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Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

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Page 1: Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini

Università di Parma

Performance Evaluation

of Ultrathin gate oxide

CMOS Circuits

Page 2: Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

Outline

Simulation models Designed circuit Circuit analysis

Conclusions

Power dissipation Logic Swing and Noise Margin Frequency

Page 3: Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

Technology

Starting technology LETI Minimum channel

length 50nm Supply voltage 1.5V Measurement performed

on Lot 6564 wafer12 in Udine University

Projected technologies Oxide thickness from

1.5nm down to 0.9nm Supply voltage from

1.5V down to 0.9V

Page 4: Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

Simulation model

Physical (DESSIS) simulation Projection to different

tox

comparison to ideal device

Circuit model EKV non-gate-

permeable core HDL correction blocks

Compact circuit model

Physical device model

Page 5: Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

Device model vs. measurements

0,0 0,5 1,0 1,5

0

10

20

30

40

5060

70

80

I G (

nA)

VG (V)

measurement simulation

VDS

0,0 0,5 1,0 1,5

0,0

0,5

1,0

1,5 measurement simulation

VDS

VG (V)

I D (

mA

)

Page 6: Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

Ring oscillator

101 stages Gate-current effects from reasonably-sized

devices (200nm X 10m) Gate current => CMOS architecture no

longer “ratioless” NAND gate: both static and dinamic analysis

Page 7: Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

tox (nm) P (W) LS (V) f (MHz)

1.5 8.4 1.488 28.7

1.3 14.7 1.486 45.0

1.1 20.0 1.486 54.2

0.9 23.6 1.486 55.8

Ideal circuit performance

Waveforms

Period shorteningVOH lowering

VOL rising

Power dissipation increase

Page 8: Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

Power consumption

P = <Preal> - <Pideal >

Ps = (IG,n + IG,p) · Vdd /2

Static Power consumption due to gate current

0,9 1,1 1,3 1,5

0,1

1

10

100

P Ps

P, P

s (

W)

tox

(nm)

VH

Page 9: Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

9

Power consumption

Power consumption increase, reduced by scaling down supply voltage

Solution: oxynitride / high–k dielectric

0,9 1,1 1,3 1,50,01

0,1

1

10

100

1000

0,01

0,1

1

10

100

1000

P I

G

I G (A

)

P (W

)

tox

(nm)

0,9 1,1 1,3 1,510

100

1000

10

100

1000

I G (A

)

Vdd (V)P

(W

)

P IG

Page 10: Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

Logic Swing degradation

Logic Swing degradation, reduced by scaling down supply voltage

0,9 1,1 1,3 1,510

-5

10-4

10-3

10-2

10-1

100

101

102

103

10-2

10-1

100

101

102

103

104

105

106

LS IG

I G (A

)

LS

(mV

)

tox (nm)

0,9 1,1 1,3 1,51E-5

1E-4

1E-3

0,01

0,1

1

1E-5

1E-4

1E-3

0,01

0,1

1

I G (

A)

Vdd (V)L

S (

V) LS

IG

Page 11: Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

Noise Margin Reduction

Logic Swing reduction

Noise Margin reduction

0,9 1,1 1,3 1,5300

400

500

600

700

ideal case real case

high NM

low NM

Noi

se M

argi

n (m

V)

tox

(nm)

Page 12: Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

Logic Swing degradation

VH

VL

0,9 1,1 1,3 1,51,301,321,341,361,381,401,421,441,461,481,50

tox

(nm)

LS

(V

) single stage chain

Page 13: Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

Frequency shift

Frequency shift, reduced by scaling down supply voltage

0,9 1,1 1,3 1,50,01

0,1

1

10

f (M

Hz)

tox

(nm)

0,9 1,1 1,3 1,51

2

3

4

5

6

Vdd (V)f

(M

Hz)

Page 14: Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

Frequency shift

Complex transient due to: Additional currents

tunneling through gate oxide

Reduced Logic Swing

Global effect observed: Frequency increase

Vi-1Vi Vi+1

IDp IGp

IGnIDn C

VL VH

Page 15: Alessandro Marras, Ilaria De Munari, Davide Vescovi, Paolo Ciampolini Università di Parma Performance Evaluation of Ultrathin gate oxide CMOS Circuits

Conclusions

Compact circuit model developed: Based on physical model Good fitting with measurements

Effects of direct-tunneling current investigated: Power consumption increase Logic swing and noise margin degradation Frequency shift

Circuit maintains its functionality, but with some non- negligible performance degradations

Within the investigated range, permeable-gate devices seems to be suitable for practical applications