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Electron Beam Evaporator Planetary Substrate Manipulator
EBE-1
UHV Deposition System
FBBEAR system control software is a multifunctional
software to control the whole EBE system, i.e. Manipula-
tor rotation speed, heating program, e-beam process, etc.
FBBEAR’s Deposition wizard make it hassle free to save
your experimental recipe, and fully automatize the depo-
sition processes. In addition, it also allow data logging in
order to review past deposition parameters. FBBear also
allows data processing and analysis.
Established in USA since 2007, AdNaNoTek Corporation is the rising leader in ultrahigh vacuum
(UHV) technologies and solutions provider. We specialize in the design and manufacture of state-of
-the-art and fully customizable UHV systems.
Our UHV deposition systems are guaranteed to deposit extremely high quality thin films in terms of
uniformity and purity. With our vast experience in UHV deposition technology, and consistent in-
teraction with our customers: we are sure that we will continue to improve and optimize our prod-
ucts, and be the leading UHV deposition systems provider around the globe.
ABOUT COMPANY
Contact us
TEL: 886-2-22982594
FAX: 886-2-22984812
CHINA MOBILE:+8618362958206
EMAIL: [email protected]
Website: http://www.adnano-tek.com/
3422 Old Capitol Trail,
Wilmington,
DE 19808, USA
We excel in manufacturing fully
customizable UHV systems, such as:
Molecular Beam Epitaxy System (MBE)
Magnetron Sputtering (MSD)
Pulsed Laser Deposition (PLD)
Ion Beam Deposition System (IBD)
Atomic Layer Deposition (ALD)
Integrated UHV Systems
Laser Heating System
FBBEAR SYSTEM CONTROL SOFWARE
E B E - 1 S P E C I F I C A T I O N
F E A T U R E
Electron beam heating can reach temperatures higher than traditional filament resistance heater. It can heat the target above 3000 °C. It can place target crucibles in cooling slots, this reduce the possibility of contaminating other target deposition process, hence improving the quality of deposition. Finally, electron beam can heat the target surface directly to improve the heating efficiency.
A d v a n t a g e s o f E - b e a m E v a p o r a t o r
AdNaNoTek's Electron Beam Evaporator (EBE - 1) can deposit large-scale thin-film with ex-
tremely high quality and a great repeatability. It is equipped with e-beam source with multiple tar-
get crucibles. It can store up to maximum of 6 target materials. It is also capable for high melting
temperature element deposition. In addition, it is possibly to upgrade EBE with sample planetary
mechanism which rotate and revolve multiple samples. This allows precise and simultaneous dep-
osition of in many substrates while significantly improving the uniformity and quality of the de-
posited thin-film.
Furthermore, precise control and high stability is achieved by making the process automated with
the use of the AdNanoTek's FBBEAR system control software. FBBEAR, provides complete data
logging, precise parameter tuning, and automatic parameter setting of the deposition process. This
makes the deposition process to be operated with ease, fully automated, user-friendly, consistent,
and will give reliable experimental repeatability.
● UHV-compatible chamber with inner protective shield
● Base Pressure: 5E-9torr
● Substrate Manipulator
● 4-in substrate holder (8-in max)
● Heating up to 300°C
● Rotation (speed 20rpm)
● Water-cooling
● E-gun source with 6 target crucibles
● 2 Thickness monitors
● Turbopump with roughing pump
● Full range vacuum gauge
● Automatic deposition process
● Load-lock with vacuum pumps and gauges
E - B e a m f o r J o s e p h s o n J u n c t i o n
D u a l E - B e a m
P l a n e t a r y S u b s t r a t e M a n i p u l a t o r
In order to meet requirement of multi-film deposition while accounting the thickness uniformity, a planetary mechanism of sample manipulator is conceptualize. The Planetary sub-strate manipulator has multiple substrate holders - with 6 (or 8) sample holders for 4- (3-) inch wafer - which allows sim-ultaneous deposition on multiple substrates. In addition, it significantly improves the uniformity and quality of the de-posited thin-film by rotating each substrate holders at high-speed while allowing revolution movement as well.
O P T I O N A L U N I T S
Depending on the design of the chamber, EBE-1 can be customized and installed with a variety of deposition components ● Dual e-beam sources ● Planetary substrate manipulator ● Single 4-inch (8-inch) tilting sample holder ● Clean room interface ● Single/dual mask system with z-motion ● Ion beam cleaning/etching chamber ● Oxidation chamber ● Flux monitor ● Confocal source ports for effusion cell modules ● Thermal boat for thermal evaporator module ● Magnetron sputter cathode module ● Pre-annealing heating system in load lock ● Customizable chamber design Any specific parts that you need in your experiment can be integrated to EBE-1
P r o t e c t i v e S h i e l d i n g
SYSTEM
INTRODUCTION
C l e a n r o o m I n t e r f a c e
