrated.

Shutter systems in front of the magnetrons allow for pre-sputtering and for quickly stopping the deposition of material onto the substrates.

Loading/unloading station — Large door for loading/unloading — Rotary basket

Pre-treatment chamber — Inverse sputter etcher

Process chamber Short-wavelength mirrors

— 3 planar or rotatable magnetrons — DC, DC pulsed, RF processes — Gas inlet and distribution system — BIAS

CS1200 MULTI-CHAMBER DRUM COATING SYSTEM The CS1200 is a 4-chamber system and enables the processing of customer-specific

substrates by means of RF sputter etching, RF sputtering or unipolar DC or pulsed coating. This can be done in process mode with horizontally directed particle stream and vertically arranged substrates. The system enables hot deposition at a defined and highly uniform temperature.

The system is loaded through a magazine load lock chamber. A vacuum robot transfers the carrier automatically between each vacuum chamber of the system.

One of the of applications for this system is the manufacturing of thermo-electrical generators.

Loading/unloading station — Magazine load lock chamber combined with loading/unloading door

Transfer chamber — Vacuum robot

Carrier storage area — For temporary storage in vacuum

2 process chambers Semiconductors and metallic materials

— One for metallization, one for semiconductor materials and barrier films

— Simultaneous processing in both process chambers is possible

— Pre-cleaning with etching unit — Up to 9 planar magnetrons — DC, DC pulsed, RF processes — Heating system — Gas inlet and distribution system — PEM

High vacuum pumping system

— With turbopumps

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Process chamber - stainless steel vacuum chamber with 5 ports

— Up to 4 magnetrons, planar or rotatable — Pre-treatment module

1 Large door for loading/unloading

— User-friendly handling — Easy to clean

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Rotary drum with several compartments

for substrate carriers

— Carrier size is defined by the substrate — Freely selectable rotation speed — Basket can be removed

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WORLDWIDE SALES AND SERVICE VON ARDENNE GmbH (headquarters) I Am Hahnweg 8 I 01328 DRESDEN I GERMANYSales: +49 (0) 351 2637 342 I sales@vonardenne.biz Service: +49 (0) 351 2637 9400 I support@vonardenne.biz

VON ARDENNE Vacuum Equipment (Shanghai) Co., Ltd. I +86 21 6173 0210 I +86 21 6173 0200 I sales-vave@vonardenne.biz; support-vave@vonardenne.biz

VON ARDENNE Malaysia Sdn. Bhd. I +60 4408 0080 I +60 4403 7363 I sales-vama@vonardenne.biz; support-vama@vonardenne.biz

VON ARDENNE Japan Co., Ltd. I Tokyo office I +81 3 6435 1700 I +81 3 6435 1699 I sales-vajp@vonardenne.biz; support-vajp@vonardenne.biz

VON ARDENNE Japan Co., Ltd. I Osaka office I +81 6 6324 4600 I +81 6 6324 8870 I sales-vajp@vonardenne.biz; support-vajp@vonardenne.biz

VON ARDENNE North America, Inc. I Ohio office I +1 419 386 2789 I +1 419 873 6661 I sales-vana@vonardenne.biz; support-vana@vonardenne.biz

VON ARDENNE North America, Inc. I Arizona office I +1 480 726 5470 I +1 480 855 0947 I sales-vana@vonardenne.biz; support-vana@vonardenne.biz

VON ARDENNE develops and manufactures industrial equipment for vacuum coatings on materials such as glass, wafers, metal strip and polymer fi lms. These coatings give the surfaces new functional properties and can be between one nanometer and a few micrometers thin, depending on the application.

Our customers use these materials to make high-quality products such as architectural glass, absorbers and absorber tubes for solar-thermal power plants, refl ectors for lighting systems, displays for smartphones and touchscreens, solar modules and heat protection window fi lm for automotive glass.

We supply our customers with technologically sophisticated vacuum coating systems, extensive expertise and global service. The key components are developed and manufactured by VON ARDENNE itself.

Systems and components made by VON ARDENNE make a valuable contribution to protecting the environment. They are vital for manufacturing products which help to use less energy or to generate energy from renewable resources.

VON ARDENNE WHO WE ARE & WHAT WE DO.

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Photos © VON ARDENNE GmbH ENGLISH 01/2017

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