SSC125 - MINI SPUTTER SOURCEThe power to innovate

• Test novel thin film ideas

• Speed up process development

• Eliminate costly test targets

The SSC125 is a “mini” sputter source intended for both

development and production. The source is flange mounted

in single, dual, triple or quadruple combinations. Power

supply configurations enable operation of the individual

cathodes in series or simultaneously for development of

alloys, phase change materials or complex dielectric stacks

avoiding extended development times with expensive test

alloy targets. Source shutters can be fitted for each cathode

or according to planned operational mode.

Targets are water cooled individually to ensure optimum

conditions are maintained for each cathode and the source

flange opens through 180 for simple target exchange.

The source flange can be fitted to either Single or Batch

Process Modules and is fully integrated within the Radiance

software architecture.

Example configuration showing four SSC125 installed on a Single Process Module (SPM)

Product descriptions, photos and data are supplied within the brochure for general information only and may be superseded by any data contained within Evatec quotations, manuals or specifications.

Evatec Ltd.Lochrietstrasse 14CH-8890 FlumsSwitzerlandTel: + 41 81 720 1080Fax: + 41 81 720 1081info@evatecnet.comwww.evatecnet.com

SSC125 - MINI SPUTTER SOURCE

Single SSC125 mounted on hinged flange in Single Process Module

Specifications

Nominal Target Diameter 125mm

Sputter Modes DC, DC Pulsed, Mid Frequency, or RF

Configuration Options Single SourceDual Source

Triple SourceQuadruple Source

Operation Modes Individually or simultaneously according to Sputter Mode and Power Supply Configuration

Target Cooling Indirect