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UCLA Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator. Presented by Navid Vafaei- Najafabadi Advisor: Chan Joshi On behalf of E200 Collaborators

Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

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Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator. Presented by Navid Vafaei-Najafabadi Advisor: Chan Joshi On behalf of E200 Collaborators. Authors. - PowerPoint PPT Presentation

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Page 1: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLA

Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield

Accelerator.

Presented by Navid Vafaei-NajafabadiAdvisor: Chan Joshi

On behalf of E200 Collaborators

Page 2: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLAAuthors

• (UCLA) N. Vafaei-Najafabadi, K. A. Marsh, C. E. Clayton, W. An, W. Lu, W. B. Mori, C. Joshi

• (SLAC) E. Adli, S. Corde, M. Litos, S. Li, S. Gessner, J. Frederico, M.J. Hogan, D. Walz, J. England, J. P. Delahaye

• P. Muggli

Page 3: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLAWhy Rubidium

• Advantage: avoiding– Head erosion– Ion motion

• Disadvantage:– Secondary ionization

Page 4: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLATransformer Ratio

• Beam loading can occur because of a trailing beam or captured background electrons

Page 5: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLARequired Charge for Beam Loading

nb>np

Pencil beamLong beam Λ~1

Src: M. Tzoufras, PRL (2008)

Our beam’s Characteristicsnp=2.7x1017,N=1.3x1010,σr=3 μm, σz=35 μm

Q>110 pC

Page 6: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLAExperimental Setup

Page 7: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLABetatron Oscillations in Plasma

• X-ray yield depends on the number of oscillations• If the trapped charge is a function of interaction length, we

are prominently trapping Rb II.

ArRbIIArII

RbI

ArI

Dark Current Region

Rb

RbII/ArII

RbII

ArAr

Evolution of beam envelope

Page 8: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLAExcess Charge Correlates with X-ray Yield

Page 9: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLAAbsolute Calibration of Length

Length is absolutely calibrated using experimental results from two ovens

Page 10: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLABeam Loading with the Same Current Profile

Page 11: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLARaw Data and Transformer Ratio

Transformer ratio reduces with excess charge

÷6x2

Foil3 Foil2 Foil1 No Foil

Page 12: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLATransformer Ratio and Excess Charge

Page 13: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLASimulations Show Beam Loading

• Simulation parameters: 2.7x1017, εN=250 mm-mrad• Simulations where Rb II or Ar are turned off, showed little to

no beam loading.

Page 14: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLAReduction in Transformer Ratio

• E- drops because of head erosion• E+ drops at a faster rate than the E- because of beam loading

Page 15: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLAConclusions

• Distributed injection of electrons occurs due to beam induced ionization of Rb+

• These electrons can beam load the wake and reduce the accelerating field.

• Quantified this effect by correlating the increase of Rb II electrons with energy gain and loss of the different slices of the drive electron bunch as the plasma length is varied.

• PIC simulations shows that this correlation is indeed the cause of the reduction of the transformer ratio due to the beam loading effect.

Page 16: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLAFuture Work

• This has given rise to mixed gas experiment to produce decent quality and high energy beam

• Will write a long paper once this is accepted.

Page 17: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

THE END

Page 18: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLAData Corroboration for the Two Ovens

• Trapped charge has the same form as X-ray Yield

Page 19: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLA

0 50 100 150 200 250 300 3500

0.5

1

1.5

2

2.5

3

3.5

Variation of Min Bunch Width with Emittance In Beam Enve-lope Model

Normalized Emittance

min

(σr)

Page 20: Evidence for beam loading by distributed injection of electrons in a Plasma Wakefield Accelerator

UCLADipole radiation on X-rays

Actual blocked radiation Schematically shown blocked radiation