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Marie’s slides Watch this presentation on www.scitable.com © 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec) Automated alignment procedure for s3tching with a focused ion beam Marie Verbist 17 June 2010

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Page 1: Marie’s slides !#$%&'()&*+,-%'-#)./$0'(/'))prcen.upr.edu/uploads/doc/ECS-03-07-02-Marie-s...Marie’s slides Watch this presentation on © 2010 Marie Verbist (Photonics Research

Marie’s slidesWatch this presentation on www.scitable.com

© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Automated alignment procedure  for s3tching with a focused ion beam 

Marie Verbist 

17 June 2010 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

nano 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

nano photonics 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

nano photonics very very small photonic chips 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

nano photonics very very small photonic chips  fabricated with nanometer precision 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

nanophotonics 

focused ion beam 

alignment procedure 

Automated alignment procedure  for s3tching with a focused ion beam 

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Marie’s slidesWatch this presentation on www.scitable.com

© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

nanophotonics 

focused ion beam 

alignment procedure 

Automated alignment procedure  for s3tching with a focused ion beam 

waveguides by focused ion beam s3tching 

Page 8: Marie’s slides !#$%&'()&*+,-%'-#)./$0'(/'))prcen.upr.edu/uploads/doc/ECS-03-07-02-Marie-s...Marie’s slides Watch this presentation on © 2010 Marie Verbist (Photonics Research

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

nanophotonics 

focused ion beam 

alignment procedure 

Automated alignment procedure  for s3tching with a focused ion beam 

confining and guiding light 

photonic components 

fabrica3on 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Light can be confined by  refrac3ve index contrast 

light 

low n 

high n 

low n 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Light can be confined by  refrac3ve index contrast 

layer sandwich of materials with different refrac3ve index (n) 

light 

low n 

high n 

low n 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Light can be confined by  refrac3ve index contrast 

layer sandwich of materials with different refrac3ve index (n) 

total internal reflec3on light stays in the core with higher n 

light 

low n 

high n 

low n 

Page 12: Marie’s slides !#$%&'()&*+,-%'-#)./$0'(/'))prcen.upr.edu/uploads/doc/ECS-03-07-02-Marie-s...Marie’s slides Watch this presentation on © 2010 Marie Verbist (Photonics Research

Marie’s slidesWatch this presentation on www.scitable.com

© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Light can be confined by  refrac3ve index contrast 

layer sandwich of materials with different refrac3ve index (n) 

total internal reflec3on light stays in the core with higher n 

higher index contrast smaller core and sharper bends 

light 

low n 

high n 

low n 

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Waveguides are the basis of  many nanophotonic components 

cross‐sec3on  air (n=1) 

Si (n=3.4) 

SiO2 (n=1.4) 

top view 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Waveguides are the basis of  many nanophotonic components 

cross‐sec3on  air (n=1) 

Si (n=3.4) 

SiO2 (n=1.4) 

top view 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

CMOS fabrica.on tools ideal for industry 

?? ideal for research 

mass fabrica3on  prototype fabrica3on 

long development cycle  short development cycle 

not all materials  all materials 

CMOS technology is not ideal for prototyping 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

CMOS fabrica.on tools ideal for industry 

?? ideal for research 

mass fabrica3on  prototype fabrica3on 

long development cycle  short development cycle 

not all materials  all materials 

CMOS technology is not ideal for prototyping 

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Marie’s slidesWatch this presentation on www.scitable.com

© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

CMOS fabrica.on tools ideal for industry 

?? ideal for research 

mass fabrica3on  prototype fabrica3on 

long development cycle  short development cycle 

not all materials  all materials 

CMOS technology is not ideal for prototyping 

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Marie’s slidesWatch this presentation on www.scitable.com

© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

CMOS fabrica.on tools ideal for industry 

?? ideal for research 

mass fabrica3on  prototype fabrica3on 

long development cycle  short development cycle 

not all materials  all materials 

CMOS technology is not ideal for prototyping 

Focused Ion Beam tool 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

nanophotonics 

focused ion beam 

alignment procedure 

Automated alignment procedure  for s3tching with a focused ion beam 

working principle 

need for s3tching 

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An ion beam is  focused  scanned  blanked 

A focused ion beam tool enables milling and imaging 

target 

Ga+ beam 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

An ion beam is  focused  scanned  blanked 

Impact causes   atoms to be spuTered away                          

A focused ion beam tool enables milling and imaging 

target 

Ga+ beam 

spuTered atoms 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

An ion beam is  focused  scanned  blanked 

Impact causes   atoms to be spuTered away                          

This allows for   milling holes 

A focused ion beam tool enables milling and imaging 

target 

Ga+ beam 

spuTered atoms 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

An ion beam is  focused  scanned  blanked 

Impact causes   atoms to be spuTered away                         electrons to be released 

This allows for   milling holes 

A focused ion beam tool enables milling and imaging 

target 

Ga+ beam 

secondary electrons 

spuTered atoms 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

An ion beam is  focused  scanned  blanked 

Impact causes   atoms to be spuTered away                         electrons to be released 

This allows for   milling holes  imaging (through electron detec3on) 

A focused ion beam tool enables milling and imaging 

target 

Ga+ beam 

secondary electrons 

spuTered atoms 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Large structures need to be s3tched 

same number of pixels for any field width 

field width 

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Large structures need to be s3tched 

same number of pixels for any field width for a certain required scan resolu3on, the FW is limited 

large FW  small FW 

low resolu3on  high resolu3on 

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Large structures need to be s3tched 

same number of pixels for any field width for a certain required scan resolu3on, the FW is limited 

structures larger than the field width have to be s3tched i.e. etch part of the structure, move stage, etch next part, … 

large FW  small FW 

low resolu3on  high resolu3on 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

nanophotonics 

focused ion beam 

alignment procedure 

Automated alignment procedure  for s3tching with a focused ion beam 

adjus3ng the beam rota3on 

adjus3ng the beam shi[ 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Problem 1 : misalignment of beam and stage axes 

Beam axes and stage axes are slightly misaligned 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Problem 1 : misalignment of beam and stage axes 

Beam axes and stage axes are slightly misaligned 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Problem 1 : misalignment of beam and stage axes 

Beam axes and stage axes are slightly misaligned 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Problem 1 : misalignment of beam and stage axes 

Beam axes and stage axes are slightly misaligned 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Solu3on 1 : adjust beam rota3on 

Determine angle between stage and beam axes move stage to the corners of a square mill alignment markers in each corner and image calculate angle from rotated square 

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Solu3on 1 : adjust beam rota3on 

mill & image 

Determine angle between stage and beam axes move stage to the corners of a square mill alignment markers in each corner and image calculate angle from rotated square 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Solu3on 1 : adjust beam rota3on 

mill & image  move stage 

Determine angle between stage and beam axes move stage to the corners of a square mill alignment markers in each corner and image calculate angle from rotated square 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Solu3on 1 : adjust beam rota3on 

mill & image  move stage 

Determine angle between stage and beam axes move stage to the corners of a square mill alignment markers in each corner and image calculate angle from rotated square 

image & match 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Solu3on 1 : adjust beam rota3on 

mill & image  move stage 

Determine angle between stage and beam axes move stage to the corners of a square mill alignment markers in each corner and image calculate angle from rotated square 

image & match 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Solu3on 1 : adjust beam rota3on 

mill & image  move stage 

Determine angle between stage and beam axes move stage to the corners of a square mill alignment markers in each corner and image calculate angle from rotated square 

image & match 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Problem 2 : inaccuracy of stage moves 

Stage moves are too inaccurate causing overlap or space between the several milled parts 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Problem 2 : inaccuracy of stage moves 

Stage moves are too inaccurate causing overlap or space between the several milled parts 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Problem 2 : inaccuracy of stage moves 

Stage moves are too inaccurate causing overlap or space between the several milled parts 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Problem 2 : inaccuracy of stage moves 

Stage moves are too inaccurate causing overlap or space between the several milled parts 

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Solu3on 2 : adjust beam shi[ 

Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers 

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Solu3on 2 : adjust beam shi[ 

mill & image 

Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Solu3on 2 : adjust beam shi[ 

mill & image 

Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Solu3on 2 : adjust beam shi[ 

mill & image 

Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Solu3on 2 : adjust beam shi[ 

mill & image  move & match 

Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Solu3on 2 : adjust beam shi[ 

mill & image  move & match 

Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers 

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Marie’s slidesWatch this presentation on www.scitable.com

© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Solu3on 2 : adjust beam shi[ 

mill & image  move & match  mill & image 

Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers 

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Marie’s slidesWatch this presentation on www.scitable.com

© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Solu3on 2 : adjust beam shi[ 

mill & image  move & match  mill & image 

Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers 

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Marie’s slidesWatch this presentation on www.scitable.com

© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Solu3on 2 : adjust beam shi[ 

mill & image  move & match  mill & image 

Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers 

Page 52: Marie’s slides !#$%&'()&*+,-%'-#)./$0'(/'))prcen.upr.edu/uploads/doc/ECS-03-07-02-Marie-s...Marie’s slides Watch this presentation on © 2010 Marie Verbist (Photonics Research

Marie’s slidesWatch this presentation on www.scitable.com

© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Solu3on 2 : adjust beam shi[ 

mill & image  move & match  mill & image 

Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers 

Page 53: Marie’s slides !#$%&'()&*+,-%'-#)./$0'(/'))prcen.upr.edu/uploads/doc/ECS-03-07-02-Marie-s...Marie’s slides Watch this presentation on © 2010 Marie Verbist (Photonics Research

Marie’s slidesWatch this presentation on www.scitable.com

© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Solu3on 2 : adjust beam shi[ 

mill & image  move & match  mill & image 

Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers 

Page 54: Marie’s slides !#$%&'()&*+,-%'-#)./$0'(/'))prcen.upr.edu/uploads/doc/ECS-03-07-02-Marie-s...Marie’s slides Watch this presentation on © 2010 Marie Verbist (Photonics Research

Marie’s slidesWatch this presentation on www.scitable.com

© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Solu3on 2 : adjust beam shi[ 

mill & image  move & match  mill & image 

Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers  

The waveguide itself is never imaged to avoid damage/losses 

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nanophotonics 

focused ion beam 

alignment procedure 

Automated alignment procedure  for s3tching with a focused ion beam 

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nanophotonics 

focused ion beam 

alignment procedure 

Automated alignment procedure  for s3tching with a focused ion beam 

waveguides by focused ion beam s3tching 

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Long waveguides could be s3tched 

£ 

80 μm 

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Long waveguides could be s3tched 

£ 

80 μm 

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Structures are unlimited in size  

80 μm 

1.5 mm 

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© 2010 Marie Verbist (Photonics Research Group, Universiteit Gent / imec)

Structures are unlimited in size except by the size of the sample  

80 μm 

1.5 mm 

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Photonics Research Group www.photonics.intec.ugent.be 

nanophotonics 

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as large as we want nanophotonics 

Photonics Research Group www.photonics.intec.ugent.be