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SUPERION Ion Implanter Technology for Gen 10 substrates
1.Home | 2.Introduction | 3.Multiple species | 4.High mass
resolution | 5.Beam Transmission | 6.Technical Summary
|Contact_us
Superion Mass Separated Ion Beam Technology for Gen 10
substrates
Superion Multiple Double Beam, Mass Dependent Quadrupole Line
Focusing Technology has
been developed for the Mass Analyzed Ion Implantation of Gen 6
to Gen 10 (and larger)
substrates.
Superion is an intellectual property company licensing its
technology to implanter
manufacturers.
This website describes a mass separated ion implantation (or ion
doping) system for the
implantation of any size substrate (Gen 6 to Gen 10 and larger)
for products such as OLEDdisplays and system-on-glass devices.
Current mass analyzing magnets for FPD implant use
magnets which analyze the ion beam in the plane of beam
deflection (x-y plane) and these scale
very badly with increasing beam size (and therefore substrate
size). The Superion Quadrupole
Magnet analyzes the beam in a plane perpendicular to the beam
deflection plane by mass
dependent focusing; the required beams are selected by focusing
them through apertures in a
resolving structure.
The Superion Quadrupole Analyzing Magnet is a small, low cost,
high resolving power design
which uses permanent magnets and therefore consumes no power,
and where the design of the
magnet is the same for all substrate sizes. The scaling with
substrate size is better than linear - a
3 metre substrate (Gen 10) magnet is only twice the length (and
weight) of a 1 metre substrate(approx. Gen 5) magnet, the magnet
cross-section design being identical for all substrate sizes.
The construction is modular, the magnet being constructed to the
required length from a
standard set of components.
Mass separation magnet for very large substrates
mass separated implant essential for high yieldOLED display and
system on glass substrates
one analyzing magnet design for any substrate
size
environmentally friendly zero power consumption
low cost, modular construction for any substrate
size
high resolution - 11BF+ (mass 30) / P+ (mass 31)
high beam current - any number of any size
beams
ERION Ion Implanter Technology for very large OLED FPD
http://superion-implant.com/
4 5/15/2011 10:46 AM
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impurities in, or leaking into, the source feed material.
Fig.1-2b shows a mass separated beamline for a Gen 5
FPD substrate. The beam is deflected to the right in thefirst
set of dipole gaps D1; the beam then passesthrough the quadrupole
region with a substantial
velocity component in the z-direction. This z-componentof the
beam interacts with the curved quadrupolemagnetic fields to produce
convergent mass dependentfocusing (in planes containing the
y-direction). Thebeam is then deflected to the left in the second
set ofdipole gaps D2 and the beams leave the analyzingmagnet
parallel to the beams extracted from the ionsource.
Fig.1-2c shows a mass separated beamline for a Gen
10 FPD substrate. It can be seen that the magnetdesign is
unchanged; it is simply increased in length inthe z-direction by
increasing the number of modularcomponents to achieve the required
length. It should benoted that the magnet size (volume of
permanent
magnet material and iron) scaling is better than linear,the
length of the magnet for Gen 10 (approx. 3 metresubstrate) being
double that for Gen 5 (approx. 1.1metre substrate). The magnet
power consumption iszero and expensive power supplies and
coolingsystems are not required.
The next page Introduction to Quadrupole MassSeparation
describes how mass separation isachieved.
CLICK HERE for next page ' 2. Introduction '
ERION Ion Implanter Technology for very large OLED FPD
http://superion-implant.com/
4 5/15/2011 10:46 AM
