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USING OPTICAL EMISSION SPECTROSCOPY TO IMPROVE EQUIPMENT UPTIME FOR AN AL2O3 ALD PROCESS *
JOHN LOOSamsung Austin Semiconductor
12100 Samsung Blvd. Austin, Texas 78754
* Presented at the AVS 5th International Conference on Atomic Layer DepositionAugust 8-10, 2005, San Jose California
Installed OES unit with heater blankets
0
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5000
200 300 400 500 600 700 800 900 1000
Wavenength (nm)
Sign
al In
tens
ityTypical Lightwind Emission Spectrum - ALD Process
Wavelength01
Wavelength05
Wavelength04
Wavelength03
Wavelength02
Wavelength06
Typical emission spectra of an Al2O3 ALD process
Wafer02Wafer01 Wafer03 Wafer04
Setpoint WindowWafer Processing
Typical monitoring of chamber affluent wavelength
Wav
elen
gth
Inte
nsity
SYSTEM INFORMATION
ProcessChamber
ToPump
Lightwind ChemicalMonitoring System
DownstreamICP Plasma
EmissionSource
(Sensor)
RFGenerator
Optical Fiber
Communication Link To Process Tool
Data Acquisition& Control Computer
Multi-channelOptical Emission
Spectrometer
Interface
Interface
Optional Data System
The Lightwind system monitors process chemistry via plasma-induced Optical Emission Spectroscopy (OES).
Wavelength time trend of a long chamber coat. There is a distinct shape of the trend which indicates that the chamber is ready for post chamber maintenance release.
Wav
eleng
th In
tensit
y
wavelength01 OH=309nm
350
400
450
500
550
6001s
t 5K
Coa
t1s
t 5K
Coa
t1s
t 5K
Coa
t1s
t 5K
Coa
t1s
t 5K
Coa
t1s
t 5K
Coa
t1s
t 5K
Coa
t2n
d 5K
Coa
t2n
d 5K
Coa
t2n
d 5K
Coa
t2n
d 5K
Coa
t2n
d 5K
Coa
t2n
d 5K
Coa
t2n
d 5K
Coa
t
wavelength01OH=309nm
Wavelength time trend of two successive short coats ( ½ the time of the long coat ). This shows a repeatable “seasoning” curve in the same process chamber. Keeping this signature in mind a higher gas flow coat was attempted.
1-5 2 5K Coats wavelength01 OH=309nm
250
270
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370
390
1st 5
K
1st 5
K
1st 5
K
1st 5
K
1st 5
K
1st 5
K
1st 5
K
2nd
5K
2nd
5K
2nd
5K
2nd
5K
2nd
5K
2nd
5K
2nd
5K
wavelength01OH=309nm
Proper trend indicating seasoningis complete
49pt Contour Mapperformed after coating
Improper trend indicating seasoningdid not properly occur
49pt Contour Mapperformed after coating
DALD02-5 5K Coat After the 6min 100c Coat
300
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1500
1 1199 2397 3595 4793 5991 7189 8387 9585 10783
wavelength01 OH=309nm
DALD02-5 100cc TMA Ar Bubbler Flow Coat 6min
0
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1 40 79 118 157 196 235 274 313 352 391 430 469 508 547
wavelength01 OH=309nm
6 minutes
3 hours
These charts indicate that the same seasoning curve can be
attained with a simple change to the coating recipe.
Wavelength 1
Wavelength 1
DALD02-5 5K Coat After the 6min 100c Coat
300
500
700
900
1100
1300
1500
1 1199 2397 3595 4793 5991 7189 8387 9585 10783
wavelength01 OH=309nm
DALD02-5 100cc TMA Ar Bubbler Flow Coat 6min
0
500
1000
1500
2000
2500
3000
3500
4000
4500
1 40 79 118 157 196 235 274 313 352 391 430 469 508 547
wavelength01 OH=309nm
6 hours of Chamber Coating
6 min of Chamber Coating
3 hours of Chamber Coating
By understanding the response from the chamber affluent during chamber coating , qualification time ( time required to prepare a processing chamber for production material processing ) can be reduced from 6hours to 6min.
Wavelength 1
Wavelength01
Wavelength02
Wavelength03 Wavelength04
Wav
elen
gth
Inte
nsity
Chemical Supplier A
Chemical Supplier B
In this example, precursor chemical suppliers were compared by overlapping full spectra. Critical wavelengths were previously indentified as shown above. Using OES provided additional information regarding the precursor chemical composition from both suppliers.
Bottle Fill = 100g
Bottle Fill Level = 63g
Bottle Fill Level = 43g
Bottle Fill Level 20g
These charts show how OES monitoring of chamber affluent can detect changes to the reaction liquid fill level. As the bottle level drops, the wavelength intensity decreases.
Reference Line
DALD03-5
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2004
-12-
14-0
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:00
2004
-12-
19-0
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:00
2004
-12-
24-0
0:00
:00
2004
-12-
29-0
0:00
:00
2005
-01-
03-0
0:00
:00
2005
-01-
08-0
0:00
:00
ALO_0039.bchPM5_Wavelength1.obs .avg
ALO_0039.bchPM5_Wavelength8.obs .avg
ALO_0040.bchPM5_Wavelength1.obs .avg
ALO_0040.bchPM5_Wavelength8.obs .avg
ALO_0042.bchPM5_Wavelength1.obs .avg
ALO_0042.bchPM5_Wavelength8.obs .avg
Wet CleanRelease
2nd window install
Trap installTrap RemovedPre Wet Clean
Equipment A
Here OES monitoring was used to evaluate a new pump trap design. Shortly after installation, the intensity of the monitored wavelength decreased leadingto an early detection of a trap failure.
Bottle Removal PrePurge ( 4 hours ) Bottle Removal ( 1 hour ) New Bottle Post
Purge ( 1 hour )Qualification Thk/PCs
( .5 hour )
Pre Fill Tool Setup ( 2 min )
Auto Fill SequenceIncludes 2 purge
sequences ( 20 min )
Qualification on 1st two warmup wafers
after PM release ( 8 min)
By switching to an AutoRefill System and then confirming chamber integrity post the maintenance with OES data, total time reduced by 6 hours.
The use of OES provides critical information regarding processing system integrity before and after a schedule maintenance. Here is an example whereby OES data was utilized after a precursor bottle fill. This coupled with an in-situ precursor fill system drastically reduced the total time required.