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1 CiS Forschungsinstitut für Mikrosensorik GmbH Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik: Bump Bonding 23.6.2015 Sabine Nieland, Alexander Lawerenz , Tobias Wittig, Arno Kompatscher, Christian Maier, Ralf Röder

1 CiS Forschungsinstitut für Mikrosensorik GmbH Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik: Bump Bonding 23.6.2015 Sabine Nieland,

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Page 1: 1 CiS Forschungsinstitut für Mikrosensorik GmbH Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik: Bump Bonding 23.6.2015 Sabine Nieland,

1CiS Forschungsinstitut für Mikrosensorik GmbH

Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik:Bump Bonding23.6.2015Sabine Nieland, Alexander Lawerenz, Tobias Wittig, Arno Kompatscher, Christian Maier, Ralf Röder

Page 2: 1 CiS Forschungsinstitut für Mikrosensorik GmbH Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik: Bump Bonding 23.6.2015 Sabine Nieland,

2CiS Forschungsinstitut für Mikrosensorik GmbH

Ongoing R&D Activities at CiS: Bump BondingOutlook

• Introduction and state of the art of Under Bump Metallisation (UBM)

• Under Bump Metallisation (electroless plating)

• Immersion soldering

• Light-induced plating (LIP)

• Flip-chipping

Ni/Au + solder

Page 3: 1 CiS Forschungsinstitut für Mikrosensorik GmbH Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik: Bump Bonding 23.6.2015 Sabine Nieland,

3CiS Forschungsinstitut für Mikrosensorik GmbH

Introduction

Contact points are spread over the whole sensor and chip area,

with a high density of small contact points.

Materials have to withstand the high LHC luminosity.

Temperature stability has to be from -40 °C to RT.

(FhG-IZM)(FhG-IZM)

Chip

Sensor

Particle

Bump-Bonds

Page 4: 1 CiS Forschungsinstitut für Mikrosensorik GmbH Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik: Bump Bonding 23.6.2015 Sabine Nieland,

4CiS Forschungsinstitut für Mikrosensorik GmbH

State of the art

40 µm40 µm

UBM: Ti/Pt/Au

Solder: In

Processing: evaporation (plating base), lithography & lift-off

UBM: Ti/W/Cu

Solder: SnAg3.5

Processing: sputtering (plating base), lithography, electroplating, lift-off & etching of plating base

UBM: electroless Ni/Au

Solder: SnAg3.5 as solder ball

Processing solder: solderball placement

50 µm50 µm

40 µm40 µm40 µm40 µm

Karlsruhe KIT

Berlin FhG-IZM

Pac Tech, Nauen

Page 5: 1 CiS Forschungsinstitut für Mikrosensorik GmbH Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik: Bump Bonding 23.6.2015 Sabine Nieland,

5CiS Forschungsinstitut für Mikrosensorik GmbH

UBM at CiS: electroless

AlSi pad as the base for electroless Ni + Au plating

Passivation on the AlSi as a mask for the electroless plating

No need for a PVD plating base

No need for lithography and a photoresist

No need for lifting-off (etching) the photoresist

Page 6: 1 CiS Forschungsinstitut für Mikrosensorik GmbH Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik: Bump Bonding 23.6.2015 Sabine Nieland,

6CiS Forschungsinstitut für Mikrosensorik GmbH

UBM at CiS: electroless

AlSi pad as the base for electroless Ni + Au plating

Passivation on the AlSi as a mask for the electroless plating

old new

First trials with older ATLAS/CMS-Pixel sensors

New experiments with new sensors:

• much better quality, pads are higher: some microns of Ni + thick Au layer.

Surface much more homogenious

Page 7: 1 CiS Forschungsinstitut für Mikrosensorik GmbH Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik: Bump Bonding 23.6.2015 Sabine Nieland,

7CiS Forschungsinstitut für Mikrosensorik GmbH

UBM at CiS: electroless

old

Page 8: 1 CiS Forschungsinstitut für Mikrosensorik GmbH Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik: Bump Bonding 23.6.2015 Sabine Nieland,

8CiS Forschungsinstitut für Mikrosensorik GmbH

Immersion Soldering

Wafer or diced sensor

• is immersed into solder bath

• or moves along a solder filled groove.

Solder adheres to Ni/Au-UBM & forms bumps.

FhG IZMFhG IZM

(Berlin FhG IZM)

Page 9: 1 CiS Forschungsinstitut für Mikrosensorik GmbH Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik: Bump Bonding 23.6.2015 Sabine Nieland,

9CiS Forschungsinstitut für Mikrosensorik GmbH

Ni-UBM + SnAg3.5 solder

First trials with older ATLAS pixel sensors

• homogeneity quite well

• height and width still quite small

Better results with younger sensors

• Ni/Au pads as well as the solder bumps are higher.

• Pads stick out of the sensor.

Ni/AuNi/Au + solder

Ni/Au Ni/Au + solder

Ni/Au

Page 10: 1 CiS Forschungsinstitut für Mikrosensorik GmbH Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik: Bump Bonding 23.6.2015 Sabine Nieland,

10CiS Forschungsinstitut für Mikrosensorik GmbH

LIP – Light Induced Plating

Growth of the UBM and solder is stimulated by laser light.

UBM is only growing on the passivation openings.

No additional process steps are necessary

• no plating base / resist,

• no stripping / etching.

Less cost & time consuming

(in cooperation with TU Ilmenau)

Page 11: 1 CiS Forschungsinstitut für Mikrosensorik GmbH Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik: Bump Bonding 23.6.2015 Sabine Nieland,

11CiS Forschungsinstitut für Mikrosensorik GmbH

LIP – Light Induced Plating

First trials

done on CMS-pixel sensors (no difference to ATLAS pixel):

... works in principle.

Homogeneity of Ni is “improvable”.

Also old sensor with bad Al surface used (better results expected with new sensors)

Next steps

Combine Ni-UBM (LIP or chemical) with LIP solder

Alternative to immersion soldering

different electrolytes

Sn, SnAg3.5, In, In/Sn

Additional usage of lacquer mask to grow higher solder pillars

(in cooperation with TU Ilmenau)

Page 12: 1 CiS Forschungsinstitut für Mikrosensorik GmbH Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik: Bump Bonding 23.6.2015 Sabine Nieland,

12CiS Forschungsinstitut für Mikrosensorik GmbH

Flip-chipping at CiS

Fineplacer Die-Bonder

Page 13: 1 CiS Forschungsinstitut für Mikrosensorik GmbH Ongoing R&D Activities at CiS Forschungsinstitut für Mikrosensorik: Bump Bonding 23.6.2015 Sabine Nieland,

13CiS Forschungsinstitut für Mikrosensorik GmbH

Flip-chipping at CiS: Daisy Chains

Daisy chain dummies are in production.

Geometry is based on CMS Pixel.

Different bump pad parameters will be tested:

• different bump pad diameters,

• different UBM and solder variants (also with bumps from FhG-IZM),

• large quantity,

• different sensor/chip sizes.

Measurement of resistance

Current pathsBump Bond Chip

Sensor

FhG IZM

FhG IZM

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14CiS Forschungsinstitut für Mikrosensorik GmbH

Conclusion & Outlook

CiS is exploring different kinds of UBM & flip-chip technologies.

Focus is layed on

• cost efficiency,

• dimensions (UBM and solder size),

• in-house processes (complete or partial).

Different technologies are considered and are investigated.

• Mask-less Ni/Au UBM + SnAg3.5 solder look promising at the moment.

• Possibilities of light induced plating and solder immersion are extended.

• Flip-chip tests are on the way.