FemtoLAB - Photonic Solution Center broshure.pdf · Figure 1 Optical microscope photo of olivine sample surface before experiment. Few testing cuts on the smallest piece of the shattered

P a g e | 1

Workshop of Photonics is a registered trademark of Altechna R&D Mokslininkų 6A, LT-08412, Vilnius, Lithuania, tel.: 370-5-2725738, fax.: 370-5-2723704, e-mail: [email protected], www.wophotonics.com

FemtoLAB Femtosecond laser

micromachining system

Main system features

- Femtosecond laser with 1030 nm, 515 nm, 343 nm

wavelengths

- High accuracy (< 1 μm) XYZR positioning system

- Beam scanning and shaping units

- Control of entire system through single-window

software

- Motorized attenuator for laser power control

- Sophisticated machine vision

- Safety enclosure

- Custom for different processes

- 1 year warranty (extendable)

Main applications

- Surface micro- and nano-structuring

- Selective ablation

- Micro-cutting and micro-drilling

- Surface functionalization

- 3D direct laser writing

4 W

6 W

10 W

15 W

0.2 mJ

1,5 mJ

180* fs

280* fs

200 kHz

600 kHz

1000 kHz

PHAROS laser selection

* tunable up to 10 ps

P a g e | 2


Micromachiningexamples

Figure 1 Optical microscope photo of olivine sample surface before experiment. Few testing cuts on the

smallest piece of the shattered sample are visible (left). Pattern designed for complex shape of the sample,

optimized to get maximum number of discs from available cutting area (center). Final sample prepared

according to scan trajectories. No cleaning after laser processing.

Figure 2 SEM photo of silicon (Si) surface back contact formation for photovoltaics (ʎ = 343 nm, τ = 300 fs).

Figure 3 BST ceramics grooves ablation. Optical microscope photo (left) and SEM image of lines crossing

(wavelength and pulse duration confidential).

P a g e | 3


Figure 4 Optical microscope photo of a 5 μm diameter hole drilled in glass tube (wavelength and pulse

duration confidential).

.

Figure 5 Optical microscope photos of tapper less hole drilling in stainless steel alloy. Process requires

special beam shifter unit (ʎ = 1030 nm, τ = 300 fs).

Figure 6 Optical microscope photos of various diameter holes drilled in optical fiber (left). Dark field

photo of 10 μm diameter hole drilled in fiber up to the core (ʎ = 1030 nm, τ = 300 fs).

P a g e | 4


Figure 7 Photo of surface acoustic wave transducers fabricated on YZ-LiNbO3 by selectively ablating thin

chromium layer (left). Optical microscope (front illumination) photo of transducer (ʎ = 1030 nm, τ = 300 fs).

Figure 8 Optical photos of brass micro-marking (ʎ = 1030 nm, τ = 300 fs).

Figure 9 SEM images of nanoriples fabricated on surface of sapphire (ʎ = 1030 nm, τ = 300 fs).

P a g e | 5


Figure 10 Optical microscope photos of hex pattern ablated on glass surface. Line width 10 μm

(ʎ = 515 nm, τ = 300 fs).

Figure 11 SEM images of various 3D elements grating (left) and axicon fabricated using multi

photon polymerization technique (ʎ = 515 nm, τ = 300 fs).

Figure 12 SEM images of various 3D elements birpism and lens with grating fabricated using multi

photon polymerization technique (ʎ = 515 nm, τ = 300 fs).

P a g e | 6


Figure 13 Optical microscope photo of grooves ablated on sintered silicon carbide surafe (left) and ablated

groove surface (ʎ = 343 nm, τ = 300 fs).

Figure 14 White light profilometer image of dots array fabricated on glass surface (left) and single dot profile

(ʎ = 1030 nm, τ = 300 fs).

Figure 15 SEM images of cutting 10 μm thickness copper layer on printed circuit board. Top view (left) and

60 deg tilted view on the right (ʎ = 1030 nm, τ = 300 fs).

Documents

FemtoLAB - Photonic Solution Center broshure.pdf · Figure 1 Optical microscope photo of olivine sample surface before experiment. Few testing cuts on the smallest piece of the shattered