Nanolitografi E-beam litografi Nano imprint litografi

NanolitografiE-beam litografiNano imprint litografi

Mikroskopi

SEM (scanning electron microscope)

F =-e v x B

Komponenter i SEM

Magnetisk linse

Schottky emitter elektronkilde

E-beam litografi

- Dedikerede e-beam systemer

- SEM med Raith Gmbh kontrolsystem og ’pattern generator’

DANCHIP

Test of nanowire writingE-beam writing+RIE(Nano 9 – Tom+Jeppe)

Wires and channels

2D grating:Periodicity - 250nm

Optiske strukturerDiffraktive komponenter

Nano Imprint Lithography (NIL)

Nanowire detektor

Appl. Phys. Lett. 89, 153102 (2006)

Focused Ion Beam (FIB) System

Focused Ion Beam Writing

As the diagram on the right shows,the gallium (Ga+) primary ion beam hitsthe sample surface and sputters a smallamount of material, which leaves thesurface as either secondary ions (i+ or i-) or neutral atoms (n0). The primary beam also produces secondary electrons (e-).As the primary beam rasters on the samplesurface, the signal from the sputtered ionsor secondary electrons is collected to forman image.

• E-beam ~10 nm• FIB ~20 nm• EDX

E-beam og FIB litografi

TEM samples

FIB skrivningAAU-logo på et hår

CVD med FIB stråle

Shinji MATSUI

http://www.nanonet.go.jp/english/mailmag/2006/086a.html

http://www.nanonet.go.jp/english/mailmag/2006/086a.html

http://www.nanonet.go.jp/english/mailmag/2006/086a.html

http://www.nanonet.go.jp/english/mailmag/2006/086a.html

http://www.nanonet.go.jp/english/mailmag/2006/086a.html

FIB skrivningAAU-logo på et hår