EUV Technology, SuMMIT Software Division · 2009. 9. 26. · AFM Any device that creates a graphical image. [email protected] /summit Case study 1: AIMS data Load an AIMS image file

SuMMITSuMMIT Application Notes:Application Notes:

#1 #1 –– SuMMITSuMMIT is not just for is not just for SEMsSEMs anymoreanymore

EUV Technology, EUV Technology, SuMMITSuMMIT Software DivisionSoftware Division

[email protected]@euvl.com

www.euvl.comwww.euvl.com/summit/summit

SuMMITSuMMIT supports aerial supports aerial

image data image data � SuMMIT is a general purpose litho analysis package

� SuMMIT works with wide variety of input data

� SEM (CD/analytic/cross-section …)

� AIMS tools and microscopes

� Aerial image (AI) and resist modeling tools

�Prolith

�Solid-EUV

�Panoramic

�MAST (our soon-to-be-released AI modeling tool)

� AFM

� Any device that creates a graphical image



Case study 1: AIMS dataCase study 1: AIMS data

Load an AIMS

image file.

SuMMITsupports nearly

all standard image formats

through the “File->Load

SEM image”

menu as well as device specific

formats through the “File-

>Import” menu




This example

image is an EUV

AIMS image file courtesy of

Yujen Fan, CNSE and

acquired using

the SEMATECH Berkeley AIT.



Crop tools

Rotate tools


Rotate and crop

image as desired using

Image Proc Menu. Various

other basic

imaging process features are

available through this

same menu.




With the region of interest selected, Auto Fence and calculate to get CD and LER data as you would for any SEM image. Through dose behavior can be simulated by changing the analysis threshold.



Case study 2: AI modelingCase study 2: AI modeling

Load a Prolith(for example)

aerial image



Modeled aerial

image of mask

with LER





SuMMITincludes a

default AI modeling

analysis recipe

that may be used if desired




Analysis results show LER of 1.6

nm and infinity

LER of 12.9 nm. Large infinity

LER comes from significant

line-to-line CD

variation.

Infinity LER

estimated from

line-to-line CD

variation: Constantoudis et

al., JVSTB 22,

1974 (2004).

Var∞

= Var(W) + Var(CD) + Var(σW)



Case study 3: AI MEEFCase study 3: AI MEEF

Enable the

contact-hole-analysis toolbox




Load a modeled

aerial image of a field of contacts

where one

contact had a ~3% error on

the mask, then Auto Fence and

process (calculate).




Open the

Advanced Contact Plot

Tool for a plot of all the CDs. The

results show a

CD error on the one contact of

~3% indicating a MEEF of 1.

SuMMITSuMMIT Litho Analysis SoftwareLitho Analysis Software

For more information

please visit www.euvl.com/summitor contact [email protected]

Documents

EUV Technology, SuMMIT Software Division · 2009. 9. 26. · AFM Any device that creates a graphical image. [email protected] /summit Case study 1: AIMS data Load an AIMS image file