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GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu , Chris Chu Iowa State University Form ICCAD2009

GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

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Page 1: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

GREMA: Graph Reduction Based Efficient MaskAssignment for Double Patterning Technology

Yue Xu , Chris Chu Iowa State University

Form ICCAD2009

Page 2: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Outline

•Introduction•Problem formulation•Candidate Stitch generation•Mask assignment

▫Initial Mask assignment▫Generate of Flipping Graph▫Simplification of Flipping Graph▫ILP Formulation for Max Cut Problem

•Experimental Results

Page 3: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009
Page 4: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009
Page 5: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Double Patterning5

AB

CD

E

Layout Decomposition

mindp

Mask 2Mask 1

Stitch

Page 6: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009
Page 7: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

DPT decomposition methodology•1. model-based decomposition approach is

based on optical simulation => more accurate , but time-consuming

•2. rule-based approach slices and assigns patterns based on geometric relationship between patterns => efficiency

Page 8: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Outline

•Introduction•Problem formulation•Candidate Stitch generation•Mask assignment

▫Initial Mask assignment▫Generate of Flipping Graph▫Simplification of Flipping Graph▫ILP Formulation for Max Cut Problem

•Experimental Results

Page 9: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Problem formulation

•Given : circuit layout ,the minimum distance btw each patterns.

•Objective : minimize the patterns violating the minimum distance rule and the number of stitches

Page 10: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Overview( two stage approach )

Page 11: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Outline

•Introduction•Problem formulation•Candidate Stitch generation•Mask assignment

▫Initial Mask assignment▫Generate of Flipping Graph▫Simplification of Flipping Graph▫ILP Formulation for Max Cut Problem

•Experimental Results

Page 12: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Conflict Graph

A CB

L

Page 13: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Candidate Stitch generation

•The odd cycle in CG => infeasible•We can slice one node in the odd cycle <=

useful stitch•Some slicing may be unused. (i.e A -> B ->

L )•How to find a useful slicing node? => node

projection idea introduced in [11].•GREMA uses breadth first search (BFS) to

find odd cycles and choose all suitable candidate stitches.

Page 14: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009
Page 15: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Outline

•Introduction•Problem formulation•Candidate Stitch generation•Mask assignment

▫Initial Mask assignment▫Generate of Flipping Graph▫Simplification of Flipping Graph▫ILP Formulation for Max Cut Problem

•Experimental Results

Page 16: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Initial Mask assignment

•Cluster: conflict edge connected component.

•GREMA arbitrarily picks up a node in each cluster and denotes the node as cluster head.

•assign all of the cluster node to same partition.

Page 17: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Generate of Flipping Graph

•Abstract each cluster in DG into a single node.•Flipping of Ci and Cj : let the cluster heads of

Ci and Cj to be different partition (change which one?)

•Flipping gain▫Before flipping: Ns After flipping: Nd▫Flipping gain: Nd - Ns

Page 18: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Simplification of Flipping Graph•Case1: tree structure

Page 19: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Simplification of Flipping Graph

•Case 2: Serial Edge

Page 20: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Simplification of Flipping Graph

Page 21: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Simplification procedure

while( only exist two nodes or all of nodes have at least degree three )while( exist degree one node )detects all degree one node and remove itserial_edge_simplify()parellel_edge_simplify() while( exist degree one node )detects all degree one node and remove it

ILP_solve()

Page 22: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Example

Page 23: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

ILP Formulation for Max Cut Problem

Page 24: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009
Page 25: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Outline

•Introduction•Problem formulation•Candidate Stitch generation•Mask assignment

▫Initial Mask assignment▫Generate of Flipping Graph▫Simplification of Flipping Graph▫ILP Formulation for Max Cut Problem

•Experimental Results

Page 26: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009

Experimental Result

These benchmarks use cells from Artisan 90nm libraries with 140*0.4nm minimum spacing and 100*0.4nm minimum line width.

Page 27: GREMA: Graph Reduction Based Efficient Mask Assignment for Double Patterning Technology Yue Xu, Chris Chu Iowa State University Form ICCAD2009