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Defects in Materials
www.cambridge.org© in this web service Cambridge University Press
Cambridge University Press978-1-107-40997-2 - Materials Research Society Symposium Proceedings: Volume 209:Defects in MaterialsEditors: Paul D. Bristowe, J. Ernest Epperson, Joseph E. Griffith and Zuzanna Liliental-WeberFrontmatterMore information
www.cambridge.org© in this web service Cambridge University Press
Cambridge University Press978-1-107-40997-2 - Materials Research Society Symposium Proceedings: Volume 209:Defects in MaterialsEditors: Paul D. Bristowe, J. Ernest Epperson, Joseph E. Griffith and Zuzanna Liliental-WeberFrontmatterMore information
MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS VOLUME 209
Defects in Materials
Symposium held November 26-29, 1990, Boston,Massachusetts, U.S.A.
EDITORS:
Paul D. BristoweMassachusetts Institute of Technology, Cambridge, Massachusetts, U.S.A.
J. Ernest EppersonArgonne National Laboratory, Argonne, Illinois, U.S.A.
Joseph E. GriffithAT&T Bell Laboratories, Murray Hill, New Jersey, U.S.A.
Zuzanna Liliental-WeberLawrence-Berkeley Laboratories, Berkeley, California, U.S.A.
IMIRIS1 MATERIALS RESEARCH SOCIETY
Pittsburgh, Pennsylvania
www.cambridge.org© in this web service Cambridge University Press
Cambridge University Press978-1-107-40997-2 - Materials Research Society Symposium Proceedings: Volume 209:Defects in MaterialsEditors: Paul D. Bristowe, J. Ernest Epperson, Joseph E. Griffith and Zuzanna Liliental-WeberFrontmatterMore information
cambridge university press Cambridge, New York, Melbourne, Madrid, Cape Town, Singapore, São Paulo, Delhi, Mexico City
Cambridge University Press32 Avenue of the Americas, New York ny 10013-2473, USA
Published in the United States of America by Cambridge University Press, New York
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© Materials Research Society 1991
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First published 1991 First paperback edition 2012
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isbn 978-1-107-40997-2 Paperback
Cambridge University Press has no responsibility for the persistence oraccuracy of URLs for external or third-party internet websites referred to inthis publication, and does not guarantee that any content on such websites is,or will remain, accurate or appropriate.
This work was supported by the Air Force Office of Scientific Research, Air Force Systems Command, USAF, under Grant Number AFOSR 91-0088.
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Cambridge University Press978-1-107-40997-2 - Materials Research Society Symposium Proceedings: Volume 209:Defects in MaterialsEditors: Paul D. Bristowe, J. Ernest Epperson, Joseph E. Griffith and Zuzanna Liliental-WeberFrontmatterMore information
Contents
PREFACE xvii
MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS xviii
PART I: DEFECTS IN METALS
•DEFECTS IN MATERIALS: THEIR CHARACTERIZATION ANDSIMULATION 3
Colin G. Windsor
*ON THE NATURE OF GRAIN BOUNDARY STRUCTURES IN NANOPHASEMATERIALS 15
R.W. Siegel and G.J. Thomas
ALTERNATIVE LENGTH SCALES FOR POLYCRYSTALLINE MATERIALS 27C.S. Nichols, R.F. Cook, D.R. Clarke, andD.A. Smith
EFFECT OF GRAIN BOUNDARY STRUCTURE ON GRAIN BOUNDARYDIFFUSIVITIES IN THE Au/Ag SYSTEM 3 3
Qing Ma and R.W. Balluffi
HREM INVESTIGATION OF THE STRUCTURE OF THE S5(310)/[001]SYMMETRIC TILT GRAIN BOUNDARY IN Nb 3 9
Wayne E. King, G.H. Campbell, A. Coombs, M.J. Mills,and M. Ruhle
DIFFRACTION EFFECTS FROM [111] TWIST BOUNDARIESIN GOLD 47
I. Majid, D. Wang, and P.D. Bristowe
EFFECT OF HYDROGEN ON THE ELECTRONIC STRUCTURE OF AGRAIN BOUNDARY IN IRON 53
Genrich L. Krasko, Ralph J. Harrison, andG.B. Olson
THE ACCOMMODATION OF LATTICE MISMATCH ON THE (111)INTERPHASE BOUNDARY PLANE IN FCC METALS 59
P. Gumbsch and H.F. Fischmeister
TILT BOUNDARIES IN BCC METALS: COMPARISON OF RESULTSUSING DIFFERENT INTERATOMIC INTERACTIONS 65
S.M. Foiles, M.S. Daw, and R.B. Phillips
ANTIPHASE BOUNDARY CALCULATIONS FOR THE Ll 2 STRUCTUREUSING AN EMBEDDED ATOM METHOD MODEL 71
Jeanne R. Brown and Robert A. Johnson
X-RAY SCATTERING FROM HIGHLY DISTORTED LATTICESUNDERGOING PHASE SEPARATION 77
Satish I. Rao, C.H. Wu, and C.R. Houska
*Invited Paper
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MICROSTRUCTURAL ANALYSIS OF HEXAGONAL CLOSE-PACKEDMETALS USING X-RAY DIFFRACTION AND TRANSMISSIONELECTRON MICROSCOPY 83
M. Griffiths and J.E. Winegar
METASTABLE PHASES AND DEFECT MICROSTRUCTURES INMELT-SPUN RIBBONS OF Nb3Al
M. Aindow, J. Shyue, T.A. Gaspar, and H.L. Fraser
DEFECTS, MICROSTRUCTURE AND PROPERTIES OF THEINDUSTRIAL 35 CrMoV STEEL 95
Wu Wangzi and Qiao Guiwen
PART II: THEORY AND SIMULATION OF DEFECTS
*THE ENCHANTING PROPERTIES OF OXYGEN ATOMS IN SILICON 103M. Needels, J.D. Joannopoulos, Y. Bar-Yam,S.T. Pantelides, and R.H. Wolfe
PECULIAR DOPING BEHAVIOR OF Si:Be 119Eugen Tarnow, S.B. Zhang, K.J. Chang, andD.J. Chadi
MOLECULAR DYNAMICS STUDIES OF DEFECTS IN Si 12 5M.S. Duesbery, D.J. Michel, Efthimios Kaxiras,and B. Joos
THE ELECTRONIC STRUCTURE OF GRAIN BOUNDARIES IN Nb 131Erik C. Sowa, A. Gonis, and X.-G. Zhang
*MOLECULAR DYNAMICS SIMULATIONS OF STEPS AT CRYSTALSURFACES 135
G.H. Giliner and A.F. Bakker
DEFECT GENERATION AND MOTION IN POLYETHYLENE-LIKECRYSTALS, ANALYZED BY SIMULATION WITH SUPERCOMPUTERS 147
Bernhard Wunderlich, A. Xenopoulos, D.W. Noid,and B.G. Sumpter
A MORPHOLOGICAL APPROACH TO CONSTRUCTING INTERATOMICPOTENTIALS: AN APPLICATION TO SILICON 159
P. Dallot and P.D. Bristowe
SEMIEMPIRICAL ANGULAR-FORCE METHOD FOR BCC TRANSITIONMETALS 165
A.E. Carlsson
ANISOTROPIC DISPLACEMENT THRESHOLD ENERGIES IN SILICONBY MOLECULAR DYNAMICS SIMULATIONS 171
LeAnn A. Miller, David K. Brice, Anil K. Prinja,and S. Thomas Picraux
THE SURFACE GREEN'S FUNCTION IN SEMICONDUCTORS BY THETIGHT-BINDING LINEAR MUFFIN-TIN ORBITAL METHOD 177
M. Sob and J. Kudrnovsky
*Invited Paper
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A CLUSTER CALCULATION OF B AND P IMPURITIES INAMORPHOUS SILICON 183
L. Enrique Sansores, R.M. Valladares,J.A. Cogordan, and A.A. Valladares
FIRST-PRINCIPLES STUDY OF PHOTOEXCITED DEFECTS INPOLYSILANE CHAINS 189
J.W. Mintmire, R.C. Mowrey, D.W. Brenner,B.I. Dunlap, and C.T. White
CONTRIBUTIONS OF CONFORMATIONAL AND STRUCTURAL DEFECTSTO THE HYPERPOLARIZABILITIES OF POLYMERS 195
Steven M. Risser and Kim F. Ferris
SIMULATION OF THE CRYSTAL-TO-AMORPHOUS TRANSFORMATIONIN IRRADIATED QUARTZ 201
Uma Jain, Adam C. Powell, and Linn W. Hobbs
CALCULATION OF DEFECT PROPERTIES OF NiTi AND FeTi 207Russell T. Lutton, Michael J. Sabochick,and Nghi Q. Lam
DISLOCATION MOBILITIES IN NiAl FROM MOLECULAR DYNAMICSSIMULATIONS 213
A. Moncevicz, P.C. Clapp, and J.A. Rifkin
THE FREE ENERGY SIMULATION APPROACH TO GRAIN BOUNDARYSEGREGATION IN Cu-Ni 219
H.Y. Wang, R. Najafabadi, D.J. Srolovitz, andR. LeSar
ATOMIC-SCALE SIMULATION OF ADHESION BETWEEN METALLICSURFACES 225
Paul A. Taylor
CALCULATION OF DIFFRACTION PATTERNS ASSOCIATED WITHELECTRON IRRADIATION INDUCED AMORPHIZATION OF CuTi 231
R. Devanathan, N.Q. Lam, M.J. Sabochick,P. Okamoto, and M. Meshii
HOT ELECTRONS RELAXATION 2 39A.M. Mazzone
VIBRATIONAL FREQUENCIES FOR MODEL SILICATES:EXTENSIONS BEYOND MOLECULAR PROPERTIES 245
Kim F. Ferris and Steven M. Risser
A SIMPLE STATISTICAL THEORY FOR GRAIN GROWTH INMATERIALS 251
P. Mulheran and J.H. Harding
SIMULATING VACANCY, IMPURITY AND ELECTRONIC DEFECTSTATES IN MgO, LiCl AND La2Cu04 USING QUANTUM CLUSTERAND CLASSICAL LATTICE SIMULATION TECHNIQUES IN ACONSISTENT MANNER 257
Robin W. Grimes, C.R.A. Catlow, A.L. Shluger,R. Pandey, R. Baetzold, and A.H. Harker
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FIRST-PRINCIPLES STUDY OF SOLITON HYPERFINEINTERACTIONS IN POLYACETYLENE 263
C.T. White, F.W. Kutzler, J.W. Mintmire, andM.R. Cook
PART III: POINT AND LINE DEFECTS
*X-RAY CHARACTERIZATION OF DEFECTS IN IRRADIATED IRON 271J. Peisl, H. Franz, A. Schmalzbauer, andG. Wallner
IN-SITU NMR INVESTIGATION OF DYNAMICAL BEHAVIOR OFPOINT AND LINE DEFECTS DURING DEFORMATION OF NaCl 283
K. Detemple, O. Kanert, K. Linga Murty, andJ.Th.M. De Hosson
ELECTRON CHANNELLING CONTRAST IMAGING (ECCI) OFDISLOCATIONS IN BULK SPECIMENS 289
J.T. Czernuszka, N.J. Long, E.D. Boyes, andP.B. Hirsch
DIFFUSION MECHANISMS IN BCC-Zr: A MOLECULAR DYNAMICSAPPROACH 293
F. Willaime and C. Massobrio
DEFECT DYNAMICS OF A NEMATIC POLYMER IN A MAGNETICFIELD 299
Alejandro D. Rey
LONGITUDINAL RELAXATION OF A THERMALLY STRESSED FIBERBY PRISMATIC DISLOCATION PUNCHING 305
David C. Dunand and Andreas Mortensen
DISLOCATION DYNAMICS IN B.C.C. METALS: A NUCLEARMAGNETIC RESONANCE AND TRANSMISSION ELECTRONMICROSCOPIC STUDY 311
J.Th.M. De Hosson and O. Kanert
EFFECT OF PARTICLE SIZE ON THE PLASTIC ZONE FORMATIONIN FRONT OF MODE I CRACK IN ABS POLYMERS 317
Beta Y. Ni and J.C.M. Li
HETEROCYCLIZATION OF ACETYLENE TO THIOPHENE AT DEFECTSON THE Pd(lll) SURFACE 323
Andrew J. Gellman
WEAK LOCALIZATION EFFECTS IN FLUORINE-INTERCALATEDGRAPHITE FIBERS 329
S.L. di Vittorio, M.S. Dresselhaus, V. Bayot,L. Piraux, J-P. Issi, M. Endo, and T. Nakajima
CHARACTERIZATION OF ACTIVATED CARBON FIBERS 3 35A.W.P. Fung, A.M. Rao, K. Kuriyama,M.S. Dresselhaus, G. Dresselhaus, and M. Endo
PHOTOCONDUCTIVITY OF HIGHLY DISORDERED CARBON FIBERS 341Kazuyoshi Kuriyama and Mildred S. Dresselhaus
*Invited Paper
viii
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RAMAN STUDIES OF FLUORINE-INTERCALATED CARBON FIBERS 347A.M. Rao, A.W.P. Fung, M.S. Dresselhaus,G. Dresselhaus, M. Endo, and T. Nakajima
VACANCY PROPERTIES IN ORDERED NiGa AND NiAl 353S.M. Kim
DISLOCATION DENSITY DETERMINATION IN POLYCRYSTALLINECOPPER BY NEUTRON DIFFRACTION ON EXTINCTION MEASUREMENTS 3 59
J. Palacios Gomez
PART IV: DEFECTS IN SEMICONDUCTORS
*THE DX CENTER: HOW COMPLICATED CAN A POINT DEFECT BE? 367Thomas N. Theis
PROPERTIES OF Cu IN GaAs 379Rosa Leon, Maria Kaminska, Kin Man Yu, andEicke Weber
EXTRINSIC GETTERING OF COPPER IN SILICON: HETEROGENEOUSPRECIPITATION ON NEAR-SURFACE DISLOCATIONS 385
P.M. Rice, M.J. Kim, and R.W. Carpenter
THEORY OF HYDROGEN COMPLEXES IN Si 391S.B. Zhang and W.B. Jackson
IMPURITY-DEFECT COMPLEXES IN HYDROGENATED AMORPHOUSSILICON 397
Lin H. Yang, C.Y. Fong, and Carol S. Nichols
SPECTROSCOPIC STUDY OF HYDROGEN INDUCED DEFECTIN a-Ge:H 403
Shu Jin and Lothar Ley
THE PRECIPITATION OF NICKEL AND COPPER AT GRAINBOUNDARIES IN SILICON 409
H.J. Moller, U. Jendrich, L. Huang, andA. Foitzik
MAJORITY CARRIER TRANSPORT ACROSS SEMICONDUCTORGRAIN BOUNDARIES 415
S.F. Nelson, P.V. Evans, S.L. Sass, andD.A. Smith
ON THE DISTRIBUTION MECHANISM OF VOIDS INSi-IMPLANTED GaAs 421
Samuel Chen, S.-Tong Lee, G. Braunstein,K.Y. Ko, and T.Y. Tan
ANALYSIS OF ANOMALOUS PEAK HEIGHTS IN DLTS OFMBE-GROWN ALUMINUM GALLIUM ARSENIDE 427
W. Lim, L.P. Trombetta, and Keith Jamison
FREQUENCY DEPENDENCE ON HOPPING CONDUCTANCE INCRYSTALLINE ELECTRON IRRADIATED SEMICONDUCTORS 43 3
S.D. Kouimtzi
*Invited Paper
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EVIDENCE OF DEFECT LEVELS IN p AND n-TYPE ELECTRONIRRADIATED Si 439
S.D. Kouimtzi
OPTICAL INVESTIGATIONS ON DONOR DOPED CdTe 445W. Stadler, B.K. Meyer, D.M. Hofmann,D. Sinerius, and K.W. Benz
PHONONS IN MIXED II-VI COMPOUND SEMICONDUCTORS 451D.N. Talwar, Alan C. Coleman, P.M. Amirtharaj,S. Perkowitz, Z.C. Feng, and P. Becla
RAMAN STUDIES OF ZnSe LATTICE DAMAGE AND RECOVERY DUETO N IMPLANTATION AND ANNEALING 457
A. Deneuville, P. Ayyub, C.H. Park, T. Anderson,P. Lowen, K.S. Jones, and P.H. Holloway
EFFECT OF THE EXTINCTION DISTANCE IN X-RAY ROCKINGCURVE ANALYSES OF II-VI COMPOUNDS 463
P.D. Moran and R.J. Matyi
PAC STUDIES OF DEFECTS IN AgCl AND II-VI COMPOUNDS 469J.C. Austin, M.L. Swanson, W.C. Hughes, andS.S. Choi
X-RAY TOPOGRAPHY STUDIES OF OXYGEN PRECIPITATES INMCZ SILICON 475
Anthony J. Holland, G. Stephan Green,Brian K. Tanner, and Mai Zhenhong
DAMAGE FREEZE-IN PHENOMENA AS A FUNCTION OF DOPANTIMPLANT TYPE IN GERMANIUM-RICH REGIONS IN SILICON 481
Sheldon Aronowitz, Courtney Hart, and Sharon Myers
INFLUENCE OF CURRENT INJECTION INTO a-SiN:H FILMSON CHARGE TRAPPING DEFECTS 487
Tomoki Oku, Kiyoshi Kawabata, Yukio Higaki,Teruhito Matsui, Hirozo Takano, and Mutsuyuki Otsubo
ANALYSIS FOR THE CHARACTERIZATION OF OXYGEN IMPLANTEDSILICON (SIMOX) BY SPECTROSCOPIC ELLIPSOMETRY 493
M.G. Doss, D. Chandler-Horowitz, J.F. Marchiando,S. Krause, and S. Seraphin
ELECTRICAL PROPERTIES OF S+ IMPLANTATION IN SI GaAs 499Guanqun Xia, Anmin Guan, Haiyang Geng,and Weiyuan Wang
STRUCTURAL DEFECTS IN LASER ANNEALED ARSENIC IMPLANTEDSILICON 505
J.M. Tonnerre, M. Matsuura, G.S. Cargill III, andL.W. Hobbs
SYNCHROTRON TOPOGRAPHIC STUDIES OF THE INFLUENCE OFRAPID THERMAL PROCESSING ON DEFECT STRUCTURES IN SINGLECRYSTAL SILICON 511
Michael Dudley, Franklin F.Y. Wang, Thomas Fanning,Georgios Tolis, Jun Wu, and David T. Hodul
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POINT DEFECT INJECTION AND ENHANCED Sb DIFFUSION IN SiDURING Co-Si AND Ti-Si REACTIONS 517
J.W. Honeycutt and G.A. Rozgonyi
CONTACTLESS DEEP LEVEL TRANSIENT SPECTROSCOPY USINGMICROWAVE REFLECTION 523
M.S. Wang and J.M. Borrego
MINORITY CARRIER INDUCED DEBONDING OF HYDROGEN FROMSHALLOW DONORS IN SILICON 529
Carleton H. Seager and Robert A. Anderson
LONG RANGE COULOMB EFFECTS ON HYDROGEN DEBONDING FROMBORON ACCEPTORS IN SILICON 535
R.A. Anderson and C.H. Seager
INVESTIGATION OF DEEP LEVEL DEFECTS IN MERCURIC IODIDEBY THERMALLY STIMULATED CURRENT SPECTROSCOPY 541
X.J. Bao, T.E. Schlesinger, R.B. James, A.Y. Cheng,C. Ortale, and L. van den Berg
DLTS STUDY OF OPTOELECTRONIC DEVICES IN THE DYNAMICREGIME 547
S. Mil'shtein, D. Tripp, and A. Karakashian
STRUCTURAL PROPERTIES OF a-Ge^N^.H ALLOYS 555F.C. Marques and I. Chambouleyron
HYPERFINE AND SUPERHYPERFINE TENSORS AS PROBES OF THELOCAL ENVIRONMENT OF DEEP-LEVEL DEFECT CENTERS 561
Michael Cook and C.T. White
TEMPERATURE DEPENDENT RECOMBINATION LIFETIMEIN SILICON: INFLUENCE OF TRAP LEVEL 567
Andrzej Buczkowski, Zbigniew J. Radzimski,Yoshi Kirino, Fumio Shimura, andGeorge A. Rozgonyi
HYDROGEN DIFFUSION IN N-TYPE SILICON. COMPARISONWITH P-TYPE SILICON 573
R. Rizk, P. de Mierry, D. Ballutaud,M. Aucouturier, and D. Mathiot
NEUTRON IRRADIATED URANIUM SILICIDES STUDIED BYNEUTRON DIFFRACTION AND RIETVELD ANALYSIS 579
R.C. Birtcher, M.H. Mueller, andJ.W. Richardson, Jr.
MODIFICATIONS IN GAP STATE DISTRIBUTION UPON HIGHENERGY ELECTRON BOMBARDMENT IN n TYPE HYDROGENATEDAMORPHOUS SILICON 585
Suvarna Babras, S.V. Bhoraskar, and V.G. Bhide
EVIDENCE OF FORBIDDEN REFLECTIONS IN THE DIFFUSESCATTERING OF HgQ 8()Cd0 2QTe SINGLE CRYSTALS 593
J.P. Quintana'
ANALYSIS OF OXYGEN GETTERING AND DISLOCATION LOCKINGIN SILICON 597
Dimitrios Maroudas and Robert A. Brown
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PART V: INTERFACES AND SURFACES
SCANNING TUNNELING MICROSCOPY IMAGING OF DEFECTS INLAYERED COMPOUNDS 605
G.P.E.M. Van Bakel, J.Th.M. De Hosson, and T. Hibma
A SCANNING TUNNELING MICROSCOPY STUDY OF THE REDUCEDTiO2(110) SURFACE 611
Gregory S. Rohrer, Victor E. Henrich, andDawn A. Bonnell
IMAGING OF CRACKS IN SEMICONDUCTOR SURFACES USINGSCANNING TUNNELING MICROSCOPY 617
T. Foecke, R. King, A. Dale, and W.W. Gerberich
SIMULATIONS OF STEP MOTION DURING CRYSTAL EVAPORATION 623A. Peter Jardine
*STUDY OF SURFACE DEFECTS WITH THE REFLECTED ELECTRONS 629Tung Hsu
DEFECTS IN THE STRUCTURE OF S=27 <110> TILT GRAIN-BOUNDARIES IN Ge 637
Stuart McKernan, C. Barry Carter, and Zvi Elgat
CHARACTERIZATION OF INTERFACIAL STRUCTURE IN LARGELATTICE MISMATCH HETEROEPITAXY: Ag/Si(lll) 643
D.C. McKenna, G.-C. Wang, and K. Rajan
HREM STUDY OF Al-Si INTERFACES 649Mohammad Shamsuzzoha, Pierre A. Deymier, andDavid J. Smith
COMBINED TEM AND X-RAY TOPOGRAPHIC CHARACTERIZATIONOF In^Ga1-xAs/GaAs STRAINED LAYER SYSTEMS 655
Michael Dudley, Gong-Da Yao, David Paine,David Howard, and Robert N. Sacks
THREADING DISLOCATION DENSITIES IN MISMATCHEDHETEROEPITAXIAL (001) SEMICONDUCTORS 661
J.E. Ayers, S.K. Ghandhi, and L.J. Schowalter
WRONG BONDS AT COMPOUND SEMICONDUCTOR GRAINBOUNDARIES 667
W.R.L. Lambrecht, C.H. Lee, M. Methfessel,M. van Schilfgaarde, C. Amador, and B. Segall
HIGH RESOLUTION ELECTRON MICROSCOPY STUDIES OFINTERFACES BETWEEN A12O3 SUBSTRATES AND MBE GROWNNb FILMS 673
J. Mayer, J. Dura, C.P. Flynn, and M. Riihle
INTERFACE STRUCTURE OF EPITAXIAL AND Nb FILMS ONSAPPHIRE: GRAZING INCIDENCE X-RAY DIFFRACTION ANDX-RAY REFLECTIVITY STUDIES 679
C.H. Lee, K.S. Liang, F.S. Shieu, S.L. Sass,and C.P. Flynn
*Invited Paper
xii
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ELECTRON MICROSCOPY STUDY OF MOCVD-GROWN TiO2 FILMSAND TiO2/Al2O3 INTERFACES 685
Y. Gao, K.L. Merkle, H.L.M. Chang, T.J. Zhang,and D.J. Lam
TEM EVALUATION OF CuAu-I TYPE ORDERED STRUCTURES INMBE-GROWN InGaAs CRYSTALS ON (110) InP SUBSTRATES 691
O. Ueda, Y. Nakata, T. Nakamura, and T. Fujii
DEEP LEVEL DEFECT CHARACTERIZATION OF MBE GROWNInGaAs/GaAs HETEROSTRUCTURES 697
W.R. Buchwald, J.H. Zhao, and F.C. Rong
HIGH QUALITY GaAs MIS DIODES WITH VERY LOW SURFACESTATE DENSITY 703
Yoshihisa Fujisaki, Sumiko Sakai, Saburo Ataka,and Kenji Shibata
INFLUENCE OF SURFACE RELAXATION ON X-RAY TOPOGRAPHICIMAGING OF INTERFACIAL DISLOCATIONS IN HETEROSYSTEMS 707
Gong-Da Yao, Jun Wu, Michael Dudley,Vijay Shastry, and Peter Anderson
COMPARISON BETWEEN HOMO- AND HETERO-EPITAXIAL LAYERSBY PHOTOREFLECTANCE SPECTROSCOPY 713
K.L. Jiao, Z.Q. Shi, and W.A. Anderson
OBSERVATION OF HEXAGONAL AlGaAs GROWN BY OMCVD 719D.M. Hwang, T.S. Ravi, R. Bhat, S. Simhony,C.Y. Chen, and E. Kapon
FERROELASTIC DOMAIN SWITCHING IN TETRAGONALZIRCONIA 725
C.J. Chan, F.F. Lange, M. Riihle, J.F. Jue,and A.V. Virkar
INTERPRETATION OF ALUMINA/YTTRIUM-ALUMINUM GARNETORIENTATION RELATIONSHIPS BY GEOMETRIC CRITERIA 731
R.S. Hay and L.E. Matson
INTERFACE STRESS IN ARTIFICIAL MULTILAYERS 737J.A. Ruud, A. Witvrouw, and F. Spaepen
PART VI: DEFECTS IN OXIDE SUPERCONDUCTORS
•IRRADIATION DEFECT STRUCTURES IN YBa2Cu307_x AND THEIRCORRELATION WITH SUPERCONDUCTING PROPERTIES 743
Marquis A. Kirk
DEFECT NETWORK IN SUPERCONDUCTING CERAMIC OXIDESSTUDIED BY NEUTRON AND PROTON IRRADIATION 753
E. Mezzetti, D. Andreone, G. Castagno,R. Cherubini, S. Colombo, R. Gerbaldo,and B. Minetti
*Invited Paper
xiii
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SHORT RANGE ORDER STRUCTURES IN Y-Pr-Ba-Cu-0 SYSTEMSTUDIED BY X-RAY ABSORPTION FINE STRUCTURE (XAFS)TECHNIQUES 759
Y.H. Kao, A. Krol, Z.H. Ming, C.S. Lin, Y.L. Soo,C.X. Gu, I.S. Yang, and C.C. Tsuei
DEFECT DEPENDENCE OF POSITRON LIFETIMES IN OXIDESUPERCONDUCTORS 765
P.A. Sterne, J.C. O'Brien, R.H. Howell, andJ.H. Kaiser
THE ROLE OF CATION POINT DEFECTS AND OXYGENINTERSTITIALS ON MODULATIONS IN UNDOPED AND DOPEDBi-Sr-Ca-Cu-0 SUPERCONDUCTORS 771
P.L. Gai, M.A. Subramanian, and A.W. Sleight
INVESTIGATIONS OF YBa2Cu307_5 FILMS GROWN ONVICINALLY-POLISHED MgO SUBS~TRATES 777
S.K. Strei.ff.er, B.M. Larson, and J.C. Bravman
DEFECT CHEMISTRY OF HIGH Tc SUPERCONDUCTORS 783Kazuo Fueki and Yasushi Idemoto
NEW CONCEPTS IN MODELLING INTERFACIAL DEFECTS INYBa2Cu307_x 789
John G. Darab, R.K. MacCrone, and K. Rajan
OXYGEN DIFFUSION IN La2_xSrxCu04_ 795Elizabeth J. Opila, Harry L. Tuller,Bernhardt J. Wuensch, and Joachim Maier
OXYGEN IN-DIFFUSION AND OUT-DIFFUSION IN SINGLECRYSTAL YBa2Cu307_5 801
John R. LaGraff, Pengdi Han, and David A. Payne
THEORETICAL MODELING AND EXPERIMENTAL CHARACTERIZATIONOF PLANAR DEFECTS IN Y2Ba4Cu6+x014+x 807
C.P. Burmester, M. Fendorf, L.T. Wille, andR. Gronsky
DEFECTS IN DECOMPOSED YBa2Cu40x (124) SUPERCONDUCTORAFTER RAPID ANNEALING 813
Y. Li, Y. Gao, K.L. Merkle, H. Shi, andU. Balachandran
ELASTIC AFTER-EFFECT DUE TO OXYGEN RELAXATION INYBa2Cu307_5 ABOVE Tc 819
J.R. Cost, P.E. Armstrong, R.B. Poeppel, andJ.T. Stanley
THERMAL DESORPTION STUDIES OF ISOTOPICALLY-LABELEDOXYGEN FROM La2Cu04+5 825
N.D. Shinn, M.E. Bartram, J.E. Schirber,D.L. Overmyer, J.W. Rogers, Jr., Z. Fisk,and S.-W. Cheong
xiv
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Cambridge University Press978-1-107-40997-2 - Materials Research Society Symposium Proceedings: Volume 209:Defects in MaterialsEditors: Paul D. Bristowe, J. Ernest Epperson, Joseph E. Griffith and Zuzanna Liliental-WeberFrontmatterMore information
ELECTRON CHANNELING PATTERN: A TOOL FOR STUDYINGYBaCuO-HTSC THIN FILMS 831
K.H. Young, J.Z. Sun, T.W. James, andB.J.L. Nilsson
PREPARATION AND CHARACTERIZATION OF La1Sr2Nb5010_x
SPECIMENS 837Donald H. Galvan, M. Avalos-Borja, L. Cota-Araiza,J. Cruz-Reyes, and E.A. Early
HIGH RESOLUTION DOUBLE CRYSTAL DIFFRACTOMETRY OFHIGH T c SUPERCONDUCTING EPITAXIAL Gd-Ba-Cu-0 FILMS 841
D.Y. Dai, G.S. Green, B.K. Tanner, H.C. Li,H.R. Yi, and R.L. Wang
EFFECT OF 120 MeV OXYGEN ION IRRADIATION ONCURRENT-VOLTAGE CHARACTERISTICS IN YBaCuO 847
A. Iwase, N. Masaki, T. Iwata, and T. Nihira
SEVERAL IMPORTANT PROBLEMS IN YBaCuO AND ITS DOPEDSYSTEMS 853
H. Zhang, S.Q. Feng, Q.R. Feng, X. Zhu, andZ.Z. Gan
GAMMA RADIATION EFFECTS ON SOME PROPERTIES OF YBCO 861L. Luo, Y.H. Zhang, S.H. Hu, W.H. Liu,G.L. Chang, and W.X. Hu
THE OXYGEN DEFECT CHEMISTRY OF La2_xSrxCu04 .2+5 867Elizabeth J. Opila and Harry L. Tuller
MICROSTRUCTURES IN Y-Ba-Cu-0 THIN FILMS INVESTIGATEDBY XAFS TECHNIQUES 87 3
A. Krol, Z.H. Ming, C.S. Lin, Y.L. Soo, C.X. Gu,Y.H. Kao, E. Narumi, D.T. Shaw, and G.C. Smith
POSITRON LIFETIME STUDIES OF DEFECT STRUCTURES INBal-xKxBi03 8 7 7
"j.C. O'Brien, R.H. Howell, H.B. Radousky,P.A. Sterne, D.G. Hinks, T.J. Folkerts, andR.N. Shelton
SUBSTITUTION AND DEFECT CHEMISTRY OF La-Cu-0 SYSTEMS 883P.L. Gai, M. Kunchur, and E.M. McCarron
NONSTOICHIOMETRY, DEFECT STRUCTURE AND ENERGETICSIN T (La2MO4; M=Cu,Ni) AND T'(Nd2Cu04) STRUCTURES 889
Anurag Dwivedi and A.N. Cormack
PHONONS, OXYGEN ISOTOPE EFFECT AND SUPERCONDUCTIVITYIN Ba^K^BiC^ 895
W. Jin, C.K. Loong, D.G. Hinks, P. Vashishta,R.K. Kalia, M.H. Degani, D.L. Price,J.D. Jorgensen, and B. Dabrowski
UNSTABLE PLANE IN Bi-Sr-Ca-Cu-0 SYSTEM BY TGA 901H. Zhang, Q.R. Feng, S.Q. Feng, X. Zhu, andZ.Z. Gan
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MOLECULAR CALCULATIONS OF INTERPLANAR ELECTRONICINTERACTIONS IN A YBACu2O6+5 CLUSTER AS A FUNCTIONOF THE OXYGEN CONCENTRATION 905
J.A. Cogordan, L.E. Sansores, and A.A. Valladares
AUTHOR INDEX 911
SUBJECT INDEX 9l5
MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS 921
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Preface
This volume represents the proceedings of the FourthInternational Symposium held by MRS on the Characterization ofDefects in Materials. Like its predecessors, the symposium wasdesigned to be broad in scope and cover the structure andproperties of all types of defects in all classes of materials.To a large extent this goal was achieved since papers werepresented describing investigations on point, line, and planardefects (including surfaces) in metals, alloys, polymers,ceramics, amorphous materials, semiconductors, superconductors,composites and intercalated fibers. The wide variety of systemsstudied clearly reflects the importance of defects in materialsscience. While experimental investigations still dominated thesymposium, a significant fraction of contributions focused ontheory and simulation. This book contains 142 of the 206 paperspresented in both oral and poster sessions representingcontributions from fourteen different countries.
The symposium was sponsored by the Air Force Office ofScientific Research, Argonne National Laboratory, PhilipsElectronic Instruments, Blake Industries, Inc. and Eastman KodakCompany. The organizers are grateful for their financialsupport. They also want to thank the invited speakers, sessionchairpersons and manuscript reviewers for their contributionstoward making the symposium a success. Finally, the organizersextend their gratitude to Barbara Rich and Sandy Ung for theirdiligent secretarial support.
Paul D. BristoweJ. Ernest EppersonJospeh E. GriffithZuzanna Liliental-Weber
February 1991
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MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS
Volume 180—Better Ceramics Through Chemistry IV, C.J. Brinker, D.E. Clark,D.R. Ulrich, B.J.J. Zelinsky, 1990, ISBN: 1-55899-069-0
Volume 181—Advanced Metallizations in Microelectronics, A. Katz, S.P. Murarka,A. Appelbaum, 1990, ISBN: 1-55899-070-4
Volume 182—Polysilicon Thin Films and Interfaces, B. Raicu, T.Kamins,C.V. Thompson, 1990, ISBN: 1-55899-071-2
Volume 183—High-Resolution Electron Microscopy of Defects in Materials, R. Sinclair,D.J. Smith, U. Dahmen, 1990, ISBN: 1-55899-072-0
Volume 184—Degradation Mechanisms in III-V Compound Semiconductor Devices andStructures, V. Swaminathan, SJ. Pearton, O. Manasreh, 1990,ISBN: 1-55899-073-9
Volume 185—Materials Issues in Art and Archaeology II, J.R. Druzik, P.B. Vandiver,G. Wheeler, 1990, ISBN: 1-55899-074-7
Volume 186—Alloy Phase Stability and Design, CM. Stocks, D.P. Pope, A.F. Giamei,1990, ISBN: 1-55899-075-5
Volume 187—Thin Film Structures and Phase Stability, B.M. Clemens, W.L. Johnson,1990, ISBN: 1-55899-076-3
Volume 188—Thin Films: Stresses and Mechanical Properties II, W.C. Oliver,M. Doerner, G.M. Pharr, F.R. Brotzen, 1990, ISBN: 1-55899-077-1
Volume 189—Microwave Processing of Materials II, W.B. Snyder, W.H. Sutton,D.L, Johnson, M.F. Iskander, 1990, ISBN: 1-55899-078-X
Volume 190—Plasma Processing and Synthesis of Materials III, D. Apelian, J. Szekely,1990, ISBN: 1-55899-079-8
Volume 191—Laser Ablation for Materials Synthesis, D.C. Paine, J.C. Bravman, 1990,ISBN: 1-55899-080-1
Volume 192—Amorphous Silicon Technology, P.C. Taylor, M.J. Thompson,P.G. LeComber, Y. Hamakawa, A. Madan, 1990, ISBN: 1-55899-081-X
Volume 193—Atomic Scale Calculations of Structure in Materials, M.A. Schluter,M.S. Daw, 1990, ISBN: 1-55899-082-8
Volume 194—Intermetallic Matrix Composites, D.L. Anton, R. McMeeking, D. Miracle,P. Martin, 1990, ISBN: 1-55899-083-6
Volume 195—Physical Phenomena in Granular Materials, T.H. Geballe, P. Sheng,G.D. Cody, 1990, ISBN: 1-55899-084-4
Volume 196—Superplasticity in Metals, Ceramics, and Intermetallics, M.J. Mayo,J. Wadsworth, M. Kobayashi, A.K. Mukherjee, 1990, ISBN: 1-55899-085-2
Volume 197—Materials Interactions Relevant to the Pulp, Paper, and Wood Industries,J.D. Passaretti, D. Caulfield, R. Roy, V. Setterholm, 1990,ISBN: 1-55899-086-0
Volume 198—Epitaxial Heterostructures, D.W. Shaw, J.C. Bean, V.G. Keramidas,P.S. Peercy, 1990, ISBN: 1-55899-087-9
Volume 199—Workshop on Specimen Preparation for Transmission ElectronMicroscopy of Materials II, R. Anderson, 1990, ISBN: 1-55899-088-7
Volume 200—Ferroelectric Thin Films, A.I. Kingon, E.R. Myers, 1990,ISBN: 1-55899-089-5
Volume 201—Surface Chemistry and Beam-Solid Interactions, H. Atwater, F.A. Houle,D. Lowndes, 1991, ISBN: 1-55899-093-3
Volume 202—Evolution of Thin Film and Surface Microstructure, C.V. Thompson,J.Y. Tsao, D.J. Srolovitz, 1991, ISBN: 1-55899-094-1
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Cambridge University Press978-1-107-40997-2 - Materials Research Society Symposium Proceedings: Volume 209:Defects in MaterialsEditors: Paul D. Bristowe, J. Ernest Epperson, Joseph E. Griffith and Zuzanna Liliental-WeberFrontmatterMore information
MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS
Volume 203—Electronic Packaging Materials Science V, E.D. Lillie, RJ. Jaccodine, P. Ho,K. Jackson, 1991, ISBN: 1-55899-095-X
Volume 204—Chemical Perspectives of Microelectronic Materials II, L.H. Dubois,L.V. Interrante, M.E. Gross, K.F. Jensen, 1991 ISBN: 1-55899-096-8
Volume 205—Kinetics of Phase Transformations, M.O. Thompson, M. Aziz,G.B. Stephenson, D. Cherns, 1991, ISBN: 1-55899-097-6
Volume 206—Clusters amd Cluster-Assembled Materials, R.S. Averback, D.L. Nelson,J. Bernholc, 1991, ISBN: 1-55899-098-4
Volume 207—Mechanical Properties of Porous and Cellular Materials, L.J. Gibson,D. Green, K. Sieradzki, 1991, ISBN-1-55899-099-2
Volume 208—Advances in Surface and Thin Film Diffraction, P.I. Cohen,D.J. Eaglesham, T.C. Huang, 1991, ISBN: 1-55899-100-X
Volume 209—Defects in Materials, P.D. Bristowe, J.E. Epperson, J.E. Griffith,Z. Liliental-Weber, 1991, ISBN: 1-55899-101-8
Volume 210—Solid State Ionics II, G.-A. Nazri, R.A. Huggins, D.F. Shriver,M. Balkanski, 1991, ISBN: 1-55899-102-6
Volume 211—Fiber-Reinforced Cementitious Materials, S. Mindess, J.P. Skalny, 1991,ISBN: 1-55899-103-4
Volume 212—Scientific Basis for Nuclear Waste Management XIV, T. Abrajano, Jr.,L.H. Johnson, 1991, ISBN: 1-55899-104-2
Volume 213—High Temperature Ordered Intermetallic Alloys IV, L. Johnson, D.P. Pope,J.O. Stiegler, 1991, ISBN: 1-55899-105-0
Volume 214—Optical and Electrical Properties of Polymers, J.A. Emerson,J.M. Torkelson, 1991, ISBN: 1-55899-106-9
Volume 215—Structure, Relaxation and Physical Aging of Glassy Polymers, RJ. Roe,J.M. O'Reilly, J. Torkelson, 1991, ISBN: 1-55899-107-7
Volume 216—Long-Wavelength Semiconductor Devices, Materials and Processes,A. Katz, R.M. Biefeld, R.J. Malik, R.L. Gunshor, 1991, ISBN 1-55899-108-5
Volume 217—Advanced Tomographic Imaging Methods for the Analysis of Materials,J.L. Ackerman, W.A. Ellingson, 1991, ISBN: 1-55899-109-3
Volume 218—Materials Synthesis Based on Biological Processes, M. Alper, P.C. Rieke,R. Frankel, P.D. Calvert, D.A. Tirrell, 1991, ISBN: 1-55899-110-7
Earlier Materials Research Society Symposium Proceedings listed in the back.
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Cambridge University Press978-1-107-40997-2 - Materials Research Society Symposium Proceedings: Volume 209:Defects in MaterialsEditors: Paul D. Bristowe, J. Ernest Epperson, Joseph E. Griffith and Zuzanna Liliental-WeberFrontmatterMore information