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ALD
fHi
hA
LDfH
ih
LE
OL
EO
dL
YOd
LYO
Ui
Mt
lU
iM
tl
ALD
ofH
igh
ALD
ofH
igh--
LaEr
OLa
ErO
33an
dLa
YOan
dLa
YO33
Usi
ngM
etal
Usi
ngM
etal
Am
idin
ate
Sour
ces
Am
idin
ate
Sour
ces
Hua
zhi L
i, D
aew
on H
ong,
and
Deo
V. S
hena
i*A
dvan
ced
Thin
-Film
Tech
nolo
gies
Adv
ance
dTh
in-F
ilmTe
chno
logi
es,
Roh
m a
nd H
aas
Elec
tron
ic M
ater
ials
LLC
, Nor
th A
ndov
er, M
A 01
845
YiLi
dR
GG
d*
Yiqu
nLi
u an
dR
oyG
.Gor
don*
Dep
artm
ent o
f Che
mis
try
and
Che
mic
al B
iolo
gy,
Har
vard
Uni
vers
ity, C
ambr
idge
, MA
0213
8
Sele
ctio
nof
Suita
ble
Plat
form
sfo
rALD
Sele
ctio
nof
Suita
ble
Plat
form
sfo
rALD
Sele
ctio
nof
Suita
ble
Plat
form
sfo
rALD
Sele
ctio
nof
Suita
ble
Plat
form
sfo
rALD
OOR
1
R3
MR
2
MX
NR
2R
1M
etal
hal
ide
Met
al
-dik
eton
ate
MR
MO
R
MN
R1
R2
N NR
2
R1
R3
MO O R
M
NN
R4
MR
3
R5
OM
Met
al a
lkyl
Met
al a
lkox
ide
Met
al d
ialk
ylam
ide
Met
alam
idin
ate
Met
al
-dik
etim
inat
e
Met
al a
lkox
yalk
oxid
e
Mt
ldi
lkl
ilk
id
MM
R1 R
2
NR
8
R7
R6
R5
R3
R4
NR
M
R
Met
alam
idin
ate
Met
al c
yclo
pent
adie
nide
Met
al d
ialk
ylam
inoa
lkyl
Met
aldi
alky
lam
inoa
lkox
ide
Met
al A
mid
inat
es
• Bid
enta
te“c
hela
ting”
effe
cts
Impr
oved
ther
mal
stab
ility
than
amid
esB
iden
tate
chel
atin
gef
fect
sIm
prov
edth
erm
alst
abilit
yth
anam
ides
•R1,
2,3
tuni
ng in
am
idin
ate
Vola
tility
and
reac
tivity
con
trol
•No
dire
ct M
-C b
onds
Less
car
bon
inco
rpor
atio
n in
film
s
Stab
leA
mor
phou
sH
igh
Stab
leA
mor
phou
sH
igh--
kD
iele
ctric
sk
Die
lect
rics
Stab
leA
mor
phou
sH
igh
Stab
leA
mor
phou
sH
igh--
kD
iele
ctric
sk
Die
lect
rics
LaM
O3
(M =
Lu,
Y, E
r, Yb
) are
alte
rnat
ive
cand
idat
es to
ach
ieve
hig
her k
(3
0 –
40),
and
<1.0
E-8A
/cm
2cu
rren
t lea
kage
, with
<10
nm fi
lm th
ickn
ess
Die
lect
rick
Con
duct
ion
Ban
d of
fset
Vala
nce
Ban
d o
ffset
SiO
23.
93.
54.
4
Al 2O
38
2.8
4.9
HfS
iO4
121.
53.
4
LaA
lO3
181.
93.
2La
AlO
318
1.9
3.2
LaH
fOx
202.
02.
6
GdS
cO3
222.
02.
5
DS
O22
20
25
DyS
cO3
222.
02.
5
LaLu
O3
322.
12.
1
LaM
Oha
spo
tent
ialt
ore
plac
ec
rren
thig
hk
mat
eria
lLa
MO
3ha
spo
tent
ialt
ore
plac
ecu
rren
thig
h-k
mat
eria
l
LY
dE
Aid
it
Sf
Rh
dH
LY
dE
Aid
it
Sf
Rh
dH
La,Y
, and
ErA
mid
inat
eSo
urce
sfr
omR
ohm
and
Haa
sLa
,Y, a
ndEr
Am
idin
ate
Sour
ces
from
Roh
m a
ndH
aas
La-F
AM
DLa
(iPr 2
-fam
d)3
Y-A
MD
YA
MD
Y(iP
r 2-a
md)
3Er
-AM
DEr
(iPr 2
-am
d)3
Prop
ertie
sof
Lant
hano
idA
mid
inat
ePr
ecur
sors
Prop
ertie
sof
Lant
hano
idA
mid
inat
ePr
ecur
sors
Nam
eLa
-FA
MD
Y-A
MD
Er-A
MD
M. W
. (g/
mol
)52
0.53
512.
61
590.
96
Prop
ertie
sof
Lant
hano
idA
mid
inat
ePr
ecur
sors
Prop
ertie
sof
Lant
hano
idA
mid
inat
ePr
ecur
sors
App
eara
nce
Whi
te s
olid
Whi
te s
olid
Pin
k so
lid
M.P
. (ºC
)19
3 -1
95no
t obs
erve
d be
low
250
ºCno
t obs
erve
d be
low
250
ºC
Den
sity
(g/m
L)0.
55
0.51
0.53
Vapo
r Pre
ssur
e lo
g P
(Tor
r) =
1.84
08 –
1151
/T(K
)>
0.1
Torr
@ 1
30 ºC
log
P(T
orr)
= 1
.941
–11
17/T
(K)
> 0.
1 To
rr @
130
ºClo
g P
(Tor
r) =
5.86
7 –
2377
/T(K
)>
0.1
Torr
@ 1
30 ºC
Ther
mal
Sta
bilit
ySt
able
to 3
00 ºC
by A
RC
Stab
le to
250
ºC b
y A
RC
Stab
le to
250
ºC b
y A
RC
1 H N
MR
orga
nic
impu
rity
N.D
.or
gani
c im
purit
y N
.D.
orga
nic
impu
rity
N.D
.
ICP
Purit
y>9
9.99
99%
>9
9.99
999%
>9
9.99
999%
Shel
f life
Sta
ble
over
9 m
onth
sS
tabl
e ov
er 9
mon
ths
Sta
ble
over
9 m
onth
s
TGA
Cle
an e
vapo
ratio
n w
ithne
glig
ible
resi
due
Cle
an e
vapo
ratio
n w
ithne
glig
ible
resi
due
Cle
an e
vapo
ratio
n w
ithne
glig
ible
resi
due
VP
Cf
LS
VP
Cf
LS
Vapo
rPre
ssur
eC
urve
sfo
rLa
Sour
ces
Vapo
rPre
ssur
eC
urve
sfo
rLa
Sour
ces
•La-
FAM
D o
ffers
hig
her v
apor
pre
ssur
e th
an o
ther
pla
tform
s.
VP
dTG
AfL
YE
Aid
it
VP
dTG
AfL
YE
Aid
it
Vapo
rPre
ssur
e an
dTG
A o
fLa,
Y,Er
Am
idin
ates
Vapo
rPre
ssur
e an
dTG
A o
fLa,
Y,Er
Am
idin
ates
Cle
an e
vapo
ratio
n w
ith <
1% re
sidu
e
La-F
AM
D
Evap
orat
ion
Beh
avio
r of L
a Pr
ecur
sors
Evap
orat
ion
Beh
avio
r of L
a Pr
ecur
sors
ppby
Isot
herm
al T
GA
at 1
20 ºC
by Is
othe
rmal
TG
A a
t 120
ºC1.
05
0.95
1.00
ratio
La
FAM
D
080
0.85
0.90
eight loss
Com
petit
or c
ompo
und
1 C
ompe
titor
com
poun
d 2
0.70
0.75
0.80
we
020
4060
8010
012
014
00.
65
time
(min
)(
)
La F
AM
DIm
prov
ed v
olat
ility
than
oth
er c
omm
erci
al L
a pr
ecur
sors
Hi
hTh
lSt
bilit
fLth
idA
idi
tH
ih
ThlS
tbi
litfL
thid
Aid
it
Hig
hTh
erm
alSt
abili
ty o
fLan
than
oid
Am
idin
ates
Hig
hTh
erm
alSt
abili
ty o
fLan
than
oid
Am
idin
ates
Sta
ble
up to
300
o C
La F
AM
D
Acc
eler
ated
rate
cal
orim
etry
ana
lysi
s
11 HN
MR
ofY
AM
D@
200C
HN
MR
ofY
AM
D@
200C
11 HN
MR
ofY
AM
D@
200C
HN
MR
ofY
AM
D@
200C
1632
hr
1008
hr
648
hr
0 hr
Y A
MD
Hig
h th
erm
al s
tabi
lity
dem
onst
rate
d by
NM
R S
tudy
11 HN
MR
ofLa
FAM
D@
200C
HN
MR
ofLa
FAM
D@
200C
11 HN
MR
ofLa
FAM
D@
200C
HN
MR
ofLa
FAM
D@
200C
1080
h10
80hr
501
hr
68 h
r
0 hr
La F
AM
Dim
prov
ed th
erm
al s
tabi
lity
dem
onst
rate
d by
NM
R S
tudy
ALD
Er
ALD
Er 22
OO33
Er s
ourc
e te
mpe
ratu
re 1
40 o C
800.
51.
01.
52.
0En
ergy
(MeV
)
ALD
with
H2O
at 3
00 o C
sub
stra
te te
mpe
ratu
re=>
Er 2
O3
@ 0
.83
Ang
stro
m/c
ycle
Ni
itii
filb
RB
SC
bt
t4060 alizedYield
No
impu
ritie
sin
film
byR
BS
on
C s
ubst
rate
Film
den
sity
6.8
g c
m-3
, ~80
% o
f bul
k de
nsity
20Norma
050
010
0015
00C
hann
el
0
with
surfa
ceC
No
carb
on in
film
by
XP
S
with
surfa
ceC
cont
amin
atio
n
No
Caf
ter
No
Caf
ter
sput
terin
g
ALD
Er
ALD
Er 22
OO33
Cub
ic c
ryst
al s
truct
ure
