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7/31/2019 Graphene - An Experimentalist's Perspective
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J. AppenzellerPurdue University & Birck Nanotechnology Center
West Lafayette, IN 47907
Purdue Summer School 2009, July 22
Graphene field-effect transistors
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The materials impact
a2
a1
One layer of graphite (graphene)- different from graphite
8
0
-8
kx
ky
( ) FE k v k=
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The materials impact
8
0
-8
kx
ky
Graphene is a gapless semiconductor
2 2 2
2( )
D lin
F
D E Ev
=
E
DOS
( ) FE k v k=
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Material BulkMobility
Bandgap EffectiveMass
cm2/Vs eV m*/mo
GaN 2,0004 3.475 0.25
Si 1,4001,3 1.121,2 0.191,2
Ge 3,9001,3 0.6611,2,3 0.0821,2
GaAs 8,5001,3 1.4241,2,3 0.0671,2,3
InGaAs 12,0006
0.747
0.0418
InAs 40,0001 0.3541,3 0.0231,3
InSb 70,0001,3 0.171,3 0.0141,3
1 Handbook Series on Semiconductor Parameters,Levinshtein et al., 1996.
2 Advanced Semiconductor Fundamentals, Pierret, 2003.3 Compound Semiconductor Bulk Materials and Characterizations,
Oda, 2007.
4 Private communication, T. Sands, 2009.5 Properties of Advanced Semiconductor Materials, Bougrov et al., 2001.
6 J.D. Oliver et al., J. Cryst. Growth, 54, 64 (1981).7 K.-H. Goetz et al., J Appl. Phys., 54, 4543 (1983).8 GaInAsP alloy semiconductors, John Wiley & Sons 1982.
The materials impact
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Material BulkMobility
Bandgap EffectiveMass
cm2/Vs eV m*/mo
GaN 2,0004 3.475 0.25
Si 1,4001,3 1.121,2 0.191,2
Ge 3,9001,3 0.6611,2,3 0.0821,2
GaAs 8,5001,3 1.4241,2,3 0.0671,2,3
InGaAs 12,0006
0.747
0.0418
InAs 40,0001 0.3541,3 0.0231,3
InSb 70,0001,3 0.171,3 0.0141,3
The materials impact
graphene 100,0009
0 09 cond-mat 0805.1830v1 2008.
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2
1d tot
I CL
The materials impact
2 2 *
dddelay
d scatt
totV L L m
I
C
=
*
gL m E const =Direct tunneling probability fromsource to drain (WKB) is constant if:
*
*
1 1
g
delay
g scscat tt at
m
m E E
=
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The materials impact
1delay
g scatt E
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The materials impact
1delay
g scatt E
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The quantum capacitanceimpact:
00 f
gf
0qox CC
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but there is more Cq
Cox
classical limit
quantum capacitance limit
oxtot CC
qtot CC
2~
L
CI totd
2~ L
I
VC
d
ddtot=
2~ L
I
VC
d
ddtot=
LCq ~
oxox t
LC ~
diffusive:
2~
tot
ox
LP C V
t =
2~
totP C V L =
Advantages of the quantum capacitance limit
ox qtottot
g ox q
C CQC e
C C
= =
+
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Graphene field-effect transistors
content not available at this time
Purdue Summer School 2009, July 22
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improved electrostatics allows toreduce the device length
bodyox body
ox
t t
=
Advantages of 1D / 2D
Nano allows for improvedelectrostatics
Graphene and graphene nanoribbons are ultra-thin body
devices with a tbody0.5nm
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Advantages of 1D / 2D
Advantages of graphene andgraphene nanoribbons
8
0
-8
kxky
300nm
reduced scattering
top-down approach
ultra-thin body
1:1 band movement
improved scaling
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Switching in graphene versus carbon nanotubes
The energy dependence of the
density of states is the key for
current modulation in G-FETs
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Graphene field-effect transistors
content not available at this time
Purdue Summer School 2009, July 22
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2
1
22ln 1 exp
gsBgs
B
eVek TeI V
h h k T
= + +
Source to drain through conduction band:
(1)
Note: In our calculations, we will consider only one kF-point.
All currents need to be multiplied by 2 for carbon nanotubes.
One-dimensional transport in the QCL limit
( ) ( ) ( )( )1 1 ,gs
D s
eV
I e dE D E v E f E T
=
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2
122 ln 1 exp
gsBgs
B
eVek TeI Vh h k T
= + +
Source to drain through conduction band:
2 2
2
22 2ln 1 exp
gsdsBds gs
B B
eVeVek Te eI V V
h h h k T k T
= +
Drain to source through conduction band:
(1) (2)
One-dimensional transport in the QCL limit
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One-dimensional transport in the QCL limit
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2 2
3
2 2 2
2 ln 1 exp
ds gs
gs dsB
B
g
B B
g
e e eI V V
h h h
eV eVek T
h k
E
T k T
E
T k
=
+ + +
Drain to source through valence band:
Source to drain through valence band:
2
4
22 2ln 1 exp
gsBgs
B
g
B
geVek Te e
I Vh h h k
EE
T k T
= + + +
(1) (2)
(3)(4)
One-dimensional transport in the QCL limit
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One-dimensional transport in the QCL limit
Contributions from I1 to I4
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2 2
3
2 2 2
2 ln 1 exp
ds gs
gs dsB
B
g
B B
g
e e eI V V
h h h
eV eVek T
h k
E
T k T
E
T k
=
+ + +
Drain to source through valence band:
Source to drain through valence band:
2
4
22 2ln 1 exp
gsBgs
B
g
B
geVek Te e
I Vh h h k
EE
T k T
= + + +
(1) (2)
(3)(4)
One-dimensional transport in the QCL limit
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One-dimensional transport in the QCL limit
Eg-dependence of output characteristics
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One-dimensional transport in the QCL limit
CNFET with Eg=0.1eV
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Graphene field-effect transistors
content not available at this time
Purdue Summer School 2009, July 22
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1D and 2D transport in the QCL limit
CNFET with Eg=0.1eV G-FET with Eg=0eV
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One-dimensional transport in the QCL limit
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( )21
tot g dss ThdC V
LVI V=
On the operation of different FETs
Silicon MOSFET (with gap)( )d gsQI V
[ ]1 ( , ) ( ,( )) ( ) sd D dVgs
fI e dE D E T f E T E v E =
Carbon nanotube FET (with gap)
[ ]( , ) ( , )dV
s dgs
f E T fI EE Td Graphene FET (without gap)
[ ]2 ( ) ( , ) ( ,( ) )Dd s dVgs
I e L dE v ED f EE T f E T =
2
( )Dd Vgs
D EI dE
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Silicon nanowire FET Carbon nanotube FET(with gap)
Graphene FET(without gap)
( )d gsQI V [ ]( , ) ( , )dV
s dgs
f E T fI EE Td
2( )Dd
VgsD EI dE
On the operation of different FETs
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The quantum capacitance
Large area graphene devices
for quantum capacitance
characterization
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Graphene field-effect transistors
content not available at this time
Purdue Summer School 2009, July 22
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Sample fabrication
AFM height: 0.4nm
1m
Single layer graphene through peeling
IEDM Technical Digest, 509 (2008)
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Graphene capacitance measurements
Similar Id-V
gsare obtained for single and multi-layer graphene
IEDM Technical Digest, 509 (2008)
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Graphene capacitance measurements
Cq ~ DOS
E
2 2
2graphene
F
EDOS
=
22
multi graphenemDOS
=
However, C-Vgs characteristics are very different
IEDM Technical Digest, 509 (2008)
G h i
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Graphene capacitance measurements
Including a trap capacitance contribution allows to
G h i
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Graphene capacitance measurements
extract the quantum capacitance Cq
IEDM Technical Digest, 509 (2008)
G h i
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Graphene capacitance measurements
Scaled graphene devices will operate in the QCL!
Cox (2nm Al2O3)
G h bilit
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Graphene mobility
Intrinsic and extrinsic
contributions in graphene
devices
G h d i h t i ti
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Graphene device characteristics
short channel characteristics long channel characteristics
mobility extraction from gm
carrier concentration in gm- region: ns~1012cm-3
G h d i h t i ti
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2
0
ds m ox
gs ox ds ds r
I g dL
V C V WV
L
= =
Graphene device characteristics
Mobility decreaseis evidence of
transition into the
ballistic transport
regime
G h d i h t i ti
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( )1 ) (ox oxgs th ds gs th injC CI V V V VL L
VL L
= = +
0
L
L
=
+
Graphene device characteristics
( )0 ( )ds oxball gs th injball
V CI L V V
R L
= =
G h d i h t i ti
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Graphene device characteristics
Graphene de ice characteristics
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Graphene device characteristics
00 /(1 )
caLL L
R
= +
+ +
300c
R m=
( )o gs thox
Wa V Vd
=
300nm =
IEDM Technical Digest, 509 (2008)
Summary
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Summary
Graphene devices can operate in thequantum capacitance regime
Graphene offers a number of intrinsicmaterials related properties that makeit particularly suited for electronic applications
Contact effects need to be considered ingraphene even in the absence of a bandgap