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~D-R192 963 PIOTOLUMZNESCENT PROPERTIES OF P-GRAS ELECTRODES 1RELATED TO THE "PHOTOCUR.. (U) WISCONSIN UNIV-MRDISONDEPT OF CHEMISTRY P 9 JOHNSON ET AL. 88 JUL 87
UNCLASSIFIED UiIS/DC/TR-87/4 N@iS14-85-K-8631 F/G 9/5 NL
ONE
L "-' ,v" - w- . - ' w w -mill - wl- .-l " l - w.: ... - -,-ra -
II'U
| &-I .t 4
OFFICE OF NAVAL RESEARCH
Contract N00014-85-K-0631 l FILE CtR&T Code 4134003
Technical Report No. UWIS/DC/TR-87/4
Photoluminescent Properties of p-GaAs Electrodes Relatedto the "Photocurrent Anomaly": Determination of SurfaceElectron-Capture Velocities and Depletion Widths in
Photoelectrochemical Cells
by
Phelps B. Johnson,.Christopher S. McMillan, Arthur B.Ellis, and William S. Hobson
CV Prepared for Publication in the [ 1 on For
Journal of Applied Physics >"Uainr) n cd
University of Wisconsin JX4tiicn tioroDepartment of Chemistryi Madison, Wisconsin 53706 By~Distribution/
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Reproduction in whole or in part is permitted for anypurpose of the United States Government
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DTIC*To whom all correspondence should be addressed : J U L 211987
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11. TITLE (Include Security Clauification)Photoluminescent Properties of p-GaAs Electrodes Related to the "Photocurrent Anomaly":Determination of Surface Electron-Capture Velocities and Depletion Widths in Photoelectro-
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16. SUPPLEMENTARY NOTATIONPrepared for publication in the Journal o pplied Physics
17. COSATI CODES 18. S UBJeC.TftS (Continue on reverse if necesso and idenify by block number)'LD GROUP SUB-GROUP 9W ; photoluminescence; dead ayer model; depletion
width, surface electronrcapture velocity; photoelectro-chemical cells I, , G'.. 4 )e" r
19. AB ACT (Continue on reverse if necessary and identify by block number)Steady-state photoluminescence (PL) measurements have been used to determine depletion
widths W and surface electron-capture velocities S for p-GaAs electrodes in aqueous acidicelectrolytes. Electrodes subjected to slow cycling of applied potential (10 mV/a) exhibita hysteresis in PL intensity in the "photocurrent anomaly" (PA) potential regime, character-ized by negligible photocurrent at voltages up to .5 V negative of the flatband potentialO0.1 V vs. SCE). A marked hysteresis in S values s observed in the Ppotential regimeof -0.1 to -0.4 V vs. SCE. Estimated S values arel high, approaching 17.lcm/s, but decreasesignificantly during anodic-going scans. Variationk in W between -0.1 4d -0.8 V vs. SCEindicate that strong Fermi-level pinning does not olktain. Electrode ope ation under a pulsedpotential program (-0.05 to -1.00 V vs. SCR) caused transient reductio in S of approxi-mately an order of magnitude.f ,' , "7, ,,
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4
I. INMhO)UCTION
Photoluminewence (L) techniques offer unique advantages for
the study of ph otoelectrochemlcal cells WWC's). The PL intensity of
smicondutors is sensitive to thi-depletim width W in the
semiconductor and to the rate of minority carrier loss at the
surface 8. A simple dead-layer model (DLMO has been employed to
relate changes in the steady-state PL intensity of a variety of
semclnductor electrodes to Changes in W.2 - 6 Both pulsed 7 and
steoady-state8 ,9 PL intensity measurements have been interpreted
in terms of changes in S. Recently, we have shown that a PL
model developed by Mettler o is capable of simutaneously assessing
values of W and 8 as a function of electrode potential. The model
was applied to n-GaAs electrodes in PEC's employing aqueous
telluride electrolyte.11
The non-idemlities in the photoeetrhmica behavior of
p-type m-v smionductors have bernm the subject of several
studie.12- 1 Of particular interest Is the apotourent anomaly"
(PA), a 0.4 to 0.6 V separation of the photcurrent onset from the
flatband potential.14 As a consemuec of this overpotential, the
onet of cathodic currents leading to hydrogen evolution Is cls to
that of conventional metal electrode and much of the theoretical
efficiency for converting optical to chemical energy Is lost.
For EC's employing p-GaAs or p-GaP electrodes in H2804
electrolyte, several theories have been advanced to account for the
observed PA. In one study, a thermally-limited value of S was a
scontributor to the effect. 14 Another study attributed the
PA to increases in 8 at potentials near the fiat-band potential Vfp,
5due to the amrrespanding higher c ncentration Of majority Carriers
at the srace-13 Also releant to an understanding at the PA is
Fermi-level pinning which has bexen proposed for aqueous p-CAAspcs.12U7 Transient, PL effects have been ascribed to a shift in
band edge in the PA potential regime.6
We a spot herein an the steady-stte and transient PL
properties of a p-GaAs--based PBC employing an aqueous acidi'
eletroyt. Our results reveal that over the potential regime
corrzesponding to the PA. values of 8 show cosiderable hysteresis;
the values are high, ma- mll approximiating the thermal limit.
Furthermore, significant variations in W observed between -0.1 and
-0.8 V vs. SCE indicate that the electrode is not strongly pinned.
Operating the electrode under a pulsed potential program cause a
transient reduction in 8 al approximately an order of magnitude.
UI. THEORY
A simple deed-layer model (UDM has. been used to estimate
changes in W from FL quenching data: The model assumes that
electron-hole pairs formed within a distance on the order of W do
not radiatively recambine. Thus, a chang In dead-layer thickness
AD as a function of applied potential is axpreAe by Eq. (1).
AD (-1/a') ln(PL1/PL2), I
where a, u(a +ap) is the sum at the absorptivities of the
semiconductor for the excitation and emission wavelengths,
ae.pectively; and P!.1 and PL2 are PL intensities at two arbitrary
potentials tar which the semiconductor is in depletion. If one of the
6electrode potentials is Vb then the total dead-layer thickness,
appro aig the depietion width, may be obtained. The DLM is
valid under conditions of high or constant virtual surface
recombination velocity 8.2
Use of AD values as a lower limit for W in Eq. (2) yields an
approxmat lower limit far the Schottky barrier height VB at the
semiconductor-electrolyte interface. In this expression, e is the
dielectric constant of the semiconductor (12.9 for GaAs18), e0 is the
perrnlttlvity
W . (2tte0V B/qNj A "/ [2]
of vacuum; q is the electronic charge; and NA is the acceptor
concentration.
Despite its strengths, the DLMs inability to accommodate
significant changes in 8 or to yield absolute depletion widths
restricts its applicability. A more powerful methodology was
developed by Mettler for the analysis of P1. fromGaAs in air.10 His
treatment, encompassing both the dead-layer formalism and the
influence of minority carrier loss at the surface upon PL intensity,
results in Eel. (3). In this equation, IL is the observed
IL K exp [-(ae.4up)W] 0 eLn
( *eLn) 2 1*(3
.~(Sr:GO(*L:~) (*e+GP)Ln
PL intensity divided by the excitation intensity, corrected for
7
reflectve lkes; x is a constant containing the internal quantum
efflicW ad g@a - trical factors Involved in light collection; Ln is
the electron diffusion length; and Or. is the reduced surface
elStv n-apture velocity. The reduced velocity is a 1--nsimles:
Waaut related to the more comm only determined surface
eectron-capture velocity 8 by Sq. (4), where 'Ini s the electron
lifetime. Our us of the term
Sr -3('TA~n)(4)
osurface electron-capture velocitya rather than the conventional
term asurtace recombination velocityu used by Mettler reflects the
fact that additional pathways for surface recombnation involving
interfacial charge transfer are available in a PEC.
The derivation of Eq. (3) assumes that the optical Pen-etration
depthi (OPID) Is significantly less than the minority carrier diffusion
length, i.e., £e'1 -(Ln. Given an estimate Of Ln. a Plot Ot IL vs- £e 1
(IL-OPD plots) can be fit to Eq. (3) to obtain both W and Sr. The
value of w obtained can be used to appromimt the Schottky
bailJer height VB with Eq. (2) (vide supra).
Data acquired at different potentials is analymed by using the
solution of Eq. (3) (shape fit) obtained at one potential V1 as a
refeence A rati R formed With the VI data and data obtained at
another potential V2 , is fit to Eq. (5) (ratio tits). As expected. Eq. (5)
IL(VO ep[(1)p((l)WV)] ( IV,Q fL(V2) I x (eo)WV)(2) ]V2
(5)
where (IV- Sr(V) + - 1n
(Sr(V)+1)(SpLui+1) (ae+up)Ln
U.A 9
reduces to Sqg. () iftSr is relatively large (OSn I and a6 Ln) or
lip Anu-t at the ayplied potential? our use of ratios (Q-OPD plots)
rather than iniida IL-OPD plots leads to smaller standard
deviaion n W and S.
Use of thesn equations requires absorptivities a., reflectivitles,
and an estimate of Ln. The absorptlvlties used for p-GaAs were
thoae employed in the study at n-GaAs electrodes.11 An
absoptlvtyof 9 z 10 cm-4 was used for the emitted light,
monioredat 865 rim.19 For data acquired in solution, literature
retectvltes 0 were corrected for the refractive index of the
Literature values for Ln in mnelt-grown or diffused p-GaAs:Zn
varY1-23, but reasonable estimates for use in Eqs. (3) and (5) are 5
pmn for p - 3.1 z 10 17 cm73 , 4 Mr for p a I x 1018 m3, and 3 Ian
for p - 1.8 x 1019 cm 3 . The qualitative aspects of this analysis are
unaffected by this paaee, although the data cannot be fit if
very small ('1 Wn) values Ot Ln are used. Larger values Of L
yield larger calculated W and Sr. values. Values of W are relatively
ftnsensitive to the value Of Ln chosen; however, calculated values at
rwe nearly propor-tional to the Ln value employed.
M. EKPElvMN
The p-GaAs samples used in this study were melt-grown
samples obtained from Lse Diode ILaboratories (Cd doped, (111), 3.1 x
1017 cm-3 ), Atomnergic Chels, Inc. (Zn doped, (111), 1.0 z 1018
cm-3 ), and IMorgan Semicnuco, Inc. (Zn doped, 1/20 off (100), 1.8
z 1019 cm73 ). The (111)-riented samples were receved with a
pad IBI-ace (As ftoe). and this surface was used in our
ezperiment.. The orientation of the (111) samples was determne
9by chemical etching and optical microscopy.2 4 Ohmic contacts to the
crystals (- O.S x O.S x 0.1 mm3) were made by soldering a HgtnZn
eutect to the back of the crysta. Crystals were then mounted as
described eewl'ere.2 5 Before use in a 1:C, electrodes were etched
in a room temperature 3:1:1 H2-0 4 :H 2 (30X):H20 solution, followed
by rinsing with M140H and triply-dlstille (3D) water.
The electrolyte was prepared frm H2804 (Malllnckrodt
analytical reagent grade or Alfa Products Ultrapure gave similar
results) and VSCN (Baker, reagent grade). An solutions were
deyenated with N2 for at least 30 mi. befe use, bubbled and
blanketed with N2 during use, and magnetically stirred.
Luvotag (L-V) and current-voltage (l-V) curves
were obtained by cycling between -0.05 V and -0.65 V vs. SC at 10
mV/s using a standard three-electrode n tic setup and
6 .. m -' equipmnt described previously.2 5 Front-surface PL
was monltored at the unrt band m8axium o 665 rum. The
experimental apparatus is as described previously, 11 ept for the
use of a -- m-- z -~o assembly. Ilumination was
accomplished with a Photn Technologies Inc. Model 01-ISO
high-intensity mumination system, which includes a Model O-ISOXI
150 W Xe lamp, an elliptical mirror, and a Model 01-001 0.25-m
moochromator. This excitation system permits computer control
o0 the wavelength scan rate and entrance sit, the latter providing
control of the system' output intensity. The output was kept
roughly photon-matched and the uncorrected measured bandpass of
the system was typicaly -10 nrn over the 450-690 nm spectral
range used. The intensity at the sample surface with 570 nm
excitation was -1.S mW/cm 2 . A Melles-Griot hot mirror (03 MHG
007) was placed at the exit slit of the excitation monochromator to
10reduce near-intrared Inefer ence (2, -700 nm) with the PL signal. A
polarizin filter was also used to prevent spectral variations in the
excitation luito.
The program, for the pulsed-potential experiments (toggling
between -0.05 V (0.5 9) and -1.0 V vs. BCE (0.5 s)) was provided by
an EG&G PARC Model 175 Universal Pogramer and Model 173/176
Moentiostat/Current, Follower. PL intensity for the pulse
eperiments was obtained with an EGRG ORTEC Model 9349 Log/Lin
Ratmetrused to monitor the amplifter/discrlrnlnator, and a
Uinsels LY 18100 X(T)-Y recorder operated in time base mode. The
system response time was estimated at '0.2 s.
A difficulty in Characterizing the p-GaAs PL is osdby its
temporal instability during photoelectrochernical operation. As
described in the text, addition of KSCN to the electrolyte improves
the lang-term stability of L-V behavior. Reproducible IL-OPD curves
were typically obtained by cycling the electrode between -0.05 V
and -0.65 V with excitation at 450 nm for at least 45 min. prior to
the acustion of data for the plots; by acquiring the data over 30
rim intervals rather than the 10 nm intervals used in air or at
open circuit; and by perfomin ratio fits (Q-OPI) Plots, Eq. (5))
relative to data obtained at -0.8 V on the cathodic-going scan, a
potential for which IL-0131)curves ezhibited the least change with
timne The generated IL-OIM and Q-OPI) curves were fit using a
nonlinear least-square curve-fitting program.
MI. RESULTS
A. PL properties in a PEC
Typical luInececeotage (L-V) and current-voltage (l-V)
curves for a p-GaAs electrode (p.- 3.1 z 1017 cm-3) in aqueous H2804
11
electrolyte are shown in Fig. 1. The PL intensity, shown over
one-anl-a-half cycles, exhibits a substantial enhancment between
the first and second cycles as well as considerable hysteresis
between anodic- and cathodic-going scans. The potential regime
most affected is from -- 0.4 to 0.0 V vs. SM. As shown in the
bottom panel of Fig. 1, this is just the regime corresponding to the
htcrt anomaly" (PA): negligible Faradaic current flows
between the estimated flatband potential, under illumination, of 0.1
V vs. SCE14 and -0.4 V. We will show that the PL effects derive
largely from changes in the reduced surface electron-capture
velocity S r over the PA potential regime, although some
contribution from a change in W cannot be excluded.
With continued cycling between -0.05 V and -0.85 V, the PL
settles into the patterns shown in Fig. 2. These plots were obtained
in the presence of KSCN, which markedly improved the long-term
stability of the data; the salt is reported to aid the rev rsbility of
Ga plating2 6 and to assist the anodic dissolution of Ga from GaAs
surface. 2 7 The figure emphasizes the greater relative hysteresis at
shorter excitation wavelengths, implying that surface chemistry
causes the hysteresis (vide infra).
Electrode ratflectance was montored over several cycles to
discern whether the PL changes Were attributable to this
pa rameter. No changes were observed within the error ( 2X
relative) of the expertment. The variations in PL thus result from
changes in W, 8r, or both.
An analysis using Mettler's methodology provides a means for
obtaining Sr and W as a function of applied potential. Typical
IL-OPD plots for a p-GaAs electrode at -0.1 V (anodic-going) and -0.8
V (cathodic-going) vs. SCE are shown in Fig. 3. Good fit* are
.I
12obtained to Eq. (3) for both A ratio fit ("OPD plot) using Eq. (S) for
the data at -0.1 V was somewhat les satisfactory, although it
resulted in similar values for W and Sr.
The discrepancy observed with the ratio fit is likely due to
errors of several percent in the relative spectral response of the
apparatus and/or in the absorptivities and reflectivittes of the
semiconductor. Occaulonyall small negative values for W are
obtained, but they are within experimental error of zero.
Values of W and 8r, extracted from the curves of Fig. 3 and
from Q-OPD curves at other potentials, are compiled in Table I and
plotted in Fig. 4. A comparison of the values for W and Sr for the
two scan directions indicates that the PL intensity in the PA regime
is affected by changes in both parameters: On the cathodic-going
scan, W increases modestly by -100 A, but Sr increases by a factor
of two between --0.1 and -0.4 V; similar values are obtained in the
PA regime on the anodic-ong scan, although corresponding values
for Sr are consistently lower. The dismrepancy in Sr for the two
scan directions can account for the hysteresis observed, although we
cannot exclude some contribution from W, due to the uncertainty
in our measurements. It is noteworthy that the hysteresis in PL
intensity and in 8 r occurs in the region of negligible photocurrent
where conventional surface recombination and not Faradaic charge
transfer is the dominant form of minority carrier relaxation at the
interface. The change in 8r implicates changes in the chemical
nature of the surface. The magnitude of 8r is also of interest. Our
maximum values of nearly 100 correspond to values for 8, using
Eq. (4) and literature electron lifetimes (-10 - 9 s)21,23 and diffusion
length* (1-5 ^m), that approximate the thermal limit of -107 cm/s.
In principle, values a W permit an assessment of the manner
13in which applied potential is partitioned across the
semiconductor-electrolyte interface. Although such an analysis
must be tempered by the uncertainty in W, values at W are
smaller than would be expected based on the flatband potential of
-0.1 V vs. SCe reported for illuminated p-Gas. 14 Assuming ideal
behavior, Eq. (2) predicts that W will change most rapidly with
potential at potentials near Vfb. Data in Table I exhibit the
opposite trend, indicating that partitioning of applied potential
occurs at the more positive potentials sampled. Beyond the PA
potential regime, as the electrode potential passes fro -0.4 to -0.8
V, W increases from 80 to 360 A; this cotresonds to a 0.3 V
increase in Schottky barrier height for a 0.4-V increment of applied
potential.
Data obtained an more conductive samples (p -1.0 x 1018 and t.8
x 1019 cm - 3 ) exhibit the same trends in W and Sr but generally
indicate larger barriers and barrier height changes with applied
potential. As a result of the linear relationship between carrier
concentration and barrier height (Eq. (2)), erroz in W increase with
p. Thus, although the calculated barriers may exceed those
theoretically possible for GaAs (i.e., VB E.), perfectly reasonable
barriers exist within the uncertainties of the measurement. In this
context it Is worth examining results found with the simple
dead-layer model (DLIV). Table I shows that values for AD from Eq.
(1) are considerably larger than the cding values for W
obtained using Mettler's treatment. In many cases the AD values
correspond to physically unreasonable changes in barrier height, a
consequence of interpreting the PL changes exclusively in terms of
changes in the width of the space-charge region.
L l~d IMMK
14B. Transient PL effects
As shown in Fg. 1, an initial cycling of the p-As electrode
produces a s tial enhancement in PL intensity in the PA
potential regime. A related observation was made by Uosaki, et al:
trarient PL enhan-cments were observed upon pulsing p-GaAs
electrodes from -1.0 V to rest potentials positive of or equal to -0.35
V vs. Ag/Aga in 0.5 M H2 804 electrolyte.6 We have examined the
transient PL enhancments and demonstrate below that they are
acoompanied by a significant reduction in Sr .
Brief operation of a freshly etched electrode cathodic of --0.4 V
vs. SCE yields a transient increase in PL intensity when the
electrode is subsequently taken out of circuit or brought to a
potential near the open-circuit voltage (OCV) of 0.1 to 0.2 V. Much
of the PL enhancement decays within seconds of the positive-going
pulse, although some enhancement persists for minutes. The
magnitude of the PL increase varies with the extent of etching and
with the duration and potential of the cathodic excursion; the PL
transient increased in intensity with more cathodic potentials up to
-1.0 V.
Repetitive pulsing between a cathodic potential (-1.00 V for 0.5
s) and a potential slightly negative of the OCV (-0.05 V for 0.5 s)
produces a maximum enhancement in PL intensity after several
minutes, as shown in Fig. 5. This maximum intensity was
sufficiently stable to permit acquisition of IL-OPD plots. Ratio fits
were then obtained relative to data obtained at the OCV prior to
commencing the pulse program. Representative data are shown in
Fig. 6.
Analysis of the Fig. 6 data reveals that 8 r declines by an order
of magnitude, from 90 at 0CV before the pulse program to -6 at
15-0.05 V after the pulse program; values for W were within
exprmental aerrort ofinro in both measurements . During the
exlpairment, the PL intensity at -1.00 V remains constant to within
l0X while the Pt. intensity at -0.05 V increases roughly six-told.
This indicates: that W and Sr at -1 .00 V (-N80 A and 90, res peactively,
for the experiment at Fig. 6) ame negligibly affected by the
P. rip rtment.
IV. DSUSO
Our Pt. data indicate that sigificant channges in Sr oocur in the
photcurentanomaly (PA) regime of p-GaAs-based PUW epoyn
aqueous H2804 electrolyte. These changes are evident in both
long-term cyclic voltamnmetric scans and in pulsed potentiail
exrperiments. The PL data prompt conm ertofa the surface
chemistry that could alter the number and/or location of surface
states mediating recomrbination. Two possiblities are chemistry
associated with hydrogen evolution arid i imdcw oax
prnpc e. The approxim ate net- potential of the Pt. transient,
behavior and ot the hysteresis in L-V plots (-0.4 V vs. 8CM
corresponds to the onset of cathodic current tor hydrogen
evolution2 6 , suggesting that surface coverage by hydrogen atoms
may influence P.
Alternatively, changes in Sr. could involve the preferential
reductive removal ot surface As. Woodall, et. al. have recently
used photochemnical methods to temapor arily remove surface states
frm n-.. and p-aAs29 The change was attributed to the
phoachrnialremoval at As anid/or A8203 and their associated
srflace states, with possible inhibition of the surface degradation by
a gallium oxide layer; the possibility at an oxide-free surface was
16not ruled out. Our results may reflect analogous variations in the
densty of As-related surface states. In this scenario, the cathodic
portio the cycle could be Interpreted as allowing preFerntial
removal at surface As, and the anodic portion as creating a
transient protective gallium oxide.
Turning to the values ot W obtained, we note that they are in
ar.rd with existing capacitance studies,14,30 which indicate that
SFemi-leve pinning (fixed VB and hence W) is not a
prevalent mchanism for p-GaAs In acidic aqueous electrolyte. A
200-mV positive band edge shift under illumination was inferred by
Kelly and Mummng from capacitance measurements as the
electrode potti nears V. Uosak et. al. explained their PL
tran nts, observed following a positive-oing potential pulse, in
terms o such a shift. The band edge shift was attributed to
surface chemistry in that study.6 Our results are not Isistent
with sorme prti n of applied potential. They also indicate that
changes in 8, derived fron surface chemistry, play a crucial role in
transient PL behavior.
A thermally limited value Of 8r in the PA regime had been
estmated previously by Kelly and Merrnlng. 14 Although we find
that Or varies -Agnificantly in the PA regime, our maximum values
do appoach the thermal limit ot -o 7 cm/s. Particularly intriguing
is the or=d-tof-magnitude reduction in Sr found by pulsing the
electrode across the PA potential regime. If the reduction i S is
due to the removal or shifting of surface states, then it is possible
that surface treatment during a pulsing program could preserve
the effect. Whether this could facilitate interfacial charge transfer
is hard to predict. Irnovements to date in p-type m-V
phoourrent properties have come from using redo. couples with
17
better kinetic than the hydrogan evolution reaction1 4 or by
enhancin the hydrogen evolution kinetics by meta 1 3 or metal ion
treetmuegt.15 ,16
V. CON1CLUSIONS
The PL from p-GaAs photocathodes employed in aqueous
sulfuric acid electrolyte has been used to moxnitor the depletion
width W and surface electron-capture velocity 8 while the electrode
$erve as the photocathode in an operating PEC. In the region of
the 011oto-current anomaly (between -0.1 and -0.4 V vs. SCZ),
hysteresis in the PL intensity correlates with hysteresis in values of
8. Value* of 8 are near the thermal limit. Repetitive pulsing of the
electrode potential between -0.05 and -1.00V vs. SC! yields an
order-of-magnitude reduction in 8. Variations in W between -0.1
and -0.6 V vs. SC! indicate that the electrode is not strongly
Fermit-leiel pinned, but uncertainties in W preclude a more detailed
analysis of the pattoigof applied potential across the
p-GaAs-electrolyte interface.
ACKNOWLEDGUMMIT
The authors thank the Office ot Naval Research anid the
University of WIsconsin-MadIson, University-Industry Research
Progrm for support of this research. We thank Laura Becke of
LAse Diodes, Inc. and Alan Hueliman of MIT for Hall
measuremnents.
18
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3. R. Guruthra. M.Tamknklwlcz, and R.P.811brstain, J.Api. Phys., 54 , 6787 (1983)
4. W. 8. "Hbuam P. B. Johnson, A. B. EIs, and R. M.Diotld, Appl. Phys. Lett., 4S, ISO (194).
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20Thkil 1. Electrode Parameters of a p-CGaAs-based pECa
volts W AD volts W 40vs.sczrb (JJC .Jd ~. vs.SCzb (A)C (Ayd ~
(-)-0.1 -10 200 42 (+)-0.1 0 0 32
(-) -0.2 20 330 51 W)- 0.2 -20 70 37
(-) -0.3 30 400 59 (+) -0.3 30 260 46
-- 0.4 80 510 66 (W)-0.4 110 450 61
(-) -0.5 180 610 70 (W)-0.5 210 630 73
C-) -0.6 220 710 78 W)- 0.6 260 710 77
C-) -0.7 310 750 73 (W)-0.7 310 760 79
0--0.8 359 810 72 (4)- 0.8 340 820 84
0CVf 50 - 78
a Properties derived hran the FL af a p-GaAs electrode, (111)
As-rich face, with p - 3.1 x 1017 cm3. The FEC conuisted of a
thir-electrd potentiastatlc: setup and a 0.5 M 112804/0.1 M
KBCN electrolyte. Table entries are extracted fruit Q-OPD plot*
like that shown in Fig. 3. Magnetic stirring, a N2 blanket, and
slow N2 bubbling were used In all PEC exlpei ments. Dold-faced,
numbers are data acquired at the potential to which ratio fits
(Eq. (5)) are refte rn ed. Agr-eemnent between shape fits (Et. (3))
and the ratio results tabulated here (Eq. (5)) was gonerally
good. The Influence of uncertainties in Ln an the table entries
is discussed in the text.b potential at the p-GvaAs electrode; the symbol precedng the
voltage indicates a cathodic-going (-) or anodlc-coing (+) scan.
c Depletion width at the indicated potential, obtained by fitting
Q-=P curves to Eq. (5); at the referenc potential of (-) -0.8 V
21vs. wC, w is obtainbed by fiting the k,-OPD curve to Eq. (S).
The stantlard, deviation at the nonlinear least-squares fit for
tte reference value was ! 110 A. The relative error between
two values on the table ts typucally _*20460 A., with the larger
uncertainiIn the regbon of hysteresis. Negative values
reflect the uncertainty in the d-smnta of W.
d Change in dedlyrthickness relative to the value for()
-0.1 V vs. SM!. The values iste are those calculated for 570-nm
excitation.
*0 Reduced surface electron-capture velocity at the indicated
potential, obtained by fitting Q-OPD curves to Eq. ()k at the
reference potential of (-) -0.8 V vs. SC!. Sr was calculated using
Eq. (3). The standard deviation of the nonlinear least,-Wpure
fat for the reference value was ! St. The relative error between
two values in the table is typically !"-.
f The value obtained at o~pen circuit (0.17 V vs. OW! prio to
cycling the eletrode's voltage.
22
Figure 1. Relative photocurrnt (bottom panel) and PL intensity(top panel) as a function of electrode potential for ap-GaAs-based PEC employing 0.5 M H2804 electrolyte; PLintensity was monitored at Anm, 865 ram. The electrode (p3.1 z 1017 -cm3) was eicted i-ith -1.5 mW/cm 2 of 450-nm light.The first and second cat scans of PL intensity arelabeled A and B, respectively; the photocurrent Is only shownfor the initial scan. The curves were swept simultaneously at10 mV/s.
Figure 2. Photolutmnescence intensity as a function of electrodepotential for three emcitation wavelengths, 450, 570, and 690 nm.Data were obtained for a p-GaAs electrode (p,3.x1 7 cm"3 ) in0.5 M H12804/0.1 M KSCN electrolyte after cycling continuously for4 h between -0.05 and -0.85 V vs. SC! at 10 mV/s. The three-anels do not have the sa m vertical scale.
Figure 3. PhotolI -- / -- : Intensity vs. optical penetrationdepth (IL-OP)) curves for a p-GaAs electrode (p - 3.1 x 1017 cm 3)
in 0.5 M H2804/0.1 M KSCN electrolyte at two electrodepotent/als, -0.1 V (squares; acquired for an anodic-going can)and -0.8 V vs. SM (circles; acquired for a cathodic-going scan).Values of 8r and W eztracted at these potentials are given inTable I. The solid line passing through data at -0.8 V and thedashed line at -0.1 V are best fits to Eq. (3). The solid linepassing through data at -0.1 V Is the best fit to Eq. (5)
Figure 4. Calculated values of 8r and W as a function otelectrode potential. Values from the cathodic-going scans aredenoted by squares and those om anodic-going scans by
rcie. ma ete calculated for -0.6 V on the cathodic-goingscan serve as the reference values. The error bars for thereference values reflect the uncertainty in the absolute valuesand the other error bars reflect the uncertainty in the relativevalues.
23
Figure 5. Growth in P1. Intensity caused by electrode pulsing.The p-GaAs electrode (p a 3.1 x 1017 c7 3 ) was operated in 0.5
M "40&1 M KSCN electrolyte with 450-nm excitation. P1.
intensity for tinm preceding t -30 Is that of a freshly etchedelectrode at open circuit; atear t - 0, the data are the endPoints of the recorder Pen's deflection, obtained while pulsingthe electrode potential between -0.05 V vs. SCE (0.5 a), the top
Curve, and -1.00 V vs, SCE (0.5 s), the lower curve.
Figure 6. Photol m-nsec (P1. intensity vs. optical
pen rtiondepth (IL-OPI) curves) for a p-Ga.M electrode (p a 3.1x 1017 cmn3 ) in 0.5 M H2S04 electrolyte befor being placed incircuit (circles) and at -0.05 V vs. SCE after being repetitivelypulsed, as described in Fig. (5), until the P1. ehnmnt hadsaturated (squares). Values of Sr. and W extracted at thesepotentials are presented in the text. The solid lines are thebest fit to Eel. (3) for the open-circuit data and the best fit toEq. (5) for the -0.05 V data.
<~ B0
=L
0 4-
' 40s
.0.8 -0 04 0.20.
POTENTIAL, VOLTS vs. SCE
450 flim
570 nm
690 am
*A GA
POM-L VOT VLSC
* U W *~ U
q
EU
* '0* (~4w~*.b
* x
z0
* zw
'S..
In 000'id 9Aav'iH~J j
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01
20
a
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POETIL VOT VS SCE
RELATIVE PL INTENSITY0 -4o Cl'
0* I
I
* I
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2*
S
**g~J
II
IaI
*aI
IA - - I - - a
RELATIVE PL MNENSITY0 0
o
0
zti
00
0-0
0%0
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Maw*