Department of Mechanical Engineering

Institute of Micro- and Nanotechnologies

FG Technische Optik

Xinrui Cao, Prof. S. Sinzinger

Phone +49 3677 69-2489

Fax +49 3677 69-1281

xinrui.cao@tu-ilmenau.de

www.tu-ilmenau.de/to

B1- Interference lithography on curved surfaces (Lau effect for optical lithography)

Theoretical and practical study on Lau effect - Optical coherence of illumination - Intensity distribution at variable grating separations - 3D filed distribution around the image planeApplication of Lau effect in lithographic structuring

Motivation

Experimental results and lithography

- Optical coherence of illumination for Lau effect

The project is funded by the DFG in the framework of Research Training group „Tip and laser-based 3D-Nanofabrication in extended macroscopic working areas“ (GRK 2182/1) at the Technische Universität Ilmenau, Germany.

- Intensity distribution in the image plane

- 3D field distribution around the image plane - Application of Lau effect in optical lithography

Fig.1: Setup of Lau effect

Fig.5: Lithographic structuring (light source: UV-LED)Fig.4: Intensity distribution around the

back focal plane of the Fourier lens (f=120mm)

Fig.2: Intensity image under (a) spatially coherentillumination, and (b) spatially incoherent illumination

Fig.3: Intensity distribution in the back focal plane ofthe Fourier lens (f=120mm) at variable grating separations