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At a glance DELMIA V5.18 expands the IBM Digital Manufacturing Portfolio with the addition of DELMIA Process Planning Solutions and new and enhanced Release 18 functions. The DELMIA Process Planning suite delivers powerful tools for process and resource planning. Enhancements to previously announced products deliver a seamless end-to-end final assembly process planning solution. Further developments extend the production-ready solutions for the automotive body-in-white and shipbuilding domains. Improved usability exploits V5 fundamentals to create a powerful 3D model-based definition (MBD) manufacturing process planning solution that includes engineering requirements. 3D simulation for assembly processes and human factors capabilities benefit from significant usability enhancements and breakthroughs. Overview DELMIA V5.18 adds the DELMIA Process Planning suite of five configurations and 17 products. Through methodically structured planning, this suite supports the early recognition of process risks, re-use of proven processes, traceable changes and decisions, and access to process knowledge that is distributed across the enterprise. Process Planning applications can be used from the conceptual product design phase, through the preplanning and detail planning stages, and on to the production phase as alternative designs and manufacturing scenarios mature. Digital manufacturing solutions designed and built for your industry V5.18 enhancements that extend capabilities for work instruction authoring will significantly benefit the aerospace domain by employing unique process functional tolerancing annotations that are not dependant on design datasets. In the automotive domain, V5.18 supplies enhancements for automatic line balancing that can benefit the final assembly domain plus a series of enhancements for the body-in-white domain that extends its capabilities in production implementation. Collaborative product lifecycle management (PLM) to leverage knowledge and expertise across your enterprise Significant enhancements improve the interoperability between the Manufacturing Hub and the DELMIA Process Detailing and Validation solutions. IBM United States Announcement 208-045, dated March 11, 2008 DELMIA V5.18 expands IBM Product Lifecycle Management digital manufacturing IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 1 Description ................................................. 2 Product positioning .................................... 4 Reference information ............................... 5 Additional details ........................................6 Education support .................................... 26 Technical information ...............................26 Ordering information ................................ 35 Terms and conditions .............................. 50 Prices ....................................................... 52

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At a glance

DELMIA V5.18 expands the IBM Digital Manufacturing Portfolio with theaddition of DELMIA Process Planning Solutions and new and enhancedRelease 18 functions.

• The DELMIA Process Planning suite delivers powerful tools forprocess and resource planning.

• Enhancements to previously announced products deliver a seamlessend-to-end final assembly process planning solution.

• Further developments extend the production-ready solutions for theautomotive body-in-white and shipbuilding domains.

• Improved usability exploits V5 fundamentals to create a powerful 3Dmodel-based definition (MBD) manufacturing process planningsolution that includes engineering requirements.

• 3D simulation for assembly processes and human factors capabilitiesbenefit from significant usability enhancements and breakthroughs.

Overview

DELMIA V5.18 adds the DELMIA Process Planning suite of fiveconfigurations and 17 products. Through methodically structuredplanning, this suite supports the early recognition of process risks,re-use of proven processes, traceable changes and decisions, andaccess to process knowledge that is distributed across the enterprise.Process Planning applications can be used from the conceptual productdesign phase, through the preplanning and detail planning stages, andon to the production phase as alternative designs and manufacturingscenarios mature.

Digital manufacturing solutions designed and built for yourindustry

• V5.18 enhancements that extend capabilities for work instructionauthoring will significantly benefit the aerospace domain byemploying unique process functional tolerancing annotations that arenot dependant on design datasets.

• In the automotive domain, V5.18 supplies enhancements forautomatic line balancing that can benefit the final assembly domainplus a series of enhancements for the body-in-white domain thatextends its capabilities in production implementation.

Collaborative product lifecycle management (PLM) to leverageknowledge and expertise across your enterprise

• Significant enhancements improve the interoperability between theManufacturing Hub and the DELMIA Process Detailing and Validationsolutions.

IBM United States Announcement208-045, dated March 11, 2008

DELMIA V5.18 expands IBM Product Lifecycle Management digitalmanufacturing

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 1

Description .................................................2

Product positioning .................................... 4

Reference information ............................... 5

Additional details ........................................6

Education support ....................................26

Technical information ...............................26

Ordering information ................................35

Terms and conditions .............................. 50

Prices .......................................................52

• Usability is improved by exploiting V5 fundamentals for powerful 3D model-based definition(MBD) manufacturing process planning, including engineering requirements.

• New support for manufacturing assembly and manufacturing kit definition based on"black-box" work packages is added.

• Enhanced capabilities in manufacturing change management extend support to a wider rangeof business process scenarios, such as reducing constraints for end-users.

Breakthrough technologies to help you gain productivity — Significant usabilityenhancements and breakthroughs improve 3D simulation for assembly and human factors.

Key prerequisites

DELMIA V5.18 runs on selected versions of:

• Microsoft® Windows®

• AIX®

• Hewlett Packard HP-UX

• Sun Solaris

Planned availability date

March 14, 2008

Description

DELMIA allows manufacturers in any industry to virtually define, plan, create, monitor, andcontrol all production processes. It offers an array of dedicated applications for industries,combined with an environment for knowledge-sharing, process and resource management, andthe ability to capture and implement best practices for manufacturing.

DELMIA PLM technology allows manufacturers to interact with factory processes early in thedesign stage and months before actual production commitment. Engineers, management, andstakeholders across the extended enterprise can have a 3D visualization of the real world withthe ability to evaluate "what-if scenarios," make changes, optimize shop floor operations, andidentify and eliminate costly errors and design mistakes. These capabilities allow any enterpriseto facilitate higher quality and foster greater innovation. DELMIA also extends its PLMtechnology to smaller businesses within the supply chain to allow smaller companies to betterconnect and collaborate with larger manufacturers.

DELMIA Process Planning

This release adds the suite of process planning configurations and products to the DELMIAportfolio. DELMIA Process Planning delivers a comprehensive process and resource planningsupport environment. The resulting process diagrams help to create a clear overview of thesequences and links between processes and resources early in product design conception.Process Planning can be used to perform planning tasks such as:

• Layout planning

• Time measurement

• Process and resource planning

• Product evaluation

• Cost analysis

• Line balancing

Its applications deliver a high-quality solution for early recognition of process risks, re-use ofproven processes, traceable changes and decisions, and access to distributed processknowledge. This comprehensive treatment of the relationships among product, process, andmanufacturing resource data, including plant layout, helps to avoid planning mistakes and toobtain a precise overview, early in the design process, of the required investment costs,

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 2

production space, and manpower required.

Excellence for manufacturing production performance

The addition of the process planning suite to the portfolio, combined with enhancements to thepreviously announced Process Detailing and Validation Solutions, deliver a new level ofexcellence for manufacturing production performance.

DELMIA PLM for your industry: Aerospace

DELMIA V5.18 provides a new option for rendering work instruction text using process functionaltolerancing and annotation (PTA) as opposed to the preexisting capability utilizing 2D standardtext windows. Such PTAs, combined with user-definable visualization of engineeringrequirements employing standard functional tolerancing and annotation (FTA), offers a flexiblemechanism for manufacturing to define explicit immersive visualization to support workinstructions independent of design engineering content and/or data management.

As a result, manufacturing planners can define 3D work instructions with unique visualizationcharacteristics without requiring any changes to design engineering datasets, thus reducing thecost for supporting authoring and related change activity. Moreover, the independent control ofthe 3D definition to support uniquely manufacturing-oriented authoring scenarios increases thevalue proposition in general because otherwise the required design/manufacturing coordinationmight be viewed as an undue burden.

Automotive

For final assembly, DELMIA V5.18 provides a seamless, end-to-end final assembly solution fromprocess planning to 3D validation. Benefiting from the V5 resource-centric approach, automaticline balancing results can be automatically viewed and edited in 3D. As a result, manufacturingplanners can easily see and check the tasks performed by workers at each station or eachworkplace of the assembly line. It also allows them to validate the assembly line layout and dofine tuning of operations between stations using 3D. Additionally, automatic line balancing nowsupports both "Green Field" (new factories) and "Brown Field" (existing factories with establishedlines and processes) scenarios.

For body-in-white processes, V5.18 delivers a new assembly specification tree to replace theproduct flow viewer. This capability allows the user to define assemblies and sub-assembly billsof material (BOMs) derived from the manufacturing process plan.

Additionally, this release delivers new capabilities for defining manufacturing line concepts in 2D,independent of the resource layout. This includes the capability to define input parts, assemblies,and sub-assemblies as well as output assemblies for each line. Furthermore, new simulationroll-up capabilities provide the mechanism to combine simulation data from multiple stations formulti-station/line level simulation.

These resource-centric capabilities and views of product, process, and resource data provide theautomotive planner with essential capabilities for production implementation of the DELMIAbody-in-white and final assembly solutions.

Shipbuilding

With the release of V5.18, DELMIA — DPM Structure Lofting 2, a process planning solution forthe shipbuilding domain, moves from controlled to general availability. This configurationprovides the shipbuilding planner with a wide variety of structure lofting (large sheet-metallayouts) tools and process planning and validation, in-process model generation, and shop floordocumentation capabilities. It delivers the power of V5 collaborative 3D technology to a domainthat is presently moving from 2D technology to advanced 3D design and planning.

Collaborative PLM

DELMIA V5.18 delivers new capabilities to perform volume filtering when loading arbitraryproduct data from the DELMIA Manufacturing Hub into a DELMIA session. Such volume filteringcan significantly reduce the complexity of datasets and also improve overall system performancefor general usage. The net result and value to the end-user is that they can complete theirauthoring tasks in much less time because the system will provide faster performance.Moreover, they will be able to make better decisions within their planning activities owing to thedecreased complexity and thus the overall quality of the plan will be higher, resulting indecreased problems and changes driven from the shop-floor, all leading to decreased productioncost and reduced time to market at the required quality/cost targets.

With this release, DELMIA now supports all possible types of FTA and linked geometries for useas engineering requirements within design and for use during manufacturing process planning.This enhanced support is mandatory to enable a "3D-only" business process.

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 3

This release also expands the support of V5 "black-box" work packages for use when definingmanufacturing kits and assemblies. This capability further enables a "3D-only" business processacross the design-manufacturing disciplines.

DELMIA V5.18 provides additional features within the manufacturing change managementmodule to allow flexibility of the applied constraints. For example, the user can now specify ifspecific attributes within a process object should be excluded from change control, even whilethe rest of the metadata in the same object is subject to change control. The key benefit is that itreduces the complexity for end-users, thus increasing their efficiency in completing their tasks.Ultimately this leads to reduced time and cost for completing the required manufacturingplanning activities.

Breakthrough technologies: Four new human factors catalogs deliver significant usabilityenhancements to the DELMIA human factors suite. These catalogs include hundreds ofpredefined postures, preferred angles, various sized manikins, and tasks. Through the use ofthese richly populated catalogs, the ergonomist can reduce simulation model build time by asmuch as 70%.

DELMIA V5.18 provides an additional capability for process verification using 3D statemanagement. A simplified definition of 3D states and positions combined with new commands(such as Synchronize position or Redefine reference object) allows simulation engineers tosignificantly reduce the set-up time of their 3D environment.

Accessibility by people with disabilities

Owing to the graphics-intensive nature of its engineering design applications, this product hasbeen granted a deviation.

Product positioning

DELMIA brings together a set of digital manufacturing solutions targeted for industrial sectors inwhich continuing optimization is a determinant factor. These solutions allow manufacturers tobring their products to market more quickly, while reducing production costs and encouraginginnovation.

DELMIA digital manufacturing solutions assist industries where continuous transformation andoptimization of manufacturing processes are critical. These include automotive, aerospace anddefense, fabrication and assembly, electrical and electronic, consumer goods, and shipbuilding.The DELMIA PLM suite of computer-aided process planning and engineering solutions enablescompanies to achieve lean, build-to-order manufacturing by fostering a concurrent engineeringenvironment. Coverage extends from the conceptual phase of product and process design,through simulation and monitoring of manufacturing processes, to shop floor operations, such ascapacity planning, implementation and monitoring.

DELMIA digital manufacturing solutions deliver many benefits, including:

• Comprehensive process planning in the early design phase

• Maximization of production efficiency and factory utilization

• Optimization of investment

• Ability to capture and re-use best practices and enterprise knowledge

• Ability to anticipate and correct potential problems in the design and manufacturing pipeline

• Derivation and carry-over of process engineering and production resources

• Reduction of time-to-market and manufacturing costs

• Reduction in the time required to start production and related costs

• Ability to improve time-to-volume

• Ability to foster innovation of products and processes

• Ability to gain maximum profitability

IBM has worked with thousands of manufacturers of all sizes around the world to implementsolutions designed to enhance product development and streamline manufacturing processes.

• PLM solutions from IBM are the industry standard for OEMs, supply chain partners, and

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 4

suppliers.

• IBM has over 31,000 PLM customers worldwide in a wide range of industries that includeautomotive, aerospace, industrial products, electronics, chemicals, and petroleum.

• IBM does not just install technology. We serve as a trusted advisor to provide thebest-of-breed PLM applications, IT environment, integration capabilities, and businessstrategy to help you achieve your business objectives.

• IBM and Dassault Systemes have partnered for over 20 years to develop and deliver leadingPLM solutions.

• IBM and Dassault Systemes have one of the largest PLM practices in the world with over2,000 application engineers and consultants worldwide.

• Dassault Systemes, IBM, and our clients have collaborated to implement Dassault Systemesand IBM technology to power digital manufacturing, resulting in significant return oninvestment (ROI) and improvements in manufacturing and engineering effectiveness.

• IBM Global Business Solutions also has a complete suite of services offerings around theDELMIA, CATIA, ENOVIA VPLM, and ENOVIA SmarTeam products, including consulting,planning, implementation, integration, training, support, and managed services.

Hardware and software support services

SmoothStart™/installation services: SmoothStart/Installation Services are not available forDELMIA products.

DELMIA V5 services plan

PLM Services, part of IBM Global Business Services, offers a robust portfolio of services toassist with the implementation of DELMIA V5. Careful planning and implementation are essentialto getting the most from DELMIA V5.

IBM can help with assessment, solution design, planning, installation, data migration, customapplication development, best-practices consulting, user and administrative training, support,and project management.

For additional information on service offerings and how IBM professionals can assist with theimplementation of DELMIA V5 in your environment, contact an IBM representative or IBMServices organization or visit

http://www.ibm.com/solutions/plm

Select PLM Services from the list of related links.

Reference information

For information about CATIA V5.18, refer to Software Announcement 207-215, dated September25, 2007.

For information about ENOVIA VPLM V5.18, refer to Software Announcement 207-214, datedSeptember 25, 2007.

For information about ENOVIA SmarTeam V5.18, refer to Software Announcement 207-212,dated September 25, 2007.

Trademarks

XT and SmoothStart are trademarks of International Business Machines Corporation in the United Statesor other countries or both.

AIX and SP2 are registered trademarks of International Business Machines Corporation in the UnitedStates or other countries or both.

Microsoft and Windows are registered trademarks of Microsoft Corporation.

Other company, product, and service names may be trademarks or service marks of others.

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 5

Additional details

This release introduces the DELMIA Process Planning suite of configurations and products andadds 19 new Process Detailing and Validation products to those announced in DELMIA V5.17.Seven Process Detailing and Validation configurations and one AOP are withdrawn.

About hubs

The DELMIA Manufacturing Hub: DELMIA Process Planning configurations and products arebuilt around the DELMIA Manufacturing Hub. The hub is a customizable database that supportsthe DELMIA product, process, and resource (PPR) data model. It is the repository for all dataand relationship definitions for products, processes, and resources used in manufacturingplanning. Hub libraries contain all global data, such as plantype sets with related templateprojects, work system components, global scripts, planning states, raw materials, as well asstandard data types and V5 catalogs. It employs an object-oriented data model whereproject-specific containers store all the data objects that belong to the plans related to a project.The data model supports three main types of components:

• Products

• Processes

• Resources

Customization features allow the data model to be extended for both user-defined data typesand attributes.

The ENOVIA Engineering Hub: The ENOVIA Engineering Hub manages the"engineering-owned" intellectual property gathered during the product life cycle. Using the sameproduct, process, and resource data models as found in the DELMIA Manufacturing Hub, theENOVIA Engineering Hub provides a consistent information infrastructure and supports thecomplex web of inter-relationships that relate individual data components. The EngineeringHub's unique configuration modeler interprets effectivity and option conditions for relationships toallow an unprecedented degree of variability while minimizing data redundancy.

Included in the Engineering Hub are interoperability features with CATIA Version 4 and Version5, ENOVIAPM, ENOVIA SmarTeam, and DELMIA. CATIA V5 is built on the same data model asENOVIA VPM allowing for the engineering knowledge implemented by the product designers,such as assembly relations and constraints, to be accessed in ENOVIA and utilized for impactanalysis and automatic change propagation. Connection to DELMIA hubs enables complete"cradle-to-grave" IP life-cycle management.

DELMIA Process Planning

The DELMIA Process Planning solution suite delivers a comprehensive process and resourceplanning support environment. The resulting process diagrams can provide a clear overview ofthe sequences and links between processes and resources early in product design conception.The products in this suite can help in performing such planning tasks as:

• Layout planning

• Time measurement

• Process and resource planning

• Product evaluation

• Cost analysis

• Line balancing

Ordering DELMIA Process Planning products: Products can be ordered as a predefined setof products included in a standard configuration or as a shareable product delivered with its ownlicense key. Shareable products allow one user to obtain the license at the beginning of asession or to leave it for another user within the network.

Some products are included products. These can be distinguished from configurations andshareable products by the lack of the 5671 prefix in their product identifier. Included products areavailable only in configurations; however, they are described here to provide insight into thecapabilities of the configurations in which they are included.

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 6

Products can have one or more pre- or corequisite products. Refer to the Software requirementssection for details.

Process Planning configurations (all new in this release): DELMIA — ENOVIAManufacturing Hub Access (5671-EAC)

The DELMIA — ENOVIA Manufacturing Hub Access Configuration allows DELMIA V5 clients toaccess the ENOVIA Manufacturing Hub. There is no user interface.

The configuration comprises the following products:

DELMIA — Manufacturing Change Management (5671-MCM)

DELMIA — Configuration & Effectivity Filtering (5671-CEF)

DELMIA — ENOVIA Manufacturing Hub Client (EMH)

DELMIA — ENOVIA Manufacturing Hub Server (EMS)

DELMIA — Process Engineer (5671-EEC)

DELMIA Process Engineer enables users to recognize process risks early in the process design,to reuse proven processes, to trace changes and evidence of the decision making process, andto access process knowledge scattered across the enterprise. Process Engineer'scomprehensive treatment of the relationships among product, process, and manufacturingresource data, including layout, allows users to avoid planning mistakes, paving the way for aprecise overview of the entire process early in the planning stages. This clear-cut overviewdetails the investment costs, production space, and manpower resources required.

Process Engineer delivers a structured planning methodology that systematically leads to anoptimal solution by considering all process-related costs and by analyzing alternatives early inthe planning process. Risks are drastically reduced because Process Engineer allows for there-use of proven processes. Because it supports multiple users and allows for collaborativeplanning, planning time is shortened.

Process Engineer organizes each project based on the unique structure of the product,processes, resources, and plant layout involved. This solution customizes the user interface andreporting formats to meet individual requirements and promotes an identical planningenvironment for all projects. It provides built-in documentation of planning history and reflectsany data change immediately across the entire project.

Process Engineer can be used as a DELMIA Manufacturing Hub-based solution, eitherstand-alone or in conjunction with other DELMIA products, to build a complete, enterprise-widesolution. It enables users to administer access rights to the DELMIA Manufacturing Hub andallows mapping to project- or company-specific reporting systems.

The DELMIA — Process Engineer configuration comprises the following products:

DELMIA — Configuration & Effectivity (5671-CEF)

DELMIA — Target Tracking (5671-TGT)

DELMIA — Product Viewing (5671-PVW)

DELMIA — Process & Resource planning (5671-EPR)

DELMIA — Standard Time Management (5671-STM)

DELMIA — 2D Layout Planning (5671-L2P)

DELMIA — Plantype Editor (PTE)

DELMIA — Report Designer (RPD)

DELMIA — Object Customization (OCU)

DELMIA — 3D Layout planning (L3P)

DELMIA — PPR Navigator & Editor (PRN)

DELMIA — ENOVIA Manufacturing Hub Client (EMH)

DELMIA — ENOVIA Manufacturing Hub Server (EMS)

DELMIA — Industrial Engineer (5671-EIC)

DELMIA — Industrial Engineer is a powerful browsing and administration tool for accessing andmanipulating any item of information stored in the PPR Hub.

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 7

It allows users to access the entire planning content and all logical relationships stored in theHub. PPR items and their relationships, as well as planning prerequisites and objectives, areeasily accessed by a Windows®-like user interface. Its easy-to-use interface can be used totailor PPR Hub content to project- and company-specific requirements. Additional powerfulcustomization capabilities allow users to adapt the interface to the terminology of project- andcompany-specific requirements.

The configuration's user manager can be employed to administer access rights to the PPR Hubthrough the PPR Navigator. Individual users and groups and their access rights to planningcontent, functions, and structures are easily defined. Industrial Engineer also allows the user tomap to or incorporate project- or company-specific reporting systems. A powerful forms editorenables users to rapidly define forms for evaluations and reports.

Industrial Engineer integrates seamlessly with other DELMIA process planning and simulationproducts. Task automation can be defined programmatically with easy-to-use Visual Basic andJava™ scripting on the supported Windows platforms. Industrial Engineer also allows users toefficiently and reliably determine the time required to perform a specific job sequence based oncommonly used time measurement methods or proprietary time standards. Its intuitive userinterface allows multiple users to work efficiently after only a brief familiarization period.

DELMIA — Industrial Engineer offers:

• The ability to access the entire planning content and all logical relationships in a commonplanning environment

• An easy-to-use interface to tailor PPR Hub content to project- and company-specificrequirements

• The ability to adapt user interface terminology to project- or company-specific requirements

• Support for project- or company-specific reporting systems

• Administration of access rights to the Manufacturing Hub

• Quick and efficient generation of time analyses with all common analysis procedures (UAS,MEK, and MTM2)

• Capture and management of estimated and recorded time values

• Checking of rules for accuracy and totality

• Structured management of time analyses with a central repository for general purpose data

• Data compression capability across any number of data levels

• Structured data management

• Automatic update of time values

• Creation of user-defined formulas for determining process time

• Flexible search mechanisms based on search patterns

The DELMIA — Industrial Engineer configuration comprises the following products:

DELMIA — Standard Time Management (5671-STM)

DELMIA — Plantype Editor (PTE)

DELMIA — Report Designer (RPD)

DELMIA — Object Customization (OCU)

DELMIA — 3D Layout planning (L3P)

DELMIA — PPR Navigator & Editor (PRN)

DELMIA — ENOVIA Manufacturing Hub Client (EMH)

DELMIA — ENOVIA Manufacturing Hub Server (EMS)

DELMIA — PPR Navigator for Manufacturing Hub (5671-EPC)

The DELMIA — PPR Navigator is a powerful browsing and administration tool for accessing andmanipulating any item of information stored in the PPR Hub. It allows users to access the entireplanning content and all logical relationships stored in the PPR Hub. PPR items and theirrelationships, along with planning prerequisites and objectives, can easily be accessed by a

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 8

Windows-like user interface. The PPR Navigator includes an easy-to-use interface to tailor PPRHub content to project- and company-specific requirements. Additional powerful customizationcapabilities allow users to adapt the interface to the terminology of these project- andcompany-specific requirements.

The configuration's user manager allows system administrators to manage access rights to thePPR Hub. Individual users and groups and their access rights to planning content, functions, andstructures are easily defined. The PPR Navigator also allows the user to map to or incorporateproject- or company-specific reporting systems. A powerful forms editor enables users to rapidlydefine forms for evaluations and reports.

The PPR Navigator integrates seamlessly with other DELMIA process planning and simulationproducts. Additionally, task automation can be defined programmatically with easy-to-use VisualBasic and Java Scripting that is supported on Windows platforms.

DELMIA — PPR Navigator offers the following functions:

• Allows users to access the entire planning content and all logical relationships in a commonplanning environment

• Delivers an easy-to-use interface for tailoring PPR Hub content to project- or company-specificrequirements

• Allows the user to adapt the interface to project- specific or company-specific requirements

• Supports project- or company-specific reporting systems

• Allows users to administer access rights to the PPR Hub

DELMIA — PPR Navigator comprises the following products:

DELMIA — Plantype Editor (PTE)

DELMIA — Report Designer (RPD)

DELMIA — Object Customization (OCU)

DELMIA — 3D Layout planning (L3P)

DELMIA — PPR Navigator & Editor (PRN)

DELMIA — ENOVIA Manufacturing Hub Client (EMH)

DELMIA — ENOVIA Manufacturing Hub Server (EMS)

DELMIA — Process & Resource Planner (5671-ERC)

DELMIA — Process & Resource Planner enables the creation, management and comparison ofplanning alternatives and variants in all phases of the planning process. It allows users to accessand administer the PPR Hub, allowing them to create, manipulate, and navigate any item ofinformation that is of significance within the context of integrated process engineering. It alsopermits users to efficiently and reliably determine the time required to perform a specific jobsequence based on commonly used time measurement methods or company-proprietary timestandards. Its intuitive user interface allows multiple users to work efficiently after only a brieffamiliarization period.

Process & Resource Planner supports the step-by-step detailing and systematic preliminaryplanning of a manufacturing process based on the process graph and the manufacturing conceptgraph. With a capacity and cost analysis that can be activated at any time, the planner has aneffective instrument for quickly and accurately determining the optimal manufacturing process fora new product from both a technical and economic standpoint, with no detours or guessinggames. The schematically displayed manufacturing concept describes and links all of thecost-effective processes and resources of the future manufacturing process. It therefore formsthe basis for:

• Capacity and cost calculations associated with planning

• A comparison of alternative manufacturing concepts

• The subsequent detailed planning and automatic balancing (with DELMIA — WorkloadBalancing)

• Generating the model for material flow simulation

DELMIA — Process & Resource Planner includes the following capabilities:

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 9

• Supports the methodical planning process through step-by-step detailing based on theprocess graph and the schematic manufacturing concept

• Is open for the company-specific adaptation of process and resource views (object types,attributes, and graphic symbols that can be freely configured)

• Supports overall planning by taking into account all of the technical demands that play animportant role in designing the manufacturing process

• Integrates and links all planning information in the DELMIA PPR Hub and by using the resultsof geometry-oriented process planning with DPM

• Enables the planner to continuously monitor controllable manufacturing costs

• Supports the cost comparison of alternative manufacturing concepts and the analysis of themanufacturing run-up (step-by-step expansion of the manufacturing process)

• Prepares the information contained in the manufacturing concept for automatic layoutgeneration and dynamic simulation

DELMIA — Process & Resource Planner comprises the following products:

DELMIA — Process & Resource Planning (5671-EPR)

DELMIA — Standard Time Management (5671-STM)

DELMIA — 2D Layout Planning (5671-L2P)

DELMIA — 3D Layout planning (L3P)

DELMIA — Plantype Editor (PTE)

DELMIA — Report Designer (RPD)

DELMIA — Object Customization (OCU)

DELMIA — PPR Navigator & Editor (PRN)

DELMIA — ENOVIA Manufacturing Hub Client (EMH)

DELMIA — ENOVIA Manufacturing Hub Server (EMS)

Process Planning products (all new in this release): Products with a 5671 prefix areorderable (shareable) products. Those with no 5671 prefix are included-only products. They aredescribed here to provide insight into the capabilities of the configurations in which they areincluded. There are no AOPs.

DELMIA — Automatic Line Balancing (5671-ALB)

DELMIA — Automatic Line Balancing enables users to balance processes in automotive finalassembly applications by taking into account several restrictions and by creating geometricalassembly stations. It is a powerful digital technology-based tool that delivers a rich array offunctions to assist the planner in balancing processes for automotive assembly lines. It offersdata in a visually-intuitive, graphically-intensive, and easy-to-use manner so that the rightinformation is available.

Automatic Line Balancing features:

• Automatic balancing based on a process graph and other restrictions

• Material planning

• Manual re-balancing with warnings based on the restrictions

• 2D view of stations, workplaces, processes, and containers

• Several other views

The balancing algorithm takes into account the following restrictions:

• Production rate

• Assembly process precedence

• Space required for material supply

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 10

• Body assignment of process

• Locking of technical stations

• Given worker density

• Work process height

Based on input data, Automatic Line Balancing creates an optimized balancing approach. Theuser interface shows a 2D display of the assembly line, with its stations and material supplyzones along the line. Using drag and drop, the planner can change the balancing result.Throughout the planning process, the system checks the restrictions and gives itsrecommendations to the planner.

Balancing also takes into account the space required for material support at each station. ThePPR data model is visible in the linked products and containers at each process. The plannercan display the assigned parts with their containers using a simple mouse click. For materialplanning, the containers display information on the number of parts, container size, and thefrequency of material supply.

DELMIA — Configuration & Effectivity (5671-CEF)

DELMIA — Configuration & Effectivity allows users to define and apply filter criteria to largemanufacturing projects to view only the desired data. There are several types of filters. Forexample, the user can define criteria such as labels in a project library. After the labels aredefined, they can be applied to the manufacturing object using change management or manuallywhen authoring the manufacturing object. When working on a project, the user can specify thefilter criteria for the project based on the previously defined labels. When the effectivities areapplied, whether through change management or manually, the filter is applied to themanufacturing objects, and only the filtered objects become visible. This allows the user to viewonly the required data for a project.

Configuration & Effectivity delivers the following functions:

• A configuration library

– Option codes

– Option effectivities

– Configuration handler

– Production programs

– Labels

– Lint numbers

– Effectivity domains

• Filter criteria — Different PPR criteria

• Effectivity

– Explicitly applied

– Implicit behavior (link and sibling activated)

• Filtering algorithms

– Code rule frequency

– Absolute effectivity

DELMIA — ENOVIA VPM Connection (5671-E4M)

DELMIA — ENOVIA VPM Connection transfers engineering design data from ENOVIA VPM V4to the ENOVIA Manufacturing Hub. It closely integrates product design departments (usingENOVIA VPM V4 and CATIA V4 or V5) with product manufacturing departments (using ENOVIAManufacturing Hub and DELMIA V5).

ENOVIA VPM Connection transfers the following information:

• Product metadata

– Product structure

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– Product attributes

– Model and document data

– Configuration and effectivity data

• Product geometry — CATIA Graphic Representations (PGRs)

The data transfer can be performed either interactively or via a batch program. Further, theManufacturing Hub can be updated in two ways:

• Full transfer mode — Always transfer the complete product structure.

• Partial transfer mode — Do not transfer the complete product structure, but selectedsub-assemblies only. This mode supports the transfer of a very large product structure by"assembling" it from smaller pieces.

The supported objects in ENOVIA VPM V4 are:

• Product-related objects

– Reference parts

– Part instance information

– Link information (product structure)

– Transformation matrices

• Documents and models

– CGR filename

– CGR geometry

• Effectivity-related objects

– Effectivity on links between parts

– Category, option, and specification

Further capabilities include:

• Type mapping

• Attribute mapping

• Update management and protocol

• Filtering

DELMIA — ENOVIA VPM V5 Connection (5671-E5M)

DELMIA — ENOVIA VPM V5 Connection transfers engineering design data from ENOVIA VPMV5 to the ENOVIA Manufacturing Hub. It closely integrates product design departments (usingENOVIA VPM V5 and CATIA V5) with product manufacturing departments (using ENOVIAManufacturing Hub and DELMIA V5). ENOVIA VPM V5 Connection transfers the followinginformation:

• Product metadata

– Product structure

– Product attributes

– Document data

– Configuration and effectivity data

• Product geometry

– CGRs

– Direct ENOVIA vault geometry access in V5 applications

The data transfer can be performed either interactively or via a batch program. Further, the

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Manufacturing Hub can be updated in three ways:

• Full transfer mode — Always transfer the complete product structure.

• Partial transfer mode — Do not transfer the complete product structure, but selectedsub-assemblies only. This mode supports the transfer of a large product structure by"assembling" it from smaller pieces.

• Incremental transfer mode — Transfer only those changes since a given date.

The supported objects in ENOVIA VPM V5 are:

• Product-related objects

– Product root class (PRC)

– Part master, part version, item instance

– Assembly relations, such as product structure

– Product class (PC)

– Substitute parts

– Transformation matrices

– Bounding boxes

• Document master, document revision, document iteration

– CGR filename

– CGR geometry — CGR file creation through DMU Utilities

– Document name

– Document ID — Allows vault access for DELMIA clients

• Effectivity-related objects

– Effectivity on assembly relations

– Product specifications

– Category, option, specification

– Multiple effectivity domains

Further capabilities include:

• Type mapping

• Attribute mapping

• Update management and protocol

• Filtering

DELMIA — ENOVIA Manufacturing Hub Client (EMH)

The ENOVIA Manufacturing Hub is a customizable database that supports the DELMIA PPRdata model. It is the repository for all data and relationship definitions for the products,processes, and resources used in manufacturing planning. The architecture employs a singledatabase instance that can be used concurrently by several client types, although only onemodification is allowed at a time. The maximum number of active clients for a Manufacturing Hubis configurable.

Manufacturing Hub libraries contain all global data, such as plantype sets with related templateprojects, work system components, global scripts, planning states, raw materials, as well asstandard data types and V5 catalogs. The data model primarily uses inheritance as a modelingmechanism in its hierarchical structure.

The Manufacturing Hub introduces an object-oriented data model to store data in the database.Project-specific containers store all the data objects that belong to the plans related to a project.The data model supports three main types of components:

• Products

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• Processes

• Resources

Customization features allow the data model to be extended for both user-defined types andattributes and to store this information. Customization introduces its own data model containingentities describing types, attributes, and parent-child relationships. These entities model howcomponents are structured within projects. They also provide the facilities necessary to extendthe data model. The customization facility's data model is referred to as the metadata model. Themetadata model holds display information for clients.

DELMIA — ENOVIA Manufacturing Hub Server (EMS)

The ENOVIA Manufacturing Hub is a customizable database that supports the DELMIA PPRdata model. It is the repository for all data and relationship definitions for products, processes,and resources used in manufacturing planning. The architecture employs a single databaseinstance that can be used concurrently by several client types, although only one modification isallowed at a time. The maximum number of active clients for a Manufacturing Hub isconfigurable.

Manufacturing Hub libraries contain all global data, such as plantype sets with related templateprojects, work system components, global scripts, planning states, raw materials, as well asstandard data types and V5 catalogs. The data model primarily uses inheritance as a modelingmechanism in its hierarchical structure.

The Manufacturing Hub introduces an object-oriented data model to store data in the database.Project-specific containers store all the data objects that belong to the plans related to a project.The data model supports three main types of components:

• Products

• Processes

• Resources

Customization features allow the data model to be extended for both user-defined types andattributes and to store this information. Customization introduces its own data model containingentities describing types, attributes, and parent-child relationships. These entities model howcomponents are structured within projects. They also provide the facilities necessary to extendthe data model. The customization facility's data model is referred to as the metadata model. Themetadata model holds display information for clients.

DELMIA — Process & Resource Planning (5671-EPR)

DELMIA — Product and Resource Planning supports the complex task of manufacturing processplanning in two methodically structured steps:

• Determination of the process concept, which, based on the process graph, describes theprocesses as well as the process sequence and properties required for manufacturing theproduct.

• The outline and optimization of the manufacturing concept, which also describes in graphicform (symbol layout) the resources required for manufacturing the product, both qualitativelyand quantitatively, and links them with the processes.

Within the process graph, the planner first determines the necessary (value-added)manufacturing or installation steps and their required sequence for manufacturing the product.The processes are displayed as rectangles, and their sequence by directional connectingarrows. A series of processes can also be defined as a fixed, unalterable priority relation, whichresults for example from the geometry-oriented installation follow-up inspection and simulationwith DPM for Assembly.

The DELMIA PPR Hub is the integrating basis for all DELMIA products that specify or use theprocess (priority) graph. The processes are linked to the elements of the product structure usingthe drag and drop function, which is displayed in the DELMIA — PPR Navigator. In this way, avariant code that may be available is transferred from the product node to the process. Thelinking of product and process is inherited in the subsequent actualization stages of planning(resources in the manufacturing concept or manufacturing layout).

Technical and classifying attributes are available for describing the process properties and canbe completed and adapted in any way within the framework of the configuration. Execution timescan be stored both as an estimated value and as an analyzed value of the processes. Here

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users can gain access to the standardized analysis procedures used worldwide and to the timecomponents which they define (company-specific process standards) using the integratedDELMIA — Standard Time Measurement.

Proven processes and procedural results can also be saved as reusable templates so that theywill be available from the library for use in all planning procedures as a modifiable template orfixed standard.

Whereas the process concept remains "solution-neutral" with respect to the actual manufacturingdesign, the manufacturing concept answers the question as to which resources—machinery,tools, logistic aids and the human work force—are used to realize the processes in the factory.Non-value-add activities are also typically recorded here as part of the planning (such astransport and testing procedures), which are unavoidable for the successful execution andperpetuation of production and which incur costs.

The manufacturing concept graph can be automatically derived from the process graph as aninitial outline. This results in a 1:1 allocation of processes and resources (work stations), whichcan be quickly and easily changed using a variety of convenient editing functions. This methodcould be used, for example, to plan new product-specific manufacturing plants scheduled forconstruction.

The resources of an existing manufacturing concept graph can also be linked individually to anyof the various processes available in the PPR structure. This can be done directly using drag anddrop function. This approach would be applied to planning for the manufacture of new productsusing existing plants (typically workshop manufacturing).

Resources are represented in the manufacturing concept graph by type-specific symbols thatcan be freely configured according to type, quantity and shape. Different colored connectinglines or directional arrows represent links (such as worker to machine) and material flow. All ofthe important information, such as process and performance times, information for media useand all directly calculable preparation and operating costs can be stored in the resources.

The analysis functions assigned to the manufacturing concept show the current level ofutilization of resources at all times according to the planning state, the amount of human labor,and the total costs being incurred for the preparation and operation of the future manufacturingprocess. In this way, the planner can continuously monitor the costs of product manufacturingover which he or she has some control. Based on this analysis, the planner can comparealternative manufacturing concepts with respect to economic indicators.

The analysis is based on a number of so-called premises. These consist of boundaries andstandards, which include time-related planned quantities for product and manufacturing, targetcosts, working time or shift model, and technical requirements of the manufacturing location.

If the DELMIA — 3D Layout Planning product is available, a three-dimensional preliminary layoutoutline can be generated from the manufacturing concept graph, which can later be furtheredited interactively. When generating the layout, specific components from the system elementslibrary or form-describing macros should already have been assigned to the resource symbols inthe manufacturing concept graph. Each resource symbol can even be linked to a 3D macro fromthe very start. (Feasible within the scope of the system configuration.)

Both process and manufacturing concepts can be structured for better manageability. This canbe accomplished either by sub-dividing the graphs into groups or by creating a hierarchicalstructure of subordinate graphs.

Process and Resource Planning stores all data in the DELMIA PPR Hub. In this way, the createdinformation is also visible and can be queried in the PPR Navigator under the specific process orresource node. Conversely, the processes and resources created in the Navigator are alsodisplayed in the process graph or in the manufacturing concept graph and can be inserted intothe process at that point.

DELMIA — 2D Layout Planning (5671-L2P)

DELMIA — 2D Layout Planning supports the simultaneous engineering of production facilities.The schematic layout of the manufacturing concept is turned into a 2D layout and assists inbasic and detail planning of manual and semi-automated workplaces and entire work systems(resource planning). Both general and detailed planning can be performed during each stage ofthe planning phase. A bill of resources of layout components is created automatically ascomponents are added to the layout, and investment roll-ups are calculated. 3D graphiccomponents can be used with the limitation that they can only be visualized in the 2D top view.

To allow the user to quickly create cost-effective designs and to optimize layouts, whether forstations, lines, or complete work systems, 2D Layout Planning comes with a library of commonlyused manufacturing equipment. Users can also easily create their own system elements or useCAD data, such as CGR files, JT files, or VRML1 files, in the layout. System elements are stored

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in a library, allowing their re-use in multiple layouts and projects. In addition to graphics, userscan store detailed written information about the system elements in the database, such as name,manufacturer, and purchase price.

The areas of application include:

• Production facility layout

• Material flow design

• Workplace layout

• Operating materials selection, dimensioning, and arrangement

• Ergonomic evaluation of workplace layout

• Documentation and archiving of planning results

The most important planning results are:

• Bills of resources with all required work system elements

• 2D and 3D workplace views and drawings

• Workplace dimensions

• Facility layouts

DELMIA 2D Layout Planning supports the quick, cost-effective design and optimization ofergonomically safe manual and partially automated work systems.

DELMIA — 3D Layout Planning (L3P) DELMIA 3D Layout Planning supports the simultaneousengineering of production facilities. The schematic layout of the manufacturing concept is turnedinto a 3D layout and assists in basic and detail planning of manual and semi-automatedworkplaces and entire work systems (resource planning). Creating the layout in 3D providesmore accuracy than layouts created in 2D. Additionally, 3D layouts are easier to understand andcan also serve as a basis of discussion.

Both general and detailed planning can be performed during each stage of the planning phase. Abill of resources of layout components is created automatically as components are added to thelayout and investment roll-ups are calculated.

To allow the user to quickly create cost-effective designs and to optimize layouts, whether forstations, lines, or complete work systems, 3D Layout Planning comes with a library of commonlyused manufacturing equipment. Users can also easily create their own system elements or useCAD data, such as CGR files, JT files, or VRML1-files, in the layout. System elements are storedin a library, allowing their re-use in multiple layouts and projects. In addition to graphics, userscan also store detailed written information about the system elements in the database, such asname, manufacturer and purchase price.

The areas of application include:

• Production facility layout

• Material flow design

• Workplace layout

• Operating materials selection, dimensioning, and arrangement

• Ergonomic evaluation of workplace layout

• Documentation and archiving of the planning results

The most important planning results are:

• Bills of resources with all required work system elements

• 3D workplace views and drawings

• Workplace dimensions

• Facility layouts

DELMIA 3D Layout Planning supports the quick, cost-effective design and optimization of

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ergonomically safe manual and partially automated work systems.

DELMIA — Manufacturing Change Management (5671-MCM)

DELMIA — Manufacturing Change Management supports the formal management of changes inthe Manufacturing Hub and in change management controlled (CMC) projects. It also provides aconfiguration control zone (CCZ) process that is related to the relationships of a process. Theowning component controls all modifications on objects within the CCZ through the planningstate related access rights of the owner component.

There are two modes available for change management:

• Common change management — Manufacturing actions are created and maintained inENOVIA and are copied to DELMIA as action proxies.

• Detached change management — Actions are created and maintained directly in DELMIA.

Additional customization provides the ability to define the behavior of manufacturing objectsand relations in manufacturing change management projects.

Manufacturing Change Management can be used to:

• Create and promote or demote actions

• Create modification statements that carry effectivity

• Open a project in CMC mode

• Apply versioning

– Controlled creation, modification, and deletion of versioned objects

-- Applying standard effectivities

-- Applying maximum configuration (either ALWAYS or NEVER valid)

– Controlled creation, modification and deletion of relationships owned by versioned objects

– Tracking of modifications performed on versioned objects and relationships owned byversioned objects

• Perform shop floor integration consistency checks based on selected modification statements

• Retrieve information about tracked modifications

DELMIA — Object Customization (OCU)

The DELMIA — Object Customization offers a large set of utilities for editing types. Creation ofattributes, editing, of attribute properties, and creation/modification of parent child relation aresome of the commonly used functions of DELMIA Object Customization. Functions include:

• Insert a configuration — Open a configuration in INI or XML file format for viewing and editing.These two file types are used to check a configuration before importing it.

• Import a configuration with various update modes.

• Export a configuration.

• Compare configurations.

• Sort a view by type name, prompt, physical name, or base type.

• Create/edit an attribute, editor, page, or parent-child relationship.

DELMIA — PPR Navigator & Editor (PRN)

The DELMIA — PPR Navigator & Editor is a powerful browsing and administration tool foraccessing and manipulating any item of information stored in the PPR Hub. It allows users toaccess the entire planning content and all logical relationships stored in the PPR Hub. PPRitems and their relationships, along with planning prerequisites and objectives, can easily beaccessed by a Windows-like user interface. Powerful user-defined product, process, andresource variant management makes a vast amount of information available to the user but doesnot overwhelm the user because it is delivered only on request.

The PPR Navigator & Editor includes an easy-to-use interface to tailor PPR Hub content toproject- and company-specific requirements. Additional robust customization capabilities allow

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users to adapt the interface to the terminology of these project- and company-specificrequirements.

The included user manager allows system administrators to manage access rights to the PPRHub. Individual users and groups and their access rights to planning content, functions, andstructures are easily defined. The PPR Navigator & Editor also allows the user to map to orincorporate project- or company-specific reporting systems. A powerful forms editor enablesusers to rapidly define forms for evaluations and reports.

The PPR Navigator integrates seamlessly with other DELMIA process planning and simulationproducts. Additionally, task automation can be defined programmatically with easy-to-use VisualBasic and Java Scripting that is supported on Windows platforms.

DELMIA — Plantype Editor (PTE)

DELMIA — Plantype Editor can create and edit custom data models on top of the basic datamodel provided by the Manufacturing Hub. These data models can then be used in one or moreprojects. To allow even greater flexibility, it is possible to define data models for each projectindependently. Beyond creating new types derived from basic data types, it also enables theuser to define the hierarchy and define its relationships to other data types in the data model.

The Plantype Editor is a useful tool for customizing type attributes. A desired type behavior canbe defined by modifying the properties of the attribute. For example, the attribute could becustomized to specify whether or not it will be visible in the browser or whether or not it can beprinted. Among other properties that can be customized is the GUI control type to be used in theproperties dialog. To a great extent, these customization capabilities reduce the chances ofinvalid entries and also supply the appropriate control for a particular attribute type. Additionally,the editor can be used to specify the style the attribute is to use in the properties dialog, such asthe font and background color.

The Plantype Editor provides a powerful way to define the layout of the properties dialog. Itallows the user to define pages and groups, which deliver a user-friendly way to group attributesfor quick access. Advanced layout techniques, such as groups-in-groups, provide the user withadditional flexibility in defining layouts.

DELMIA — Product Viewing (5671-PVW)

With DELMIA — Product Viewing enabled, the user can define viewers for different CADformats, which then can be used to visualize CAD files associated with product nodes. Thiscapability allows the users to employ their preferred tool for product graphic viewing.

DELMIA — Report Designer (RPD)

DELMIA — Report Designer is a powerful report authoring and creation tool. It can be used tocreate a wide variety of customized reports to suit any requirement. Users can create forms bydragging and dropping attributes from a tree structure in the designer. The vast amount ofattributes does not overwhelm the user because the attributes are grouped in a user-friendlymanner to provide fast access.

The Report Designer supports various page layouts and sizes and a variety of output formats(PDF, PNG, JPEG, and so on) in addition to outputting to a printer. It can:

• Print/preview from properties dialog

• Script actions for printing

• Print/preview graphics

• Print/preview external data sources using ODBC

• Script variables

• Print/preview attributes belonging to parent nodes

• Group attributes in page folders and show customized names

• Print/preview list

DELMIA — Standard Time Measurement Datacard (5671-SDC)

DELMIA — Standard Time Measurement Datacard delivers tools for data card-based timeanalysis. Each time analysis subsystem consists of codes, and users often employ datacards toenter the codes. Datacards show all the codes with their options, such as distance, weight, andprecision. If a user does not know all the code options, Standard Time Measurement Datacardassists in writing a time analysis by providing predefined datacards for all standard codes. Users

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can also create user-defined codes and data cards and organize them into groups.

DELMIA — Standard Time Measurement MOST (5671-SMO)

DELMIA — Standard Time Measurement MOST performs time analysis using the Maynard andCompany, Inc. MOST system. MOST divides the process into steps, each of which requires aspecific amount of time.

DELMIA — Standard Time Measurement MTM (5671-SMT)

DELMIA — Standard Time Measurement MTM analyzes processes using the MTM organizationtime analysis system to define the time required by a process. The process is split up into steps,each requiring a pre-defined amount of time, such as reach, grasp, move, position, release, orhuman body motions. MTM takes distances and weight into account and supports analysis ofsteps that involve the use of both hands. It gives detailed information about the workflow.

DELMIA — Standard Time Measurement SAM (5671-SSA)

DELMIA — Standard Time Measurement SAM is based on sequence-based activity and method(SAM) analysis to measure the movements of objects moved by hands. The movements follow aconsistent pattern of activity sequence. There are basic, supplementary, and repetitive activities.Every activity measured supports parameters that include distance, weight, and precision.

DELMIA — Standard Time Measurement (5671-STM)

DELMIA — Standard Time Measurement allows users to efficiently and reliably determine thetime required to perform a specific job sequence based on commonly used time measurementmethods or company-proprietary time standards. Its intuitive user interface allows multiple usersto work efficiently after only a brief familiarization period. Functions include:

• Quick and efficient generation of time analyses with all common analysis procedures

• Capture and management of estimated and recorded time values

• Checking of rules for accuracy and completeness

• Structured management of time analyses with a library as a central repository for generalpurpose data

• Data compression capability that can be applied to covering any number of data levels

• Structured data management

• Automatic updating of time values

• Creation of user-defined formulas for determining process times

• Design of user-defined print forms

• Flexible search mechanisms using search patterns

• Extensive user configuration and authorization/security options

• Import of ERGOTime data

• Tools for data management

DELMIA — Standard Time Measurement Value Added (5671-SVA)

DELMIA — Standard Time Measurement Value Added allows users to create and assign thevalue and non-value add categories for the DELMIA — Standard Time Measurement product. ADELMIA — Standard Time Measurement license is needed to use the value added feature.

DELMIA — Standard Time Measurement WF (5671-SWF)

DELMIA — Standard Time Measurement WF (Work Factor) provides tools to perform ReadyWorkfactor time analysis. Ready Workfactor is a time analysis system developed by the WofacCorporation to define time required for a process. The process is split into steps, each of whichrequires a predefined amount of time for such motions as grasp, pickup, assemble, and release.Body members (hand, arm, trunk, foot, and leg) are regarded as distinct and separate from eachother. In addition to quick and efficient creation and management of Ready Workfactor timeanalyses, Standard Time Measurement WF can create analyses datacards.

DELMIA — Target Tracking (5671-TGT)

DELMIA — Target Tracking allows users to define targets at the beginning of project to enablescheduled-to-actual comparisons to be made during each phase of planning. Targets need to be

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set for planning projects to determine the course of the plan according to its scheduled progress,with space dependencies and a spending schedule, and to enable a scheduled-to-actualcomparison to be made during each phase of the planning process. Targets can then beincluded in the DELMIA — Process Engineer (5671-EEC) product for one area or for multipleareas to cover an entire project. The Process Engineer allows the user to set detailed targetvalues with which the areas of responsibility with target data for the entire enterprise and forcross-functions between individual divisions.

DELMIA — Target Tracking offers the following functions:

• Generate new targets

• Assign targets

• Edit target settings

• Move targets

• Search targets

• Print/preview

DELMIA — Workload Balancing (5671-WLB)

DELMIA Work Load Balancing is an integrated application for the general assembly domain. Itcreates relationships between processes and stations. Work Load Balancing offers data in avisually intuitive, graphically intensive, easy-to-use manner so that the right kind of data isavailable to the planner.

The primary features of the tool are:

• Relate processes to stations

• Create a list view with configurable columns

• Create a chart view with a bar chart

• Display usage based on cycle time, number of workers, or total station time

• Calculate and display balancing results

– Overall utilization (real)

– Utilization of a single workplace (real)

– Overall idle time (real and optimum)

– Cycle time

– Total time

– Idle time of a single workplace (real)

– Overall number of required workers (real and optimum)

– Required number of workers for a single workplace (real)

• Reflect code rule filtering

• Balance over two levels of PPR tree hierarchies (configurable)

• Compute in one balancing operation the individual cycle times of the sub-sections of a line

• Modify flags for workplaces

• Create a tooltips chart view to show detailed process information

DELMIA Process Detailing and Validation

Withdrawn configurations and products: The following are withdrawn from marketing:

• DELMIA — DPM Assembly GT 2 Configuration (5672-AG2)

• DELMIA — DPM Body in White GT 2 Configuration (5672-BG2)

• DELMIA — Tolerance Analysis of Deformable Assembly 3 Configuration (5672-MA3)

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• DELMIA — DPM Machining GT 2 Configuration (5672-PG2)

• DELMIA — Robotics Simulation GT 2 Configuration (5672-WG2)

• DELMIA — Robotics Simulation XT™ 2 Configuration (5672-XG2)

• DELMIA — DPM Process & Resource Definition GT 2 Configuration (5672-XG2)

The capabilities delivered by these withdrawn configurations can be achieved by adding AOPsto an available configuration to create a functionally equivalent custom configuration. Forexample, adding Assembly Design 1, Part Design 1, Wireframe & Surface 1, Real TimeRendering 1, Interactive Drafting 1, and Generative Drafting 1 to DPM Assembly 2 will providefunctions equivalent to the withdrawn DPM Assembly GT 2 configuration. Current customerscan migrate to new configurations through the special bid process. Contact your IBMrepresentative for details.

• DELMIA Automation — CLM System Behavior Definition 2 AOP (5674-SBH).

Other changes

• The following configurations and products are now generally available. Previously, they weresubject to controlled availability.

– DELMIA — DPM Structure 2 Configuration (5672-DS2)

– DELMIA — Electrical Harness Process Simulation 2 AOP (5674-EHS)

• DELMIA — STEP Core Interface 1 is now available as a shareable product (5672-MST).Previously, it was available as an AOP only.

• DELMIA — DPM Shop Floor Viewer 2 is now available as an AOP (5674-SHF). Previously, itwas an included-only product.

• The correct name for the 5672-SP2® configuration is DELMIA — Structure ManufacturingPreparation 2.

Ordering Process Detailing and Validation products: These products can be ordered in threeways:

• As a predefined set of products included in a standard configuration.

• As an AOP, so called because it can be added on to a standard configuration to build acustom configuration.

• As a shareable product. In this case the product is delivered with its own license key.Shareable products allow one user to obtain the license at the beginning of a session or toleave it for another user within the network. Shareable products, along with configurations, aredistinguished by their 5672 prefix; AOPs are distinguished by their 5674 prefix.

Note that some products are available as either an AOP or a shareable product.

Products can have one or more pre- or corequisite products. Refer to the Software requirementssection for details.

New DELMIA Process Detailing and Validation products: DELMIA — Part Design FeaturesRecognition 1 (5674-FRM)

DELMIA — Part Design Feature Recognition 1 (FRM) recognizes CATIA Part Design features inan isolated B-representation. The user can retrieve a comprehensive CATIA product structurefrom an isolated B-representation part and then import the part and recover its elementary PartDesign features. Part Design Feature Recognition 1 fosters better downstream applicationsintegration to improve part simplification for tool definition and more flexible local design.

DELMIA — Generative Shape Design 1 (5672-GSM)

DELMIA — Generative Shape Design 1 helps design mechanical shapes based on acombination of wireframe and multiple surface features. It includes an extensive set of tools forcreating and modifying mechanical surfaces used in the design of complex shapes or hybridparts. Generative Shape Design 1 employs smart tools, such as "powercopy," to manage featurereuse. Its feature-based approach offers a productive and intuitive design environment wheredesign methodologies and specifications can be captured and reused.

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DELMIA — Human Preferred Angle Catalog 2 (5672-MAC, 5674-MAC)

DELMIA — Human Preferred Angle Catalog 2 delivers a set of preferred angles related to thecomfort, safety, and strength of different postures. Users can quickly optimize human manikinpostures. Benefits include:

• Enhances the precision of analyses results by providing catalogs containing advancedcomfort, safety, and strength data

• Optimizes manikin posture based on scientific references for comfort, safety, and strength

• Promotes human ergonomics simulation to more users though an improved user experience

DELMIA — Assembly Design 1 (5674-MAS)

DELMIA — Assembly Design 1 (AS1) manages assemblies, giving users the ability to:

• Design in an assembly context with user-controlled associativity

• Concurrently engineer the design of the assembly and individual parts

• Establish mechanical assembly constraints using mouse movements or graphical commandsto snap parts into position

Through a manual-automatic update choice, users can reorder the product structure, drag partsdynamically into position, and make collision and clearance checks. Productivity is ensuredthrough catalog access for standard parts and assemblies, access to powerful advancedassembly features, automatic exploded view generation, and automated bills of material (BOMs)generation.

Assembly Design 1 features:

• A complete range of assembly tools for supporting concurrent design teams

• Work optimization by automatically managing the progressive relevant loading (BREP mode)and display of assembly data

• Comprehensive assembly annotation and documentation

• High-productivity assembly manipulation and modification tools allowing dynamic analysis ofassembly definitions and collision checking

• Real-world product simulation by utilizing the unique flexible behavior derived from mechanicalassembly definition

DELMIA — DMU Navigator 1 (5674-MDU)

DELMIA — DMU Navigator 1 performs collaborative digital mock-up (DMU) reviews usingpowerful visualization, navigation, and communication capabilities. A large number of tools(annotation support, hyperlink and animation creation, publishing, and conferencing tools)facilitate collaboration among all team members involved in the digital mock-up inspectionprocess. Productivity is enhanced through the ability to automate commands and work onvisualization files for quick data loading. Complete digital mock-up review and simulation is madepossible through native integration with other DMU products, such as DMU Dimensioning &Tolerancing Review and DMU Space Analysis 1.

Addressing all populations involved in DMU-related processes, DMU Navigator 1 handles digitalmock-ups of all sizes, from consumer goods assemblies to large assemblies for automotive,aerospace, plant, shipbuilding, and heavy machinery.

DMU Navigator 1 includes the following functions:

• Provides 2D viewing and 3D navigation tools for DMU inspection

• Supports a large set of 2D and 3D formats

• Allows collaboration on the same project review from different location thanks to itsconferencing capability

• Supports publishing through report creation in HTML format

DELMIA — Human Task Catalog 2 (5672-MHC, 5674-MHC)

DELMIA — Human Task Catalog 2 boosts productivity by delivering a catalog of tasks and task

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transitions for common postures. It includes process information for simulating from-to transitionsfor common postures, such as sitting to standing, standing to kneeling, and ingress and egress.Estimated time reductions for generating a simulation using catalogs can be as high as 70%when compared to non-catalog-based processes.

Human Task Catalog 2 fosters the sharing and dissemination of consistent data amongstakeholders in an organization. It is also an effective way to improve the user experience whilereducing the time needed to generate simulations, thereby promoting the use of human modelingby more designers. Users can also re-use major components of manikin-related data with allappropriate simulations.

DELMIA — Multi-Slide Lathe Machining 2 (5674-MML)

DELMIA — Multi-Slide Lathe Machining 2 enables NC programmers to leverage the productivityof multi-slide lathe machining centers that feature multiple turrets and spindles. Multi-Slide LatheMachining helps companies to optimize their return on investment on these multi-axis lathemachines and boosts the overall productivity of complex part machining processes by deliveringpowerful tools for creating, simulating, and synchronizing NC programs that use multiple turrets,shortening the time required to machine high-quality parts. Multi-Slide Lathe Machining takesadvantage of the standard knowledgware capabilities and the associativity with design tools forefficient change management.

Multi-Slide Lathe Machining 2 includes the following functions:

• Optimizes the use and the productivity of lathe center machines

• Delivers smart steering synopses for turning and/or milling operation synchronization

• Helps to manage program quality through time-based replay review capabilities

• Fosters a high level of automation and standardization by capture and reuse of provenmanufacturing know-how

• Uses associativity with design tools for efficient design change management

DELMIA — Multi-Axis Surface Machining 2 (5674-MMM)

DELMIA — Multi-Axis Surface Machining 2 easily defines numerical control (NC) programsdedicated to machining multiple surfaces and curves of 3D parts in multi-axis mode. It offers5-axis simultaneous surface machining operations and a variety of tool axis strategies, includingdynamic tool axis inclination for collision avoidance. As a complementary product to 3-AxisSurface Machining 2 (MSM), Multi-Axis Surface Machining 2 extends 3-axis surface machiningto multi-axis machining. Furthermore, it takes advantage of the intuitive user interface for quicktool path creation and tight integration between tool path generation and verification, includingmaterial removal simulation.

Multi-Axis Surface Machining 2 features:

• Multi-axis machining of multiple surfaces with full collision avoidance using various tool pathstyles

• Multi-axis machining of multiple curves using various tool path styles

• Various tool axis strategies, including dynamic lead/lag and tilt angle

• Material removal simulation in multi-axis mode

• Complementary product to extend the capabilities of 3-Axis Surface Machining 2

DELMIA — Human Posture Catalog 2 (5672-MPC, 5674-MPC)

DELMIA — Human Posture Catalog 2 boosts user productivity by delivering two sets of catalogscontaining more than 350 postures for both static and grasping postures. These catalogs letusers quickly insert a human manikin into a digital mock-up and then, if needed, to fine-tune themock-up until the targeted manikin position is reached. Catalog-based simulations offer up to a70% productivity gain over non-catalog based processes.

Human Posture Catalog 2 offers climbing, driving, crawling, hand counting, sitting, and standingstatic postures with more than 200 grasping postures adapted to more than 60 tools. Catalogsare also adapted to different population percentiles for maximum grasping precision.

Additionally, Human Posture Catalog 2 affords the designer an improved user experience.Selecting from the hundreds of standard positions available makes it easier to use digital humanmanikins and promotes the use of human modeling by more designers. It also makes it easy for

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 23

a designer to create a new posture by starting with a standard catalog posture, fine-tuning it, andthen saving it for future use.

DELMIA — Part Design 1 (5674-MPD)

DELMIA — Part Design 1 supplies a basic set of integrated multi-discipline tools for part design.Using the best-in-class feature approach combined with Boolean tools, users can integratemultiple product views and constraints. Designers can choose between single part sketching orworking in the assembly context and benefit from the controlled associativity that promotescollaborative design.

With clear specification management tools, modifications can be made and the impact assessedquickly. This capability is ideal for multi-user environments where the ability to perform rapiditerations is key to productivity. The benefits of this approach are maximized when combinedwith other applications for styling, mechanical surface definition, assembly modeling, anddownstream documentation.

Part Design 1 features:

• A full range of specification-driven features with intuitive definition and modification

• Implicit and explicit relationship definitions to drive design and manufacturing intent

• A flexible multi-body approach to part design to optimize teamwork, performance, and reuse

• A natural approach of modifications for optimization through a powerful context recognitionmechanism

DELMIA — Composite Review 2 (5674-MPR)

Distributed supply chain organizations need a way for stakeholders to view, understand, andevaluate a virtual product definition — anytime, anywhere, in any format. Composite Review 2allows users to share composite knowledge across the value chain. It gives them dynamiccomposite information access, numerical analysis, and core sampling in the product context.

Composite Review 2 is part of the global V5 solution for composite design and manufacturingthat allows manufacturers — aerospace, automotive, shipbuilding or consumer goods companies— to reduce the time needed to design composites parts.

DELMIA — Real Time Rendering 1 (5674-MRT)

Real Time Rendering 1 (RT1) enables designers to leverage technological materialspecifications to produce realistic renderings of their model. Texture can be created fromscratch, modified from imported digital images, or selected from the included library. Associativityis maintained between the material library and the material applied to the parts. Materials can beapplied through a specification-driven approach or through simple selection. Real-time displaycomputations quickly convert models to realistic renderings.

Real Time Rendering 1

• Applies rendering and technological specifications to designs enabling users to producerealistic renderings

• Enables designers to interactively create material texture definitions

• Allows designers to create design families and organize the material definitions

• Includes a library of predefined materials

• Offers the option of applying textures with standard Windows methods or through aspecification-driven approach

• Renders textured images in real time

• Enables users to share material specifications with other DELMIA applications

• Offers the same ease of use and user interface consistency as all DELMIA applications

DELMIA — 3 Axis Surface Machining 2 (5674-MSM)

DELMIA — 3 Axis Surface Machining 2 easily defines 3-axis milling and drilling operations.High-speed milling technology is supported for all milling operations. Quick tool path definition isbased on an intuitive user interface. Tools can be easily created and stored in tool catalogs. Theentire manufacturing process is covered: tool path definition and computation, tool pathverification (including material removal simulation to NC code, and shop floor documentation

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 24

generation. Instant Cycle Update Technology allows fast tool path update after modification.Associativity with design parts allows efficient change management.

3 Axis Surface Machining 2 features:

• A full set of 3-axis milling and drilling operations for accurate tool path definition, includingsupport of high-speed milling technology

• Automated detection and reworking of un-machined areas in roughing or finishing

• Flexible management of tools stored in file-based tool catalogs or in external tool databases

• A high level of automation and standardization by capturing and reusing proven manufacturingknow-how

• Tool path verification by material removal simulation and analysis of the in-process part

• Associativity with design parts for efficient change management

DELMIA — Human Anthropometry Catalog 2 (5672-MTC, 5674-MTC)

DELMIA — Human Anthropometry Catalog 2 delivers a set of anthropometry data dealing withdifferent population sizes. It enhances the precision of analyses results by providing catalogswith advanced anthropometry attributes. Designers can optimize and validate products againstdifferent population segments to increase market acceptance. Selecting from the standardmanikins in the catalog makes it easier to use digital human manikins and promotes the use ofergonomic simulation by more designers.

DELMIA — Wireframe & Surface 1 (5674-MWS)

DELMIA — Wireframe & Surface 1 is used to create wireframe construction elements during thepreliminary design phase. It can also enrich existing 3D mechanical part designs with wireframeand basic surface features. Its feature-based approach contributes to a productive and intuitivedesign environment where design methodologies and specifications can be captured andreused.

Wireframe & Surface 1 features:

• Essential 3D geometric features to create wireframes and shapes

• A wireframe and surface structure editor for facilitating the capture of design intent andspeeding up design changes

• Associative design-in-context to allow concurrent work with user-controlled associativity

• Timesaving management of design modifications

• Flexible post-design 3D parameterization

DELMIA — Production System Simulation 2 (5674-PSS)

DELMIA — Production System Simulation performs dynamic simulation-based evaluation andimprovement of a manufacturing process and its related material flow. It is a validation tool forthe process planner and a decision support tool for production engineers for analyzing thecharacteristics (design, capacity planning, layout planning, inventory management, andscheduling) of production systems. It can be used to simulate the logical behavior of the systemto observe, analyze, and verify the coordination of resources in the operation of the system. Itoffers capabilities to test and verify that a given system can achieve the required production rateand provides tools to identify and eliminate bottlenecks.

Production System Simulation 2 assists in the definition of statistics collection for product,process, and resource entities, collates and stores the collected statistics, and allows the user togenerate and view reports on the collected statistics.

Production System Simulation 2

• Performs multi-cycle simulation with uncertainty and product mix

• Defines system boundaries, sources, and sinks

• Defines activity time variability

• Assigns rules for resource behavior to influence product acceptance for processing androuting

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 25

• Simulates components of production system including uncertainty and variability

• Runs discrete event simulation with or without animation

• Collects defined statistics for products, processes, and resources and generates reports onthe collected statistics

• Trace and debug models during simulation

DELMIA — DPM Shop Floor Viewer 2 (5674-SHF)

This product is now available as an AOP. Previously, it was available as an included-onlyproduct.

Education support

Schedules and enrollment

Call the IBM PLM North America (PLM/NA) response line at 800-395-3339 for schedules andenrollments.

Technical information

Specified operating environment

Hardware requirements

Summary of DELMIA V5.18 recommended configurations

• Oracle server — Any certified hardware and operating system platform

• Manufacturing Hub server

– Hardware

-- Any certified 64-bit server machine (EM64T, AMD64)

-- Any certified 32-bit server machine (Intel® x86)

– Operating system — Windows Server R2 (32-bit)

• Clients, including local server installation

– 64-bit — Any certified 64-bit server machine (EM64T, AMD64) with Windows XP 64-bitService Pack P1 only

– 32-bit — Any certified 32-bit server machine (Intel x86) with Windows XP 32-bit ServicePack 2 only

A complete list of certified combinations of hardware and software platforms can be found at

http://www.3ds.com/support/workstations-peripherals/

Hardware requirements for DELMIA Process Detailing and Validation: The followingrequirements are common to all operating systems supported by this release. Platform-specificrequirements are specified in subsequent topics:

• Required components and features

– Disk drive: An internal or external disk drive (minimum recommended size is 4 GB) isrequired to store program executables, program data, the user environment, and to supplypaging space. Installation of all DELMIA Process Detailing and Validation products requires2.0 GB on Microsoft® Windows, 2.4 GB on AIX®, 2.7 GB on HP-UX, and 2.3 GB on Solaris.

– Memory: 256 MB of RAM is the minimum recommended for all applications. 512 MB ofRAM is recommended for DMU applications on large assemblies. Requirements may begreater when large amounts of data are used.

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 26

– Internal/external drives: A CD-ROM drive is required for program installation and for accessto the online documentation, which can optionally be downloaded to disk.

– Display: A graphics color display compatible with the selected platform-specific graphicsadapter. The minimum recommended size for usability reasons is 17 inches. Minimumresolution for Windows workstations is 1024 x 768 and 1280 x 1024 for UNIX®workstations. When selecting a graphics adapter, hardware texturing capability is stronglyrecommended when using products that employ texture mapping, in which case the amountof texture RAM has to be adequate for the number and complexity of textures to be used.

– Keyboard: A specific keyboard compatible with the selected installation locale may berequired for national language support.

– Pointing device: Three-button mouse. On Windows workstations, a two-button mouse mayalternatively be used (the third button is emulated with a keyboard sequence). Thethree-button mouse is recommended for usability reasons. IntelliMouse (two buttons plus awheel instead of the third button) is an alternative to the three-button mouse on Windowsworkstations. The wheel acts as the middle button to allow additional manipulations, suchas panning and scrolling.

• Optional components and features: For Platform 2 (P2) products, SpaceBall orSpaceMouse, in addition to the standard mouse, can be used to perform graphicmanipulations (zoom, pan, and rotate). The required drivers are delivered with these devices.Support of these devices is also available with the DMU Navigator 1 (5674-MDU) AOP.

The robustness of the overall solution is dependent on the robustness of the operating systemand the hardware environment used. Configurations certified by Dassault Systemes for runningDELMIA are published at

http://www.3ds.com/support/workstations-peripherals/

Although DELMIA products might run on configurations or with graphic adapters other than thosespecified for each of the following platforms, incidents specific to such configurations or adapterswill not be accepted for support.

Microsoft Windows XP 32-bit

• System unit: An Intel Pentium® 4 or Xeon-based workstation running Microsoft Windows XPProfessional Edition Service Pack 2 is required.

• Graphics adapter: A graphics adapter with a 3D OpenGL accelerator is required.

Note: Graphics performance on local transformations (panning, zooming, and rotating model)will depend on the selected graphics adapter. The graphics adapter should have the followingcapabilities:

– 24-bits, true color, double buffered visual.

– 24-bits, Z-buffer.

– Stencil buffer.

– Minimum supported resolution: 1024 x 768. A resolution of 1280 x 1024 is recommendedfor usability reasons.

• Network adapter: An active LAN adapter (Ethernet or Token Ring, installed and configured)is required for license key purposes.

Microsoft Windows x86 64-bit

• System unit: An Intel Xeon EM64T or AMD Opteron 64-bit based workstation runningMicrosoft Windows XP Professional x64 Edition.

• Memory: 4 GB is the recommended minimum.

• Disk drive: 2.5 GB is the recommended minimum.

• Graphics adapter: A graphics adapter with a 3D OpenGL accelerator is required.

Note: Graphics performance on local transformations (panning, zooming, rotating model) willdepend on the selected graphics adapter. The graphics adapter should have the followingcapabilities:

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 27

– 24-bits, true color, double buffered visual.

– 24-bits, Z-buffer.

– Stencil buffer.

– Minimum supported resolution: 1024 x 768. A resolution of 1280 x 1024 is recommendedfor usability reasons.

• Network adapter: An active LAN adapter (Ethernet or Token Ring, installed and configured)is required for license key purposes.

AIX: System unit: Any RS/6000®, based on the POWER4™, POWER5™, Power PC-970processor families, supported on AIX V5.3

Graphics adapter: One of the following graphics adapters is required.

• GXT500P

• GXT550P

• GXT800P

• GXT800M

• GeXT2000P

• GXT3000P

• GXT4000P

• GXT4500P

• GXT6000P

• GXT6500P

HP-UX: System unit: Any B-Class, C-Class, or J-Class workstation based on the PA8000,PA8800, and PA8900 processor family and supported on HP-UX 11iv1.

Graphics adapter: One of the following graphics adapters is required.

• Visualize-FXE

• Visualize-FX2

• Visualize-FX4

• Visualize-FX5

• Visualize-FX6

• Visualize-FX10

• Fire GL-UX

• Fire GL T2-128

• Fire GL X1

• Fire GL X3

Sun Solaris: System unit: Any Ultra1, Ultra2, Ultra10, Ultra30, Ultra60, Sun Blade 100, SunBlade 150, Sun Blade 1000, Sun Blade 1500, Sun Blade 1500+ (1.5 GHz), Sun Blade 2000, orSunBlade 2500 workstation based on the UltraSPARC processor supported on Solaris 10.

Graphics adapter: One of the following graphics adapters is required.

• Creator3D

• Creator3D Series III

• Elite 3D (U10-440MHz only for U10 workstations)

• Elite 3D Lite

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 28

• Expert 3D

• XVR-500

• XVR-600

• XVR-1000

• XVR-1200

Hardware requirements for DELMIA Process Planning servers: Any Windows 2003 Serverplatform as certified by Microsoft.

Hardware requirements for DELMIA Process Planning client

• Processor: Intel Pentium-4, minimum 2400 MHz.

• Disk drive: Minimum of 1024 MB; 2048 MB to install a client, server, and an Oracle server onthe same machine.

• Graphical interface: 1024 x 768 OpenGL with a minimum of 32 MB onboard memory.

• Network connection: LAN (completely configured).

• Communication protocol: TCP/IP. The machine must have an IP address (either static orvia DHCP).

Software requirements

Software requirements for DELMIA Process Detailing and Validation: Summary ofchanges for V5.18

• The following operating systems are no longer supported in V5.18:

– Microsoft Windows 2000 Professional Edition

– AIX 5.2

– SGI IRIX (all levels)

– Sun Solaris 8

• Minimum run-time support for AIX running on Power4 or Power5 processors for both 32- and64-bit is provided by AIX 5.3 ML03.

• Minimum run-time support for HP-UX Run-time is HP-UX 11i December, 2004 (on 32-bit only).

• Minimum run-time support on Sun Solaris SPARC is Solaris 10 SPARC. The minimum levelrequired is Solaris 10 HW 03/05 with 119280-06 CDE 1.6 — Runtime library patch for Solaris10.

• The required level for document browsers in a UNIX environment is Mozilla 1.7 for AIX,HP-UX, and Solaris and Firefox 2.0 for SUN Solaris SPARC.

• The required level for document browsers in a Microsoft Windows environment is MicrosoftInternet Explorer 7.0 or Mozilla 1.7.

• The required level for JRE is 1.5.0 for all operating systems.

Common software requirements: DELMIA Process Detailing and Validation runs on selectedlevels of:

• Microsoft Windows XP and XP x64

• AIX

• Hewlett Packard HP-UX 11iv1

• Sun Solaris SPARC

Refer to the Program Directory or contact your IBM Support Center for appropriate correctiveservice to apply to the software described below.

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 29

Software requirements for Microsoft Windows XP Professional Edition Service Pack 2:Windows XP delivers an implementation of OpenGL libraries. These libraries may have to bemodified to accommodate the selected graphics adapter when installing the graphics adapterand its associated drivers. For recommendations related to driver levels based on certifiedconfigurations, visit

http://www.3ds.com/support/workstations-peripherals/

A localized version of the operating system may be required when the selected installation localediffers from Latin 1.

Note: DELMIA V5.18 does not support Windows 2000 Professional. Customers currentlyrunning DELMIA V5 on Windows 2000 are encouraged to migrate to Windows XP.

DELMIA Process Detailing and Validation 64-bit on Windows XP Professional x64 Edition:A Microsoft implementation of OpenGL libraries as delivered with Microsoft Windows XPProfessional x64 Edition. These libraries may have to be modified to accommodate the selectedgraphics adapter when installing the graphics adapter and its associated drivers. Forrecommendations related to driver levels based on certified configurations, visit

http://www.3ds.com/support/workstations-peripherals/

DELMIA Process Detailing and Validation 32-bit on Windows XP Professional x64 Edition:A Microsoft implementation of OpenGL libraries as delivered with Microsoft Windows XPProfessional x64 Edition. These libraries may have to be modified to accommodate the selectedgraphics adapter when installing the graphics adapter and its associated drivers. Forrecommendations related to driver levels based on certified configurations, visit

http://www.3ds.com/support/workstations-peripherals/

Software requirements for AIX 32- and 64-bit platforms: AIX 5.3 ML03 (using 64-bit kernel),with the following components:

• XL C/C++ Enterprise Edition Run-time Environment at a minimum level of V7.0.0. XL 7 May2005 PTF R/T (xIC.aix50.rte at level 7.0.0.6) is delivered through APAR IY71976

• XL Fortran Enterprise Edition for AIX Run-time at a minimum level of V9.1.0. November 2004XL Fortran for AIX V9.1 Runtime PTF is available at

http://www.ibm.com/support/docview.wss?rs=0&uid=swg24008377

Or

AIX 5.3 TL04-SP01 (using 64-bit kernel) with following components:

• XL C/C++ Enterprise Edition Run-time Environment at a minimum level of V8.0.0. January2006 IBM C++ Runtime Environment Component for AIX is available at

http://www.ibm.com/support/docview.wss?rs=0&uid=swg24011532

• XL Fortran Enterprise Edition for AIX Run-time at a minimum level of V10.1.0 available at

http://www.ibm.com/support/docview.wss?rs=0&uid=swg24010669

Software requirements for HP-UX: HP-UX Version HP-UX 11iv1 (11.11) (December, 2004)with the following components at the minimum levels indicated:

• HP-UX Technical Computing OE (TCOE) Component December 2004.

• HP-UX 700 OpenGL 3D API Runtime Environment.

• CDE (delivered with the operating system).

• A localized version of the operating system may be required when the selected installationlocale differs from ISO code pages.

• WebSphere® Application Server 6.1 and WPS support require HP 11iv2; however,applications support is not provided on HP 11iv2.

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 30

Software requirements for Sun Solaris: Sun Solaris 10 H/W 03/05, with 119280-06 CDE 1.6— Runtime patch for Solaris 10.

DELMIA Process Detailing and Validation general packaging principles

• A DELMIA P1 product or a DELMIA P1 configuration requires or must include (in the case ofconfigurations) DELMIA — Object Manager 1 (DO1). P1 products can be used on P2, and insuch cases, they operate with DELMIA — Object Manager 2 (DOM).

• A DELMIA P2 product or a DELMIA P2 configuration requires, or must include (in the case ofconfigurations), DELMIA — Object Manager 2 (DOM).

• License keys for configurations are acquired and released for the total configuration.

• The functions within a configuration cannot be shared.

• A configuration is required for each DELMIA seat.

• DELMIA add-on and shareable products may require prerequisite products that are notincluded in a standard purchased configuration. When a prerequisite product is not included inthe selected standard configuration, both the AOP and its prerequisite products must bepurchased and included as AOPs within a custom configuration. Prerequisites for shareableproducts can be satisfied by a standard configuration, by an AOP within a customconfiguration, or by a shareable product.

Macro replay capabilities: DELMIA has built-in macro record and replay capabilities. For UNIX,the interpreter is VB Script 3.0 from Mainsoft. Its components are included as shared libraries.

For Windows, the interpreter is either:

• VB Script, at a minimum level of V5.0. It is delivered with Microsoft Internet Explorer. VB Scriptlibraries at level 5.0.0.3715 are delivered with Microsoft Internet Explorer 5.0 or at later levelswith later versions of Internet Explorer. Use of VB Script is recommended for developingMicrosoft Windows- and UNIX-compatible macros.

• Microsoft VisualBasic for Applications (VBA), at a minimum level of 6.0. VBA is delivered andinstalled by default with DELMIA Process Detailing and Validation.

Printer and plotter support

• UNIX — DELMIA Process Detailing and Validation supports the following plotter/printerlanguages:

– CGM-ISO, ATA, CALS

– Hewlett Packard HP-GL/2-RTL and HP-GL or IBM-GL subsets

– OCE Graphics GPR50: VDF plotting routines

– PostScript

• Windows — Printers and plotters are supported through the vendor's drivers for the targetedprinter or plotter relative to the targeted version of the operating system. Contact the printer orplotter vendor for requirements and support.

Batch monitoring using WebSphere MQ (WMQ): Using WMQ communication tools, somebatch operations can be launched remotely. When implemented at the batch level, this optionalfeature requires WMQ at minimum level 6.0. For availability of client and server components onsupported platforms, visit

http://www.ibm.com/software/mqseries/messaging/

WMQ Client is required on systems where the transaction is initiated. WMQ Server is requiredon systems where remote batches are executed.

Software requirements for DELMIA Process Planning

Manufacturing Hub server: The Manufacturing Hub server requires Windows Server 2003Service Pack 2 or Windows Server 2003 R2 (32-bit).

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 31

Clients

• Windows XP Pro Service Pack 2 only (32-bit)

• Windows XP x64 Service Pack 1 only (64-bit)

• Windows Server 2003 Service Pack 2 or R2 (32-bit) when used as a Citrix server

Certified third-party software (Windows-based)

• Oracle database — Oracle 10.0.2 is a prerequisite for the Manufacturing Hub server.

• Java is a prerequisite for:

– Manufacturing Hub server

– Single sign-on (SSO) on Process Planning clients

– Manufacturing Hub integration and SSO on Process Detailing and Validation (32- and64-bit)

The required level is:

– For Windows 32-bit — Sun J2SE Runtime Environment 5.0 Update 7

– For Windows 64-bit — Sun J2SE Runtime Environment 5.0 Update 7 for AMD64

• Microsoft J# V2.0 and Microsoft .NET Framework 2.0 is a prerequisite for SSO andWebServices for the Manufacturing Hub and for SSO on Process Planning and 32-bit ProcessDetailing and Validation clients.

• FlexLM Version 8.3b is a prerequisite for the licensing environment for the Manufacturing Hubserver and Process Planning clients.

• Citrix Presentation Server 4 is not a prerequisite, but can be used with Process Planningclients.

• Microsoft Office Excel 2003 is a prerequisite for script-based reporting on Process Planningclients and for DPM work instructions on Process Detailing and Validation clients.

• Microsoft Internet Explorer 7 is a prerequisite for ErgoCheck on Process Planning clients andfor documentation on Process Detailing and Validation clients.

Notes

• For 64-bit SSO, only JRE is supported. For 32-bit SSO, either JRE or J# with .NET can bechosen.

• WebServices is required for change management via the ENOVIA Engineering Hub.

• For the Java Runtime Environment on Windows XP, the environment variable JAVA_HOMEhas to be set on the Process Planning server to establish communication between it andProcess Planning clients. The required version cab be downloaded from

http://java.sun.com/products/archive/j2se/5.0_07/index.html

• To obtain the .NET Framework 2.0 redistributable, go to

http://www.microsoft.com/downloads

Database-related prerequisites: Oracle RDBMS Server Standard Edition or Enterprise EditionVersion 10.2.0.2, or higher, is required to store data on the Manufacturing Hub server.

Access to product information: Product information is delivered with the product CDs in HTMLformat. An HTML browser is required to access this documentation. Online documentation maybe installed and used only in the same supported operating environments as DELMIA ProcessDetailing and Validation.

• In a UNIX environment

– For AIX, HP-UX, or Solaris — Mozilla 1.7

– Firefox for SUN Solaris SPARC

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 32

• In a Microsoft Windows environment, one of the following browsers is required:

– Microsoft Internet Explorer at a minimum level of 7.0

– Mozilla 1.7 with the Java plug-in installed

In addition to a Java-enabled Web browser, the Java Plug-in at level 1.5 to search onlinedocumentation:

• For AIX, Java Runtime Environment version Java 1.5.0 SR3 can be downloaded from

http://www.ibm.com/developerworks/java/jdk/aix/service.html

• For HP-UX, Java Runtime Environment 5.0.0.1 can be downloaded from

http://www.hp.com/go/java

• For Sun Solaris, Java Runtime Environment version 5 update 7 can be downloaded from

http://java.sun.com/products/archive/index.html

• For Microsoft Windows, Java plug-in version 5 update 7 can be downloaded from

http://java.sun.com/products/archive/index.html

Although access to the online documentation might work on other HTML browsers, incidentsspecific to browsers other than those specified are not eligible for support.

Note: Improvements in HTML searching and printing capabilities eliminate the need to duplicateproduct information in the Portable Document Format (PDF) format. PDF CDs are therefore nolonger included in the DELMIA Process Detailing and Validation softcopy collection kit.

Prerequisites for the license management environment: Process Detailing and Validation

Process Detailing and Validation applications must have an active LAN card (Ethernet or tokenring) and TCP/IP installed and properly configured, even in the case of nodelock keys, though fornodelock there is no need to have the workstations connected to the network. No additionallicense management software is required when accessing nodelock license keys.

IBM License Use Management (LUM) is required to serve concurrent license keys across anetwork. A LUM configuration file (i4ls.ini) is required on DELMIA Process Detailing andValidation clients to access concurrent license keys from these servers. Server and Nodelocklicense management mechanisms are available on all supported operating environments.

IBM LUM level V4.6.8.3 is the minimum level.

The latest release of IBM LUM V4, together with any applicable patches, can be downloaded atno charge from

http://www.ibm.com/software/awdtools/lum/support.html

Access to the downloads requires an IBM ID, which can be created at no cost when firstrequesting a download.

Process Planning

Process Planning applications require FlexLM 8.3b on the Manufacturing Hub server andProcess Planning clients.

FlexLM technical information can be found at

http://www.macrovision.com/pdfs/flexlm_licensing_end_user_guide.pdf

For details about license management, refer to the Use limitation applies section.

New product-specific prerequisites: The following table lists prerequisites for new productsannounced in this release. Prerequisites/corequisites are included in standard configurations.When adding any of these products to a standard configuration to create a custom configurationwhere the standard configuration does not already contain the prerequisite product, theprerequisite product (and its prerequisites, if any) must also be added. Where there is more than

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 33

one prerequisite, all are required. For corequisites, only one is required.

DELMIA Process Detailing and Validation

Product Prerequisites Corequisites

FRM DOM, MG1, MNC, MPD, PRP, PTPGSM DO1MAC DOM, MHBMAS DO1MHC DOM, MHT, PRPMML DOM, MLM, MNCMMM DOM, MNCMPC DOM, MHBMPD DO1MPR DOM, MNVMRT DO1 or MDUMSM DOM, MNCMST DO1MTC DOM, MHBMWS DO1PSS CSM, D5I, DMR, DOM, LM1, MSD, PRP, PSY

DELMIA Process Planning

ALB EMH, PRNCEF EMH, PRNE4M EMHE5M EMHEPR EMH, PRNL2P EMH, PRNMCM EMH, PRMPVW EMH, PRNSDC EMH, PRN, STMSMO EMH, PRN, STMSMT EMH, PRN, STMSSA EMH, PRN, STMSTM EMH, PRNSVA EMH, PRN, STMSWF EMH, PRN, STMTGT EMH, PRNWLB EMH, PRN

Planning information

Packaging: DELMIA V5.18 adds a deliverable for the Process Planning suite.

Deliverable Form number

Process Detailing and Validation code and LCD4-7892program directory (19 CDs)

Process Planning code and program directory (2 CDs) LCD7-2698*English Online Documentation (3 CDs) SK4T-3605MultiCAx code and program directory (6 CDs) LCD4-7893**LUM 4.6.8 with patch 4.6.8.3 (1 CD) LCD4-7885Licensed Program Specification GI11-6422Registration Memo GI11-4404

* Ships only with an order for one or more of the Process Planningproducts.

** Ships only with an order for one or more of the MultiCAx products.

Security, auditability, and control

The announced programs use the security and auditability features of the operating systemssoftware. The customer is responsible for evaluation, selection, and implementation of securityfeatures, administrative procedures, and appropriate controls in application systems andcommunication facilities.

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 34

Ordering information

Current licensees

Current licensees will receive this update from IBM Software Delivery and Fulfillmentautomatically.

Should you require further assistance, contact your country IBM representative.

Shipment of this release of DELMIA V5 is scheduled to be completed by March 28, 2008.

New licensees

Orders for new licenses will be accepted now. For new licensees, shipment will begin on theplanned availability date.

An order for DELMIA V5 basic licensed programs consists of:

• A licensed standard configuration program order (5671-XXX or 5672-XXX)

• A licensed custom configuration (5672-XXX) with AOPs (5674-XXX)

• Optional licensed shareable product program order (5671-XXX or 5672-XXX)

• One system program order (SPO and 5628-DEL)

The 5671-XXX, 5672-XXX, and 5674-XXX orders are required for billing and asset registration.The 5628-DEL orders are required to ship machine-readable materials and publications.

DELMIA V5 products are available only on CD-ROM.

Release summary

Programnumber Program name

New DELMIA Process Detailing and Validation shareable products

5672-MAC DELMIA -- Human Preferred Angle Catalog 25672-MHC DELMIA -- Human Task Catalog 25672-MPC DELMIA -- Human Posture Catalog 25672-MST DELMIA -- STEP Core Interface 15672-MTC DELMIA -- Human Anthropometry Catalog 2

New DELMIA Process Detailing and Validation AOPs

5674-FRM DELMIA -- Part Design Features Recognition 15674-GSM DELMIA -- Generative Shape Design 15674-MAC DELMIA -- Human Preferred Angle Catalog 25674-MAS DELMIA -- Assembly Design 15674-MDU DELMIA -- DMU Navigator 15674-MHC DELMIA -- Human Task Catalog 25674-MML DELMIA -- Multi-Slide Lathe Machining 25674-MMM DELMIA -- Multi-Axis Surface Machining 25674-MPC DELMIA -- Human Posture Catalog 25674-MPD DELMIA -- Part Design 15674-MPR DELMIA -- Composite Review 25674-MRT DELMIA -- Real Time Rendering 15674-MSM DELMIA -- 3 Axis Surface Machining 25674-MTC DELMIA -- Human Anthropometry Catalog 25674-MWS DELMIA -- Wireframe & Surface 15674-PSS DELMIA -- Production System Simulation 25674-SHF DELMIA -- DPM Shop Floor Viewer 2

DELMIA Process Planning configurations (all new)

5671-EAC DELMIA -- ENOVIA Manufacturing Hub AccessConfiguration

5671-EEC DELMIA -- Process Engineer Configuration5671-EIC DELMIA -- Industrial Engineer Configuration

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 35

5671-EPC DELMIA -- PPR Navigator for Manufacturing HubConfiguration

5671-ERC DELMIA -- Process & Resource Planner Configuration

DELMIA Process Planning products (all new)

5671-ALB DELMIA -- Automatic Line Balancing5671-CEF DELMIA -- Configuration & Effectivity5671-E4M DELMIA -- ENOVIA VPM Connection5671-E5M DELMIA -- ENOVIA VPM V5 Connection5671-EPR DELMIA -- Process & Resource Planning5671-L2P DELMIA -- 2D Layout Planning5671-MCM DELMIA -- Manufacturing Change Management5671-PVW DELMIA -- Product Viewing5671-SDC DELMIA -- Standard Time Measurement Datacard5671-SMO DELMIA -- Standard Time Measurement MOST5671-SMT DELMIA -- Standard Time Measurement MTM15671-SSA DELMIA -- Standard Time Measurement SAM5671-STM DELMIA -- Standard Time Measurement5671-SVA DELMIA -- Standard Time Measurement Value Added5671-SWF DELMIA -- Standard Time Measurement WF5671-TGT DELMIA -- Target Tracking5671-WLB DELMIA -- Workload Balancing

Withdrawals

The following are withdrawn from marketing:

Programnumber Program name

5672-AG2 DELMIA -- DPM Assembly GT 2 Configuration5672-BG2 DELMIA -- DPM Body In White GT 2 Configuration5672-MA3 DELMIA -- Tolerance Analysis of Deformable

Assembly 3 Configuration5672-PG2 DELMIA -- DPM Machining GT 2 Configuration5672-WG2 DELMIA -- Robotics Simulation GT 2

Configuration5672-WX2 DELMIA -- Robotics Simulation XT 2

Configuration5672-XG2 DELMIA -- DPM Process & Resource Definition GT 2

Configuration5674-SBH DELMIA Automation -- CLM System Behavior

Definition 2 AOP

Other changes

• The name of the Process Detailing and Validation 5672-SP2 configuration is changed toDELMIA — Structure Manufacturing Preparation 2.

• A variable term license charge (YLC) entitlement entity is added for the 5672-NL8 SoftcopyCollection Kit.

Product ordering: To configure an order for a license for a standard configuration or shareableproduct, specify the:

• Configuration/shareable product program number

• User quantity

• appropriate charge option: Primary license charge (PLC) with an annual license charge (ALC)or YLC

Note: The configurator will automatically add to your order the:

• Appropriate entitlement entity identifiers, license options, and pricing metrics

• Appropriate orderable supplies (OSPs)

To order a basic license for a custom configuration, specify the:

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 36

• Standard configuration program number

• Appropriate charge option (PLC with ALC or YLC)

• User quantity

• AOPs (up to a maximum of 80)

Note: Support for AOPs up to a maximum of 80 requires LUM at a minimum level of 4.6.5.

Note: The configurator will automatically add to your order the:

• AOP indicator registration and AOP software order (SWO) number

• Appropriate entitlement entity identifiers, license options, and pricing metrics

• Appropriate OSPs

Entitlement, license option, and pricing metric information for all configurations, shareableproducts, and AOPs are contained in this section.

The following tier levels apply for all configurations and products in this announcement:

• Recurring license

ALC User 1-9

ALC User 10-25

ALC User 26+

• Variable term license

YLC User 1-9

YLC User 10-25

YLC User 26+

Process Detailing and Validation shareable products

Entitlement License Pricingentity Description option metric

DELMIA -- Human Preferred Angle Catalog 2 Product (5672-MAC)

S014MRP MAC Prod Primary License Lic to Use PLC per UserS014MRT MAC Prod Recurring License Basic ALC per UserS014MRS MAC Prod Variable Term Lic Basic YLC per User

DELMIA -- Human Task Catalog 2 Product (5672-MHC)

S014MS8 MHC Prod Primary License Lic to Use PLC per UserS014MS7 MHC Prod Recurring License Basic ALC per UserS014MS2 MHC Prod Variable Term Lic Basic YLC per User

DELMIA -- Human Posture Catalog 2 Product (5672-MPC)

S014MSK MPC Prod Primary License Lic to Use PLC per UserS014MSC MPC Prod Recurring License Basic ALC per UserS014MSB MPC Prod Variable Term Lic Basic YLC per User

DELMIA -- STEP Core Interface 1 Product (5672-MST)

S014ND5 MST Prod Primary License Lic to Use PLC per UserS014ND6 MST Prod Recurring License Basic ALC per UserS014ND4 MST Prod Variable Term Lic Basic YLC per User

DELMIA -- Human Anthropometry Catalog 2 Product (5672-MTC)

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 37

S014MSN MTC Prod Primary License Lic to Use PLC per UserS014MSM MTC Prod Recurring License Basic ALC per UserS014MSW MTC Prod Variable Term Lic Basic YLC per User

Process Detailing and Validation AOPs

Entitlement License Pricingentity Description option metric

DELMIA -- Part Design Features Recognition 1 AOP (5674-FRM)

S014MT2 FRM AOP Primary License Lic to Use PLC per UserS014MT3 FRM AOP Recurring License Basic ALC per UserS014MT6 FRM AOP Variable Term Lic Basic YLC per User

DELMIA -- Generative Shape Design 1 AOP (5674-GSM)

S014MTG GSM AOP Primary License Lic to Use PLC per UserS014MTC GSM AOP Recurring License Basic ALC per UserS014MTH GSM AOP Variable Term Lic Basic YLC per User

DELMIA -- Human Preferred Angle Catalog 2 AOP (5674-MAC)

S014MTK MAC AOP Primary License Lic to Use PLC per UserS014MTL MAC AOP Recurring License Basic ALC per UserS014MTT MAC AOP Variable Term Lic Basic YLC per User

DELMIA -- Assembly Design 1 AOP (5674-MAS)

S014MV1 MAS AOP Primary License Lic to Use PLC per UserS014MV2 MAS AOP Recurring License Basic ALC per UserS014MTW MAS AOP Variable Term Lic Basic YLC per User

DELMIA -- DMU Navigator 1 AOP (5674-MDU)

S014MVB MDU AOP Primary License Lic to Use PLC per UserS014MVF MDU AOP Recurring License Basic ALC per UserS014MV6 MDU AOP Variable Term Lic Basic YLC per User

DELMIA -- Human Task Catalog 2 AOP (5674-MHC)

S014NDM MHC AOP Primary License Lic to Use PLC per UserS014NDK MHC AOP Recurring License Basic ALC per UserS014NDL MHC AOP Variable Term Lic Basic YLC per User

DELMIA -- Multi-Slide Lathe Machining 2 AOP (5674-MML)

S014MVR MML AOP Primary License Lic to Use PLC per UserS014MVN MML AOP Recurring License Basic ALC per UserS014MVH MML AOP Variable Term Lic Basic YLC per User

DELMIA -- Multi-Axis Surface Machining 2 AOP (5674-MMM)

S014MW2 MMM AOP Primary License Lic to Use PLC per UserS014MW0 MMM AOP Recurring License Basic ALC per UserS014MVT MMM AOP Variable Term Lic Basic YLC per User

DELMIA -- Human Posture Catalog 2 AOP (5674-MPC)

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 38

S014MWB MPC AOP Primary License Lic to Use PLC per UserS014MW6 MPC AOP Recurring License Basic ALC per UserS014MW5 MPC AOP Variable Term Lic Basic YLC per User

DELMIA -- Part Design 1 AOP (5674-MPD)

S014MWM MPD AOP Primary License Lic to Use PLC per UserS014MWJ MPD AOP Recurring License Basic ALC per UserS014MWF MPD AOP Variable Term Lic Basic YLC per User

DELMIA -- Composite Review 2 AOP (5674-MPR)

S014MWX MPR AOP Primary License Lic to Use PLC per UserS014MWR MPR AOP Recurring License Basic ALC per UserS014MWZ MPR AOP Variable Term Lic Basic YLC per User

DELMIA -- Real Time Rendering 1 AOP (5674-MRT)

S014MX4 MRT AOP Primary License Lic to Use PLC per UserS014MX6 MRT AOP Recurring License Basic ALC per UserS014MX2 MRT AOP Variable Term Lic Basic YLC per User

DELMIA -- 3 Axis Surface Machining 2 AOP (5674-MSM)

S014MXD MSM AOP Primary License Lic to Use PLC per UserS014MXF MSM AOP Recurring License Basic ALC per UserS014MXL MSM AOP Variable Term Lic Basic YLC per User

DELMIA -- Human Anthropometry Catalog 2 AOP (5674-MTC)

S014MXS MTC AOP Primary License Lic to Use PLC per UserS014MXV MTC AOP Recurring License Basic ALC per UserS014MXT MTC AOP Variable Term Lic Basic YLC per User

DELMIA -- Wireframe & Surface 1 AOP (5674-MWS)

S014MZ5 MWS AOP Primary License Lic to Use PLC per UserS014MZ7 MWS AOP Recurring License Basic ALC per UserS014MZ3 MWS AOP Variable Term Lic Basic YLC per User

DELMIA -- Production System Simulation 2 AOP (5674-PSS)

S014MZC PSS AOP Primary License Lic to Use PLC per UserS014MZG PSS AOP Recurring License Basic ALC per UserS014MZD PSS AOP Variable Term Lic Basic YLC per User

DELMIA -- DPM Shop Floor Viewer 2 AOP (5674-SHF)

S014N04 SHF AOP Primary License Lic to Use PLC per UserS014N02 SHF AOP Recurring License Basic ALC per UserS014N01 SHF AOP Variable Term Lic Basic YLC per User

New Process Detailing and Validation non-billable AOP indicator codes: No-chargeindicator codes are set up under each of the 5672 configurations for which the AOP is available.

Entitlement License Pricingentity Description option metric

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 39

DELMIA -- DPM Assembly 2 (5672-AP2)

S014R0L 5674-ARW AOP Indicator Code AOP Registration No ChgS014R0K 5674-EHS AOP Indicator Code AOP Registration No ChgS014R0H 5674-FRM AOP Indicator Code AOP Registration No ChgS014R0W 5674-MAC AOP Indicator Code AOP Registration No ChgS014R0R 5674-MAS AOP Indicator Code AOP Registration No ChgS014R0N 5674-MEQ AOP Indicator Code AOP Registration No ChgS014R0X 5674-MG1 AOP Indicator Code AOP Registration No ChgS014R0J 5674-MHC AOP Indicator Code AOP Registration No ChgS014R0V 5674-MK1 AOP Indicator Code AOP Registration No ChgS014R0P 5674-MPC AOP Indicator Code AOP Registration No ChgS014R0S 5674-MPD AOP Indicator Code AOP Registration No ChgS014R0T 5674-MPR AOP Indicator Code AOP Registration No ChgS014R0M 5674-MRT AOP Indicator Code AOP Registration No ChgS014R0Z 5674-MTC AOP Indicator Code AOP Registration No ChgS014R14 5674-MWS AOP Indicator Code AOP Registration No ChgS014R12 5674-RST AOP Indicator Code AOP Registration No ChgS014R13 5674-SHF AOP Indicator Code AOP Registration No ChgS014R10 5674-SPR AOP Indicator Code AOP Registration No Chg

DELMIA -- DPM Body In White 2 (5672-BP2)

S014R1P 5674-ARW AOP Indicator Code AOP Registration No ChgS014R1L 5674-EHS AOP Indicator Code AOP Registration No ChgS014R15 5674-EIP AOP Indicator Code AOP Registration No ChgS014R19 5674-FRM AOP Indicator Code AOP Registration No ChgS014R16 5674-MAC AOP Indicator Code AOP Registration No ChgS014R1N 5674-MAS AOP Indicator Code AOP Registration No ChgS014R1T 5674-MDU AOP Indicator Code AOP Registration No ChgS014R1V 5674-MEQ AOP Indicator Code AOP Registration No ChgS014R1F 5674-MG1 AOP Indicator Code AOP Registration No ChgS014R18 5674-MHC AOP Indicator Code AOP Registration No ChgS014R1S 5674-MK1 AOP Indicator Code AOP Registration No ChgS014R1G 5674-MPC AOP Indicator Code AOP Registration No ChgS014R1B 5674-MPD AOP Indicator Code AOP Registration No ChgS014R1K 5674-MPR AOP Indicator Code AOP Registration No ChgS014R17 5674-MRT AOP Indicator Code AOP Registration No ChgS014R1M 5674-MTC AOP Indicator Code AOP Registration No ChgS014R1C 5674-MWS AOP Indicator Code AOP Registration No ChgS014R1H 5674-RST AOP Indicator Code AOP Registration No ChgS014R1D 5674-SHF AOP Indicator Code AOP Registration No ChgS014R1J 5674-SPR AOP Indicator Code AOP Registration No Chg

DELMIA -- DPM Body In White XT 2 (5672-BX2)

S014R22 5674-EHS AOP Indicator Code AOP Registration No ChgS014R26 5674-EIP AOP Indicator Code AOP Registration No ChgS014R25 5674-FRM AOP Indicator Code AOP Registration No ChgS014R1W 5674-MAC AOP Indicator Code AOP Registration No ChgS014R23 5674-MDU AOP Indicator Code AOP Registration No ChgS014R1X 5674-MEQ AOP Indicator Code AOP Registration No ChgS014R1Z 5674-MHC AOP Indicator Code AOP Registration No ChgS014R24 5674-MPC AOP Indicator Code AOP Registration No ChgS014R20 5674-MPR AOP Indicator Code AOP Registration No ChgS014R21 5674-MTC AOP Indicator Code AOP Registration No ChgS014R28 5674-PSS AOP Indicator Code AOP Registration No ChgS014R2B 5674-SHF AOP Indicator Code AOP Registration No ChgS014R29 5674-SPR AOP Indicator Code AOP Registration No Chg

DELMIA -- DPM Structure 2 (5672-DS2)

S014R37 5674-BWP AOP Indicator Code AOP Registration No ChgS014R33 5674-DBG AOP Indicator Code AOP Registration No ChgS014R35 5674-EIP AOP Indicator Code AOP Registration No Chg

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 40

S014R2C 5674-ELR AOP Indicator Code AOP Registration No ChgS014R2V 5674-FRM AOP Indicator Code AOP Registration No ChgS014R2W 5674-MAC AOP Indicator Code AOP Registration No ChgS014R39 5674-MEQ AOP Indicator Code AOP Registration No ChgS014R32 5674-MFR AOP Indicator Code AOP Registration No ChgS014R2J 5674-MFT AOP Indicator Code AOP Registration No ChgS014R2K 5674-MGD AOP Indicator Code AOP Registration No ChgS014R2Z 5674-MHA AOP Indicator Code AOP Registration No ChgS014R2H 5674-MHB AOP Indicator Code AOP Registration No ChgS014R2S 5674-MHM AOP Indicator Code AOP Registration No ChgS014R2T 5674-MHP AOP Indicator Code AOP Registration No ChgS014R2N 5674-MKE AOP Indicator Code AOP Registration No ChgS014R2F 5674-MOP AOP Indicator Code AOP Registration No ChgS014R36 5674-MPC AOP Indicator Code AOP Registration No ChgS014R2R 5674-MPR AOP Indicator Code AOP Registration No ChgS014R31 5674-MRL AOP Indicator Code AOP Registration No ChgS014R30 5674-MRR AOP Indicator Code AOP Registration No ChgS014R2M 5674-MSA AOP Indicator Code AOP Registration No ChgS014R2G 5674-MSD AOP Indicator Code AOP Registration No ChgS014R38 5674-MTC AOP Indicator Code AOP Registration No ChgS014R2D 5674-MTR AOP Indicator Code AOP Registration No ChgS014R2X 5674-PLT AOP Indicator Code AOP Registration No ChgS014R2L 5674-SPR AOP Indicator Code AOP Registration No ChgS014R34 5674-SRL AOP Indicator Code AOP Registration No ChgS014R2P 5674-WKI AOP Indicator Code AOP Registration No Chg

DELMIA -- ENVISION Assembly 2 (5672-EA2)

S014R3K 5674-EHS AOP Indicator Code AOP Registration No ChgS014R3J 5674-FRM AOP Indicator Code AOP Registration No ChgS014R3F 5674-MAC AOP Indicator Code AOP Registration No ChgS014R3C 5674-MEQ AOP Indicator Code AOP Registration No ChgS014R3H 5674-MHC AOP Indicator Code AOP Registration No ChgS014R3D 5674-MPC AOP Indicator Code AOP Registration No ChgS014R3G 5674-MPR AOP Indicator Code AOP Registration No ChgS014R3B 5674-MTC AOP Indicator Code AOP Registration No ChgS014R3N 5674-SHF AOP Indicator Code AOP Registration No ChgS014R3L 5674-SPR AOP Indicator Code AOP Registration No Chg

DELMIA -- NC Machine Tool Builder 2 (5672-MB2)

S014R3S 5674-GSM AOP Indicator Code AOP Registration No ChgS014R3V 5674-MDU AOP Indicator Code AOP Registration No ChgS014R3P 5674-MEQ AOP Indicator Code AOP Registration No ChgS014R3R 5674-MFR AOP Indicator Code AOP Registration No ChgS014R3X 5674-MK1 AOP Indicator Code AOP Registration No ChgS014R3W 5674-MMM AOP Indicator Code AOP Registration No ChgS014R3T 5674-MPR AOP Indicator Code AOP Registration No ChgS014R41 5674-MPS AOP Indicator Code AOP Registration No ChgS014R42 5674-MRL AOP Indicator Code AOP Registration No ChgS014R44 5674-MSM AOP Indicator Code AOP Registration No ChgS014R40 5674-MVG AOP Indicator Code AOP Registration No ChgS014R43 5674-PCR AOP Indicator Code AOP Registration No ChgS014R3Z 5674-PLT AOP Indicator Code AOP Registration No ChgS014R46 5674-PRL AOP Indicator Code AOP Registration No ChgS014R47 5674-PRR AOP Indicator Code AOP Registration No ChgS014R45 5674-SPR AOP Indicator Code AOP Registration No Chg

DELMIA -- Manufacturing Simulation Foundation 2 (5672-MF2)

S014R4S 5674-APN AOP Indicator Code AOP Registration No ChgS014R49 5674-ARW AOP Indicator Code AOP Registration No ChgS014R4R 5674-BWP AOP Indicator Code AOP Registration No ChgS014R4K 5674-DBG AOP Indicator Code AOP Registration No ChgS014R4T 5674-EIP AOP Indicator Code AOP Registration No ChgS014R4B 5674-ELR AOP Indicator Code AOP Registration No ChgS014R4N 5674-FRM AOP Indicator Code AOP Registration No ChgS014R4F 5674-LE1 AOP Indicator Code AOP Registration No Chg

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S014R4J 5674-LS1 AOP Indicator Code AOP Registration No ChgS014R4L 5674-MAC AOP Indicator Code AOP Registration No ChgS014R4H 5674-MDU AOP Indicator Code AOP Registration No ChgS014R4P 5674-MFR AOP Indicator Code AOP Registration No ChgS014R4M 5674-MFT AOP Indicator Code AOP Registration No ChgS014R48 5674-MGD AOP Indicator Code AOP Registration No ChgS014R4D 5674-MHC AOP Indicator Code AOP Registration No ChgS014R4G 5674-MHM AOP Indicator Code AOP Registration No ChgS014R4C 5674-MHP AOP Indicator Code AOP Registration No ChgS014R5B 5674-MID AOP Indicator Code AOP Registration No ChgS014R5D 5674-MIG AOP Indicator Code AOP Registration No ChgS014R55 5674-MK1 AOP Indicator Code AOP Registration No ChgS014R4X 5674-MKE AOP Indicator Code AOP Registration No ChgS014R5J 5674-MPC AOP Indicator Code AOP Registration No ChgS014R56 5674-MPR AOP Indicator Code AOP Registration No ChgS014R51 5674-MSA AOP Indicator Code AOP Registration No ChgS014R5F 5674-MSD AOP Indicator Code AOP Registration No ChgS014R5H 5674-MTC AOP Indicator Code AOP Registration No ChgS014R4Z 5674-OLP AOP Indicator Code AOP Registration No ChgS014R5G 5674-PCR AOP Indicator Code AOP Registration No ChgS014R52 5674-PLT AOP Indicator Code AOP Registration No ChgS014R59 5674-PSS AOP Indicator Code AOP Registration No ChgS014R50 5674-PSY AOP Indicator Code AOP Registration No ChgS014R5C 5674-RRS AOP Indicator Code AOP Registration No ChgS014R4V 5674-RST AOP Indicator Code AOP Registration No ChgS014R5K 5674-SHF AOP Indicator Code AOP Registration No ChgS014R57 5674-SRL AOP Indicator Code AOP Registration No ChgS014R54 5674-TSA AOP Indicator Code AOP Registration No ChgS014R58 5674-WSQ AOP Indicator Code AOP Registration No ChgS014R4W 5674-WSU AOP Indicator Code AOP Registration No Chg

DELMIA -- Machining Foundation 2 (5672-MP2)

S014R67 5674-APN AOP Indicator Code AOP Registration No ChgS014R64 5674-APS AOP Indicator Code AOP Registration No ChgS014R5L 5674-ARW AOP Indicator Code AOP Registration No ChgS014R69 5674-BWP AOP Indicator Code AOP Registration No ChgS014R66 5674-DBG AOP Indicator Code AOP Registration No ChgS014R62 5674-EHS AOP Indicator Code AOP Registration No ChgS014R5N 5674-EIP AOP Indicator Code AOP Registration No ChgS014R5R 5674-ELR AOP Indicator Code AOP Registration No ChgS014R5V 5674-FRM AOP Indicator Code AOP Registration No ChgS014R61 5674-GSM AOP Indicator Code AOP Registration No ChgS014R6B 5674-MAC AOP Indicator Code AOP Registration No ChgS014R5S 5674-MDU AOP Indicator Code AOP Registration No ChgS014R65 5674-MEQ AOP Indicator Code AOP Registration No ChgS014R5P 5674-MFR AOP Indicator Code AOP Registration No ChgS014R5X 5674-MFT AOP Indicator Code AOP Registration No ChgS014R5T 5674-MGD AOP Indicator Code AOP Registration No ChgS014R63 5674-MHA AOP Indicator Code AOP Registration No ChgS014R6C 5674-MHB AOP Indicator Code AOP Registration No ChgS014R6D 5674-MHC AOP Indicator Code AOP Registration No ChgS014R5M 5674-MHM AOP Indicator Code AOP Registration No ChgS014R5W 5674-MHP AOP Indicator Code AOP Registration No ChgS014R5Z 5674-MHT AOP Indicator Code AOP Registration No ChgS014R68 5674-MK1 AOP Indicator Code AOP Registration No ChgS014R60 5674-MKE AOP Indicator Code AOP Registration No ChgS014R6M 5674-MMM AOP Indicator Code AOP Registration No ChgS014R71 5674-MPC AOP Indicator Code AOP Registration No ChgS014R6H 5674-MPR AOP Indicator Code AOP Registration No ChgS014R74 5674-MPS AOP Indicator Code AOP Registration No ChgS014R6J 5674-MSA AOP Indicator Code AOP Registration No ChgS014R6K 5674-MSD AOP Indicator Code AOP Registration No ChgS014R6P 5674-MSM AOP Indicator Code AOP Registration No ChgS014R75 5674-MTC AOP Indicator Code AOP Registration No ChgS014R73 5674-MTT AOP Indicator Code AOP Registration No ChgS014R6L 5674-MVG AOP Indicator Code AOP Registration No ChgS014R6S 5674-OLP AOP Indicator Code AOP Registration No ChgS014R6W 5674-PCR AOP Indicator Code AOP Registration No ChgS014R72 5674-PLT AOP Indicator Code AOP Registration No ChgS014R6Z 5674-RRS AOP Indicator Code AOP Registration No ChgS014R6F 5674-RST AOP Indicator Code AOP Registration No Chg

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S014R6R 5674-SHF AOP Indicator Code AOP Registration No ChgS014R76 5674-SPR AOP Indicator Code AOP Registration No ChgS014R6N 5674-SRL AOP Indicator Code AOP Registration No ChgS014R6V 5674-TSA AOP Indicator Code AOP Registration No ChgS014R6T 5674-WKI AOP Indicator Code AOP Registration No ChgS014R6G 5674-WSQ AOP Indicator Code AOP Registration No ChgS014R70 5674-WSU AOP Indicator Code AOP Registration No Chg

DELMIA -- DPM Process Definition 2 (5672-PD2)

S014R78 5674-DBG AOP Indicator Code AOP Registration No ChgS014R7L 5674-MDU AOP Indicator Code AOP Registration No ChgS014R7N 5674-MEQ AOP Indicator Code AOP Registration No ChgS014R77 5674-MFR AOP Indicator Code AOP Registration No ChgS014R7H 5674-MFT AOP Indicator Code AOP Registration No ChgS014R7J 5674-MGD AOP Indicator Code AOP Registration No ChgS014R7D 5674-MHA AOP Indicator Code AOP Registration No ChgS014R7S 5674-MHB AOP Indicator Code AOP Registration No ChgS014R7G 5674-MHM AOP Indicator Code AOP Registration No ChgS014R7K 5674-MHP AOP Indicator Code AOP Registration No ChgS014R7R 5674-MID AOP Indicator Code AOP Registration No ChgS014R7F 5674-MK1 AOP Indicator Code AOP Registration No ChgS014R79 5674-MKE AOP Indicator Code AOP Registration No ChgS014R7P 5674-MOP AOP Indicator Code AOP Registration No ChgS014R7B 5674-MPR AOP Indicator Code AOP Registration No ChgS014R7C 5674-MRL AOP Indicator Code AOP Registration No ChgS014R7M 5674-MSA AOP Indicator Code AOP Registration No ChgS014R7T 5674-MTR AOP Indicator Code AOP Registration No ChgS014R7W 5674-PLT AOP Indicator Code AOP Registration No ChgS014R7V 5674-SPR AOP Indicator Code AOP Registration No Chg

DELMIA -- DPM Machining 2 (5672-PP2)

S014R92 5674-APN AOP Indicator Code AOP Registration No ChgS014R7Z 5674-ARW AOP Indicator Code AOP Registration No ChgS014R8P 5674-BWP AOP Indicator Code AOP Registration No ChgS014R8M 5674-EHS AOP Indicator Code AOP Registration No ChgS014R8N 5674-EIP AOP Indicator Code AOP Registration No ChgS014R8F 5674-ELR AOP Indicator Code AOP Registration No ChgS014R81 5674-FRM AOP Indicator Code AOP Registration No ChgS014R83 5674-GSM AOP Indicator Code AOP Registration No ChgS014R85 5674-MAC AOP Indicator Code AOP Registration No ChgS014R8W 5674-MAS AOP Indicator Code AOP Registration No ChgS014R8V 5674-MDU AOP Indicator Code AOP Registration No ChgS014R91 5674-MEQ AOP Indicator Code AOP Registration No ChgS014R8D 5674-MFR AOP Indicator Code AOP Registration No ChgS014R84 5674-MHC AOP Indicator Code AOP Registration No ChgS014R8L 5674-MHT AOP Indicator Code AOP Registration No ChgS014R8J 5674-MK1 AOP Indicator Code AOP Registration No ChgS014R8S 5674-MML AOP Indicator Code AOP Registration No ChgS014R8K 5674-MMM AOP Indicator Code AOP Registration No ChgS014R8R 5674-MPC AOP Indicator Code AOP Registration No ChgS014R8T 5674-MPD AOP Indicator Code AOP Registration No ChgS014R89 5674-MPR AOP Indicator Code AOP Registration No ChgS014R94 5674-MRL AOP Indicator Code AOP Registration No ChgS014R8C 5674-MRT AOP Indicator Code AOP Registration No ChgS014R86 5674-MSD AOP Indicator Code AOP Registration No ChgS014R8X 5674-MSM AOP Indicator Code AOP Registration No ChgS014R95 5674-MTC AOP Indicator Code AOP Registration No ChgS014R8G 5674-MWS AOP Indicator Code AOP Registration No ChgS014R8Z 5674-OLP AOP Indicator Code AOP Registration No ChgS014R82 5674-PLT AOP Indicator Code AOP Registration No ChgS014R80 5674-RRS AOP Indicator Code AOP Registration No ChgS014R8B 5674-RST AOP Indicator Code AOP Registration No ChgS014R7X 5674-SHF AOP Indicator Code AOP Registration No ChgS014R87 5674-SOR AOP Indicator Code AOP Registration No ChgS014R90 5674-SPR AOP Indicator Code AOP Registration No ChgS014R93 5674-WKI AOP Indicator Code AOP Registration No ChgS014R88 5674-WSU AOP Indicator Code AOP Registration No Chg

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 43

DELMIA -- DPM Review 2 (5672-PR2)

S014R9C 5674-ARW AOP Indicator Code AOP Registration No ChgS014R9L 5674-DBG AOP Indicator Code AOP Registration No ChgS014R9W 5674-MDU AOP Indicator Code AOP Registration No ChgS014R9P 5674-MEQ AOP Indicator Code AOP Registration No ChgS014R9K 5674-MFR AOP Indicator Code AOP Registration No ChgS014R9Z 5674-MFT AOP Indicator Code AOP Registration No ChgS014RB0 5674-MGD AOP Indicator Code AOP Registration No ChgS014R9B 5674-MHA AOP Indicator Code AOP Registration No ChgS014R9M 5674-MHB AOP Indicator Code AOP Registration No ChgS014R9J 5674-MHM AOP Indicator Code AOP Registration No ChgS014R98 5674-MHP AOP Indicator Code AOP Registration No ChgS014R9H 5674-MID AOP Indicator Code AOP Registration No ChgS014R9S 5674-MK1 AOP Indicator Code AOP Registration No ChgS014R99 5674-MKE AOP Indicator Code AOP Registration No ChgS014R9N 5674-MOP AOP Indicator Code AOP Registration No ChgS014R9T 5674-MPR AOP Indicator Code AOP Registration No ChgS014R9R 5674-MRL AOP Indicator Code AOP Registration No ChgS014R9D 5674-MTR AOP Indicator Code AOP Registration No ChgS014R96 5674-PLT AOP Indicator Code AOP Registration No ChgS014R9G 5674-PRL AOP Indicator Code AOP Registration No ChgS014R9F 5674-PRR AOP Indicator Code AOP Registration No ChgS014R9V 5674-SHF AOP Indicator Code AOP Registration No ChgS014R97 5674-SPR AOP Indicator Code AOP Registration No ChgS014R9X 5674-SRL AOP Indicator Code AOP Registration No Chg

DELMIA -- DPM Shop 2 (5672-SF2)

S014RBJ 5674-ARW AOP Indicator Code AOP Registration No ChgS014RBG 5674-DBG AOP Indicator Code AOP Registration No ChgS014RBH 5674-MDU AOP Indicator Code AOP Registration No ChgS014RBP 5674-MEQ AOP Indicator Code AOP Registration No ChgS014RB6 5674-MFR AOP Indicator Code AOP Registration No ChgS014RBX 5674-MGD AOP Indicator Code AOP Registration No ChgS014RBB 5674-MHA AOP Indicator Code AOP Registration No ChgS014RBN 5674-MHB AOP Indicator Code AOP Registration No ChgS014RB1 5674-MHM AOP Indicator Code AOP Registration No ChgS014RBL 5674-MHP AOP Indicator Code AOP Registration No ChgS014RBM 5674-MK1 AOP Indicator Code AOP Registration No ChgS014RBW 5674-MKE AOP Indicator Code AOP Registration No ChgS014RBV 5674-MNV AOP Indicator Code AOP Registration No ChgS014RBK 5674-MOP AOP Indicator Code AOP Registration No ChgS014RB2 5674-MPR AOP Indicator Code AOP Registration No ChgS014RB9 5674-MRL AOP Indicator Code AOP Registration No ChgS014RBD 5674-MRR AOP Indicator Code AOP Registration No ChgS014RBS 5674-OLP AOP Indicator Code AOP Registration No ChgS014RBT 5674-PCR AOP Indicator Code AOP Registration No ChgS014RB3 5674-PLT AOP Indicator Code AOP Registration No ChgS014RBF 5674-PRL AOP Indicator Code AOP Registration No ChgS014RBC 5674-PRR AOP Indicator Code AOP Registration No ChgS014RB8 5674-RRS AOP Indicator Code AOP Registration No ChgS014RB4 5674-RST AOP Indicator Code AOP Registration No ChgS014RBZ 5674-SPR AOP Indicator Code AOP Registration No ChgS014RB5 5674-WSQ AOP Indicator Code AOP Registration No ChgS014RB7 5674-WSU AOP Indicator Code AOP Registration No Chg

DELMIA -- Structure Manufacturing Preparation 2 (5672-SP2)

S014RC2 5674-DBG AOP Indicator Code AOP Registration No ChgS014RC4 5674-MDU AOP Indicator Code AOP Registration No ChgS014RC1 5674-MEQ AOP Indicator Code AOP Registration No ChgS014RC0 5674-MFR AOP Indicator Code AOP Registration No ChgS014RC3 5674-MFT AOP Indicator Code AOP Registration No ChgS014RCN 5674-MGD AOP Indicator Code AOP Registration No ChgS014RCP 5674-MHA AOP Indicator Code AOP Registration No ChgS014RCH 5674-MHB AOP Indicator Code AOP Registration No ChgS014RCG 5674-MHM AOP Indicator Code AOP Registration No Chg

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 44

S014RCD 5674-MHP AOP Indicator Code AOP Registration No ChgS014RCJ 5674-MID AOP Indicator Code AOP Registration No ChgS014RCB 5674-MKE AOP Indicator Code AOP Registration No ChgS014RCF 5674-MNV AOP Indicator Code AOP Registration No ChgS014RC9 5674-MOP AOP Indicator Code AOP Registration No ChgS014RC5 5674-MPR AOP Indicator Code AOP Registration No ChgS014RCL 5674-MRL AOP Indicator Code AOP Registration No ChgS014RC6 5674-MRR AOP Indicator Code AOP Registration No ChgS014RCM 5674-MSA AOP Indicator Code AOP Registration No ChgS014RC8 5674-MTR AOP Indicator Code AOP Registration No ChgS014RCK 5674-PCR AOP Indicator Code AOP Registration No ChgS014RCC 5674-PLT AOP Indicator Code AOP Registration No ChgS014RC7 5674-SPR AOP Indicator Code AOP Registration No Chg

DELMIA -- DPM Shop Order Release 2 (5672-SR2)

S014RCZ 5674-ARW AOP Indicator Code AOP Registration No ChgS014RDM 5674-DBG AOP Indicator Code AOP Registration No ChgS014RDD 5674-MDU AOP Indicator Code AOP Registration No ChgS014RCW 5674-MEQ AOP Indicator Code AOP Registration No ChgS014RDK 5674-MFR AOP Indicator Code AOP Registration No ChgS014RCT 5674-MFT AOP Indicator Code AOP Registration No ChgS014RDP 5674-MGD AOP Indicator Code AOP Registration No ChgS014RDR 5674-MHA AOP Indicator Code AOP Registration No ChgS014RD0 5674-MHB AOP Indicator Code AOP Registration No ChgS014RD4 5674-MHM AOP Indicator Code AOP Registration No ChgS014RDL 5674-MHP AOP Indicator Code AOP Registration No ChgS014RCX 5674-MID AOP Indicator Code AOP Registration No ChgS014RD3 5674-MK1 AOP Indicator Code AOP Registration No ChgS014RCV 5674-MKE AOP Indicator Code AOP Registration No ChgS014RD7 5674-MOP AOP Indicator Code AOP Registration No ChgS014RCS 5674-MPR AOP Indicator Code AOP Registration No ChgS014RDJ 5674-MRL AOP Indicator Code AOP Registration No ChgS014RD2 5674-MSA AOP Indicator Code AOP Registration No ChgS014RD6 5674-MTR AOP Indicator Code AOP Registration No ChgS014RD8 5674-OLP AOP Indicator Code AOP Registration No ChgS014RDG 5674-PLT AOP Indicator Code AOP Registration No ChgS014RD9 5674-PRL AOP Indicator Code AOP Registration No ChgS014RDN 5674-PRR AOP Indicator Code AOP Registration No ChgS014RCR 5674-RRS AOP Indicator Code AOP Registration No ChgS014RDC 5674-RST AOP Indicator Code AOP Registration No ChgS014RDB 5674-SHF AOP Indicator Code AOP Registration No ChgS014RDH 5674-SPR AOP Indicator Code AOP Registration No ChgS014RD5 5674-WSQ AOP Indicator Code AOP Registration No ChgS014RDF 5674-WSU AOP Indicator Code AOP Registration No Chg

DELMIA -- NC Machine Tool Simulation 2 (5672-VT2)

S014RDV 5674-ARW AOP Indicator Code AOP Registration No ChgS014RDX 5674-GSM AOP Indicator Code AOP Registration No ChgS014RDS 5674-MDU AOP Indicator Code AOP Registration No ChgS014RDT 5674-MEQ AOP Indicator Code AOP Registration No ChgS014RDW 5674-MFR AOP Indicator Code AOP Registration No ChgS014RDZ 5674-MHA AOP Indicator Code AOP Registration No ChgS014RF5 5674-MHB AOP Indicator Code AOP Registration No ChgS014RFK 5674-MHM AOP Indicator Code AOP Registration No ChgS014RF9 5674-MHP AOP Indicator Code AOP Registration No ChgS014RF1 5674-MK1 AOP Indicator Code AOP Registration No ChgS014RF2 5674-MMM AOP Indicator Code AOP Registration No ChgS014RFC 5674-MPR AOP Indicator Code AOP Registration No ChgS014RF3 5674-MRL AOP Indicator Code AOP Registration No ChgS014RF8 5674-MSM AOP Indicator Code AOP Registration No ChgS014RFJ 5674-MVG AOP Indicator Code AOP Registration No ChgS014RF4 5674-OLP AOP Indicator Code AOP Registration No ChgS014RFG 5674-PCR AOP Indicator Code AOP Registration No ChgS014RFF 5674-PLT AOP Indicator Code AOP Registration No ChgS014RF0 5674-PRL AOP Indicator Code AOP Registration No ChgS014RFB 5674-RRS AOP Indicator Code AOP Registration No ChgS014RFD 5674-RST AOP Indicator Code AOP Registration No ChgS014RF7 5674-SHF AOP Indicator Code AOP Registration No Chg

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 45

S014RFH 5674-SPR AOP Indicator Code AOP Registration No ChgS014RF6 5674-WSU AOP Indicator Code AOP Registration No Chg

DELMIA -- Robotics Simulation 2 (5672-WL2)

S014RFV 5674-APN AOP Indicator Code AOP Registration No ChgS014RG1 5674-BWP AOP Indicator Code AOP Registration No ChgS014RFT 5674-EHS AOP Indicator Code AOP Registration No ChgS014RG8 5674-EIP AOP Indicator Code AOP Registration No ChgS014RG7 5674-FRM AOP Indicator Code AOP Registration No ChgS014RG5 5674-MAC AOP Indicator Code AOP Registration No ChgS014RG6 5674-MAS AOP Indicator Code AOP Registration No ChgS014RG0 5674-MDU AOP Indicator Code AOP Registration No ChgS014RFP 5674-MEQ AOP Indicator Code AOP Registration No ChgS014RFR 5674-MG1 AOP Indicator Code AOP Registration No ChgS014RG9 5674-MHC AOP Indicator Code AOP Registration No ChgS014RG2 5674-MK1 AOP Indicator Code AOP Registration No ChgS014RFZ 5674-MPC AOP Indicator Code AOP Registration No ChgS014RFN 5674-MPD AOP Indicator Code AOP Registration No ChgS014RG3 5674-MPR AOP Indicator Code AOP Registration No ChgS014RFX 5674-MRT AOP Indicator Code AOP Registration No ChgS014RG4 5674-MTC AOP Indicator Code AOP Registration No ChgS014RFS 5674-MWS AOP Indicator Code AOP Registration No ChgS014RFW 5674-PSS AOP Indicator Code AOP Registration No ChgS014RGC 5674-SHF AOP Indicator Code AOP Registration No ChgS014RFM 5674-SPR AOP Indicator Code AOP Registration No Chg

DELMIA -- DPM Process & Resource Definition 2 (5672-XP2)

S014RGX 5674-BWP AOP Indicator Code AOP Registration No ChgS014RGV 5674-EIP AOP Indicator Code AOP Registration No ChgS014RH4 5674-ELR AOP Indicator Code AOP Registration No ChgS014RGD 5674-FRM AOP Indicator Code AOP Registration No ChgS014RGW 5674-MAC AOP Indicator Code AOP Registration No ChgS014RGF 5674-MAS AOP Indicator Code AOP Registration No ChgS014RH1 5674-MDU AOP Indicator Code AOP Registration No ChgS014RGG 5674-MEQ AOP Indicator Code AOP Registration No ChgS014RH3 5674-MG1 AOP Indicator Code AOP Registration No ChgS014RGN 5674-MHA AOP Indicator Code AOP Registration No ChgS014RGH 5674-MHB AOP Indicator Code AOP Registration No ChgS014RGS 5674-MHM AOP Indicator Code AOP Registration No ChgS014RGK 5674-MHP AOP Indicator Code AOP Registration No ChgS014RGL 5674-MK1 AOP Indicator Code AOP Registration No ChgS014RGR 5674-MPC AOP Indicator Code AOP Registration No ChgS014RH5 5674-MPD AOP Indicator Code AOP Registration No ChgS014RGJ 5674-MPR AOP Indicator Code AOP Registration No ChgS014RH0 5674-MRT AOP Indicator Code AOP Registration No ChgS014RGM 5674-MTC AOP Indicator Code AOP Registration No ChgS014RGZ 5674-MWS AOP Indicator Code AOP Registration No ChgS014RH2 5674-SPR AOP Indicator Code AOP Registration No ChgS014RGP 5674-SRL AOP Indicator Code AOP Registration No ChgS014RGT 5674-WKI AOP Indicator Code AOP Registration No Chg

Process Planning configurations

Entitlement License Pricingentity Description option metric

DELMIA -- ENOVIA Manufacturing Hub Access Configuration (5671-EAC)

S014N07 EAC Config Primary License Lic to Use PLC per UserS014N0F EAC Config Recurring License Basic ALC per UserS014N0B EAC Config Variable Term Lic Basic YLC per User

DELMIA -- Process Engineer Configuration (5671-EEC)

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 46

S014N0J EEC Config Primary License Lic to Use PLC per UserS014N0P EEC Config Recurring License Basic ALC per UserS014N0S EEC Config Variable Term Lic Basic YLC per User

DELMIA -- Industrial Engineer Configuration (5671-EIC)

S014N0V EIC Config Primary License Lic to Use PLC per UserS014N11 EIC Config Recurring License Basic ALC per UserS014N13 EIC Config Variable Term Lic Basic YLC per User

DELMIA -- PPR Navigator for Manufacturing Hub Configuration (5671-EPC)

S014N15 EPC Config Primary License Lic to Use PLC per UserS014N1B EPC Config Recurring License Basic ALC per UserS014N1D EPC Config Variable Term Lic Basic YLC per User

DELMIA -- Process & Resource Planner Configuration (5671-ERC)

S014N1G ERC Config Primary License Lic to Use PLC per UserS014N1M ERC Config Recurring License Basic ALC per UserS014N1P ERC Config Variable Term Lic Basic YLC per User

Process Planning products

Entitlement License Pricingentity Description option metric

DELMIA -- Automatic Line Balancing Product (5671-ALB)

S014N1S ALB Prod Primary License Lic to Use PLC per UserS014N1Z ALB Prod Recurring License Basic ALC per UserS014N21 ALB Prod Variable Term Lic Basic YLC per User

DELMIA -- Configuration & Effectivity Product (5671-CEF)

S014N23 CEF Prod Primary License Lic to Use PLC per UserS014N28 CEF Prod Recurring License Basic ALC per UserS014N2B CEF Prod Variable Term Lic Basic YLC per User

DELMIA -- ENOVIA VPM Connection Product (5671-E4M)

S014N2F E4M Prod Primary License Lic to Use PLC per UserS014N2M E4M Prod Recurring License Basic ALC per UserS014N2J E4M Prod Variable Term Lic Basic YLC per User

DELMIA -- ENOVIA VPM V5 Connection Product (5671-E5M)

S014N2P E5M Prod Primary License Lic to Use PLC per UserS014N2W E5M Prod Recurring License Basic ALC per UserS014N2Z E5M Prod Variable Term Lic Basic YLC per User

DELMIA -- Process & Resource Planning Product (5671-EPR)

S014N31 EPR Prod Primary License Lic to Use PLC per UserS014N36 EPR Prod Recurring License Basic ALC per UserS014N38 EPR Prod Variable Term Lic Basic YLC per User

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 47

DELMIA -- 2D Layout Planning Product (5671-L2P)

S014N3B L2P Prod Primary License Lic to Use PLC per UserS014N3H L2P Prod Recurring License Basic ALC per UserS014N3K L2P Prod Variable Term Lic Basic YLC per User

DELMIA -- Manufacturing Change Management Product (5671-MCM)

S014N3M MCM Prod Primary License Lic to Use PLC per UserS014N3T MCM Prod Recurring License Basic ALC per UserS014N3W MCM Prod Variable Term Lic Basic YLC per User

DELMIA -- Product Viewing Product (5671-PVW)

S014N3Z PVW Prod Primary License Lic to Use PLC per UserS014N44 PVW Prod Recurring License Basic ALC per UserS014N46 PVW Prod Variable Term Lic Basic YLC per User

DELMIA -- Standard Time Measurement Datacard Product (5671-SDC)

S014N48 SDC Prod Primary License Lic to Use PLC per UserS014N4F SDC Prod Recurring License Basic ALC per UserS014N4H SDC Prod Variable Term Lic Basic YLC per User

DELMIA -- Standard Time Measurement MOST Product (5671-SMO)

S014N4K SMO Prod Primary License Lic to Use PLC per UserS014N4R SMO Prod Recurring License Basic ALC per UserS014N4T SMO Prod Variable Term Lic Basic YLC per User

DELMIA -- Standard Time Measurement MTM1 Product (5671-SMT)

S014NKL SMT Prod Primary License Lic to Use PLC per UserS014NKS SMT Prod Recurring License Basic ALC per UserS014NKV SMT Prod Variable Term Lic Basic YLC per User

DELMIA -- Standard Time Measurement SAM Product (5671-SSA)

S014N4W SSA Prod Primary License Lic to Use PLC per UserS014N52 SSA Prod Recurring License Basic ALC per UserS014N54 SSA Prod Variable Term Lic Basic YLC per User

DELMIA -- Standard Time Measurement Product (5671-STM)

S014N56 STM Prod Primary License Lic to Use PLC per UserS014N5C STM Prod Recurring License Basic ALC per UserS014N5F STM Prod Variable Term Lic Basic YLC per User

DELMIA -- Standard Time Measurement Value Added Product (5671-SVA)

S014N5H SVA Prod Primary License Lic to Use PLC per UserS014N5N SVA Prod Recurring License Basic ALC per UserS014N5R SVA Prod Variable Term Lic Basic YLC per User

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 48

DELMIA -- Standard Time Measurement WF Product (5671-SWF)

S014N5T SWF Prod Primary License Lic to Use PLC per UserS014N60 SWF Prod Recurring License Basic ALC per UserS014N62 SWF Prod Variable Term Lic Basic YLC per User

DELMIA -- Target Tracking Product (5671-TGT)

S014N64 TGT Prod Primary License Lic to Use PLC per UserS014N69 TGT Prod Recurring License Basic ALC per UserS014N6C TGT Prod Variable Term Lic Basic YLC per User

DELMIA -- Workload Balancing Product (5671-WLB)

S014N6F WLB Prod Primary License Lic to Use PLC per UserS014N6L WLB Prod Recurring License Basic ALC per UserS014N6N WLB Prod Variable Term Lic Basic YLC per User

Optional products: This release adds a variable term license charge for the National LanguageSoftcopy Collection Kit. Primary and recurring license entitlement entities were announcedpreviously.

DELMIA -- National Language Softcopy Collection Kit (5672-NL8)

Entitlement License Pricingentity Description option metric

S014711 NL8 Prod Variable Term Lic Basic YLC per User

Orderable supplies

Only configurations ship supplies because configurations are prerequisites for all shareable andadd-on products.

Note: An exception is those few products that have standalone supplies. For example, an orderfor 5672-NL8 delivers the optional English softcopy collection kit.

For each configuration ordered, the ShopPLM configurator will add the 5628-DEL SPO andassign the entitlement entity number for the orderable supply.

Distri-Orderable butionsupply ID Language Medium Description

S014RPP English CD-ROM DELMIA ENOVIA Mfg Hub Acc Cf (5671-EAC)S014RPM English CD-ROM DELMIA Process Engineer Cf (5671-EEC)S014RPH English CD-ROM DELMIA Industrial Eng Cf (5671-EIC)S014RPK English CD-ROM DELMIA PPR Nav -- Mfg Hub Cf (5671-EPC)S014RPS English CD-ROM DELMIA Proc & Resrc Plan Cf (5671-ERC)

Optional stand-alone supplies: When using the 5672-NL8 product to order the optionalDELMIA V5 English National Language Softcopy Collection Kit (SK4T-3605), use the followingorderable supply ID to effect shipment:

Distri-Orderable butionsupply ID Language Medium Description

S0146MG English CD-ROM DELMIA English Softcopy Pubs (5672-NL8)

Withdrawn orderable supplies: The following orderable supplies are withdrawn effectiveimmediately:

Distri-Orderable butionsupply ID Language medium Description

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 49

S0146WM English CD-ROM DELMIA DPM Assembly GT 2 Cf (5672-AG2)S0146WV English CD-ROM DELMIA DPM BodynWhite GT2 Cf (5672-BG2)S0146X0 English CD-ROM DELMIA Tol Anl Dfrm Asm3 Cf (5672-MA3)S01470W English CD-ROM DELMIA DPM Machining GT 2 Cf (5672-PG2)S0146X4 English CD-ROM DELMIA Robotics Sim GT 2 Cf (5672-WG2)S0146X3 English CD-ROM DELMIA Robotics Sim XT 2 Cf (5672-WX2)S0146WP English CD-ROM DELMIA DPM ProcRsrcDefGT2 Cf (5672-XG2)

Customization options

Contact your CSO organization for any special handling such as suppression of media orexpediting an order.

Unlicensed documentation: One English softcopy collection kit is automatically included in allshipments. By using the following form number, additional kits can be ordered through the IBMPublication Ordering System at

http://www.elink.ibmlink.ibm.com/public/applications/publications/cgibin/pbi.cgi

DELMIA V5 NLV Softcopy Collection Kit -- English (SK4T-3605)

Terms and conditions

Agreement: IBM Customer Agreement

Designated machine: Not Required

Variable charges apply: No

Location license applies: No

Use limitation applies: Yes, as implemented by the license management models described.

License management for DELMIA Process Detailing and Validation: DELMIA controls thenumber of concurrent users of a configuration or product, according to the number of licensekeys acquired for the configuration or product.

DELMIA delivers identical license management mechanisms on UNIX and Windowsenvironments, based on IBM LUM. The following license management principles apply:

• A DELMIA Process Detailing and Validation configuration (standard or custom) will require alicense key. License keys for configurations are acquired and released for the totalconfiguration. The products within a configuration cannot be shared.

• Each shareable product will require a license key, in addition to one for the prerequisiteconfiguration and any prerequisite product, if applicable.

• In all cases, configuration license keys are acquired at the beginning of the process and arereleased at its termination.

• Add-on and shareable products may require license keys for prerequisite products that are notalready included in a standard configuration. Prerequisites for shareable products can besatisfied by a standard configuration, by an AOP within a custom configuration, or by ashareable product. However, because all AOPs are defined within one custom license key,any AOP prerequisites must be satisfied by either a standard configuration or by other AOPspurchased and defined within the same custom configuration.

• LUM keys must be renewed, typically every two years. The actual duration will depend on theorder details.

DELMIA Process Detailing and Validation can be used in three license management modes:nodelock, with concurrent usage of license keys on a network, or concurrent offline licensemanagement.

Nodelock usage

The use of a local display is mandatory for usage in nodelock mode. There is no limit to the

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 50

number of processes launched for a given license key (configuration or product). For instance, auser can launch the following simultaneous processes:

• A V5 interactive session

• A V5 process executed through an OLE container application

• Replay of macros recorded from captured sequences of V5 user interactions

In the nodelock mode of operation, only one license key per configuration and shareable productcan be registered per machine, and only one user can run at a time on that machine. If multiplelicense keys per configuration or shareable product, or multiple users on a single machine, arerequired, refer to the Concurrent usage section.

Concurrent usage: A user on one machine on one display uses one license key perconfiguration or shareable product used, regardless of the number of processes. If the displaychanges, then an additional license key is taken for the corresponding process.

Dynamic license management: Shareable product license keys can be acquired and releasedduring the session. (The ability to acquire and release licenses is not available forconfigurations.) Shareable license keys acquired at the beginning of the session cannot bereleased before the end of the session; only license keys dynamically granted upon user requestduring the session can be released during the session.

Concurrent offline license management: A concurrent license key control technique isavailable via the LUM server. It gives applications running on a Windows laptop the ability todisconnect from the license key server for a specific period of time.

Note: Concurrent offline license management is not available on 64-bit platforms.

During the checkout period, the server license key is unavailable for use by another concurrentuser. This feature is designed to add additional flexibility to a user's work environment. It isoffered to accommodate short-term travel needs and collaboration while away from a fixed officeenvironment or server connection. All ICA terms and conditions, including cross-border licensingterms, are unchanged, and users will check-out and check-in license keys at their home server,where rules and procedures are controlled by LUM.

License management for DELMIA Process Planning: Process Planning applications requireFlexLM 8.3b on the Manufacturing Hub server and Process Planning clients for licensemanagement purposes. FlexLM supports three licensing methods:

• License file: A license file is supplied for each server and client based on the customer order.

• License server: The license server runs an NT-Service that manages a central license file forall servers and clients.

• Temporary license: The install process provides an option to create a temporary 30-daylicense. The license file is created after entering a license code.

Educational allowance available: The standard educational allowance does not apply toDELMIA V5.

Volume orders: Contact your IBM representative.

Warranty applies: Yes

Licensed program materials availability

Restricted Materials of IBM: NoneNon-Restricted Source Materials: NoneObject Code Only (OCO): All

Program services: Program services offer a method of reporting code-related problems forDELMIA licensed software products. Program services are available electronically using theproblem submission process at the PLM Technical Support Web site at

http://www.ibm.com/software/applications/plm/support/

Note: In order to use this facility, you must use an IBM ID which has associated to it the licensedIBM customer number under which the product was purchased. If you have not yet obtained an

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 51

IBM ID, visit

http://www.ibm.com/account/profile/

If you have not yet associated the licensed IBM customer number to your IBM ID, you will beprompted to do so when accessing the problem submission facility.

When using program services, the problem report is submitted via the PLM Technical SupportWeb site; all subsequent communications will be via e-mail. The response time for theseproblem reports, regardless of the severity, will be within two business days. All communicationsmust be in English.

Not all options of the Product Lifecycle Management (PLM) technical support e-services areavailable in all countries.

Preventive Service is delivered through the next release of DELMIA products. The new releasealso includes corrections to problems, depending on the time of their submission and theirseverity.

During the program services period, Corrective Service for DELMIA V5 releases is deliveredthrough service packs on a regular basis. A service pack includes corrections for blockingproblems in production systems reported on this release and all corrections available for allcomponents at the time it is built. Service packs are provided at the same time for all platformscurrently supported. Each service pack supersedes the previous one and may be installed on topof the released level or on top of a previous service pack.

Customers may request a correction via a service pack for blocking problems. A blockingproblem is defined as:

• A problem that stops production: The customer is currently using the level for which a fix isrequested in a production environment.

• A problem that prevents migration: The customer must provide the migration plan.

• A problem that halts testing of a given level: A fix will allow customer to continue the testing.

• Installation problem: A problem that prevents the customer from installing or using the product.

• Regression: Problems reported as regressions may be due to an operation that was beingperformed erroneously or created incorrect data with a previous release and the currentrelease no longer permits these operations. Therefore, each problem reported as a regressionmust be evaluated. True regressions will be handled as Severity 1 problems.

Note: Customers experiencing problems with IBM LUM products when used with DELMIA V5products may report these problems through PLM product support. Note this only applies whenthe LUM product is being used in conjunction with a DELMIA product and the DELMIA product iswithin its support period. LUM problems will receive the program services level of support andmust be submitted via the Problem Reporting process at the PLM Technical Support Web site at

http://www.ibm.com/software/applications/plm/support/

Program services will be provided for this release of DELMIA products (V5R18) until October 1,2009.

For a list of all currently supported releases of CATIA, ENOVIA and DELMIA products visit

http://www.ibm.com/software/applications/plm/support/

At the bottom of the page, select "End of support dates" under Plan -- Product life cycle.

IBM operational support services — SupportLine: No

Other support: PLM Support Centers

Prices

For prices, contact your IBM representative.

PLC/ALC: Customers who pay a PLC and an ALC for a licensed program receiveenhancements and future releases, if any, at no additional charge. Significant new functions may

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 52

be offered as an optional feature and charged for separately. If a replacement program isannounced and the customer elects to license the replacement program for a PLC/ALC andreplace the prior program, an upgrade charge may apply.

The first payment consists of the primary license charge and the annual license charge. Theannual license charge applies yearly thereafter.

Use level charge: Charges for this program are based on usage levels. When a customerupgrades to a higher level of usage, a usage upgrade charge will apply, equal to the differencebetween the charge for the current level of usage and the higher level of usage.

IBM Global Financing

IBM Global Financing offers competitive financing to credit-qualified customers to assist them inacquiring IT solutions. Offerings include financing for IT acquisition, including hardware,software, and services, from both IBM and other manufacturers or vendors. Offerings (for allcustomer segments: small, medium, and large enterprise), rates, terms, and availability can varyby country. Contact your local IBM Global Financing organization or visit

http://www.ibm.com/financing

IBM Global Financing offerings are provided through IBM Credit LLC in the United States, andother IBM subsidiaries and divisions worldwide to qualified commercial and governmentcustomers. Rates are based on a customer's credit rating, financing terms, offering type,equipment type, and options, and may vary by country. Other restrictions may apply. Rates andofferings are subject to change, extension, or withdrawal without notice.

Trademarks

POWER4, POWER5, developerWorks, and IBMLink are trademarks of International Business MachinesCorporation in the United States or other countries or both.

AIX, RS/6000, WebSphere, and MQSeries are registered trademarks of International Business MachinesCorporation in the United States or other countries or both.

Intel and Pentium are registered trademarks of Intel Corporation.

Windows and Microsoft are registered trademarks of Microsoft Corporation.

Java is a trademark of Sun Microsystems, Inc.

UNIX is a registered trademark of the Open Company in the United States and other countries.

Other company, product, and service names may be trademarks or service marks of others.

This announcement is provided for your information only. For additional information, contact your IBM representative, call800-IBM-4YOU, or visit the IBM home page at: http://www.ibm.com

IBM United States Announcement 208-045 IBM is a registered trademark of International Business Machines Corporation 53