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WITH PURIFIED DNA ORIGAMI FROM NORTON GROUP, CROSS DESIGN. the remainder of the chips not labeled a or b or a2 are untreated, these areas were never exposed to anything in our lab. a. - PowerPoint PPT Presentation
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a
a2
b
a
b
a2
sample iii SiNx surface with CdS wires ALD coated with SiO2 with APTES
sample iv SiNx surface with CdS wires ALD coated with SiO2 NO APTES
WITH PURIFIED DNA ORIGAMI FROM NORTON GROUP, CROSS DESIGN
the remainder of the chips not labeled a or b or a2 are untreated, these areas were never exposed to anything in our lab
WITH RECTANGULAR ORIGAMI CONSTRUCT (1.6nM NOT PURIFIED) FROM SEEMAN LAB WITH 20NM GOLD NANOPARTICLES ATTACHED VIA DNA OLIGO TETHERS
WITH PURIFIED DNA ORIGAMI FROM NORTON GROUP, CROSS DESIGN - no surface decoration seen
a
iii – SiNx chip surface with CdS nanowires with 3nm of ALD SiO2 and APTES
WITH PURIFIED DNA ORIGAMI FROM NORTON GROUP, CROSS DESIGN
cantilever is 115um long
this wire is from the same chip (iii), but from an untreated area, no surface decoration seen
checked construct on mica
iii – SiNx chip surface with CdS nanowires with 3nm of ALD SiO2 and APTES
b
WITH RECTANGULAR ORIGAMI CONSTRUCT (1.6nM NOT PURIFIED) FROM SEEMAN LAB WITH 20NM GOLD NANOPARTICLES ATTACHED VIA DNA OLIGO TETHERS
cantilever is 115um long
checked construct on mica
full-z scale overview of wire above
a2
iv – SiNx chip surface with CdS nanowires with 3nm of ALD SiO2 NO APTES
WITH PURIFIED DNA ORIGAMI FROM NORTON GROUP, CROSS DESIGN - NO surface decoration seen, apparently APTES is important for origami to CdS binding
this wire is from the same chip (iv), but from an untreated area
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