EV Group Europe & Asia/Pacific GmbHDI Erich Thallner Strasse 14782 St. Florian am InnAustria+43 7712 5311 0

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Features

■ Fully automated UV-NIL imprinting and low-force detachment

■ Up to 300 mm substrates ■ 200 mm / 300 mm bridge-tool

capability ■ Continuous mode operation ■ Single-step full-area imprint

process ■ Volume manufacturing of

structures down to 40* nm and smaller

■ Supports a wide range of structure sizes and shapes, including 3D

■ Applicable on high-topography (rough) surfaces

*resolution dependent on process and template

Introduction

Automated UV Nanoimprint solution up to 300 mm, featuring EVG´s proprietary SmartNIL® technology

The EVG7300 leverages EVG´s SmartNIL technology to enable mass manufacturing of micro- and nanostructures.

Capable of printing nanostructures as small as 40* nm over a large area with unmatched throughput and low cost of ownership, the EVG7300 supports the production of a variety of devices and applications, including optical devices for augmented/virtual reality (AR/VR) headsets, 3D sensors, bio-medical devices, nanophotonics and plasmonics.

EVG’s SmartNIL technology has also been improved and modularized for the EVG7300 system. Together with EVG´s material expertise it provides the most advanced nanoimprint capabilities on the market featuring conformal imprinting, fast curing times with high-power lamp and smooth stamp detachment.

Technical DataWafer diameter (substrate size) 200 mm / 300 mm

150 mm / 200 mm

Resolution ≤ 40* nm

Supported Process SmartNIL®

Exposure source High-power LED (i-line) > 400 mW/cm²

Alignment ≤ ± 3 µm

Stamp separation Fully Automated

Mini environment and climate control Optional

Working stamp fabrication Supported

EVG®7300Automated SmartNIL® UV-NIL System