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New Tandem Accelerators for Applied Research in IFIN-HH

Status of the Installation of 1 MV Tandetron

Dan Gabriel GhiţăIFIN-HH

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Investment project

• The infrastructure investment was done in the framework of the project 7PM/1/2008 / 29.10.2008 granted by National Authority for Scientific Research [1]

• Director of the project: Dr. Nicolae Victor Zamfir (General Director of IFIN-HH)

• Initiators of the subprojects for the two accelerators: Dr. Agata Olariu and Dr. Silviu Olariu [2]

[1] http://proiecte.nipne.ro/pn2-capacitati_mari/[2] Romanian Reports in Physics, Vol. 63, No. 4, P. 923–928, 2011

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The 1 MV Tandetron Accelerator dedicated to AMS

• Installation began at the beginning of 2012• Manufactured by High Voltage Engineering Europa B.V. - The

Netherlands14C/ 13C or 12C

10Be/ 9Be

26Al/ 27Al

129I/ 127I

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The 1 MV Tandetron Accelerator dedicated to AMS

ION SOURCE

• SO110 Cs sputter ion source producing negative ions

• Spherical ionizer• 50 Sample holder

Tipical beam currents:≈ 100 μA for C-

≈ 5 μA for BeO-

≈ 400 nA for Al-

≈ 8 μA for I-

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The 1 MV Tandetron Accelerator dedicated to AMS

45o electrostatic deflector

90o dipole magnet with bouncer system

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The 1 MV Tandetron Accelerator dedicated to AMS

1 MV Cockroft Walton Tandetron Accelerator

• Maximum high voltage on the accelerating terminal: 1 milion Volts

• Charging system: Cockroft-Walton type without moving parts

• Accelerating tubes with spiraled field and titanium electrodes

• Gas stripping system inside the high voltage terminal

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The 1 MV Tandetron Accelerator dedicated to AMS

90o analyzing magnet

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The 1 MV Tandetron Accelerator dedicated to AMS

Stable isotopes measurement system

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The 1 MV Tandetron Accelerator dedicated to AMS

Electrostatic analyzer

Angle: 1200

Radius: 650 mmGap between electrodes: 25 mmMaximum bias voltage: 60 kV

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The 1 MV Tandetron Accelerator dedicated to AMS

Gas detector

Bias: 300 VGas: IsobutaneWindow: Si3N4, 50 nmWindow size: 10 mm in diameterLength: ~430 mm

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• RESULTS FROM THE ACCEPTANCE TESTS

Isotope Rare isotope/stable isotope (av. of 4

samples)

Average statistical error ( ‰)

Relative standard

deviation ( ‰)

Background level

14C 1.3 × 10-12 2.4 3.7 1.7 × 10-15

10Be 1.5 × 10-12 12.3 6.6 2.6 × 10-14

26Al 7.4 × 10-11 7.6 12.5 3.7 × 10-15

129I 1.2 × 10-11 19.5 15.1 6.7 × 10-14

For these measurements were used standard and background samples.

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Chemistry laboratory• High purity water system• Analytical balances• Ovens• Magnetic stirrers• Professional furnaces• Vacuum and pressure pumps• Evaporators• Microscopes• Centrifuges• Ultrasonic baths• High pressure liquid chromatograph

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Graphitization system• AGE – 3 (Developed

by Swiss Federal Institute of Technology)

• Fully automated graphitisation system that uses a molecular sieve trap instead a cryotrap to transfer theCO2 from sample combustion in an EA to the graphitisation reactors.*

*L. Wacker, M. Nemec, J. Bourquin, Nuclear Instruments and Methods in Physics Research B 268 (2010) 931–934

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3 MV Tandetron for IBA

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CONCLUSIONS

• The installation of the 1 MV Tandetron accelerator, along with the chemistry laboratory and the graphitization system, creates great opportunities for research using AMS techniques in various domains like medicine, archeology, geology, material science, pharmacology, environmental sciences, forensic investigations, nuclear physics and in many other fields of research.

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Acknowledgments

• Chemists: Corina Anca Simion, Nicoleta Mihaela Florea• Tandem engineers: Daniel Vasile Moşu, Iani Mitu, Gabriel

Dumitru, Bogdan Savu, Iani Mitu, Cătălin Călinescu• Tandem technical team: Dorin Moisa, Constantin Crăciun,

Gheorghe Mihon, Gheorghe Ion, Cristian Florea, Cristian Păun, Ionuț Brînzan, Gigi Naghel, Mihai Badea, Stancu Cojocaru, Viorel Bătrâneanu, Cristian Popescu and Laurențiu Povariu, Vasile Ceauselu

• AMS team: Cătălin Stan-Sion, Mihaela Enăchescu, Alexandru Petre, Simona Constantin, Corina Uroseviteanu

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THANK YOU!

1 MV Tandem website:

http://tandem.nipne.ro/~tnd1m/index.html