Polymer International 43 (1997) 97È98 Book Reviews in photoreactive polymers Processes Edited by V. V. Krongauz and A. D. Trifunac. Chapman & Hall, London, 1995. pp. x ] 409, price £69.00. ISBN 0-412-03891-9 Progress in the development of photosensitive materials, most notably photoreactive polymers, has in turn enabled signiÐ- cant advances in the formation, imaging and electronic industries. Consequently, publishing, information storage and the manufacture of electronic components are examples of businesses which are dependent upon photoreactive polymer systems. The commercial importance of photoreactive polymers has engendered a high level of research and development activity. This book addresses several aspects of the subject : its history and current status, key technical aspects and likely future applications. It is the product of 16 contributing authors drawn from industrial and academic environments on three continents. The 11 chapters fall into three sections. The Ðrst section, devoted to “History and state of the artÏ, comprises two chapters. Of these, that by Marignier on “Asphalt as the worldÏs Ðrst photopolymerÏ is both fascinating and entertaining. However, the clear exposition of underlying principles gives this chapter a value beyond that of historical curiosity. The second section, “Processes in photoreactive polymersÏ, comprises seven chapters and, at 248 pages, constitutes the bulk of the book. Contributions are somewhat uneven both in the scope of the topics covered and the quality of the writing. However, the chapters by Fouassier, on “Time resolved laser spectroscopy of excited state processes in photoimaging systemsÏ, and by BowryÈDevereaux on “Photosensitive liquid crystalline polymersÏ provide excellent reviews of their respec- tive topics. KrongauzÏs review of “Di†usion in polymer matrix and anisotropic photopolymerizationÏ is another highlight. The third section, “Photoreactive polymers in advanced appli- cationsÏ, contains two chapters, reviewing developments in holographic recording materials and photoresists. The book is well produced and cites 861 references, the most recent from 1994. It has an adequate, if not copious, subject index. The latter, and the variable quality of the chapters in the second section, direct me to an equivocal re- commendation, although the book does contain some contributions of high quality. D. M. Purbrick 1 1997 SCI. Polymer International 0959-8103/97/$17.50 Printed in Great Britain (

Book Reviews: Processes in photoreactive polymers. Edited by V. V. Krongauz and A. D. Trifunac. Chapman & Hall, London, 1995. pp. x+409, price £69.00. ISBN 0-412-03891-9

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Polymer International 43 (1997) 97È98

Book Reviews

in photoreactive polymersProcessesEdited by V. V. Krongauz and A. D. Trifunac.Chapman & Hall, London, 1995.pp. x] 409, price £69.00.ISBN 0-412-03891-9

Progress in the development of photosensitive materials, mostnotably photoreactive polymers, has in turn enabled signiÐ-cant advances in the formation, imaging and electronicindustries. Consequently, publishing, information storage andthe manufacture of electronic components are examples ofbusinesses which are dependent upon photoreactive polymersystems. The commercial importance of photoreactive poly-mers has engendered a high level of research and developmentactivity. This book addresses several aspects of the subject : itshistory and current status, key technical aspects and likelyfuture applications. It is the product of 16 contributingauthors drawn from industrial and academic environments onthree continents.

The 11 chapters fall into three sections. The Ðrst section,devoted to “History and state of the artÏ, comprises two chap-ters. Of these, that by Marignier on “Asphalt as the worldÏsÐrst photopolymerÏ is both fascinating and entertaining.

However, the clear exposition of underlying principles givesthis chapter a value beyond that of historical curiosity. Thesecond section, “Processes in photoreactive polymersÏ, com-prises seven chapters and, at 248 pages, constitutes the bulk ofthe book. Contributions are somewhat uneven both in thescope of the topics covered and the quality of the writing.However, the chapters by Fouassier, on “Time resolved laserspectroscopy of excited state processes in photoimagingsystemsÏ, and by BowryÈDevereaux on “Photosensitive liquidcrystalline polymersÏ provide excellent reviews of their respec-tive topics. KrongauzÏs review of “Di†usion in polymer matrixand anisotropic photopolymerizationÏ is another highlight.The third section, “Photoreactive polymers in advanced appli-cationsÏ, contains two chapters, reviewing developments inholographic recording materials and photoresists.

The book is well produced and cites 861 references, themost recent from 1994. It has an adequate, if not copious,subject index. The latter, and the variable quality of the chap-ters in the second section, direct me to an equivocal re-commendation, although the book does contain somecontributions of high quality.

D.M. Purbrick

11997 SCI. Polymer International 0959-8103/97/$17.50 Printed in Great Britain(