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TAP-2 - Atomic Deposition System Deposition chamber Mass spectrometer TAP Reactor chamber Diffusion pump
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Atomic Modifications and Doping of Metal Oxides for Commercially
Significant Partial Oxidation
J. Gleaves and G. Yablonski
Heterogeneous Kineticsand Particle Chemistry Laboratory
http://crelonweb.wustl.edu
Heterogeneous Selective Oxidation ProgramsHeterogeneous Kinetics and Particle Chemistry Laboratory (HKPCL)Chemical Reaction Engineering Laboratory (CREL)Chemical Engineering Dept., Washington University, St. Louis, MO
CH4 + 1/2O2 CO + 2H2 Fuels, ChemicalsSupported metal
CH2 CHCOOHCH3CH2CH3 + 2O2 + 2H2O
propane acrylic acid
Metal oxide
CH2 CHCNCH3CH2CH3 + 2O2 + NH3 + 4H2Opropane acrylonitrile
Metal oxide
+ 1/2 O2 + H2OMetal oxideC2H5 CH CH2
ethylbenzene styrene
+ 1/2 O2
propene propene oxideMetal oxideCH2 CHCH3 H2C CHCH3
O
TAP-2 - Atomic Deposition System
Deposition chamber
Mass spectrometer
TAP Reactor chamber
Diffusion pump