05 Tertiary and Advanced WWT

7/21/2019 05 Tertiary and Advanced WWT

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Tertiary and advancedwastewater treatment

Joko Wintoko

Jurusan Teknik Kimia FT UGM


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Need for advanced WWTThe need to remove organic matters & TSS

beyond secondary treatment

The need to remove nutrients N & !"The need to remove s#eci$c inorganic e%g%

heavy metas" and s#eci$c organic


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Technology used for advanced treatment

Residual constituents Depthfiltration

Surfacefiltration

Micro & ultrafiltration

Inorganic andorganic colloidal& suspendedsolid

SS Colloidal solids

Organic mater(particulate)

Dissolvedorganic matter

Total org. carbon

Refractory organics

olatile org. compounds

Dissolvedinorganic matter

!mmonia

"itrate

#$osp$orous

TDS

%iological %acteria

#rotooa


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Residual constituents Reverseosmosis

Electro-dyalisis

Adsorp-tion

Airstripping

Ion ex-change

Inorganic and

organiccolloidal & SS

SS

CS

O'


TOC

RO

OC

Dissolvedinorganicmatter

"

"O*

# TDS

%iological %acteria

#rotooa

iruses


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Residual constituents Advancedoxidationprocess

Disti-lation

Chemicalprecipi-tation

Chemicaloxidation

Inorganic and

organiccolloidal & SS

SS

CS

O'


TOC

RO OC

Dissolvedinorganicmatter

"

"O*

#

TDS

%iological %acteria

#rotooa

iruses


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Filtration

Sus#ended materiato be $tered

Granuar $termedium

Su##ort formembrane

Fiter membranee%g% coth' (ire screenor synthetic membran

SU)F*+, F-.T)*T-/N0,!T1 F-.T)*T-/N


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Fitration

htt#233(((%nature%com3nature34ourna3v5673n895:3$g;tab3567;F7%htm


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iltration

Depth

filtration

Surface

filtration

Mem!rane

filtration

Slo" sand

filtration

Rapid

filtration

Intermittent

filtration

Recirculating

filtration

#a!$ filter Microfiltration

%ltrafiltration

anofiltration

Reverse

osmosis

Diatomaceous

earth filtration

Cloth'Screen

filtration


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iltration rate ()*M'ft+, $./-$./

*ros Relia!le$ Minimum operation andmaintenance re0uirements$ %suallydoes not re0uire chemicalpretreatment$

Cons #arge land area re0uired$ eed to

manually clean filters$

ilter Media Sand$

)ravity or *ressure1 )ravity$

iltration Mechanism 2iological action3 straining3 and

adsorption$

Cleaning Method Manually removing the top + inches ofsand$

Common Applications Small ground"ater systems$

So( Sand Fiter


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iltration rate ()*M'ft+, +-4

*ros Relatively small and compact$

Cons Re0uires chemical pretreatment$ Doesn5tremove pathogens as "ell as slo"sand filters$

ilter Media Sand$ 6r sand and anthracite coal$ 6rsand and anthracite coal and garnet$

)ravity or *ressure1 )ravity$

iltration Mechanism *rimarily adsorption$ Also some straining$

Cleaning Method 2ac7"ashing$

Common Applications Most commonly used type of filter forsurface "ater treatment$

)a#id Sand Fiter


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)a#id Sand Fitration

htt#233(ater%me%vccs%edu3conce#ts3$ters%htm


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$tration

0, $ter #rocess starts by dra(ing (ater through a retainingscreen $g 6"% 0, is added to the (ater and is recyced as itforms an even coating on the retaining screen $g 7"% /ncecoated' the $tering #rocess begins $g Fiters%htm


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0iatomaceous ,arth 0,"

Fitration

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+oth3Screen $tration

AUTOMATIC BACKFLU!I"# FILT$%

www&clearse'&com('roducts&htm

TU%BO $)#$ FILT$%

M b Fit ti
http://www.clearsep.com/products.htmhttp://www.clearsep.com/products.htm


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Membrane Fitration!rocess

htt#233(((%enntech%com3membrane?technoogy%htm


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!rocess


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Micro$tration

Memcor CMF* su+merged continuous micro,ltration cellsare integral to the system& The rac-s hold the mem+rane

+undles in direct contact with the feedwater&htt#233(((%(ater?technoogy%net3#ro4ects3k(inana3k(inana


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Utra$tration

Figure b2 Utra$trationmodues arrayed in #araeon a manifod% !hoto+ourtesy of +irentSemiconductor

Figure a2 +ross section of theutra$tration modue sho(ingCo( direction%

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Nano$tration


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)everse osmosis

htt#233(((%auatechnoogy%net3aro#i@6%4#g


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htt#233(((%machineryandeui#ment%com3featured3used;(ater;treatment;eui#ment%

Used (ater treatmenteui#ment ? used reverse

osmosis $ter

)everseosmosis

gram of a %everse Osmosis Mem+rane

#233(((%es#(ater#roducts%com3about;reverse;osmosis%htm


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,ectrodiaysis

Figure 6% .eft side demonstrates a standard eectroysis#rocess% )ight side demonstrates the same #rocess (henion?seective membranes are inserted%+,M cation?e@change membrane% *,M anion?e@changemembrane%

www&.urag&d-(electrodialysis&html
http://www.jurag.dk/electrodialysis.htmlhttp://www.jurag.dk/electrodialysis.html


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,ectrodiaysis

Figure 7% !rinci#e of sim#e eectrodiaysis #rocess% 0iagramsho(s the membrane con$guration (ith aternating cation?seective 6"and anion?seective 7" membranes bet(eent(o eectrodes


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,ectrodiaysis

,ectrodiaysis unit for desating and concentration%

www&ele-trolyse&nl($le-trodialyseeng&html
http://www.elektrolyse.nl/Elektrodialyseeng.htmlhttp://www.elektrolyse.nl/Elektrodialyseeng.html


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*dsor#tion*dsor#tion is the seective coection and

concentration onto soid surfaces of #articuarty#es of moecues contained in a iuid or agas%

Kom#onen dasar adsor#si2*dsorbent2 bahan #en4era#

*dsorbate2 bahan yang di4era#2 ois'surfactants' #henos' chorides' #igments'organic sovents' HTI' etc%


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*dsorber


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!roses *dsor#si

Huk iuid

Stagnant.iuid $m

*dsorbentstructure

Huk soutiontrans#ort

Fim diusiontrans#ort

!ore trans#ort2

-!ore diusion-Surface diusion

*dsor#tion


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*dsorbentJenis adsorbent2

*ctivated carbon banyak di#akai utk#engoahan imbah krn murah

Synthetic #oymer

Siica?based adsorbent Deoite"


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Jenis karbon aktif#ranular Activated Car+on /#AC0? irreguar sha#ed#artices (ith siDes ranging from >%7 to : mm% This ty#eis used in both iuid and gas #hase a##ications% =>>?6> m73g"

1owder Activated Car+on /1AC0? #uveriDed carbon(ith a siDe #redominanty ess than >%69mm US Mesh9>"% These are mainy used in iuid #hase a##icationsand for Cue gas treatment%

1elleted Activated Car+on? e@truded and cyindricasha#ed (ith diameters from >%9 to : mm% These aremainy used for gas #hase a##ications because of theiro( #ressure dro#' high mechanica strength and o(dust content% 9>>?69>> m73g"


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FLO2 )IA#%AM FO% ACTI3AT$) CA%BO"1%O)UCTIO"

tt#233home%att%net3africantech3Gh-,3*ct+arbon;image>>7%gif


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+arbon regeneration and

reactivation%ea-tivasi2 #ada dasarnya sama denga #roses

aktivasi dari bahan baku karbon aktif%

!roses yang di#akai26% Karbon di#anaskan untuk mengusir bahan organik

teradsor#si

7% !ada #roses di atas senya(a baru bisa terbentukdi #ermukaan karbon


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+arbon regeneration and

reactivation%egenerasi2 #roses untuk memuihkan

kembai ka#asitas adsor#si dari karbonaktif yang teah ter#akai%

!roses yang di#akai2Hahan kimia untuk mengoksidasi bahan

teradsor#si

Kukus steam" utk mengusir bahan teradsor#si!earut utk mearutkan bahan teradsor#si

!roses konversi bioogis

5?6>B ka#asitas adsor#si hiang dm

regenerasi


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Gas Stri##ingStri##ing2 transfer massa dari fase cair ke

fase gas

Gas terarut daam air imbah yang bisadihiangkan dengan stri##ing2*mmonia N1


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Gas Stri##ing

htt#233en%(iki#edia%org3(iki3-mage2*ir;Stri##er;for;Wiki#edia%


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-on ,@change-on e@change is a reversibe chemica reaction

(herein an ion from soution is e@changed fora simiary charged ion attached to an

immobie soid #artice%*#ikasi2

!enghiangan kesadahan air

0aam #engoahan imbah2 #enghiangannitrogen' ogam berat dan T0S%


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Ion $4change

htt#233(((%a?science?fair?

#ro4ects%com3science;fair;#ro4ects3>ddb:e=


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IO" $5C!A"#$

htt#233(((%remco%com3i@%ht


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!engoahan dengan reaksi

kimia6% )eaction to #roduce an insoube soid%

7% )eaction to #roduce an insoube gas%


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)eaction to #roduce an

insoube soidTerutama untuk #enghiangan ogam?ogam

berat yang terarut

Kearutan garam ogam dm air terbatas ion?ion ogam direaksikan untuk membentukgaram?garam yang bisa dienda#kan2hidroksida' su$da' karbonat d


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!reci#itation of heavymetas as

hydro@ides% From.anouette'6E==%"


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Schematic of suggested mode for design of faciity forremova by forming an insoube substance%


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+hemicaSubstances+ommony Used for

-ndustriaWaste(ater

Treatment by)emova of Target

!outants as a!reci#itate


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)eaction to #roduce an

insoube gasHahan kimia yang bisa ditambahkan untukmembentuk gas tidak terarut


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Alkaline Chlorination ofCyanide

Documents

05 Tertiary and Advanced WWT