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Disentangling bulk and surface contribution in correlated systems and buried interfaces
Giancarlo Panaccione Lab. TASC - INFM - CNR, Trieste, Italy
Outline
-- VOLPE project: Characteristics and Performances
- Results:- Transition Metal Oxides (Ruthenates)- Enhanced s-contribution @ Fermi level (In2O3, PbO2) - Buried interfaces (spin valve interface, diluted magnetic semiconductors)
- Conclusions and perspectives
Long Term Proposal till 2008 + Open to users
“Bulk sensitive Photoemission on highly correlated materials”C. S. Fadley, Univ. Davis, USM. Grioni, EPFL, SwitzerlandJ. Joyce, Los Alamos, US
Core levels + Valence band
VOLPE’s history(VOLume PhotoEmission from solids with Synchrotron Radiation)
Operational since 2005 at ESRF (ID16 beamline)EU project funded in 2001 – Trieste, Univ. Rome III, ESRF, EPFL, LURE
J. Joyce, Los Alamos, USO. Tjernberg, RIT, SwedenL. H. Tjeng, Univ. Köln, Germany
Core levels + Valence bandKinetic energy up to 6-10 keV
Statistics comparable to LE-PESEnergy resolution down to < 50 meV
Needs
1) High Res/High flux beamline (low cross sections)2) Adapted Spectrometer performances (high stability/low noise)
(no commercial equivalent in 2001)
High Resolution /High Flux beamline ID16@ ESRF, inelastic scattering
A – 3 x U35 undulators
B – Si(1,1,1) double crystal mono
C – Si(n,n,n) post-monochromator
D – toroidal mirror
E – sample
F – electron analyzerE
B
CD
F
A
Channel-cut in backscattering (87o)
(3,3,3) @ 6 keV:
∆E=50 meV & 6.2•1011 ph/sec/100 mA
(4,4,4) @ 8 keV:
∆E=37 meV & 7.6•1011 ph/sec/100 mA
(5,5,5) @ 10 keV:
∆E=14 meV & 2.6•1011 ph/sec/100 mA
Combination of higher reflection order Channel-cut
e.g. (2,2,0) @ 6 keV:
∆E=340 meV & 3•1012 ph/sec/100 mA
Tunable photon energy
B
Dispersive element
+
VOLPE’s spectrometer
(Univ. Rome III and INFM)Input lensHigh retarding factor Constant linear mag.Small field of view
71 meV @ 5933 eV50 meV analyser
250
P. Torelli et al. Rev. Sci. Instr. 76, 023909 (2005)F. Offi et al. NIM A, 550, 454 (2005)G. Panaccione et al. NIM A 547, 56 (2005)
(ELETTRA)2D delay line detector
High stability power supplies
+
0.3 0.2 0.1 0.0 -0.1 -0.2 -0.30
50
100
150
200
250
Exp. FIT
Inte
nsity
(C
ount
s)
Binding Energy (eV)
Au fermi edgeT=20Khν=5933eVE
P=20 eV, slit 0.4mm
∆Eexp = 71meV
Dark counts< 0.3 events / (sec * cm2)
150
100
Pix
el
150100500Pixel
(a)(a)
2D cross delay anode (ELETTRA)G. Cautero et al. NIM A 595, 447 (2008)P. Torelli et al. Rev. Sci. Instr. 76, 023909 (2005)
Linearity guaranteed
Decoupling up to 12 kV50
0
Pix
el
150
100
50
0
Inte
nsity
(arb
. uni
ts)
369.0368.5368.0367.5Binding energy (eV)
(b) Technical parametersTime resolution: 27psSpatial resolution: <70µmPulse pair resolution: <10ns (multihit capability)Real time coincidence check @ 2MHz Configuration (1D, 2D, single channel)Full time resolved information available
500 Å
200
0
Wedge samples
Si substrate
Si 1s intensity attenuation vs. overlayer thickness
3000
4000
5000
6000
In
tens
ity (
cps)
Co wedgeSi - 1s photoemission
Sacchi et al. submitted to PRB
26 Å
39 Å
52 Å
65 Å
78 Å
Quantifying bulk sensitivity
I (x) = I0 e-x/λ
M. Sacchi et al. PRB 71, 155117 (2005)
Mind the rare-earths!!!!
4078 4079 4080 4081 4082 4083
0
1000
2000
Electron kinetic energy (eV)
91 Å
104 Å 117 Å 130 Å
Jablonski and C.J. Powell, J.El. Spectr. Relat. Phen100, 137 (1999).S. Tanuma et al. Surf. Interface Anal. 35, 268 (2003)M. P. Seah and W. A. Dench, Surf. Interface Anal. 1, 2 (1979)
2 3 4 5 6 7 8 9 100123456789
10
elements inor. comp. Co Cu Ge Gd2O3
λ (n
m)
Electron energy (keV)
Mind the rare-earths!!!!
80
90
100
8
10
12
14
16
18
Con
trib
utio
n (%
)
λ = 5 Å
Quantifying bulk sensitivity: contribution of the surface Information depth (ID)
(layer thickness from which 95% of the total signal is produced):
λ = 5 Å → ID 15 Åλ = 25 Å → ID 75 Åλ = 60 Å → ID 180 Å
0 20 40 60 80 100 120 140 160 180 2000
10
20
30
40
50
60
70
80
λ = 5 Å ~ E = 20 eV λ = 25 Å ~ E = 1.5 keV λ = 65 Å ~ E = 5 keV
Con
trib
utio
n (%
)
Thickness (Å)
λ
x
exI−
=)(
0 5 10 15 20 25 30 35 400
2
4
6
Con
trib
utio
n (%
)
Depth (Å)
M. Sacchi et al., Phys. Rev. B 71, 155177 (2005)F. Offi et al., Phys. Rev. B 77, 201101 R (2008)
hν = 1253 eV, small transfer of spectral weightdespite MIT turns samples into powder
1. MIT in V2O3
Why bulk sensitivity with HAXPES?
D.S. Toledano et al., Surf. Science 449, 19 (2000)
V 2pO 1s
MIT in V2O3 with HAXPES:V 2p core level
V2O
3 metallic phase
hν= 5934 eV
Phot
oem
issi
on I
nten
sity
(A
rb. U
nits
)
V 2p
Extra peaks disappear when crossing the MIT - Huge transfer of spectral weight
hν= 5934 eV V 2p core level
Phot
oem
issi
on I
nten
sity
(A
rb. U
nits
)
300 K (PM phase) 140 K (AFI phase)
G. Panaccione et al, PRL 97, 116401 (2006)
5400 5405 5410 5415
Phot
oem
issi
on I
nten
sity
(A
rb. U
nits
)
Kinetic Energy (eV)
V 2p Room Temp
528 526 524 522 520 518 516 514 512 510
Difference
Binding Energy (eV)Ph
otoe
mis
sion
Int
ensi
ty (
Arb
. Uni
ts)
Presence of ‘extra-peaks’ (well screened features)
only in bulk sensitive PES., only in metallic phaseV2O3, agreement M. Taguchi et al. PRB 71, 155102 (2005)
M. Taguchi et al. PRL 95, 177002 (2005) G. Panaccione et al. PRB 77, 125133 (2008) NCCOK. Horiba et al. PRL 93, 236401 (2004) F. Offi et al. PRB 77, 174422 (2008) ManganitesSuga’s group VO2, CrO2 and many other systems
M. Uruma et al. Suga’s grouparXiv:0711.2160v1 [cond-mat.str-el]
Why bulk sensitivity with HAXPES?
2. Ruthenates: Well screened features visible already in the soft X-ray range
BUT
Do Surface and Bulk behave identically?
arXiv:0711.2160v1 [cond-mat.str-el]
Contribution to PES- Surface
- Subsurface - Bulk
Phot
oem
issi
on I
nten
sity
(A
rb. U
nits
) Sr3(Mn
xRu
1-x)
2O
7
x = 5% Sr 3d
T= 20Khν = 5999 eV
VOLPE @ normal emission Almost single line – better spectral purity Sekiyama et al. PRB 70, 060506(R) 2004
Hard X-ray PES:Surface contribution strongly suppressed
5856 5858 5860 5862 5864
Phot
oem
issi
on I
nten
sity
(A
rb. U
nits
)
Kinetic Energy (eV)
Mn substitutes RuInterplay Ru 4d - Mn 3d
Mn 3+ acceptorExtra eg occupies dx2-y2
3d-4d interplay responsible of MIT with AFI order (possible OO)
Extra peaks due to competitionbetween local and non local screening
Sr3 (MnxRu2-x)O7: Evolution vs. doping? Surface vs bulk?Direct access to Ru with core level PES
Chainani and Taguchi talks
M. Taguchi et al. PRL 95, 177002 (2005)
M.A. Van Veenendal, Phys. Rev. B 74, 085118 (2006)M.A. Van Veenendaal and G. Sawatzky PRL 70, 2459 (1993)
A. Kotani and K. Okada, J. Phys. Soc. Jpn. 74, 653 (2005)
NORMAL EMISSION 45 DEGREE INCIDENCE
well screened featuresSr3(Mn
xRu
2-x)O
7
Ru 3d core level80 Khν = 460 eV
Pho
toem
issi
on In
tens
ity (
Arb
. uni
ts)
Satellite peaks in TMO core levels: soft X-raysClear doping dependence in the screening channels
APE beamline, ELETTRAE. Annese, GP et al.
165 170 175 180
Sr 3p1/2
Pho
toem
issi
on In
tens
ity (
Arb
. uni
ts)
Kinetic energy (eV)
parent x = 0.05 Mn x = 0.2 Mn
In collaboration with A. Damascelli, G. Sawatzky, UBC, Vancouver, Canada
Ru 3d
Sr 3p1/2
P
hoto
emis
sion
Inte
nsity
(ar
b. U
nits
)
Sr3(Ru
1-xMn
x)
2O
7
20 Khν = 7595 eV
Evolution vs. doping confirmed BUT
Different ratio well screened/main peaks
Satellite peaks in TMO core levels: Hard X-rays
7302 7305 7308 7311
7300 7305 7310 7315
Ru 3d
Kinetic Energy (eV)
Kinetic energy (eV)
Pho
toem
issi
on In
tens
ity (
arb.
Uni
ts)
Parent (Mn 0%) Doped (Mn 20%)
Ru 3d5/2
Enhancing s-contribution with HaXPES:Fermi level in Lead Dioxide (β-PbO2)
III
III
x 15
hν = 1486.6 eV
(a)
(b)
x 15
I
II
III
hν = 56 eV
5
PbO2 Total DOS
I
II
III i ii
D.J. Payne, R.G. Egdell, et al. PRB 75, 153102 (2007)
D.J. Payne, et al J. Phys. C, in press
Binding energy / eV
-2024681012
x 15
IIIIII
hν = 7700 eV
hν = 6000 eV
x 15
IIIIII
(c)
(d)
0
Binding energy (eV)-50510
Density of states (states per eV
per cell)
0
2
O 2p PDOSPb 6s PDOSPb 6p PDOS
Calculation
A. Walsh et al, PRL 100, 167402 (2008)
Evolution of the s-like intensityat Fermi level vs. Sn doping
Combination of XES and HaXPES
Failure of band bending model
Upper limit 2.9 eV instead of 3.75 eV
Revision needed for interface band offset,e.g. In2O3/Si will be < 1 eV
A lA l
Alq3
Buried interfaces with HaXPES:Organic spin valve - (LSMO-Alq3)TEM, J. Chapman, Univ. Glasgow, UK
F. Borgatti, I. Bergenti, A. Dediu et al. CNR-Bologna @ VOLPE
Epitaxial LSMO (20 nm) film Alq3 spin/charge layer (50-100 nm),
Thin tunnel barrier (AlOx 1-2 nm)Co top electrode (10-20 nm)
Alq3(50 nm)/Co(15 nm) Alq3(50 nm)/AlOx(2 nm)/Co(15 nm).
no A lOx
with AlOx
O1s
Yie
ld (
arb.
un.)
no AlOx
with AlOx
C1s
Core-level of Alq3/Co interfacewithout (black) and with (red) presence of AlOx film (1-2 nm)
Buried interfaces with HaXPES:Organic spin valve - (LSMO-Alq3)
As-grown samples
7060 7070 7300 7310 7320
7190 7200 6030 6040
Yie
ld (
arb.
un.)
no AlOx
with AlOx
N1s
Yie
ld (
arb.
un.)
Kinetic Energy (eV)
no AlOx
with AlOx
Al1s
Kinetic Energy (eV)F. Borgatti et al. Submitted APL
15 nm capping
Doping control: Ferromagnetic SemiconductorsModel system: Ga1-xMnxAs
Low T growth = Mn interstitial + As antisitesPost annealing Tc ↑ conductivity ↑
BUT
Tc ↓ if thickness ↑Surface vs. bulk magnetic properties
Tc < 200 KA.H. Macdonald, Nature Mat. 4, 195 (2005)
λFe
θanti dx
Fe
GaMnAs
dxedI e
x
λ−
∝hν
Mr
F. Maccherozzi et al.
Phys. Rev. Lett. 101, 267201 (2008).
Au cap
( )xρ ( )xδ
Collaboration with:
Prof. W. Wegscheider (Univ. of Regensburg)
Prof. C. H. Back (Univ. of Regensburg)
Prof H. Ebert, (LMU, Muenchen)
Fe
(GaMn)As
XMCD Fe L2,3 edges
I(+)I(-)
XMCD
H=100 Oe
0.6
0.5
0.4
0.3
0.2
0.1
0.0
TE
Y (ar
b. u
nits
)
-0.20
-0.15
-0.10
-0.05
0.00
0.05
xmcd
(%
)
sample 2 - P0(tFe = 0.71 nm)
sample 2 - P1(tFe = 0.71 nm)
sample 1(tFe = 4 nm)(tFe=1.42 nm)
5 ML 10 ML 28 ML
50
-20
-10
Mn layers magnetized anti-parallel to Fe; Mn Ferromagnetic at RT
Magnetic coupling: XMCD at Fe and Mn L2,3 (APE beamline)
730720710700
-0.20
730720710700
energy (eV)730720710700
0.5
0.4
0.3
0.2
0.1
0.0
TE
Y
650645640635
0.10
0.05
0.00
-0.05
xmcd
(%
)
650645640635
energy (eV)650645640635
Sample 2 - P0(tFe= 0.71 nm)
Sample 2 - P1(tFe= 1.42 nm)
Sample 1(tFe= 4 nm)
5 ML 10 ML 28 ML
XMCD Mn L2,3 edges
I(+)I(-)
XMCD
H=100 Oe
Evolution of Mn 2p core lines vs. Fe Thickness and doping
In as-grown and capped samples (NO SPUTTERING)
inte
nsity
(ar
b. u
nits
)
O 1s(BE=532)
Mn 2pC1s(BE=285eV)
As3d (BE=42)O3s
Ga3d(BE=20)As oxide
inte
nsity
(ar
b. u
nits
)
Mn 2p
As-cap
2 min
4 min
OAs
Fe/(GaMn)As interfaces: next step with HAXPES
inte
nsity
(ar
b. u
nits
)
600 400 200 0binding energy (eV)
60 40 20 0
as-grown
1 min
2 min
3 min
4 min
680 660 640 620binding energy (eV)
air-exposed
See also B. Schmid, R. Claessen, W. Drube et al. PRB 78, 075319 (2008)
F. Maccherozzi et al., APE beamline, in preparation
Examples of ‘useful’ HAXPES experiments
-Surface properties different from the bulk (and you search for bulk properties , e.g. some TMOs)(correlation, reconstruction, high sensitivity to contamination, no easy cleavage plan)
-Surface or interfaces properties different from the bulk(and you would like to tailor new interface properties , e.g. Fe/(GaMn)As)
- Buried systems- Buried systems(as grown, capped)
- sp contribution at Fermi level and cross section change may be important
Competitive with XAS in TEY
Valence band + core level neededComparison with soft X-ray needed
AcknowledgementsVOLPE group and collaborators
ESRF (France), G. Monaco, S. Huotari, A. Fondacaro, C. Henriquet, L. Simonelli
ELETTRA , G.Cautero, P. Lacovig, P. Pittana, M. CauteroTASC, E. Annese, U. Manju, I. VobornikUniv. Rome III (Italy), F. Offi, G. StefaniSOLEIL and LCP (France), M. Sacchi Univ. DAVIS, (CA, US) C.S. FadleyUniv. British Columbia, Canada, A. Damascelli, G. Sawatzky
THEORYA. Poteryaev, A. Georges,
M. Gatti, L. Reining(CHPT- Ecole Polytechnique,
Palaiseau, France)
SAMPLESP. Metcalf (Purdue Univ, Indiana, US)H. Takagi (Univ. Tokyo, Japan)A. Guarino, A. Vecchione (Lab. SuperMat CNR, Italy)R. Delaunay (LCP, Paris, France)R.J. Cava (Princeton)
Univ. British Columbia, Canada, A. Damascelli, G. SawatzkyUniv. Modena (Italy), S3-CNR, P. Torelli, G. Paolicelli