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Institute of MechatronicsInstitute of Mechatronics,,Nanotechnology Nanotechnology and Vacuum Techniqueand Vacuum Technique
Koszalin University of Technology
TETRAHEDRAL AMORPHOUS CARBON FILMS:
DEPOSITION METHODS, PROPERTIES AND APPLICATIONS
Jan Walkowicz
Institute of Mechatronics, Institute of Mechatronics, NanotechnologyNanotechnologyand Vacuum Techniqueand Vacuum Technique
Koszalin University Koszalin University of Technologyof Technology
Vacuum and Plasma Surface Engineering VaPSE 2009, October 22 - 26, 2009 Hejnice, Czech Republic
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Scope of the presentation
2. Deposition methods and properties of ta-C films:- deposition mechanisms,- deposition methods,- correlation between growth conditions and properties.
3. Application of ta-C films:- data storage devices,- medical implants,- antiwear applications.
1. Introduction: - types of diamond like carbon (DLC),- tetrahedral amorphous carbon (ta-C).
4. Summary.
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Introduction
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Introduction
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Introduction
hydrogen-free amorphous carbon (a-C);
hydrogenated amorphous carbon (a-C:H);
tetrahedral hydrogen-free amorphous carbon (ta-C);
tetrahedral hydrogenated amorphous carbon (ta-C:H);
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Introduction
The Association of German Engineers, Report VDI 2840, 2006: classification and nomenclature for diamond-like-carbon (DLC) and diamond films
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Introduction
Comparison of major properties of amorphous carbon and reference materials [J. Robertson]Elastic properties of amorphous carbon and diamond [J. Robertson]
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
ion energy substrate
temperature
Deposition methods and properties of ta-C films
Subplantation model[J. Robertson]
penetration
direct
knock-on(atomicpeening)
relaxation
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
[J. Robertson]
Deposition methods and properties of ta-C films
the energy and velocity distribution of the species; the purity of the beam and nature of the species that
bombard the target; the ambient pressure during deposition.
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Deposition methods and properties of ta-C films
Plasma deposition Ion deposition Ion assisted sputtering
Sputtering Cathodic Vacuum Arc Laser ablation
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Deposition methods and properties of ta-C films
Ion depositionCathodic Vacuum Arc
Laser ablation
Mass-Selected Ion Beam Deposition (MSIBD)
Filtered Cathodic Vacuum Arc (FCVA)
Filtered Pulsed Arc Discharge (FPAD)
Pulsed DC-Arc-Process (PDCAP)
Pulsed laser deposition (PLD)
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
FCVA
Deposition methods and properties of ta-C films
Ion energy range 30-400 eVMax. sp3 content 90%Max. hardness 70 GpaMax. modulus 700 GPa
Max. stress 10 GPa
30 eV 400 eV
25 nm 100 nm
6 GPa 10 GPa
10 GPa
[M. Chhowalla]
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Deposition methods and properties of ta-C films
FCVA
75%
35%
50C 250C
110C 180C
[M. Chhowalla]
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
FCVA
FPAD
Deposition methods and properties of ta-C films
~250C
FCVA
75%
35%
50C 250C
[M. Chhowalla]
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Deposition methods and properties of ta-C films
1 eV
120 eV80 eV40 eV
1 eV 70 eV
monoenergetic beams with energies of 1-100 eV,
1 eV: a low-density film (mostly sp2 bonded atoms),
70 eV: the majority of the bulk atoms are sp3 bonded, the density is noticeably higher,
transition from sp2-rich to sp3-rich material occurs between 7 and 30 eV,
the main growth mechanism of ta-C is atomic peening (subplantation is not the primary mechanism).
[B. Zheng et al.] [N.A. Marks et al.]
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Deposition methods and properties of ta-C films
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Deposition methods and properties of ta-C filmsSubstrate temperature and ion
energy effect on the microstructure of carbon films produced using FCVA method
[D.W.M. Lau et al.]
average ion energy: 10 eV – 820 eV,
DC BIAS voltage: from -25 V to -800 V,
substrate temperature: from room temperature to 640C,
deposition rate: 0.15 – 0.4 nm/s
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Deposition methods and properties of ta-C films[D. Lau et al.]
vertically oriented
sp2 sheets(< 10 Ω/nm)
ta-C
sp3
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Deposition methods and properties of ta-C films
240C
[D. Lau et al.]
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Deposition methods and properties of ta-C films
440C
[D. Lau et al.]
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Deposition methods and properties of ta-C films
640C
[D. Lau et al.]
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Deposition methods and properties of ta-C films
Temperature induced oriented growth of sp2-rich material
ion energy 40 eV
ta-Con
diamondsubstrate
120atoms
deposited
200atoms
deposited
500atoms
deposited
[D. Lau et al.]
[M. B. Taylor et al.]
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Deposition methods and properties of ta-C films[D. Lau et al.]
ta-Clow stress ta-C
a-C
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Application of ta-C films
DLC coatings for magnetic storage
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Application of ta-C films
Damping of surface fluctuations through impact-induced downhill
currents
MD simulation of the impact of 4000 atoms
[C. Casiraghi et al.]
0.12
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Application of ta-C films
DLC coatings as biocompatible materials
Blood interfacing implants: minimal macrophage attachment, maximal albumin/fibrinogen adsorption ratio.
Load bearing implants: elimination of wear debris, good biomechanical performance.
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Ta-C a-C:H (CH4)
Albumin and fibrinogen adsorption Albumin/fibrinogen adsorption ratio
Macrophage morphology
Application of ta-C films
a-C:H (C2H2)
[W. J. Ma et al.]
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
High energy FPAD (6 kV/13 kA/15 μs/600 eV)
Load bearing implant(hip joint)
Application of ta-C films
[E. Alakoski et al.]
acetabular caps and femoral heads made of AISI 316L,
mechanically polished (roughness of 5-10nm),
40-100μm of ta-C (AD) deposited by FPAD,
15 million cycles on hip joint simulator according to ISO9225
Wear debris
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Application of ta-C films
DLC coatings for antiwear applications
Cutting and forming tools, automotive parts:
good hardness and adhesion,
good wear and corrosion resistance,
good high temperature toughness
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Application of ta-C films
Pulsed Arc Discharge on Carbon Target, 50 Adc / 1600 A, 300 µsec
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Running in process 0,5 0,15
Application of ta-C films
Pulsed Arc Discharge on Carbon Target, 50 Adc / 1600 A, 300 µsec
1000 1200 1400 1600 18000
1000
2000
3000
4000
1562
1391ID/I
G = 1,25
inte
nsity
[a.u
.]
Raman schift [cm-1]
Particle free region
1000 1200 1400 1600 18000
1000
2000
3000
4000
5000
ID/I
G = 1,22
1581
1495
1346
inte
nsity
[a.u
.]
Raman schift [cm-1]
Particle rich region
ta-C SHC
[W. Grimm][A. Czyżniewski]
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Application of ta-C films
Properties of SHC (ta-C) coatings [W. Grimm] Coating thickness < 2.0 µmHydrogen content without H2
Hardness:Nano-Intender, L=10 mN > 4000 HV0.001 ...5000 HV0.001
E-modulus > 450 GPaAdhesion on HSS, VHM HF1 (VDI3824)Structure ta-Csp3-content > 70% Wear coefficient:- calo, dry, WC-ball < 10-16 m3/Nm - with diamond emulsion < 10-15 m3/Nm- oscillating steel ball, dry < 10-16 m3/Nm Friction coefficient < 0.15
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Application of ta-C films
Toolsforpunching
Motor components
Drills
[W. Grimm]
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Application of ta-C films
ta-C coatings for hardmetal woodcutting tools
Developmental Project No. UDA-POIG.01.03.01-32-052/08-00: „Hybrid technologies for woodworking tools modification” within the Operational Programme Innovative Economy POIG 2007-2013
Cr/ta-CmonoCr/ta-Cmulti
[M. Hakovirta]
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Application of ta-C films
Developmental Project No. UDA-POIG.01.03.01-32-052/08-00: „Hybrid technologies for woodworking tools modification” within the Operational Programme Innovative Economy POIG 2007-2013
Cr/ta-CmonoCr/ta-Cmulti
[M. Hakovirta]
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Application of ta-C films
Developmental Project No. UDA-POIG.01.03.01-32-052/08-00: „Hybrid technologies for woodworking tools modification” within the Operational Programme Innovative Economy POIG 2007-2013
TiN/TiAlN 3,5 μm
Cr/ta-CmonoCr/ta-Cmulti
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
Summary
1. The specific properties that distinguish the ta-C films from other DLC coatings are:- the highest content of sp3 bonding,- the highest hardness and Young modulus,- the highest level of intrinsic stress,- the highest thermal stability
2. For deposition of ta-C films the stream of energetic carbon ions is necessary.
3. The main mechanisms of ta-C growth are subplantation and atomic peening.
4. The critical parameters in ta-C films deposition is ion energy and substrate temperature.
5. Depending on deposition method ta-C films can possess properties required in electronic, biomedical and anti-wear applications.
Institute of Mechatronics, Nanotechnology and Vacuum Technique
Koszalin University of Technology
References1. S. Aisenberg and R. Chabot, Journal of Applied Physics 42 (1971) 2953-2958.2. J. Robertson, Materials Science and Engineering R 37 (2002) 129-281.3. The Association of German Engineers, Report VDI 2840, 2006.4. Y. Lifshitz, Diamond and Related Materials 5 (1996) 388-400.5. M. Kamiya et al., Vacuum 83 (2009) 510–514.6. D. W. M. Lau et al., Journal of Applied Physics 105 (2009) 084302-1-6.7. D. W. M. Lau et al., Carbon 47 (2009) 3263–3270.8. V-M. Tiainen, Diamond & Related Materials 17 (2008) 2071–2074.9. M. B. Taylor et al., J. Phys.: Condens. Matter 21 (2009) 225003 (9pp).10. B. Zheng et al., Carbon 43 (2005) 1976–1983.11. M. Hakovirta et al., Diamond and Related Materials 4 (1995) 1335-1339.12. M. Chhowalla, Diamond and Related Materials 10 (2001) 1011-1016.13. J. Zhu et al., Vacuum 72 (2004) 285–290.14. V. N. Inkin et al., Diamond and Related Materials 10 (2001) 1003-1108.15. A. C. Ferrari et al., Diamond and Related Materials 11 (2002) 994-999.16. E. Alakoski et al., Diamond and Related Materials 12 (2003) 2115-2118.17. E. Alakoski et al., Diamond and Related Materials 15 (2006) 34-37.18. J. Filik, Spectroscopy Europe 17 (2005) 10-17.19. A. C. Ferrari and J. Robertson, Physical Review B 61 (2000) 14 095-14 107.20. A. C. Ferrari, Diamond and Related Materials 11 (2002) 1053-1061.21. C. Casiraghi et al., Materials Today 10 (2007) 44-53.22. C. Casiraghi et al., Diamond and Related Materials 14 (2005) 913-920.23. A. C. Ferrari, Surface and Coatings Technology 180 –181 (2004) 190–206.24. J. Robertson, Tribology International 36 (2003) 405–415.25. A. Grill, Diamond and Related Materials 12 (2003) 166–170.26. Q. Zhao et al. Journal of Colloid and Interface Science 280 (2004) 174-183.27. W. J. Ma et al. Biomaterials 28 (2007) 1620-1628.28. E. Alakoski et al., The Open Orthopaedics Journal, 2008, 2, 43-50.29. M. Hakovirta, Diamond and Related Materials 8 (1999) 1225–1228.30. M. G. Faga and L. Settineri, Surface and Coatings Technology 201 (2006) 3002–3007.
Acknowledgements:Publication part-financed by the European Union within the European Regional Development Fund
Institute of MechatronicsInstitute of Mechatronics,,Nanotechnology Nanotechnology and Vacuum Techniqueand Vacuum Technique
Koszalin University of Technology
Thank you for your attention!