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11
Qiang Li
Department of Chemistry
Surface Chemistry of Hexacyclic Surface Chemistry of Hexacyclic Aromatic Hydrocarbons on 2Aromatic Hydrocarbons on 21 1 and Modified Surfaces of Si(100)and Modified Surfaces of Si(100)
22
Introduction• Purpose• Si(100) surface• Aromatic hydrocarbons• Experimental
Present work• Organic functionalization of Si with aromatic hydrocarbons
• Kinetics of surface processes in hydrocarbon/Si(100) systems
Summary & Outlook
OutlineOutline
33
Introduction – Organic SemiconductorsIntroduction – Organic Semiconductors
• The first organic FETTsumura et al., Appl. Phys. (1986)
S( )
X
• Organic switches
Lopinski et al., Nature (2000)
• Self-directed growth of molecular lines
• Growth of a polymer film with molecular layer deposition
T. Bitzer et al. Appl. Phys. Lett. (1997)
Joachim et al., Nature (2000)
44
• Diamond structure of Si
Introduction – Si(100) substrateIntroduction – Si(100) substrate
• Si(100)2x1 surface
Reconstruction
1x1 2x1
• Silicon is the predominant material in the semiconductor industry
• The Si-Si dimer on Si(100)2x1 mimics a double-bond organic reagent
• Ideal platform for building hybrid devices by seeding unsaturated hydrocarbons on Si(100) template
• Comparison with our previous work on the Si(111) surface
55
Introduction – Aromatic hydrocarbonsIntroduction – Aromatic hydrocarbons
• Adsorbates of interest • Functional units
phenyl methyl vinyl Heteroatom H
benzene 1 6
toluene 1 1 5+3
p-xylene 1 2 4+6
m-xylene 1 2 4+6
o-xylene 1 2 4+6
styrene 1 1 5+3
pyridine 1 1 1
CH3 H2C CH
• Organic molecules comprise of over 95% of all known chemical compounds
• Organic functional units take effect in organic-semiconductor interactions
• Aromatic hydrocarbons are relative stable during surface processes
• Study on prototypical aromatic hydrocarbons helps analysis and synthesis of oligomers and/or polymers
NN
66
Organic functionalization Organic functionalization of semiconductorsof semiconductors
Organic moleculesOrganic molecules
Organic Organic functional functional
unitsunits
Si-SiSi-Sidimerdimer
Si(100) surfaceSi(100) surface
SemiconductorsSemiconductors
InterfaceInterface
Investigated characteristic functions of phenyl, methyl, vinyl, heteroatom, H in the surface chemistry on Si(100) under different surface conditions
Derived the Kinetics of chemisorption, dissociation, desorption, and condensation polymerization
Developed a new kinetics theory for reactions in 2D-diffusion system
77
IntroductionIntroduction Experimental & theoretical methods Experimental & theoretical methods
Experimental• UHV chamber (P<10-10 Torr)
• Thermal desorption spectrometry (TDS)
• Low energy electron diffraction (LEED)
• Auger electron spectroscopy (AES)
Computational• Density functional theory
(DFT)
• Gaussian 98 package
• Geometry and energy of chemisorption
88
Cracking pattern for a specific molecule
Experimental: TDS setupExperimental: TDS setup
Temperature ramps as a linear function of time
• Intensities for different masses Amount of desorbed species
• Desorption temperature bonding energy & adsorption geometry
• Shape of TDS profiles reaction order
99
Cracking pattern for a specific molecule
Experimental: TDSExperimental: TDS
Temperature ramps as a linear function of time
• Intensities for different masses Amount of desorbed species
• Desorption temperature bonding energy & History of surface reactions
• Shape of TDS profiles reaction order
Zeroth order
First order
halfth order
second order
1010
Chemisorption at RT• Adsorption kinetics (by AES)• Surface structure (by LEED)
Thermal desorption• Adsorption Energy & geometry (by TDS, DFT)• Surface chemistry (by TDS)
Surface condition• Ar+ sputtered a-Si• Oxidized and hydrogenated Si
Post-exposure treatments• Oxidization and hydrogenation• Electron and UV light irradiation
Study of surface kinetics
Present work - ProcedurePresent work - Procedure
1111
Present work - ChemisorptionPresent work - Chemisorption
Si(100)2x1
pyridine/Si(100)2x1
AES relative intensity Adsorption coverageThe shape of coverage vs. exposure
• 1st order – molecular adsorption (benzene, toluene, xylene isomers, styrene)
• 2nd order – dissociative adsorption (pyridine)
Adsorption rate Adsorption order
LEED patternLEED pattern
1212
Assignment of adsorption states
TDS
DFT computation• Chemisorption geometry• Bonding energy
Present work - Thermal desorptionPresent work - Thermal desorption
• Desorption species• Desorption
temperature
A B
A
B
1313
Cycloaddition and dative adsorptionCycloaddition and dative adsorption
• [4+2] cycloaddition exists for all the hydrocarbons; it may convert to tight-bridge at low coverages
• [2+2] cycloaddition found in styrene/Si(100) involving the vinyl group
• Dative adsorption involving the heteroatom (N) for pyridine/Si(100)
tight-bridge
Summary of chemisorption geometries found in the present work:
1414
Present work - Surface conditionPresent work - Surface condition
Ar+ sputtered a-SiA TDS feature with a lower
adsorption energy (at a lower temperature)
B Desorption of smaller hydrocarbon fragments at a higher temperature
Oxidized and hydrogenated SiC Making the surface inert to
molecular adsorption D Except in the case of pyridine
that undergo dissociation
AA
N
BB
CC
DD
1515
Present work - Post-exposure treatmentsPresent work - Post-exposure treatments• First observation of RT
oligomerization of pyridine stimulated by low energy electron irradiation
• Unexpected elevation of D2 desorption
• The surprising recurrence of molecular desorption in the second-run TDS
• Room-temperature condensation oligomerization of pyridine on Si(100)
D2
C5D5N
N
1616
( V )
( V ) Si
H
)
( XI )
( X )
( IX ))
)
( VIII )
C2D3H (g)
D DD
SiSi
H
H
HSi
H
Si
HH
Si
( VII )
(c)
HH
( V )
( VI )
(b)
(a)
( IV )( III )
( II )( I )
(c)
(b)
(a)
+
D
H2 (g)
DD
SiSiH H
HSi
H
D
D
D
D DD
D DD
HSi
H
D
D
D
HSi
H
D
D
DDDD
+ H2 (g)
750 KH
Si SiH
+ +
+
+
H2 (g)
750 K
H
Si SiH
700 K H
Si SiH
C2D3H (g)
HH
Si Si
Si700 K
680 K
SiSi
H
H
SiHSiH+ 2H
SiSiH H
+ 2H
SiSiH H
~ 560 K+Si SiSiSi
DDD
( V )
12
12
Present work: Post-exposure hydrogenationPresent work: Post-exposure hydrogenation
D
M
First observation of surface-mediated organic chemistry driven by thermal diffusion and desorption of hydrogen
C
DD-M
D-M
D-M
( )( )
( )( )
M
1717
R H(ad)
Si H
Adsorbate
MonohydrideSi SiH H
Hydrogen abstraction
H pairing
H2 (g)
Thermal desorption
Condensation
Present work: kinetics of hydrogen evolutionPresent work: kinetics of hydrogen evolution
DD
DD
D
H
HH
Si SiSi Si
HH
+ H2 (g)
DOD
Model II
Model III (g)HPPP 2nmnm
Model I
Broader feature with multi-states
• Near first-order desorption kinetics• H diffusion independent of co-adsorbates• Exothermic formation of monohydride
I
• Near second-order desorption kinetics• H diffusion influenced by co-adsorbates• Endothermic formation of monohydride
II
800 K
DD
DD
D
D
DD
H2
Hn lnln 2
or
RT
EnH
RT
EH
aa
eedt
d
νν
θ2
n – Reaction order of desorption
Hydrogen evolution – Desorption orderHydrogen evolution – Desorption order
nHθθ2
Model I
1919
Hydrogen evolution – Model IIIHydrogen evolution – Model III
Mobile monomers Mobile dimers
Ea 23 kcal/molEd 4 kcal/molEd 8 kcal/mol
Ed(1) 3.5 kcal/molEd(2) 7 kcal/mol
Model Model IIII
(adsorbate)H
H
Si Si
R
+R CH
HH
Si Si
H
Si SiSi Si
HH
+ Si Si
H
2
(DOD) (NOD) (SOD)
Hydrogen evolutionHydrogen evolution
Si Si+Si SiR H
2 Si Si+Si SiR
2H H
(R-DOD-H) (R-SOD)
Model Model IIIIIICondensation polymerizationCondensation polymerization
• Development of the Collision Theory for the Diffusion System on surface
(g)HPPP 2nmnm
RTEnm
aekTNNdt
dH /2/12 8
• Traditional gas-phase collision theory:
• Our collision theory for diffusion system:
RTEEnm
adedt
dH /2
The activation energy of the reaction in such type of systems consists of contributions from both collision and diffusion.
D2
Si Si
2121
Hydrogen evolution – Model Hydrogen evolution – Model IIIIII
Mobile monomers Mobile dimers
Ea 23 kcal/molEd 4 kcal/molEd 8 kcal/mol
Ed(1) 3.5 kcal/molEd(2) 7 kcal/mol
2222
Functional units in Functional units in different surface processesdifferent surface processes
Phenyl Methyl
CH3
Vinyl
CH=CH2
Heteroatom
N
H
Cycloaddition
Dative bonding
Hydrogen abstraction
Desorption
Diffusion
Dissociation
Condensation polymerization
Benzene Toluene p-xylene m-xylene o-xylene styrene pyridineBenzene Toluene p-xylene m-xylene o-xylene styrene pyridine
2323
• [4+2] cycloaddition occurs for all the hydrocarbons; [2+2] cycloaddition found in styrene/Si(100); Dative adsorption involving the heteroatom for pyridine/Si(100)
• First observation of surface-mediated organic chemistry driven by thermal diffusion and desorption of hydrogen in styrene/Si(100)
• First observation of electron-induced RT oligomerization of pyridine
• A new collision theory for the 2-D diffusion system has been developed to clearly describe the nature of the reaction kinetics in lattice-diffusion systems
• Hydrogen abstraction is found to play an important role in stabilizing the adsorbed hydrocarbons for further surface processes at higher temperatures
• Three kinetics models have been developed to successfully describe all hydrogen evolution processes in the present work
Summary Summary
2424
Outlook Outlook
• Further studies by using more structural-sensitive techniques (e.g. STM and FTIR)
• Larger aromatic molecules (e.g. naphthalene and biphenyl), smaller aromatic heterocyclic molecules (e.g. pyrrole, thiophene and furan), and halogen-substituted aromatic hydrocarbons
• Monolayer system multiple organic layers • Complete and Extend the collision theory to
surface chemistry on metals (catalysis study!) and 3D-diffusion system.
2525
• Dr. K.T. Leung
• Dr. Dan Thomas, Dr. Jean Duhamel and Dr. Bruce Torrie
• Dr. Shihong Xu and Xiaojin Zhou • Zhenhua He and Sergey Mitlin• Xiang Yang, Dr. Nina Heinig , Qiang Gao• Dr. Hui Yu and Xiang He
• Entire staff of the Science Shops
• Chunling Yang
• Friends: Lili Zheng, Jingying Yin, Grace Yin, Ben Yang, Benda Liu, Yan Wu and their families
Thank youThank you
2626
Model IModel I
Si Si+SiSi
HHH
+ Si SiH H
SiSi
H
Si Si 2 Si Si
H
+ Si Si
HH
H = +6.0 kcal/mol
Dehydrogenated adsorbate
SOD DOD UOD
a 1 2 0
)1(2
)1()1(4'
2
2 x
xxxx HHH
RTEH aedt
d /2 ν
SiSi
HSi Si
HSi Si
H H Si Si
2727
Carbon concentration after annealing Carbon concentration after annealing to different temperaturesto different temperatures
100% = 1/4 monolayer
90%
30%Molecularadsorption
350-600 K
10%
Moleculardesorption
Dissociativedesorption plus...
800-1000 K
200 400 600 800 1000 1200 1400
20
40
60
80
100
100% = 100 L toluene
AES C(KLL)/Si(LVV)
Ca
rb
on
Co
nce
ntr
atio
n (
%)
Temperature (K)
60%
2828
Our collision theory for adsorbates diffusing on surface:Our collision theory for adsorbates diffusing on surface:
/RT,E/RTEnm
ad ee)(θθr nmmnm m
/RTEnmnm
de)(θθθθ meffnm mZ
m n
mmdt
dH /RTnm,En
/RTEm
nm,nm
2 ad eθe)(θr
m
m
m
m
mE
n
E
mRm
mdt
dHda
/RTEEm
/RT)(mn
/RT2
adeθ
e)(θθe
pppp rrrrrr
RRdt
dH
22222212121121211111
2 )2()1(
221221
2221221112
11221111
2
2
rrrdt
d
rrrrrdt
d
rrrrdt
d
p
p
p