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Gas Cluster Ion Beam EquipmentProf. Isao YAMADA (Kyoto University)nFusion™ 500 Series
TEL EPION INC.
GCIB SystemCharacteristics & Applications of GCIB
Defining Aperture
Gas Cluster :(Ar)n, (O2)n, (CO2)n, (SF6)n, (N2)n ・・・・・・
n~2000
Patent status & Patent owner contactPatent No. : USP5459326; 5814194; 6207282; 6797334; 6797339Patent owner contact: Masaru OZAKI (JST)
Tel:+81-3-5214-8477, e-mail: [email protected]
300mm Si Wafer
Ultra shallow dopingModification of surface structure & compositionCo-incident doping of multiple speciesAtomic level surface smoothingAsperity removalDirectional etchingAssisted deposition of thin films