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Instrumentation Errors in
Nano-Indentation
David J Munoz-Paniagua
Motivation
Ever increasing interest in microscopic machines demands a better understanding of the interactions of materials at sub-micron levels. This, combined with the fact that many technologically relevant materials are heterogeneous on a nanometer-micrometer length scale means that the study of the interactions of such materials requires the combination of reliable force measurements with imaging.
Topografiner -1972Scanning Tunnelling Microscope (STM) -1981Atomic Force Microscope (AFM) -1986Interfacial Force Microscope (IFM) -1991
Scanning probe microscopes have been around for a
number of years and are ideal for this task as they
provide a relatively inexpensive way to perform high
resolution imaging, can use different interactions as
their input signal and can be also used for
investigating the nano-mechanical properties of
materials.
at rest coming in contact
“snap-in”
Typical cantilever behaviour
compliance
during indentation
Distance
Force
4.
Indentation Sequence
2.
0. 1.Imaging
3.
5.
0
-5.5Distance
Fo
rce
Elastic
response
Onset of
plasticity
Elasto-Plastic
response
iii
iii
i) Work lost in plastic
deformation.
ii) Work recovered
elastically.
iii) Depth of residual
indent.
Where does the IFM force range fall?
1E-3 1E-6 1E-9 1E-12 1E-15
N
IFM
Casimir
Van der Waals
H bonds
Ionic bonds
Covalent bonds
DNA Stretching
Cell adhesion
Spin Flip
0 8µN
0
200
nm
1 2 3
Graham, J.F., McCague, C., Norton, P.R., Tribol. Lett. 6, 149 (1999)
IFM Nano-indentation of Alkyl ZDDP tribofilm on steel
(nm)
2 1 31 = 92 GPa
2 = 209 GPa
3 = 84 GPa
Distance [nm]
Force [µN]
0
5
10
15
20
25
0 5 10 15 20 25 30Distance [nm]
For
ce [
µN
]
400nm x 400nm
IFM Nano-indentation on Au ‹111›
78 GPa
IFM Nano-indentation on Kevlar12 x 12 µm2
core
skin
3 x 3 µm2
0
20
40
60
80
0 30 60 90 120
Distance [nm]
Forc
e [µ
N]
epoxy
62 GPa 13 GPa
2.5 GPa
Graham, J.F., McCague, C., Warren, O.L., Norton, P.R., Polymer 41, 4761 (2001)
0
10
20
30
40
50
20 nm
Force (µN)
Distance
Cleaved
7.8 GPa
Annealled
12.1 GPa
IFM Nano-indentation on PET
A SEM image of a tungsten
probe after indentation on
polyurethane.
-2
-1
0
1
2
3
4
5
6
0 50 100 150 200 250
Distance [nm]
Force [µN]
loading unloading
Indentation on polyurethane showing evidence of
transfer of material onto the probe.
IFM Nano-indentation on PU
b)
c)
a) Images taken on Polyurethane using TappingMode-IFM
a) 6µm×6µm Tapping Mode scan after a 3µm×3µm Contact Mode scan.
b) Same spot rotated by 90°. (6µm×6µm)
c) 9µm×9µm Tapping Mode scan after several Tapping Mode scans at 6µm×6µm.
Amplitude Phase
0
For
ce
Distance
23
21
*
3
4DREF =
max
max
A
FH =
*2 EA
dD
dFS
π==
compliancescanner DDD −=
Instrument Development
The closed loop stage design has been finalized and is been fabricated. This will give us sub-Åresolution on the distance axis.
Instrument DevelopmentCollaboration with Walied Moussa (U of A – Mech Eng)
Else Gallagher is working on the first batch of prototype sensors. The mask design has been finalized as of last week. Each wafer will contain roughly 200 sensors divided between 12 separate designs.
Instrument Development
We have proposed a sensor redesign that would allow us to monitor the system compliance in real time using our fibre interferometer.
Interferometry
Differential
Capacitance
Electrostatic
Feedback
4aF/√√√√Hz0.17µV/√√√√Hz
0
0
Force
Displacement
Hertz
0
0
Force
Displacement
Hertz
JKR
DMT
Fitting the approach curve
23
21
*
3
4DREF =
RDREF πγ23
423
21
* −=
*
2
*33*
2)(
83
4)(
E
a
R
aaD
EaR
aEF
πγ
γπα
−=
−=
0
0
Force
Displacement
Hertz
DMT
122
* 11−
−−
−=
i
i
s
s
EEE
νν
*2 EA
dh
dPS
π==
Oliver, W. C.; Pharr, G. M. Journal of Materials
Research 1992, 7, 1564.
Fitting the retraction curve1
22* 11
−
−−
−=
i
i
s
s
EEE
νν
iit CAE
CS
C +=+=π
β *2
11
Both parameters are determined via
nano-indentation experiments and are
interdependent. May not obtain a
unique solution.
max
max
A
FH =
Direct AFM determination of Tip Shape-Area function
Shape-area function
Description of a worn indenter
Cone
Cone + Sphere (floating)
Cone + Sphere (tangential)
Cone + Sphere (tangential + harmonic average)
Cone + Sphere (piecewise combination usingfiltering techniques)
Hyperboloid of revolution
The IFM
To God Almighty
P. R. Norton
L. L. Coatsworth
S. Tadayyon
C. M. McCague (SFU)
UWO Physics
Machine shop
UWO Chemistry
Electronics shop
M. T. McDermott
(NRC-NINT)
W. Moussa (UofA)
T. Veres (NRC-IMI)
J. Decker (NRC-INMS)
J. E. Houston (SNL)
R. Winter (SDSMT)
UofA NanoFab