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Group Meeting Presentation
12/02/2010Continuous flow reactors for
gas/liquid chemical processes
Graham Sandford
Department of Chemistry, Durham University
1
Durham
Rob Spink
Darren Holling
Jelena Trmcic
Takashi Nakano
Mark Fox
Chris McPake
Jess Breen
Prof. Richard D. Chambers
Funding
BNFL
DU Quota
Asahi Glass Co. (Japan)
Asahi Glass Co. (Japan)
Crystal Faraday / EPSRC Partnership
AWE CASE
Pfizer CASE
Flow Chemistry Projects : 1995 - present
Organofluorine Chemistry
Fluorine may effect physiological properties of molecules
Commercially very valuable for life-science products
N
O
N
FOH
O
NH
Ciprofloxacin (Bayer)
CF3
O NH
CH3
Prozac (Eli Lilley)
N
N
F
O
H
O
H
5-FU (anti-cancer)
How do we introduce fluorine into organic systems ?
2
Carbon-Fluorine bond formation
3
Nucleophilic Fluorinating agents
Electrophilic fluorinating agents
C XF
C F
X = leaving group
C HF
C F
For large scale low-cost manufacture
HFN
SF3
KF Et4NF Et3N.3HF etc.
etc.F2
N
N
CH2Cl
F
2 BF4N
F
BF4
HF KF F2
Selective Direct Fluorination – Use of F2
F2 is now a viable reagent for synthetic organic chemistry
Replacement of Hydrogen by Fluorine
Reviews
• S.T. Purrington and B.S. Kagen, Chem Rev., 1986, 86, 997.
• R.J. Lagow and J.L. Margrave, Prog. Inorg Chem., 1979, 26, 161.
• J. Hutchinson and G. Sandford, Top. Curr. Chem., 1997, 193, 1.
• G. Sandford, J. Fluorine Chem., 2007, 128, 90.
C H
F2
C F
4
Problems with using F2
Heat of Reaction
Require : efficient coolingdilute F2 in N2
polar (MeCN) or acidic (HCOOH) reaction media
Possibility of aerosol formation
Safety on a large scale ?
C H + F2 C F
H = - 430 kJmol-1
+ HF
5
Selective direct fluorination – batch process
Direct fluorination of b-ketoesters first carried out at Durham on 1 g scale
Industrial Application
Scale-up to 100s kg within 5 years for pharmaceutical production
Adapt to a continuous flow process on the industrial scale ??
OO
OEt
OO
OEt
F
(76%)10% F2 in N2
HCOOH, 5 - 10oC
NN
NN N
OH
F
F
F
V oriconazoleanti-fungal agentPfizer
OO
OMe
OO
OMe
F
10% F2 in N2
HCOOH, 5 - 10oC
6
Pfizer, OPRD, 2001, 5, 28
Tetrahedron, 1996, 52, 1
Flow reactors for Direct Fluorination
Potential advantages:
Low inventories of F2 in contact with reagents gives increased safety
Efficient mixing across phase boundary (gas/liquid)
More efficient heat exchange
Large surface/volume ratio gives excellent gas/liquid interface
‘Scale-out’ rather than scale up
Good manufacturing practice (GMP) – lab. conditions are the same as
the commercial plant
7
Single Channel Gas/Liquid Flow reactor
• Single groove cut into the surface of a nickel block (0.5 mm wide; 10 cm long)
• Kel-F viewing window
• Top-plate
• Reagents introduced via tubes cut through viewing plate
• Coolant channels through nickel block
Chem. Commun., 1999, 883 8
Single Channel Gas/Liquid Flow reactor
Chem. Commun., 1999, 883
Substrate
inlet
F2/N2
inletProduct
outlet
Cooling
coils
Substrate
inletF2/N2
inlet
Product
outlet
9
Gas/Liquid ‘pipe flow’
Gas
Liquid
Direction of flow
Direction of flow
• ‘Plug flow’ not observed
• ‘Pipe flow’ permits maximum phase interface
10
Selective fluorination – 1,3-Dicarbonyls
11Lab. Chip, 2001, 1, 132;
OEt
O O 10% F2 in N2, f low
HCO2H, 0 - 5oC OEt
O O
OEt
O O
OEt
O O
F F F
F
F
+ +
71% 12% 3%
Difluorination observed but mono-fluorinated product separated and purified
Lab Chip, 2005, 5, 1132
O O
F
O
OEt
O
F
78%
76%
OEt
O O
F Cl
74%
O
O O
F
83%
OEt
O O
F
68%
O O
F
76%
O O
F
91%
O O
F Cl
86%
Selective fluorination – 1,3-Dicarbonyls
12Chem. Eng. Tech, 2005, 28, 344
Fluorination of diethyl malonate gives mixtures
Meldrum’s acid preferred
10% F2 in N2, f low
MeCN, 0 - 5oCO O
O O
O O
O O
F
O O
O O
O O
O O
O O
O OF
F
F F
2% 11%
46% 16%
+ others
10% F2 in N2, f low
MeCN, 0 - 5oCO O
O O
O O
O O
O O
O O
F F F
+EtOH
work-up
O O
O O
F
O O
O O
F F89%, 2 : 1
+
(quantitative)
Selective fluorination - Aromatics
13
1,4-Disubstituted aromatic systems
Lab. Chip, 2001, 1, 132
10% F2 in N2, f low
HCO2H, 0 - 5oC
OCH3
NO2
OCH3
NO2
OCH3
NO2
F F F
+ + others
77% 11%
Mono-fluorinated product separated and purified
OCH3
F
CN
74%
OH
F
NO2
71%
CH3
F
CN
75%
OCH3
F
CHO
82%
Alternative to multi-step Balz-Schiemann processes
Selective fluorination - Aromatics
14
10% F2 in N2, f low
HCO2H, 0 - 5oC
CH3
NO2
NO2
CH3
NO2
NO2
F
(70%)
OCH3
NO2
NO2
F
79%
Cl
NO2
NO2
F
57%
F
NO2
NO2
F
62%
J. Fluorine Chem, 2007, 28, 29
Deactivated 1,3-disubstituted aromatic systems
Gas/liquid – liquid/liquid processes
15
Sequential fluorination-cyclisation for fluoropyrazole formation
Gas/liquid Oxidation using HOF
16
F2 can be used to ‘enable’ other difficult transformations such as oxidation processes
F2 + H2O HOF.MeCNMeCN
HOF.MeCN complex half life of ~3 h at rt
Extremely powerful oxygen transfer agent
Many oxidation reactions possible
No heavy metal by-products
S. Rozen, J. Org. Chem., 1992, 57, 7342
S. Rozen, Eur. J. Org. Chem. 2005, 2433
MeOOC
MeOOC
COOMe
COOMe
HOF.MeCN
1 min, rt
(80%)
MeOOC
MeOOC
COOMe
COOMeO
No reaction using DMDO or H2O2
Difficult to scale up in batch processes due to instability
Gas/liquid Oxidation using HOF
17
Can we synthesise and use HOF.MeCN in one continuous flow process ?
Collectproduct
HOF.MeCN
Substrate
F2 in N2
H2O, MeCN
Gas/liquid – liquid/liquid sequential flow reaction
Low inventory of HOF.MeCN : Safer process
Gas/liquid Oxidation using HOF
1818
Continuous flow oxidation using in situ generated HOF.MeCN
Applicable to large scale synthesis using continuous flow techniques
Gas/liquid Oxidation using HOF
19
Conditions
• Alkene - 2.0 mmol h-1
• HOF.MeCN - 2.0 mmol h-1
• Run time - 60 mins @ rt
• Reaction path length - 30 cm
• Yields calculated using 1H NMR
Tetrahedron Lett., 2009, 50, 1674
Gas/liquid Oxidation using HOF
20Chim. Oggi. 2010, 28, 3
Gas/liquid Oxidation using HOF
21
F
F
F
NH2
F
F
F
F
F
NO2
F
F
F2 in N2, H2O, MeCN
r.t.
Cont inuous f low
Flow rates:
10% F2 in N2 (4.8 mmol h-1)
H2O in MeCN (166 mmol h-1)
amine (2.0 mmol h-1)
73%
CF3
F
F
NO2
F
F
Br
F
Br
NO2
F
F
Br
F
F
NO2
F
F
40% 62% 51%
NO2
61%
F
NO2
F
F
F
NO2
F
F
61%
74%
NO2
61%
F
F
F
NO2
59%
F
F
Scale-out to 3-channels
• A nickel plate with three grooves/channels etched into the surface
• Viewing and top plates
Lab Chip, 2001, 1, 132 22
Scale-out challenges
• Difficult integration of microchannels supplied from one feed-stock
• No pre-cooling of gas or liquid substrates
• Uniform supply of feedstocks to channels
• Simple design for daily production and maintenance
23
Multi-channel reactor concept
Base block fitted
with ‘reservoir’ holes
Channel plate
Top plate
Substrate
inlets
Product
outlet
‘Slots’ to allow fluids from
reservoirs to channels
24Lab. Chip, 2005, 5, 191
Multi-channel reactor – base block
• Machined Stainless steel
• 3 reservoirs for substrates
and product collection
• Slits leading from reservoirs
to top of the plate
• Screw and cooling channel fittings
25
Multi-channel reactor – channel plates
• 0.5 mm thick stainless steel
• 0.5 mm wide channels
• Number of channels per plate as
required
• Fitted with crew holes to attach to base
block
9-channel plate
27 channel plate
26
Multi-channel reactor – Final design
• External cooling of stainless steel
block
• Sealing gaskets
• Various multi-channel plates (3, 9,
27 channels)
• Kel-F sealing plate for observation
• Mounted vertically
27
Multi-channel reactor - operation
28Lab. Chip, 2005, 5, 191
Multi-channel reactor – fluorination
OO
OEt
OO
OEt
F
F2/N2 (v:v)
HCO2H
8-10oC
0.5 mlh-1ch-1 (1.8 mmolh-1ch-1)
16.2 mmolh-1 (2.11gh-1)
10 mlmin-1ch-1
10% F2 in N2 83% conv. 87% yield
20% F2 in N2 93% conv. 94% yield
• Approx. 2 g product per channel per hour
29Lab. Chip, 2005, 5, 191
Multi-channel reactor - operation
• Inexpensive to construct using standard machine shop techniques
• Easy to maintain and replace corroded plates – F2 is corrosive !
• Versatile – ready interchange of channel plates (£2 per plate)
• Ability to synthesise useful amounts of product (100 g overnight)
• Better performance than bulk, less waste
30
Conclusions
Gas/liquid continuous flow reactors for effective direct fluorination processes
• 1,3-Dicarbonyl derivatives (diketones, ketoesters, diesters)
• Aromatic systems
Continuous flow oxidation reactions using HOF generated in situ
Convenient, multi-channel flow reactors for applications to manufacturing
31