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27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 1
Thomas Kolbusch, Vice President
Integration of Nano imprint R2R into the production
processes for printed electronic products
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 2
Summary
Introduction
Coatema
SummaryNano
Imprinting
Overview &
Basics
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 3
Introduction Coatema
founded
1974
Film/Paper
Printed Electronics
Prepreg
Membranes
Renewables
Textile
Glass
bespokenequipment
working widths
from100 mm
up to 5,400 mm
Fro
mL
ab
2F
ab
R&Dprojects & network
worldwideservice
laminating
coating
printing
inn
ova
tio
ns
qualitymade in Germay
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 4
Technologies & Processes
Overview and Basics
Nano-
imprinting
Laser
Patterning
Encapsulation
Pick &
place
Surface
treatment
Printing
CoatingPhoto-
lithography
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 5
Technologies & Processes
Process Parameters
Process Parameters are:
Operation speed
Rheology of coating and printing inks
Substrate condition
Tension control MD/CD
Edge control
Resolution and registration accuracy of printing/laminating systems
Precision of coating operations
Curing / drying / crosslinking
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 6
Inline Process Integration
Technologies & Processes
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 7
RewinderSlot Die
coatingUnwinder 3m Dryers ps Laser Rotary
screen
printing
Ink Jet 3m Dryers ns Laser In-line
Optical
Metrology
(SE,
Raman)
Cooling
Inline Process Integration
Technologies & Processes
Measuring
Controlling
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 8
Unwinding cabinet
• Can receive rolls with core of 3 inch.
• Max diameter of 500 mm
• Max weight 50 kg
• Web width of 300 mm
• Automated forward and reverse movement of the web
• Speed of 1-20 m/min
• Tension control of the web within the range of 5-250 N.
Web Cleaning system
• Contact cleaning rollers for particles of >1μm diameter
Winding / Cleaning
Technologies & Processes
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 9
1st Printing
• Web surface activation with Plasma Treatment
Dryer 1
• 3 meter Dryers
• Hot air and heated nitrogen
• Temperatures up to 230°C
Inline Process Integration
Technologies & Processes
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 10
Slot die coating
Technologies & Processes
• Slot-die coating station compatible for
materials used in OEs
• Print solutions with viscosity range
of 10-1000 mPa·s
• The above range can lead to layer
thickness range of 10-1000nm
• Lateral accuracy of ±1%.
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 11
Laser Scribing/Patterning
• Picosecond laser for patterning OE materials
• 3 meters cabinets
• Tension and driving web control
• system ±100 μm of accuracy
Laser Patterning
Technologies & Processes
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 12
2nd Printing Station
• Rotary screen printing
• Coating width of 300mm
• Lateral accuracy ±5%.
Dryer 2
• 3 meters Dryers
• Hot air and heated nitrogen
• Temperatures up to 230°C
Rotary screen printing
Technologies & Processes
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 13
Inline Process Integration
Technologies & Processes
Inkjet station Inkjet station Trident System Coatema Software
Already integrated:
Fuji Dimatix
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 14
Module for the registration Camera
Technologies & Processes
Technical Specifications:
Measurement Accuracy =
+/-5 µm (t.b.d.)
ATEX proof
300 mm roller width
Web speed: 1-20 m/min;
Optimum speed is 3-20
m/min
PLC-driven correction
adjustment system
Module to be operated
under N2
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 15
Rewinding station
– The rewinding station has a retaining roller
– Identical specs to the unwinding station
• 3 inch core rolls.
• Automated forward and reverse movement of the web
• Speed of 1-20 m/min
– Tension control and Edge guide system
Lamination/delamination station
– Compatible with 300mm web width.
– Web Control with Edge guide system
– Lateral accuracy of ±100 μm / 20 µm
Encapsulation
Technologies & Processes
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 16
Inline Quality control
Technologies & Processes
Ellipsiometry and inline Raman by Horiba
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 17
Summary
Technologies & Processes
• 19 m in length
• 300 mm working width
• 30m/min per minutes production speed
• 3 print stations
• Plasma treatment
• 6.000 mm nitrogen dryers in 500 mm sections
• Registration control
• Laminating station
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 18
Nanoimprint Lithography
Technologies & Processes
27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 19
Ther
mal
NIL
• Thermoplastic substrate/ resin
• Long process time
• processing above TG
• Hard molds
• High imprint pressure
• one-component system
• High material shrinkage
Ult
ra V
iole
t
NIL
• UV-curable lacquer/ resin
• short process time
• processing at room temperature
• Hard or soft molds
• Low imprint pressure
• High replication resolution
• Low material shrinkage
Har
d m
old + wear behaviour
+ life time of replication mold
+ resolution Soft
mo
ld + imprint pressure
+ life time of master mold
+ flexibilty
R2R roll-to-roll R2P roll-to-plate P2P plate-to-plate
NIL Nano imprint lithography
Technologies & Processes
The leading producer of high-quality micro- and nanostructured products serving as key components for applications like lighting,
display, life science, solar technology and environmental engineering.
The market leader in coating, printing and laminating technology with more than 40 years of experience in providing the most advanced
scale-up solutions from lab to fab as well as state-of-art full production lines.
COMMON BRAND
The one stop shop solution for
nanoimprint technologies
Imprint tools
Chemicals & materials
Production lines
Processes & guaranties
UV - Nanoimprint Lithography
Nickel Imprint Mould
UV-Laquer
Substrate
Embossing and
Curing
Separation
Technologies & Processes
UV - Nanoimprint LithographyTechnologies & Processes
Field of Applications
Printed
Electronics
Solar
Optical Encoders
Micro Lens Arrays
Waveguides
Lightguides
OLED
3D Displays
Light Enhancement
AR Surfaces
Micro Fluidics
Micro Titer Plates
Cell Separation
Lotus
Moth Eye
Shark Skin
Gecko
Display Photonics
Live Science Bionics
UV - Nanoimprint Lithography
Display:
Flat screens are getting bigger, smart phones, watches and tablets become more and more compact.
Micro- and nanostructures offer energy-efficient and cost-effective solutions to meet the advanced new requirements of the display industry.
Optical components with sophisticated light management functionality are manufactured using roll-to-roll or roll-to-plate UV-Nanoimprint processes.
UV - Nanoimprint LithographyFIELD OF APPLICATIONS
Frontlight System in E-Reader
Head-up Display
Nanoimprinted light guide
in frontlight device
Imprint tools from temicon
Optical component in head-up
display from temicon
Field of Applications
UV - Nanoimprint Lithography
Solar:Micro- and nanostructures play an important role in photonics and electronics applications, especially for trapping, coupling or concentration of sunlight on crystalline, thin film or organic photovoltaic cells.
Microstructure technology makes PV technology more efficient and improves the energy yield.
UV - Nanoimprint LithographyFIELD OF APPLICATIONS
Tandem'cells'with'12%'Efficiency!!'
Periodic Sinusoidal structure
UV - Nanoimprint LithographyFIELD OF APPLICATIONS
Bionics:Customized microstructures are used to manipulate hydrophobic/hydrophilic surface characteristics (water-repellent or absorbing surfaces, Lotus effect) or oleo phobic surface characteristics (oil-repellent surfaces, anti-fingerprint).
Appropriate surface patterning can reduce wind resistance of airplanes, cars or wind turbines, imitating the “shark skin effect”, the “Gecko effect” or fish scales.
Such modifications allow to reduce frictional resistance, limit or enhance adhesion or induce bacterial resistant effects.
FIELD OF APPLICATIONS
UV - Nanoimprint Lithography
3
1
Unique periodic surface structures in various biological species
are responsible for their exceptional properties
Self-cleaning effect of plants
Anisotropic flow in rice leaves
Reduced drag/antifoulling on a shark’s skin
Antibacterial surface of the Collembola
Lupinus polyphyllos Rice‘s leave
Shark‘s skin Collembola
W. Barthlott, C. Neinhuis, Planta 202 (1997) 1
S. G. Lee, et. al, Adv. Funct. Mater. 23 (2013), 547
P. Ball, Nature 400 (1999) 507
J. Nickerl, et al., J. R. Soc. Interface 11 (2014) 20140619.
UV - Nanoimprint LithographyField of Applications
Life Science:Lab-on-Chip technology of microfluidic structures helps shortening development periods and make examinations more comfortable for patients.
Microfluidic elements such as channels or selectively structured surfaces are necessary to handle and define the volume of a liquid right from the very first drop.
UV - Nanoimprint LithographyField of Applications
Pathogen diagnostic lab-on-a-chip
Detection platform for flexible detection of
target DNA (e.g. bacteria DNA)
Continuous flow polymerase-chain reaction (PCR)
Mixing of DNA with the appropriate PCR reagents
Amplification of target DNA by rapid thermal cycling
Amplicon detection
-> Reagents must be adapted in terms of types,
concentration and mixture for certain targets
Prototype
Example Protocol
Multi-Layering
Reaction mixtur
167 µL HotStar Master Mix
16.7 µL Taqman Custom Assay
10 µL PEG 8000
3.3 μL H2O
3.3 μL 3% BSA
200 μL TOTAL
On-Chip Mix150 μL Reaction Mixture37.5 μL B. subtilis genomic
DNA (0.24 µg/mL)62.5 μL H2O
250 μL TOTAL
Rapid thermal cycling: Heater 1: 95.5°C, Heater 2: 60°C
Automated Protokoll: PCR takes 15 minutes
Field of Applications
UV - Nanoimprint Lithography
UV - Nanoimprint LithographyField of Applications
50 µm
Micro Pillars (Super-Hydrophobic Surfaces)
Bacterial Resistant Surfaces
200 µm
10 µm
10 µm
Shark Skin (Riblet)
50 µm
500 µm
Haptic Surfaces
10 µm
UV - Nanoimprint LithographyField of Applications
100 µm
Retroreflectors
500 nm
Diffractive Optical Elements
500 nm
Printed Electronics
2 µm
10 µm
Microfluidic Structures
UV - Nanoimprint LithographyField of Applications
Customized micro- and nanostructured
sleeves are exactly adapted for the
application in TEMICOAT UV-Nanoimprint
equipment.
The sleeves are made by different mastering
techniques and electroforming of nickel.
Next generation sleeves are seamless,
offering highest efficiency and new fields of
application
for patterned films.
UV - Nanoimprint LithographyImprint Tools
Upscaling tools
Classical Approach
New Approach
Structured nickel plate Welded sleeve with seam Final product with seamlines
Seamless structured
sleeve
Seamless sleeve on
imprint cylinder
Final product without seamlines
UV - Nanoimprint Lithography
Inference lithography
Motorized Cylinder Mirror Beamsplitter
Beam expander
New Approach
Laser Interference Lithography
UV - Nanoimprint Lithography
Classical Approach
UV - Lithography
Classical Approach Wafer based product line
Large format line
UV - Nanoimprint Lithography
UV - Lithography
New Approach
UV - Nanoimprint Lithography
The printing of micro- and nanostructures into a UV-
curing resin results into functional structures with high
quality and accuracy.
Formulation properties like viscosity, chemical resistivity,
environmental stability, scratch resistance and optical
behavior are designed to the customer’s requirements.
UV - Nanoimprint LithographyChemistry
We have developed a portfolio of +20 types ofUV-Lacquer with approved characteristics like
Perfect adhesion to a broad range of substrates
High transparency
Low shrinkage
Weather durability
Chemical resistance
Temperature stability up to + 220 C
UV stability
Scratch resistance
......
UV-Lacquers are a key part of our
know how
Ultimately it is the UV-Lacquer that
gives form, function and durability to
the nanostructure
UV - Nanoimprint LithographyChemistry
PMMA - Polymethylmethacrylat(Plexiglas)
PC - Polycarbonate
PET - Polyethylenterephthalat(Polyester)
PEN - Polyethylene Naphthalate
TAC - Triacetate
OPP - Orientated Polypropylene
TPU - Thermoplastic Polyurthane
Steel foil - Stainless steel
Paper
UV - Nanoimprint LithographyMaterials
TEMICOAT applies the deep expertise of Coatema in building high-
end coating, printing and laminating equipment for full production
lines as well as for the upscale from lab to fab.
The flexible platform strategy of R2R and R2P lines
with working widths between 100 mm and more than
1000 mm allows straightforward integration of UV-
Nanoimprint into inline processes.
UV - Nanoimprint Lithography
Tools for Lab2Fab
Tools for Lab2Fab
UV - Nanoimprint Lithography
UV - Nanoimprint Lithography
Tools for Lab2Fab - R2R
UV - Nanoimprint Lithography
Tools for Lab2Fab - R2P
UV - Nanoimprint Lithography
Tools for Lab2Fab - R2P
UV - Nanoimprint Lithography
Tools for Lab2Fab - R2R
TEMICOAT offers adjusted roll-to-roll and roll-to-plate UV-
Nanoimprint processes, including a final product guarantee.
UV - Nanoimprint Lithography
Process & Guarentees
COATEMA Coating Machinery GmbH
Roseller Str. 4
D-41539 Dormagen
021 33 / 97 84 – 0
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