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Influence of Solvent on Selective Deposition of Tungsten Oxide Nanostructures via AACVD Chris Blackman

Influence of Solvent on Selective Deposition of Tungsten Oxide Nanostructures via AACVD Chris Blackman

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Page 1: Influence of Solvent on Selective Deposition of Tungsten Oxide Nanostructures via AACVD Chris Blackman

Influence of Solvent on Selective Deposition of Tungsten Oxide Nanostructures via AACVD

Chris Blackman

Page 2: Influence of Solvent on Selective Deposition of Tungsten Oxide Nanostructures via AACVD Chris Blackman

Background

• The intrinsic properties of nanomaterials promise advances in a wide range of fields

• Vapour synthesis of nanomaterials – AACVD– Increased atom efficiency– Reduced waste production– Compatible with device manufacture– Scalable

• Synthesis often requires high temperatures– Device fabrication issues– Precursor design– Other factors?

Page 3: Influence of Solvent on Selective Deposition of Tungsten Oxide Nanostructures via AACVD Chris Blackman

Synthesis

W.B. Cross et al, Chem. Mater., 2003, 2786

• Precursor [W(OPh)6]

• Solvent– Acetone– Methanol– Toluene

• Substrate 400 °C – 600 °C• Carrier (N2) Flow 200 cm3/min

Page 4: Influence of Solvent on Selective Deposition of Tungsten Oxide Nanostructures via AACVD Chris Blackman

Toluene Solution Results

Y. Liu, M. Liu, Adv. Funct. Mater., 2005, 15

Page 5: Influence of Solvent on Selective Deposition of Tungsten Oxide Nanostructures via AACVD Chris Blackman

Acetone Solution Results

Page 6: Influence of Solvent on Selective Deposition of Tungsten Oxide Nanostructures via AACVD Chris Blackman

Factors Affecting Nanostructure Morphology

• Influence of evaporation time of aerosol droplets

• ‘Normal’ view is complete evaporation of droplet

• Incomplete evaporation can lead to formation of solid shell at droplet surface

• Less volatile toluene has lower probability of forming solid shell

Page 7: Influence of Solvent on Selective Deposition of Tungsten Oxide Nanostructures via AACVD Chris Blackman

Factors Affecting Nanostructure Morphology• Influence of reactant diffusion

– Principally dependent on precursor flux

Page 8: Influence of Solvent on Selective Deposition of Tungsten Oxide Nanostructures via AACVD Chris Blackman

• Addition of methanol causes dramatic reduction in temperature required for nanostructure formation

• Methanol is known to decompose via a radical mechanism at temperatures as low as 220 °C– Formation of more reactive intermediate, i.e. methanol

is not simply a ‘carrier’ solvent

• Formation of particles (homogeneous reaction) at increased temperatures indicates a different chemical species (intermediate) may be involved compared to toluene or acetone

Methanol-containing Solution Results

Page 9: Influence of Solvent on Selective Deposition of Tungsten Oxide Nanostructures via AACVD Chris Blackman

Conclusions• The use of different ‘carrier’ solvents influences

the nanostructure morphology obtained• Differences between acetone and toluene may be

related to:– Rate of droplet evaporation– Rate of reactant diffusion

• Difference found with methanol may be related to chemical interaction between solvent and precursor

Page 10: Influence of Solvent on Selective Deposition of Tungsten Oxide Nanostructures via AACVD Chris Blackman

Acknowledgements• Dr Stella Vargas• Mr Savio Moniz• Dr Polona Umek (Jozef Stefan Institute, Slovenia)