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Lawrence Berkeley Laboratory j AFOSR/NP6. ADDRESS (City, State, and ZIP Code) 7b. ADDRESS (City, State, and ZIP Code)

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(U) X-RAY OPTICS(JOINT PROPOSAL WITH 86NP249

12. PERSONAL AUTHOR(S)Dr. David T. Attwood, Jr.

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19. ABSTRACT (Continue on reverse if necessary and identify by block number)Progress was made in diffractive x-ray microscopy, -rultilayer mirrors for x-ray imaging andlaser applications, soft x-ray imaging anl spectroscopy of biological samples, and computersimulations of x-ray optical trains., d" ) C67 -DTIC

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X-Ray Optics

At L. Technical Report jo 1 4 #Rfor the period

,S'10 (A- S' a9AFOSR Contract F49620-87-K-0001

David T. Attwood, Jr.Principal Investigator

Center for X-Ray Optics and Professor in ResidenceLawrence Berkeley Laboratory Applied Science and TechnologyUniversity of California College of Engineering1 Cyclotron Road, 2-400 University of CaliforniaBerkeley, CA 94720 Berkeley, CA 94720

Prepared for the

Air Force Office of Scientific ResearchDirectorate of PhysicsBoiling Air Force Base

Washington, DC 20332

2

Contents

Page

Introduction 3

Progress 3

Student Work 4

Appendices 12

(A) Development of Fourier Transform X-Ray Holography

Janos Kirz, Physics Department, SUNY Stony Brook, NY

(B) Reflective Optics

M.C. RichardsonUniversity of Rochester, Rochester, NY

(C) Computer Simulation of XUV Systems

F. CerrinaCenter for X-Ray Lithography

University of Wisconsin, Stoughton, WI

U-., 1, . .

By

Dititt, ~

3

Introduction

The Center for X-Ray Optics has continued in its dual roles of demonstrating the

capabilities and usefulness of the x-ray and ultraviolet regions of theelectromagnetic spectrum and developing instrumentation and techniques to makethese capabilities widely and readily available. The University Research Initiativecontract enabled the Center to maintain its student training effort, with bothgraduate and undergraduate student assistants continuing their contributions to the

Center's research projects. This report will be supplemented with our "1989 AnnualActivities Report" when it becomes available in spring 1990.

Progress

Progress is reported here in five areas of x-ray science and technology as describedbelow. The involvement and contribution of the student assistants in this work isthen described.

Application of Diffractive X-Ray Optics

We have already achieved soft x-ray microscopy resolutions of 500 A. During thepast year we fabricated zone plates with outer zone widths as small as 300 A, and weare hoping to achieve images resolved to 400 A.

Multilayer Mirrors for X-Ray Imaging

We have been making mirrors for reduction x-ray lithography at 145 A, x-ray lasercavity mirrors for wavelengths from 44.8 A to 206 A a hard x-ray (1 A) microprobefor materials science and phase-transition studies, as well as oth - coatings for highthermal loading synchrotron radiation applications.

Multilayer Mirrors for Free Electron Lasers

We continue to study detailed materials science issues associated with deep UV-FELmirrors and cavity extraction techniques.

4

Soft X-Ray Imaging and Spectroscopy of Biological Material

We continued the development of microscopy techniques for the life and physicalsciences. This included studies of subcellular structure and function, surface andmaterials science studies, and preliminary excursions into x-ray nanolithography.

Simulations of Extreme Ultraviolet Optical Systems

Progress was made on extending a computer program for x-ray tracing to includeradiation from insertion device sources (undulators and wigglers) of synchrotronradiation.

Student Work

Yan Wu is a graduate student in physics at UC Berkeley approaching completion ofhis studies. His specific thesis area involves x-ray scattering for phase transitions inliquid hydrogen or metal hydrides in a high pressure diamond anvil cell.

He has continued his work on the hard x-ray (1 A) microprobe using multilayer

coated mirrors. He has demonstrated various capabilities of this focusing system.Such a focusing system has high spatial resolution (6 microns in diameter), highintensity (109 photons/sec), and a tunable focusing energy when operated on a whitesynchrotron radiation beamline. It is ideal for high sensitivity x-ray fluorescencemicroprobing experiments. It has been used to examine interesting samples from awide selection of disciplines. The system has also examined fluid inclusion insynthetical quartz crystals to demonstrate the usefulness of such a device indetermining minor but geophysically important elements that reside in theinclusion. These fluid inclusions are extremely small and buried under the ,urface,therefore, make the use of other analytical methods extremely difficult if ntotimpossible. The examination of natural fluid inclusion could help to reveal thelocal geological history. Another class of samples from geological science that thissystem is uniquely useful for are minerals that contain high concentration ofelements with relatively low absorption edges so that they are excited underconventional microprobes (electron microprobe, proton microprobe, and other ex-ray microprobes) and their signal overshadows the lower concentration elements

5

with lower absorption edges. In our case, the excitation can be avoided by simply

adjusting the energy of our focused beam. We have also examined some biological

and materials science samples.

Another exciting application of microbeam of x-rays is in that of high pressure x-ray

diffraction from small samples. Along this line, Yan has continued to work with

the group at Carnegie Institution of Washington to perform various x-ray

diffraction exporiments, to develop necessary skill and knowledge for a successful

utilization of the multilayer focusing system in this area. We have examined

materials that are important in physics as well as materials that are of particular

interest to geology. For example, we have examined the structure of CsI under high

pressure. In this experiment, we have reached the highest pressure (302 GPa) atwhich an x-ray diffraction experiment has been performed, and observed a new

phase for CsI. This new structure, closely resembles its isoelectronic, but chemically

very distinct neighbor, the rare gas Xe. It demonstrates that the interaction between

atoms and the properties of materials under high pressure is extremely different

from their ambient pressure form. Further experiments at lower pressure alsorevealed the mechanism of the phase transition, which helped to resolve a long

outstanding controversy in the literature. The high pressures reached and theability to perform diffraction experiments under these pressures has importantapplication for the understanding of planet earth. For the first time, it is now

possible to mimic in the laboratory the extreme pressure and high temperatureconditions of the earth's interior. The improvements that can be brought about bythe use of a focusing device in these experiments will perform an important role inthe high pressure research area in general.

A report on this work was published in a recent issue of Science. Yan Wu has alsobeen involved in experimentation at the Brookhaven National Laboratory'sNational Synchrotron Light Source, and is expected to participate in experiments at

Japan's Photon Factory this winter.

Kaarin Goncz is a graduate student in biophysics who has been doing work on x-raymicroscopy of enzyme transport in cells and the study of radiation damage in cells.

She is preparing to do studies in which the native environment of transportvesicles is modified to induce loss of content as part of the secretion process. Shehas already begun this work and has a sequence of high resolution x-ray images thatindicate that this study will be possible.

6

Jonathan Denlinger is a graduate student in physics using synchrotron radiation tostudy the surface science and materials science of semiconductor materials. He is

studying the formation of the interface between the covalent semiconductor Si andthe ionic insulators CaF2, SrF2 and (Ca; Sr)F2 alloys, using x-ray standing wavefluorescence (XSWF) methods. The lattice constants of Si and CaF2 are very close(0.5 % difference at room temperature, 1.8% at typical growth temperatures), whilethat of SrF2 is about 7-8% larger (depending on the temperature). Jonathan isprobing the onset of lattice relaxation from the Si lattice constant to that of SrF2 as afunction of SrF2 layer thickness on the monolayer scale. An experimental run atBrookhaven's NSLS in August on the SrF2 on Si(111) system revealed that thecritical thickness for lattice relaxation is between 1 and 2 triple layers of SrF2, andalso gave a measurement of the Poisson ratio for an ultra thin film. Alsodetermined was the location of the atoms at the SrF2 on Si(111) interface, which hasinteresting consequences for the question of the subsequent orientation of the SrF2lattice with respect to the substrate. These results will be presented by Jonathan inFebruary at the Physics and Chemistry of Semiconductor Interfaces conference andin March at the American Physical Society meeting.

Jonathan is currently preparing for a second run at NSLS in January 1990 in whichwe will study the growth of (CaSr)F2 alloys on Si(111). We expect to employ EXAFSin addition to XSWF in this project. This work is being done in collaboration withscientists at AT&T Bell Laboratories.

Nasif Iskander is a graduate student in the group studying focusing properties ofhigh resolution fresnel zone plate lenses. Theoretical and computational aspects ofhis studies include theoretical limits, intensity distributions, the effect ofaberrations, and creation of a graphic display capability for visualizing the interplayof these variables. Nasif has been involved in some of our highest resolutionlaboratory tests of zone plates, as well as in applications.

Max Wei is a graduate student in Electrical Engineering and Computer Science whohas begun working on reduction x-ray lithography. The goal of this project is toutilize x-ray optics for the reduction of electronic patterns, hoping to achieve featuresizes of 0.1 pm over as wide a field as possible. Initial experiments are planned forearly 1990 at the University of Wisconsin's Synchrotron Radiation Center. Theseexperiments also involve collaboration with IBM.

7

Tai Nguyen is a graduate student in Materials Science and Mineral Engineering.

Two major projects on which he is working are transmission electron microscopy

studies of x-ray optical multilayers, and fabrication of micron scale slits for hard x-

ray applications using thin film technology.

Studies of the tungsten-carbon multilayer system with cross-section high resolution

TEM has continued from the previous year and was extended to include lower

resolution, plan-view TEM imaging of free standing multilayers, which provide

complementary information to that obtained from cross-sectional imaging. In

particular, crystalline grain size and phase can be more readily assessed the the plan-

view technique. More detailed understanding for the effects of crystallization onannealing were obtained in this study. Observation of tungsten-carbide (W2C)

annealing products, together with basic thermodynamics, suggests that multilayers

made of alternating layers of tungsten-carbide and carbon, rather than tungsten and

carbon, could provide more stable optical structures. Research on this issue wasinitiated.

Tai's project on fabrication of a micro-scale slit for hard x-rays combining sputtering.thin-film technology with cross-sectional sample preparation techniques alsoprogressed. The goal was to use a thin film of low Z material, such as carbon,sandwiched between to thick slabs of high Z material, such as tungsten, in cross

section as a slit for hard x-ray experiments requiring a very fine beam. Hard x-raymicroscopy, micro-probing, and tomography are examples of such experiments.Traditional slit technology does not work when the slits become smaller than about10 gm: hence the motivation for this unconventional approach. The approach

chosen requires much effort to obtain the thin metal film because of large thermalstresses in the film. Because of these difficulties, this approach was deemedunfeasible. No functional slits were obtained. From this experience new ideas for

simplified fabrication of micron slits were derived that will be pursued in the

future.

Hi resolution TEM studies of multilayers of interest for x-ray optics made of other

constituent materials were initiated. Studies of the molybdenum/silicon systemtogether with the ruthenium/carbon system were initiated. Mo/Si multilayers are

of demonstrated interesting in EUV optics, and Ru/C multilayers are of potentialinterest for high normal incidence reflectance above the Si L edges, where the

8

performance of Mo/Si multilayers falls. Comparisons of observations made from

various systems will enable us to make more general conclusions about the

structure and stability of x-ray optical multilayers that are made by the sputtering

technique.

Mark Thomas is an undergraduate physics student involved in the development of

a user friendly MS-DOS program to compute and display mirror reflectivities from

atomic/molecular surfaces, transmission efficiencies of filters, and other optical

constants for 30-10,000 eV x-ray region for the first 92 elements.

This program is already used by many researchers involved in designing

synchrotron radiation beam lines throughout the world. This work had been

accepted for publication in Nud. Inst. and Methods, and is also available as

Lawrence Berkeley Report LBL-27668 (August 1989).

Mark also participated in fabricating and characterization of sputtered multilayers

and performed calculations for novel multilayers for the 1-2 keV x-ray region. He

also participated in analyzing x-ray absorption and emission data obtained at

Brookhaven National Laboratory's NSLS X-24A beam line.

Victor Liu has been an undergraduate student assistant with the Center for X-Ray

Optics for almost a year. He assisted in the disassembly and relocation of severaldelicate experimental systems and helped to restore them to operation. He also

contributed to the building and testing of the control system for the x-ray

microprobe experiment, which involved motor control, interlock systems, and thesoftware development required for computer control interfacing. He has also beeninvolved in the rebuilding of the our flat crystal x-ray spectrometer, which required

him to learn electronic and computer control systems, high vacuum and

mechanical systems, and radiation and high voltage safety systems. We anticipate

that he will also be involved with the high resolution spectrometer in the next year.

Erik Bollt continues to provide useful computational support for our work in

synchrotron radiation and free-electron lasers. His recent project has been to study

various mirror-hole-aperture configurations for the FEL optical cavity. Theeventual goal of this project is to find an optimized cavity out coupling scheme and

to determine its loss. He has written a versatile computer program that calculatesthe mode profile and losses for a general cavity configuration, which will be useful

9

for designing an FEL cavity. He is currently bench-marking the code with knownresults.

Jeffrey Davis has continued to work on updating the atomic scattering factors for theelements Z = 1 to 90 in the energy range 10 eV to 10 keV. This work was reported inan LBL report and was presented at the VUV9 conference this summer. Jeff has alsoworked on developing software that makes use of the scattering factor tables for bothmicrovax and IBM PC computers. He has also collaborated on a Monte Carlosimulation of solid xenon photocathodes, which was also presented at the VUV9conference.

Jon Chun has worked with us for the past year and has become familiar withvacuum deposition and thin films by sputtering and evaporation and hasconstructed a variety of x-ray filters. He has also gained experience in dataacquisition using a PC and has written programs to monitor film thickness duringsputtering using a quartz crystal microbalance and a PC to communicate with amultichannel analyzer.

Some Student Publications:

J. Denlinger, M.A. Olmstead, E. Rotenberg, J.R. Patel, and E. Fontes, X-RayStanding Wave Studies of SrF) on Si(111), SSRL Users Meeting, 1989.

J. Denlinger, M.A. Olmstead, E. Rotenberg, J.R. Patel, and E. Fontes, AtomicPositions and Relaxation at a Lattice-Mismatched Semiconductor-InsulatorInterface: SrF /Si(111), PCSI-17, abstract, 1989.

B.L. Henke, J.C. Davis, E.M. Gullikson, and R.C.C. Perera, A Preliminary Reporton X-Ray Photoabsorption Coefficients and Atomic Scattering Factors for 92Elements in the 10-10000 eV Region, Lawrence Berkeley Laboratory report LBL-26259 (1988).

B.L. Henke, J.C. Davis, E.M. Gullikson, and R.C.C. Perera, Revision andExtension of the 1982 Tables of the Atomic Low Energy Scattering Factors,Presented at the Ninth International Conference on Vacuum UltravioletRadiation Physics, 17-21 July 1989 (Paper 13.24).

10

E.M. Gullikson and J.C. Davis, High Sensitivity Soft X-Ray PhotocathodesUsing the Rare Gas Solids. Presented at the Ninth International Conference onVacuum Ultraviolet Radiation Physics, 17-21 July 1989 (Paper 18.41).

H.K. Mao, Y. Wu, R.J. Hemley, L.C. Chen, J.F. Shu, and L.W. Finger, X-rayDiffraction to 302 Gigapascals: High-Pressure Crystal Structure of CesiumIodide Science, 246 (1989) 649.

T.D. Nguyen, R. Gronsky, and J.B. Kortright, High Resolution ElectronMicroscopy Study of As-Prepared and Annealed Tungsten-Carbon Multilayers,Proc. Mat. Res. Soc., 139 (1989) 357.

T.D. Nguyen, R. Gronsky, and J.B. Kortright, Detection of Crystalline Phase inCross-Section Multilayer This Film by High-Resolution Transmission ElectronMicroscopy to be published in the Proceedings of the 47th Annual Meeting ofthe Electron Microscopy Society of America (San Antonio, TX, 6-11 August1989).

S.S. Rothman, E. Anderson, D. Attwood, P. Batson, C. Buckley, K. Goncz, M.Howells, C. Jacobsen, D. Kern, J. Kirz, H. Rarback, M. Rivers, R. Tackaberry, andS. Turek, Soft X-Ray Microscopy in Biology and Medicine: Status and ProspectsPhysica Scripta, in press.

H. Rarback, C. Buckley, K. Goncz, H. Ade, E. Anderson, D. Attwood, P. Batson,S. Hellman, C. Jacobsen, D. Kern, J. Kirz, S. Lindaas, I. McNulty, M.Oversluizen, M. Rivers, S. Rothman, D. Shu, and E. Tang. The ScanningTransmission Microscope at the NSLS, Nucl. Instru. and Methods, in press.

M.M. Thomas, J.C. Davis, C.J. Jacobsen, and R.C.C. Perera, A Program forCalculatin2 and Plotting Soft X-Ray Optical Interaction Coefficients forMolecules presented at SRI '89 in Berkeley, CA August 1989.

Y. Wu, H.K. Mao, R.J. Hemley, L.C. Chen, J.F. Shu, and L.W. Finger, CrystalStructure and Equation of State of CaL abstract submitted for the March 1990Meeting of the American Physical Society.

11

Y. Wu, A.C. Thompson, J.H. Underwood, R.D. Giauque, K. Chapman, M.L.Rivers, and K.W. Jo.es, A Tunable X-ray Microprobe Using SynchrotronRadiation Nucl. Instru. and Methods, in press.

12

Appendices

(A) Development of Fourier Transform X-Ray HolographyJanos Kirz

Physics DepartmentSUNY Stony Brook, NY

During the past year the project to develop Fourier transform holography hasprogressed on several fronts:

An advanced CCD camera was constructed using a Thompson CSF CCD detectorwith 3 1p phosphor coating to transform the x-ray signal to visible light. Electronicsfor the read-out were built and tested. The camera includes a thermoelectric coolerto cool the chip to -401C and thereby reduce the dark current. The CAMAC-basedelectronics transfer the image to the VAX station 3200 for storage, display, andanalysis. The camera has an aluminized silicon nitride window to admit soft x-raysbut not visible light. It is evacuated to a pressure of 10 millitorr using a sorptionpump.

The detective performance of the first generation CCD camera was analyzed. Thesystem noise is about 50 electrons, and when cooled to -40*C, the dark current isabout 10 electrons/pixel/second. Though sufficient for obtaining first results, thesefigures will need reduction to record high quality holograms. Improved electronicsand liquid nitrogen cooling are under development to reduce the noise.

Dr. Erik Anderson of the Lawrence Berkeley Laboratory Center for X-Ray Optics,using the facilities of the Nanostructure Fabrication Group at the IBM ResearchCenter, fabricated high resolution fresnel zone plates and custom test objects for theproject. The test objects have feature sizes down to the expected resolution of theapparatus.

The zone plates and test objects were tested at the NSLS undulator beamline X1A,using the scanning transmission x-ray microscope. Images of the test objectsindicate that the zone plates perform according to design. Test objects fabricated inthe future will need to have the region surrounding the test pattern plated thickerto obtain holograms of good contrast.

The entire system, including zone plate, test object, and CCD camera were tested andaligned on the AlA beamline. Although no holograms of the test objects were

13

recorded on this first test, interference fringes for the pinhole collimator wereobserved.

Results were presented in poster papers at the NSLS Annual Users Meeting in May1989, and at the Synchrotron Radiation Instrumentation Conference in BerkeleyCalifornia in August 1989.

Graduate student Ian McNulty did much of the work under the direction of theprincipal investigator. Mr. McNulty will continue with the work for his Ph.Dthesis.

The development of Fourier transform holography is continuing with an increased

level of support for the DOE Office of Health and Environmental Research.

Publication

I. McNulty, J. Kirz, C. Jacobsen, E. Anderson, M.R. Howells, and H. Rarback,Soft X-Ray Microscope Using Fourier Transform Holography in press.

14

(B) Reflective Optics

M.C. RichardsonUniversity of Rochester, Rochester, NY

We continue to make progress in the development of curved multilayer x-ray opticsfor applications to point x-ray sources. Our efforts in the past year have been placedin four areas.

(a) Multilayer coating facility. The final assembly and testing of this facility wascompleted in 1988. Initial test multilayer coatings of Si/C layers were made to testthe uniformity and reproducibility of layer thickness with system parameters beforethe facility was moved from a building on campus to a new wing of LLE. Thefacility is part of the University of Rochester's Coating Laboratory, which wastransferred in 1988 from the Institute of Optics to LLE. Although the x-raymultilayer facility has been re-established, there are doubts about it's continuedoperation. Its operation is partially funded by the contract LLE has with DOE forinertial fusion work. In addition the facility's principal operator, Cindy Hayden, left.the employment of LLE in August 1989.

(b) Ultra-short laser-produced x-ray pulse development. Previous reports havedescribed our initial investigations of plasmas produced by high-intensity (>1015W/cm 2) ultrashort (1 psec) laser pulses. New experimental studies in this area havebeen delayed by the need to move the laser system and target facility used in thesestudies from one laboratory to another within LLE. This has largely been completedand target experiments should commence in the near future.

(c) X-ray point source in exploding wire geometry. We have recently established acollaboration with Professor David Hammer and his group at the Plasma ScienceLaboratory at Cornell University. This group is investigating point x-ray sourcesfrom exploding cross-wire targets energized by the 0.1-TW LION ion diode machine,as possible sources for photo pumped x-ray laser schemes. We have helped in thesestudies by fielding x-ray imaging and spectroscopic instrumentation to determinethe x-ray fluence from the exploding wire targets. In addition we have used this x-ray source to make initial characterization measurements of a new Kodak film(uncoated T-MAX 3200) which is sensitive in the soft x-ray and EUV range. In directcomparisons with Kodak 101-06 film, the new film exhibited reduced sensitivity (byabout a factor of 4 in the 50 A region, with lowering sensitivity for longerwavelengths). No measurements were made of the resolution or the dynamicrange.

15

(d) Multilayer Schwarzschild optics at 44A. Following our success in demonstratingnormal incidence x-ray imaging of a point source at 44A with a simple sphericalmirror [11, we are now investigating superior optical elements. Foremost amongthese objectives is the improvement in collection power and in spatial resolution.As an initial test we are experimenting with a commercially available Schwarzschildobjective (Ealing 15X reflecting objective).

This objective has a numerical aperture of 0.3 and an object distance of 13 mm. Apair of unsilvered glass mirrors have been coated with 3s W/C layers having 2dspacing of 44.18A. Account was made for the difference in angle of the two mirrorsin coating the mirrors for maximum reflectivity at 44.15 A. The mirrorcombination is currently being assembled and aligned into a vacuum-compatiblemount.

It will shortly be tested in initial experiments with plasmas produced by ultrashort(elps) laser pulses.

Reference

[1] C. M. Brown, U. Feldman, J. Seely, M. C. Richardson, H. Chen, J. Underwood,and A. Zeigler, Opt. Comm. 08, 190 (1988).

Student Participation: Hong Chen (Physics, graduate student),University of Rochester

16

(C) Computer Simulation of XUV Systems

F. CerrinaCenter for X-ray Lithography

University of Wisconsin, Stoughton, WI

The development of the modeling code has progressed along the lines described inthe statement of work. The code is in phase of advanced development and isundergoing final debugging before shipment to CXRO. In particular we have:

1. Implemented a wavefront analysis routine based on the use of least squarefitting. The original approach, based on the use of an actual fitting routine, wassoon abandoned because the non-orthogonal nature of the power series may leadeasily to singular matrices. We decided to use instead an approach based on the useof orthogonal polynomials. The algorithm selected is based on the use of Zernickepolynomials for circular apertures and of Legendre polynomials for rectangularsystems. The use of orthogonal polynomials reduce the computational load andimproves the convergence of the process. The procedure adopted is the following: a.screen is located at the systems exit aperture and SHADOW is run selecting theoption of computing the optical path, which is stored in a suitable array, for examplein function of the converging angles. The code reads the file and expands theresulting function in polynomials; the aberration coefficients are well known andalgebraic expression exists to change between the two bases. The results arepresented in the form of coefficients of the power series and of the polynomial usedto expand the path function.

2. Developed the algebraic expansion for a system of one and two mirrors. It iscomplete and working; testing will begin shortly, before delivery. The programcorrectly predicts the aberration expansion of toroidal and elliptical mirrors, on thebasis of published work (in particular Namioka's papers). Diffraction gratingsaberrations are predicted correctly, as well, up to the fifth order. The program wasoriginally based on the use of SMP; unfortunately the high cost of running theprogram has made it impossible for us to complete the development. We havebeen hampered by the lack of computational resources; this has been recentlyovercome thanks to the acquisition of two VAX systems. We have, as well, acquiredtwo copies of Mathematica, one for the VAX and the other for the IBM PC, so thatwe expect to restart soon the development work and to finish the expansion. Theapproach is indeed proving to be extremely powerful and capable of helping in thedesign of optical systems.

17

3. Implemented a large part of the calculations of the surface roughness inSHADOW and the program is being documented. The approach is based on theanalysis of Bennett, Church and on the earlier work of Beckmann and Spizzichino.SHADOW reads a file containing the power series specifying the roughness and usesit to implement a "random grating" to compute the scattered directions. This part ofthe code has not been fully developed yet, but we expect to have it completed soon.

The code development is essentially completed, while the documentation writingand the final debugging and certification have not been completed yet. We expectthat all the work will be completed during the last quarter of 1989.

The students involved have also developed a significant fraction of thedocumentation supporting SHADOW. As a side result that may be of interest to thesponsoring agency, we like to report that we have recently acquired (independentlyfrom the present grant) a software package called IDL for data analysis andvisualization. The package is extremely powerful and capable of displaying directlyoutput from SHADOW. It can perform also complex calculations and preparepresentation graphic quality plots on a variety of different plotting devices. It ishighly recommended.

AppliedScienceand

Te chno fogy

Coffege of Engineering. University of California at Berkeey

UNIVERSITY OF CALIFORNIA

Program in Applied Science and Technology

Programs of StudyThe Program in Applied Science and Technology (AS&T) is aninterdisciplinary one involving the application of emergingtechnological and mathematical developments to fundamental andapplied aspects of the physical and life sciences. Major areas ofemphasis include applied physics, mathematical sciences,technological applications to the life sciences, and other topics inwhich a cross-disciplinary environment is beneficial. In addition toits own courses, the program draws strength from severalestablished departments of the U.C.Berkeley campus, as well asfrom research opportunities at the adjacent Lawrence BerkeleyLaboratory (LBL).

The program supervises student academic and research activityleading to both the Master of Science and Doctor of Philosophydegrees. A Faculty Executive Committee is responsible for theoverall administration of the program. Each student will have aGraduate Advisor who will help develop an appropriate course ofstudy. The Faculty Executive Committee within Applied Scienceand Technology will be responsible for admissions. studentprogress, curriculum content and degree requirements. Because of,the interdisciplinary nature of the program. and the anticipateddiversity of student backgrounds and interest, a sequence of coursessatisfying University and department requirements. but relevant tothe program. will be established individually for each student.

Thesis Subject AreasCurrent faculty research pursuits include topics from all three areas:applied physics. mathematical sciences. and applications in the lifesciences. From applied physics topics include: generation ofpartially coherent short- wavelength radiation. x-ray opticaltechniques applied to the physical and life sciences. acceleratorphysics and technology, free-electron devices, plasma physics.plasma assisted materials processing, application of microscopy.spectroscopy and diffraction to probe the atomic structure andchemistry of interfaces between dissimilar materials, layered andlaminated materials. chemical. physical. and electronic properties or

interfaces, various topics in quantum electronics and nanostructurefabrication: In mathematical sciences, topics include: nonlineardynamics, numerical methods, computational fluid mechanics andturbulence theory, with possible applications to physical, biologicaland chemical systems. Also included are such topics as computergraphics, medical imaging, inverse problems in geophysics, andflame propagation. In the life sciences topics include: application ofmicroscopies and spectroscopies to living organisms, dynamicalstudies of cellular processes, biochemistry and biophysics ofmembrane transport, cellular response to stress, intracellular spatial

12/19/89

resolution of chemical substances and regulation of metabolicprocesses.

Research FacilitiesFaculty members are involved with many state-of-the-artexperimental-laboratories on the Berkeley campus and within theLawrence Berkeley Laboratory (LBL). Among the unique facilitiesat LBL are the National Center for Electron Microscopy, whichhouses the highest-resolution electron microscope in the world; theCenter for X-ray Optics; and presently under construction, theAdvanced Light Source, a next-generation synchrotron facility ofextremely high brightness and coherent power at UV and x-raywavelengths. The program has access to the many excellentlibraries on the Berkeley campus, and to powerful computationalresources at both sites. In addition to utilizing several importantresearch facilities on the Berkeley campus, including materialspreparation and diagnostics, optical laser facilities, and plasmaprocessing laboratories, the group also participates in joint researchprograms in cell physiology with the University of California at SanFrancisco.

Financial AidStudents are encouraged to apply for Regent's fellowshipsadministered by the University. Research assistantships are availablein projects supported by ex-mural grants or contacts. An effortis made to align the research assistant's interests with those of his orher faculty supervisor. Many research assistants work half-rimeduring the academic year and full-time during part of the summer.

Cost of StudyFees, insurance and tuition for 1989-90 total approximately S 1900for state residents, and S7700 for non-residents. Costs for 1990-91an expected to be slightly higher.

Cost of LivingRoom and Board in the San Francisco Area for the nine-monthacademic year averages S4500-$6500. Books and supplies totalabout $400, and entertainment and miscellaneous expenses about$1200. Costs are proportionately higher for the twelve-monthacademic year.

A New ProgramApplied Science and Technology is a new program on the U.C.Berkeley campus, operating under the auspices of the College ofEngineering's Interdisciplinary Studies Center. Until the newprogram is formally approved by the University, it will besupervised by an Applied Science and Technology FacultyExecutive Committee appointed by the Dean, College ofEngineering. Normal departmental support to students will be

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through the office of Dean Edwin Lewis, Associate Dean forInterdisciplinary studies. Student programs will be coordinatedclosely with one of Berkeley's established departments during theprogram approval process. They will remain students in thatdepartment for degree-granting purposes until final approval of thenew graduate group is secured. Subsequently, application foradmission to the group will be either directly or through adepartment. The coordination will be done by Dean Lewis and theApplied Science and Technology Faculty Executive Committee.

The UniversityThe campus is surrounded by the suburban city of Berkeley(population 110,000) at the foot of the wooded Berkeley hills. TheSan Francisco Bay Area, a nine-county region, is widely acclaimedfor its cultural resources, such as museums, galleries, symphonyorchestras, opera company, and theater. Coffee houses andrestaurants abound. The campus and large student communityprovide a stimulating atmosphere through numerous public lectures,concerts, dramatic presentations, and exhibits. A number of nearbyregional parks offer rural serenity.

Within the campus are redwood groves, plazas, and picturesqueStrawberry Creek, which runs the length of the campus, giving aparklike atmosphere. Many areas of the campus provide apanoramic view of the San Francisco Bay Area. Berkeley is theoldest of the nine campuses of the University of California, foundedin 1868. Berkeley continues to create new programs and services asit adapts to new needs and trends in an effort to make highereducation one of the most exciting and meaningful experiences.U.C Berkeley is consistently rated among the top academicinstitutions in the United States.

Student GroupApproximately 30.000 students. including close to 9.000 graduatestudents are enrolled in Berkeley. The cosmopolitan student bodyincludes about 1.900 foreign students from nearly ninety counmesand about 3.500 students from states other than California.

ApplyingApplications for the fall 1990 semester are due February 1. 1990.Applications materials are available through the address below.Students are requested to include GRE scores.

Correspondence and InformaionProgram in Applied Science and Technology230 Bechtel Engineering CenterUniversity of CaliforniaBerkeley, California 94720Telephone: 415-642-8790

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Faculty associated with the Program in Applied Science and Technology

T. Ken Gustafson (Electrical Engineering and Computer Sciences, UCB;Quantum Electronics Group, UCB; Center for X-ray Optics, L.BL)

Modern optics and quantum electronic techniques applied to signal processing, computation andmaterials studies. The investigation of nonlinear optical phenomena and in particular thresholdingand optical logic devices, x-ray optical techniques applied to nanostructure fabrication.(tkg janus.berkeley.edu) -

David Atiwood (Applied Science and Technology, UCB;Center for X-ray Optics at LBL)

Partially coherent radiation at short wave-lengths, synchrotrons, undulators, x-ray lasers,processes in hot dense plasmas; x-ray optics, microscopes, and holography; application of elementspecific x-ray microscopy to studies in the life and physical sciences.(attwood@lbl.gov)

Stanley A. Berger (Mechanical Engineering, UCB)Theoretical and numerical analysis of large and small Reynolds numbers flows, imco ibleand compressible. Physiological fluid mechanics.

Charles Birdsall (Electrical Engineering and Computer Sciences. UCB;Plasma Interdisciplinary Commitee, UCB)

Plasmas; plasma theory and many-particle simulations; applications ranging from fusion plasmas toplasma assisted mawrials, processing-, current emphasis is on plasma-sheath-surface dynamics.(birdsall@janus. berkeley.edu)

Alexandre Chorin (Mathematics Department. L'CB)Computational fluid mechanics and turbulence theory.

Leon 0. Chua (Electrical Engineering and Computer Sciences. UCB)Nonlinear circuits, Nonlinear systems, bifurcation theory, chaos, neural networks. CAD and Non-linear electronics.(chua@esvax.berkeley.edu)

Lutgard C. DeJonghe (Material Science and Mineral Engineering, UCBCenter for Advanced Materials. LBL)

The science of ceramic processing. Particulate composites of ceramics with polymer. metal orceramic matrix. Microstructure characterization.

Roger W. Falcone (Physics Department, UCB)Quantum electronics and short wavelength coherent light sources, with applications to atomicphysics, solid state physics and plasma physics.

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Ronald Gronsky (Materials Sciences and Mineral Engineering, UCB;National Center for Electron Microscopy, LBL)

Identification of atomic structure of interfaces and defects in materials using techniques of electronmicroscopy. Relationship between atomic structure and properties of metallic alloys, ceramics,semiconductors, and superconductors, including the superconducting oxides with high Tc.(rgronsky@lbl.gov)

F. Alberto Grunbaum (Mathematics Department.UCB)Image reconstruction. Tomographic methods in medicine, geophysics, nondestructive evaluation.The mathematics and physics of solitons, applications to signal processing.

Yuan T. Lee (Chemistry, UCB;Materials and Chemical Sciences Division, LBL)

Laser induced photochemical processes.

Allan J. Lichtenberg (Electrical Engineering and Computer Science, UCB;Nonlinear Systems and Dynamics Group andInterdisciplinary Plasma Committee, UCB)

Nonlinear dynamics with applications to plasmas and particle accelerators. Plasma confinement,heating and fusion.Plasma discharges for materials processing.

Michael A. Lieberman (Electrical Engineering and Computer Science, ICB;Nonlinear Systems and Dynamics Group and InterdisciplinaryPlasma Committee. UCB)

Plasmas and non-linear dynamics, both theory and experiment. Applications to integrated circuitfabrication. Chaos and bifurcations in dynamical systems. optical and quantum chaos, chaos innon-linear circuits.(liebezjanus. berkeley.edu)

Robert Macey (Molecular and Cell Biology. UCB:Applied Science Division. LBL)

Research on basic mechanisms of membrane transport using the red blood cell as a prototype:current work focuses on transport of water, urea and the electrostatic barriers imposed by the lipidbilayer. Research on pathological red cells: current work focuses on the hydration of sickle cellanemiared cells, basic osmotic properties and the fate of red cells in inhospitable environments, andin the kidney, liver and lungs. Methods include EPR and fluorescent spectroscopy, fast kinetics.and the development of mathematical models.

Philip S. Marcus (Mechanical Engineering, UCB:Nonlinear Dynamics Group)

Bifurcations and development of chaotic flows, numerical simulation of three-dimensional fluidflow, vortex dynamics, numerical algorithms for large Reynolds number flows, applications toastrophysics and geophysics.

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Jerrold E. Marsden (Mathematics, UCB;Nonlinear Dynamics Group)

Nonlinear dynamics, Hamiltonian structures, stability, geometric methods in mechanics, includingBerry's phase, general relativity and chaotic dynamics.At Cornell (marsden@mathvax.msi.cornel.edu)At Berkeley (marsden@math.berkeley.edu)

C. Bradley Moore (Chemistry, UCB)Laser-induced chemistry and laser probes of complex reaction systems.

George Oster (Molecular and Cell Biology, UCB)Theoretical understanding of cellualr structure with particular emphasis on morphogenesis.

Alexandre Quintanilha (Molecular and Cell Biology, UCB;Applied Science Division, LBL)

Oxidative and antioxidative cellular mechanisms, general cell stress and defense mechanisms, therole of sulphur in regulating enzymatic activities in cells, spectroscopic techniques applied tointracellular and membrane dynamic processes.

Arthur Rosenfeld (Physics Department, UCB)Center for Building Science, Applied Science Division, LBL)

Physics applied to efficient use of energy, particularly in buildings; utility planning for least costenergy services; energy policy; data and document bases of conservation technologies andptograms; CAD for efficient buildings.

Stephen Rothman (Physiology, Biophysics, Bioeneineering, UCSF;Center for X-ray Optics at LBL)

Cell Physiology and biodynamics with particular interest in high resolution imaging of biologicalcels and unaltered substructure with soft x-rays. Applying soft x-ray microscopy and otherimaging methods to follow dynamics at the ultrastrucrural and supramolecular level. Permeabilityof to protein molecules.

James Sethian (Mathematics Department. UCB)Numerical methods, scientific computing, partial differential equations, computational differentialgeometry, parallel processing, scientific visualization, computer graphics, and mathematicalmodeling.(sethian@think.com)

Shyh Wang (Electrical Engineering and Computer Science, UCB;Quantum Electronics Group and Solid State Group, UCB)

Heteroepitaxy by molecular beams; studies of electronic and optical properties of semiconductors,heterostructures and interfaces; applications to lasers and electronic devices of compoundsemiconductors; and application of electron-optical probings techniques to material and devicestudies.

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Alan Weinstein (Mathematics, UCB;Nonlinear Dynamics Group)Symplectic geometry, H-aniltonian structures, stability, connections between classical and quantummechanics.

(alanw@math.berkeley.edu)

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Graduate Studies in Applied Science and Technology

Emphasis in Applied Physics

Graduate students in AS&T choosing to emphasize studies in Applied Physics will be expected tocomplete a sequence of courses which cumulatively provide a firm foundation in an area of appliedphysics which combines material from a combination of physics and engineering, materials scienceand mathematics. They will also be expected to participate in research activities which familiarizethem with the state of the art technologies, in such areas as nanofabrication, materialscharacterization, generation of short wavelength radiation, etc. The selection of appropriate coursesequences, taking into account the students background, should be done with the approval of theGraduate Adviser, and with approval of the AS&T Faculty Executive Committee. Depending uponthe student's academic background, courses might be chosen from the following list:

Physics 1 10A, B Electromagnetism and OpticsPhysics 137A, B Quantum MechanicsPhysics 141A, B Solid State PhysicsPhysics 180 End Use of EnergyPhysics 210A, B Theory of Electricity and MagnetismPhysic.s 211 Equilibrium Statistical PhysicsPhysics 212 Nonequilibrium Statisical PhysicsPhysics 221A, B Quantum MechanicsPhysics 240A, B Quantum Theory of SolidsPhysics 242A, B Theoretical Plasma PhysicsPhysics 208A, B Into. to Quantum Electronics and Nonlinear OpticsEECS Basic Principles of Nanolithography and Sub-micron StructuresEECS 1 ,17A B Electromagnetic Waves and FieldsEECS 130 Integated Circuit DevicesEECS 131 Semiconductor ElectronicsEECS 136 Lasers And Quantum ElectronicsEECS 143 Processing and Desien of Inrated CircuitsEECS 210A. B Applied Elecurmametic TheoryEECS 230 Solid State ElectronicsEECS 231 Solid State DevicesEECS 236A. B Quantum and Optical Electronics. orEECS 237 Quantum Electronics of SolidsEECS 238 Superconductive Devices and CircuitsEECS 239A, B PlasmasEECS 290F Mathematical Methods in Electromagnetic TheoryEECS 290J Image ProcessingEECS 290N, 0 Integrated Circuit Technology DesignMath 121A, B Mathematical Tools for the Physical SciencesMath 128A Numerical AnalysisMath 185 Theory of Functions of Complex VariableMath 220A, B Applied Math For the Physical Sciences and EngineeringMath 224A, B Mathematical Methods for the Physical SciencesMath 228A, B Numerical Solutions of Differential EquationsMath 273 series Topics in Applied MathE 210 Introduction to X-Ray Physics and TechnologyE 298A Applied Sciences and Technology SeminarIDS Lasers and Modem OpticsIDS Radiation and Scattering at Short WavelengthsI)S Accelerator Physics and TechnologyIDS Free Electron Lasers

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IDS Introduction to Plasma PhysicsIDS Surfaces, Thin Films and Interfaces[DS Applications of Spectroscopy to Biological SystemsIDS Applied Sciences and Technology LaboratoryMSE 102 Bonding, Crystallography, and Crystal DefectsMSE 102 Crystallography and Crystal DefectsMSE 111 Electrical and Magnetic Properties of MaterialsMSE 122 Ceramic ProcessingMSE 123 Semiconductor ProcessingMSE 202 Crystal Structure and BondingMSE 204 Electron MicroscopyMSE 223 Semiconductor MaterialsMSE 224 Solar Energy MaterialsMSE 231 Advanced Electron MicroscopyMSE 241 Electron Microscopy and MicroanalysisMSE 290 Grain Boundary Structure and PropertiesChem Eng 179 Process Technology of Solid State Materials & Devices

295E Electrochemical Energy Conversion295Q Thin Film Technology

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Graduate Studies in Applied Science and Technology

Emphasis in Mathematical Sciences

Graduate students in AS&T choosing to emphasize studies in Mathematical Sciences will beexpected to complete a sequence of courses which cumulatively provide a firm foundation inmathematics and its applications to the sciences and engineering. They will also be expected toparticipate in research activities which familiarize them with state-of-the-art techniques, thuspermitting them to make significant contributions in a chosen area in basic applied mathematics.The selection of course sequences, taking into account the students background, should be donewith the approval of the Graduate Advisor, and with approval of the AS&T Faculty ExecutiveCommittee. Depending upon the student's academic background, courses might be chosen fromthe following list:

Math 121AB Mathematical Tools for the Physical SciencesMath 128AB Numerical AnalysisMath 170 Linear Programming, games, models of exchangeMath 191 Mathematical methods in classical and quantum mechanicsMath 204AB Ordinary and Partial Differential EquationsMath 211 Mathematical theory of fluid mechanics-Math 219 Ordinary Differential EquationsMath 220AB Applied Mathematics for the Physical Sciences and

EngineeringMath 221 Advanced Matrix ComputationsMath 224 Mathematical Methods for the Physical SciencesMath 228AB Numerical Solutions of Differential EquationsMath 273 Advanced Numerical AnalysisMath 275 Topics in Applied MathematicsEECS 104 Linear and Nonlinear CircuitsEECS 219 Circuit Theory and Computer-.ided AnalysisEECS 220 Nonlinear CircuitsEECS 221A Linear System TheoryEECS 221B Multivanable Feedback TheoryEECS 222 Nonlinear Systems Analysis. Stability and ControlEECS 223 Stochastic Systems: Estimation and ControlEECS 226A Random Processes in Systems,ME 266 Numerical Methods in luid MechanicsME 260 Waves in FluidsME 262 Theory of Fluid Sheets and Fluid JetsME 263 Turbulence in Engineering FlowsME 267 Geophysical Fluid DynamicsPhysics 205A. B Advanced DynamicsPhysics 231 General RelativityE 298A Applied Science and Technology Seminar

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Graduate Studies in Applied Science and Technology

Emphasis in Life Sciences

Graduate students in AS&T choosing to emphasize studies in technical applications to the LifeSciences will be expected to complete a sequence of courses which, in combination with theirresearch, will provide a firm base of knowledge regarding the chemical, physical, and dynamicalcharacteristics of the biological cell. The research should include an in-depth study of at least oneaspect of a biological system. In all cases, students will be expected to participate in researchactivities that familiarize them with state-of-the-art technologies relevant to basic contributions inthe biological sciences at the cellular and sub-cellular level. The selection of appropriate coursesequences, taking into account the student's background and interests, will be carried out with theadvice and approval of the student's Graduate Advisor. Depending upon the student'sbackground, courses might be chosen from the following list:

Anatomy 105 HistophysiologyMCB 110 General Biochemistry and Molecular BiologyMCB 120 Cell PhysiologyMCB 120L Physiology LaboratoryMCB 122 BiophysicsMCB 130 BiologyMCB 131 Radiation BiophysicsMCB 135D Cellular Aspects of DevelopmentMCB 135E Intracellular SignalingMCB 200 Advanced Biochemistry and Molecular BiologyMCB 201A, B, Advanced Biochemistry and

Molecular Bioiogv Laboratory MethodsMCB 203 Structure and Functon of Eukarvotic Cellular MembranesMCB 206 Physical Bioch e-ustryMCB 213 Structure and Func.on of the Prokarvotic CelMCB 218D DNA Structure and FunctionMCB 220B Membrane and L:x)ootein Structure and DynamicsMCB 220E Free Radicals and Oxygen Toxicity in BiologyMCB 239Z The Cytoskeleton and MorphagenesisMCB 241 Structural BioohvsicsPB 100A Molecular. Cellular and

Genectic Aspects of Plant DevelopmentPB 100B Physiology and Biochemical Plant BiologyPB 222 PhotosynthesisE 210 Introduction to X-ray Physics and TechnologyE 298A Applied Science and'Technology SeminarIDS 200A Cellular NeurobiologyIDS Applications of Spectroscopy to Biological SystemsIDS Topics in Cell PhysiologyIDS Analysis of Specific Research in BiologyMSE 204 Electron MicroscopesMSE 231 Advanced Electron Microscopes

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