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Global Leader in ALD on Particles ALD Nano adds IP in Japan and the US to its portfolio, validates commercial scale continuous particle ALD equipment, and announces speakers and open house for the ALD 2017 conference. We also have an update on the number of football fields the company has effectively coated with ALD thin films! Tap the buttons, links and images below to learn more about each story. ALD 2017 Conference ALD Nano Enews Archive Notice of Allowance in Japan for Coating Supercapacitor Materials The company continues to add IP to its strong position in the energy storage sector with a notice of allowance issued by the Japan Patent Office to coat pseudo capacitor materials using atomic layer deposition (ALD) techniques. These materials provide much greater energy density than traditional capacitor designs and include ceramic and other materials such as vanadia, titania, etc. By allowing for electrosorption and redox reactions that include intercalation processes to create pseudocapacitance, these materials act more like a battery than a traditional capacitor. Essentially, electrochemical energy is stored in a pseudocapacitor instead of electrical energy on the surface of a capacitor. ALD Nano's patent is formally identified as the "Japanese Patent Application No. 2014- 541280 based on PCT/US2012/064261, The Regents of the University of Colorado a Body Corporate & Renssalaer Polytechnic Institute, Supercapacitor Devices Having Composite Electrodes Formed by Depositing Metal Oxide Pseudo Capacitor Materials Onto Carbon Substrates.” Various research groups and companies globally are developing supercapacitors to be part of the solution for energy storage challenges and ALD coatings

Global Leader in ALD on Particles · Global Leader in ALD on Particles ALD Nano adds IP in Japan and the US to its portfolio, validates commercial ... using atom ic layer deposition

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Page 1: Global Leader in ALD on Particles · Global Leader in ALD on Particles ALD Nano adds IP in Japan and the US to its portfolio, validates commercial ... using atom ic layer deposition

Global Leader in ALD on Particles

ALD Nano adds IP in Japan and the US to its portfolio, validates commercial­scale continuous particle ALD equipment, and announces speakers and openhouse for the ALD 2017 conference. We also have an update on the number offootball fields the company has effectively coated with ALD thin films! Tap thebuttons, links and images below to learn more about each story.

ALD 2017 Conference ALD Nano Enews Archive

Notice of Allowance in Japan for Coating Supercapacitor Materials

The company continues to add IP to its strong position in the energy storage sector with anotice of allowance issued by the Japan Patent Office to coat pseudo capacitor materialsusing atomic layer deposition (ALD) techniques. These materials provide much greaterenergy density than traditional capacitor designs and include ceramic and other materialssuch as vanadia, titania, etc. By allowing for electrosorption and redox reactions thatinclude intercalation processes to create pseudocapacitance, these materials act more likea battery than a traditional capacitor. Essentially, electrochemical energy is stored in apseudocapacitor instead of electrical energy on the surface of a capacitor. ALD Nano's patent is formally identified as the "Japanese Patent Application No. 2014-541280 based on PCT/US2012/064261, The Regents of the University of Colorado a BodyCorporate & Renssalaer Polytechnic Institute, Supercapacitor Devices Having CompositeElectrodes Formed by Depositing Metal Oxide Pseudo Capacitor Materials Onto CarbonSubstrates.”  Various research groups and companies globally are developingsupercapacitors to be part of the solution for energy storage challenges and ALD coatings

Page 2: Global Leader in ALD on Particles · Global Leader in ALD on Particles ALD Nano adds IP in Japan and the US to its portfolio, validates commercial ... using atom ic layer deposition

can enhance this energy storage technology.  Along with double-layer capacitors,pseudocapacitors are a type of supercapacitor and can have orders of magnitude morecapacitance than double-layer capacitors.  The image above  this story compares apseudocapacitor to a double-layer capacitor and a lithium ion battery.

Patent Issues in the US for Coating Flexible Electronics

The markets for smart devices, televisions and other consumer and industrial electronicsare demanding flexible versions of many traditional devices.  Companies such asSamsung, LG and others are commercializing organic light emitting diodes (OLEDs) foruse in displays of these electrical devices and solutions are being developed by Corning,3M and companies in the ALD industry.  Corning is developing a flexible version of its“Gorilla Glass” but other companies are creating organic-based materials of  very flexiblesubstrates for mounting electronic circuits and optical materials such as OLEDs.  Suchorganic materials benefit from encapsulation with certain types of thin films.  The mostprecise films are those deposited by ALD and molecular layer deposition (MLD)techniques. Recently, a new patent was issued to ALD Nano by the US Patent & Trademark Officetitled, "US Patent Issued May 23, 2017: US 9,660,205 Re: Protective Coatings for OrganicElectronic Devices Made Using Atomic Layer Deposition and Molecular Layer DepositionTechniques.” ALD Nano is developing collaborations with other companies to create roll-to-roll (R2R) coating reactors for application of ALD or MLD thin films on organic substratesfor use as water purification membranes, battery separators, and flexible electronics orOLED displays.  This work enhances the company’s position in the energy storage andother fields where it is already establishing global leadership for ALD on particles; and, itdraws from past R2R research at CU Boulder and recent particle ALD spatial reactorequipment development.

Page 3: Global Leader in ALD on Particles · Global Leader in ALD on Particles ALD Nano adds IP in Japan and the US to its portfolio, validates commercial ... using atom ic layer deposition

ALD Nano Now Coats Tons of Particles Per Day

This month, the company  announced  commercial-scale validation of its continuousALD reactor system equipment for particles in support of two global materials companies.The scientific and engineering teams at ALD Nano have spent considerable resourcesover the past few years developing this first-of-its-kind technology from research scale tothe current commercial-scale systems. Filings for IP have been made by the company inmultiple jurisdictions for this equipment dubbed continuous vibrating reactor or CVR. ALDcoating capacity is more than three tons per day and 1,200 tons per year of particlematerials. The CVR is a spatial ALD reactor system and can also be utilized for MLDtechniques, run at atmospheric or pressurized conditions, and fitted with various featuressuch as plasma. System benefits include very low cost ALD and MLD coating of particleswith applications ranging from pharma to 3D printing to energy storage materials. Thecompany is already designing the next larger size of this equipment and is only offering thistechnology to its ALD and MLD enabled materials solution customers.

CU Boulder and ALD Nano Presenters at ALD 2017 and Open House

The international ALD conference is being held in Denver, Colorado this year. This premierevent will be  right in the backyard of ALD Nano and the University of Colorado Boulder,home to ALD on particles.  Personnel from the company and university are involved inmore than a dozen presentations at the conference and a list of talks can be found at theALD Nano website or by clicking on the ALD 2017 image above this story. The company isproud to be a platinum level sponsor for the event and will be hosting a private openhouse at its facility in Broomfield, Colorado on Sunday, July 16th starting at 4pm. This openhouse  is limited to existing and potential customers and research collaborators with freeshuttles available from the conference hotel to the ALD Nano facility (and back again)starting at 3:30pm. If you have not received an invitation to this event please contact us at

Page 4: Global Leader in ALD on Particles · Global Leader in ALD on Particles ALD Nano adds IP in Japan and the US to its portfolio, validates commercial ... using atom ic layer deposition

[email protected] and we will add you to the list and provide additionaldetails. Locally brewed beverages, tasty food, great conversation, and networking alongwith a facility tour are all part of the fun. Also, plan to stop by our booth at the expo andregister for a chance to win an iPad Mini.

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