Graphene - An Experimentalist's Perspective

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    J. AppenzellerPurdue University & Birck Nanotechnology Center

    West Lafayette, IN 47907

    Purdue Summer School 2009, July 22

    Graphene field-effect transistors

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    The materials impact

    a2

    a1

    One layer of graphite (graphene)- different from graphite

    8

    0

    -8

    kx

    ky

    ( ) FE k v k=

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    The materials impact

    8

    0

    -8

    kx

    ky

    Graphene is a gapless semiconductor

    2 2 2

    2( )

    D lin

    F

    D E Ev

    =

    E

    DOS

    ( ) FE k v k=

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    Material BulkMobility

    Bandgap EffectiveMass

    cm2/Vs eV m*/mo

    GaN 2,0004 3.475 0.25

    Si 1,4001,3 1.121,2 0.191,2

    Ge 3,9001,3 0.6611,2,3 0.0821,2

    GaAs 8,5001,3 1.4241,2,3 0.0671,2,3

    InGaAs 12,0006

    0.747

    0.0418

    InAs 40,0001 0.3541,3 0.0231,3

    InSb 70,0001,3 0.171,3 0.0141,3

    1 Handbook Series on Semiconductor Parameters,Levinshtein et al., 1996.

    2 Advanced Semiconductor Fundamentals, Pierret, 2003.3 Compound Semiconductor Bulk Materials and Characterizations,

    Oda, 2007.

    4 Private communication, T. Sands, 2009.5 Properties of Advanced Semiconductor Materials, Bougrov et al., 2001.

    6 J.D. Oliver et al., J. Cryst. Growth, 54, 64 (1981).7 K.-H. Goetz et al., J Appl. Phys., 54, 4543 (1983).8 GaInAsP alloy semiconductors, John Wiley & Sons 1982.

    The materials impact

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    Material BulkMobility

    Bandgap EffectiveMass

    cm2/Vs eV m*/mo

    GaN 2,0004 3.475 0.25

    Si 1,4001,3 1.121,2 0.191,2

    Ge 3,9001,3 0.6611,2,3 0.0821,2

    GaAs 8,5001,3 1.4241,2,3 0.0671,2,3

    InGaAs 12,0006

    0.747

    0.0418

    InAs 40,0001 0.3541,3 0.0231,3

    InSb 70,0001,3 0.171,3 0.0141,3

    The materials impact

    graphene 100,0009

    0 09 cond-mat 0805.1830v1 2008.

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    2

    1d tot

    I CL

    The materials impact

    2 2 *

    dddelay

    d scatt

    totV L L m

    I

    C

    =

    *

    gL m E const =Direct tunneling probability fromsource to drain (WKB) is constant if:

    *

    *

    1 1

    g

    delay

    g scscat tt at

    m

    m E E

    =

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    The materials impact

    1delay

    g scatt E

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    The materials impact

    1delay

    g scatt E

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    The quantum capacitanceimpact:

    00 f

    gf

    0qox CC

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    but there is more Cq

    Cox

    classical limit

    quantum capacitance limit

    oxtot CC

    qtot CC

    2~

    L

    CI totd

    2~ L

    I

    VC

    d

    ddtot=

    2~ L

    I

    VC

    d

    ddtot=

    LCq ~

    oxox t

    LC ~

    diffusive:

    2~

    tot

    ox

    LP C V

    t =

    2~

    totP C V L =

    Advantages of the quantum capacitance limit

    ox qtottot

    g ox q

    C CQC e

    C C

    = =

    +

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    Graphene field-effect transistors

    content not available at this time

    Purdue Summer School 2009, July 22

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    improved electrostatics allows toreduce the device length

    bodyox body

    ox

    t t

    =

    Advantages of 1D / 2D

    Nano allows for improvedelectrostatics

    Graphene and graphene nanoribbons are ultra-thin body

    devices with a tbody0.5nm

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    Advantages of 1D / 2D

    Advantages of graphene andgraphene nanoribbons

    8

    0

    -8

    kxky

    300nm

    reduced scattering

    top-down approach

    ultra-thin body

    1:1 band movement

    improved scaling

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    Switching in graphene versus carbon nanotubes

    The energy dependence of the

    density of states is the key for

    current modulation in G-FETs

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    Graphene field-effect transistors

    content not available at this time

    Purdue Summer School 2009, July 22

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    2

    1

    22ln 1 exp

    gsBgs

    B

    eVek TeI V

    h h k T

    = + +

    Source to drain through conduction band:

    (1)

    Note: In our calculations, we will consider only one kF-point.

    All currents need to be multiplied by 2 for carbon nanotubes.

    One-dimensional transport in the QCL limit

    ( ) ( ) ( )( )1 1 ,gs

    D s

    eV

    I e dE D E v E f E T

    =

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    2

    122 ln 1 exp

    gsBgs

    B

    eVek TeI Vh h k T

    = + +

    Source to drain through conduction band:

    2 2

    2

    22 2ln 1 exp

    gsdsBds gs

    B B

    eVeVek Te eI V V

    h h h k T k T

    = +

    Drain to source through conduction band:

    (1) (2)

    One-dimensional transport in the QCL limit

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    One-dimensional transport in the QCL limit

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    2 2

    3

    2 2 2

    2 ln 1 exp

    ds gs

    gs dsB

    B

    g

    B B

    g

    e e eI V V

    h h h

    eV eVek T

    h k

    E

    T k T

    E

    T k

    =

    + + +

    Drain to source through valence band:

    Source to drain through valence band:

    2

    4

    22 2ln 1 exp

    gsBgs

    B

    g

    B

    geVek Te e

    I Vh h h k

    EE

    T k T

    = + + +

    (1) (2)

    (3)(4)

    One-dimensional transport in the QCL limit

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    One-dimensional transport in the QCL limit

    Contributions from I1 to I4

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    2 2

    3

    2 2 2

    2 ln 1 exp

    ds gs

    gs dsB

    B

    g

    B B

    g

    e e eI V V

    h h h

    eV eVek T

    h k

    E

    T k T

    E

    T k

    =

    + + +

    Drain to source through valence band:

    Source to drain through valence band:

    2

    4

    22 2ln 1 exp

    gsBgs

    B

    g

    B

    geVek Te e

    I Vh h h k

    EE

    T k T

    = + + +

    (1) (2)

    (3)(4)

    One-dimensional transport in the QCL limit

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    One-dimensional transport in the QCL limit

    Eg-dependence of output characteristics

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    One-dimensional transport in the QCL limit

    CNFET with Eg=0.1eV

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    Graphene field-effect transistors

    content not available at this time

    Purdue Summer School 2009, July 22

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    1D and 2D transport in the QCL limit

    CNFET with Eg=0.1eV G-FET with Eg=0eV

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    One-dimensional transport in the QCL limit

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    ( )21

    tot g dss ThdC V

    LVI V=

    On the operation of different FETs

    Silicon MOSFET (with gap)( )d gsQI V

    [ ]1 ( , ) ( ,( )) ( ) sd D dVgs

    fI e dE D E T f E T E v E =

    Carbon nanotube FET (with gap)

    [ ]( , ) ( , )dV

    s dgs

    f E T fI EE Td Graphene FET (without gap)

    [ ]2 ( ) ( , ) ( ,( ) )Dd s dVgs

    I e L dE v ED f EE T f E T =

    2

    ( )Dd Vgs

    D EI dE

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    Silicon nanowire FET Carbon nanotube FET(with gap)

    Graphene FET(without gap)

    ( )d gsQI V [ ]( , ) ( , )dV

    s dgs

    f E T fI EE Td

    2( )Dd

    VgsD EI dE

    On the operation of different FETs

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    The quantum capacitance

    Large area graphene devices

    for quantum capacitance

    characterization

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    Graphene field-effect transistors

    content not available at this time

    Purdue Summer School 2009, July 22

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    Sample fabrication

    AFM height: 0.4nm

    1m

    Single layer graphene through peeling

    IEDM Technical Digest, 509 (2008)

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    Graphene capacitance measurements

    Similar Id-V

    gsare obtained for single and multi-layer graphene

    IEDM Technical Digest, 509 (2008)

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    Graphene capacitance measurements

    Cq ~ DOS

    E

    2 2

    2graphene

    F

    EDOS

    =

    22

    multi graphenemDOS

    =

    However, C-Vgs characteristics are very different

    IEDM Technical Digest, 509 (2008)

    G h i

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    Graphene capacitance measurements

    Including a trap capacitance contribution allows to

    G h i

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    Graphene capacitance measurements

    extract the quantum capacitance Cq

    IEDM Technical Digest, 509 (2008)

    G h i

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    Graphene capacitance measurements

    Scaled graphene devices will operate in the QCL!

    Cox (2nm Al2O3)

    G h bilit

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    Graphene mobility

    Intrinsic and extrinsic

    contributions in graphene

    devices

    G h d i h t i ti

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    Graphene device characteristics

    short channel characteristics long channel characteristics

    mobility extraction from gm

    carrier concentration in gm- region: ns~1012cm-3

    G h d i h t i ti

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    2

    0

    ds m ox

    gs ox ds ds r

    I g dL

    V C V WV

    L

    = =

    Graphene device characteristics

    Mobility decreaseis evidence of

    transition into the

    ballistic transport

    regime

    G h d i h t i ti

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    ( )1 ) (ox oxgs th ds gs th injC CI V V V VL L

    VL L

    = = +

    0

    L

    L

    =

    +

    Graphene device characteristics

    ( )0 ( )ds oxball gs th injball

    V CI L V V

    R L

    = =

    G h d i h t i ti

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    Graphene device characteristics

    Graphene de ice characteristics

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    Graphene device characteristics

    00 /(1 )

    caLL L

    R

    = +

    + +

    300c

    R m=

    ( )o gs thox

    Wa V Vd

    =

    300nm =

    IEDM Technical Digest, 509 (2008)

    Summary

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    Summary

    Graphene devices can operate in thequantum capacitance regime

    Graphene offers a number of intrinsicmaterials related properties that makeit particularly suited for electronic applications

    Contact effects need to be considered ingraphene even in the absence of a bandgap