mr-UVCur26SF - A Solvent-Free Low Viscous Photo-NIL Resist€¦ · mr-UVCur26SF imprint of a pillar...

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  • ls.17.02.28.03

    mr-UVCur26SF - A Solvent-Free Low Viscous Photo-NIL Resist

    Applicable by Inkjet Dispensing and in Roll-to-Roll NIL Processes

    micro resist technology GmbH

    Köpenicker Straße 325

    12555 Berlin

    Germany

    Tel. +49 (0) 30 641670100

    Fax +49 (0) 30 641670200

    info@microresist.de

    www.microresist.com

    Discrete areas of mr-UVCur26SF droplets inkjet dispensed on a 6‘‘ Si wafer matching the template architecture for S&R repeat NIL (Courtesy of FhG IISB, Germany)

    R2R-NIL on PC foil: AR1 L&S pattern, 500 nm pitch, inkjet dispensed mr-UVCur26SF, pristine Ni roller molds, 405 nm LED radiation, throughput speed 10 m min-1 (machine limit). Inset: SEM image of the imprint (Courtesy of IMRE, Singapore).

    R2R UV-NIL imprinted dense pillar design, 500 nm in diameter, aspect ratio > 2, deposition of mr-UVCur26SF was done via inkjet dispensing at room temperature. (Data courtesy of IMRE, Singapore)

    mr-UVCur26SF imprint of a pillar array on 2‘‘ Si wafer, pillars 75 nm in diameter, 200 nm in height (Courtesy of HZB, Germany)

    Antireflective coating on PC with mr-UVCur26SF: moth-eye pattern imprinted on PC foil in a R2R-NIL process (Courtesy of IMRE, Singapore)

    Bottom: transferredpatterns of the imprint into Si indicating aselectivity of resistto substrate of around 1.7 usingICP with HBr plasma

    Top: Imprintednanoapertures intomr-UVCur26SF usinga step-and-repeatProcess on 4‘‘ Si wafer

    – Low viscosity (15 mPas)– Liquid formulation (solvent-free)– Broad compatibility with commercial

    inkjet tools and printheads– Proved droplet volume stability over

    a period of 300 s @ RT

    Inkjet Dispensing– Good adhesion to plastic foil substrates– Ultra-high photocuring rate enabling high roller

    speeds and high throughput– R2R web speeds up to 30 m min-1 demonstrated– Constantly high pattern fidelity at various

    throughput rates

    Roll-to-Roll NIL

    – Step&Repeat NIL process– Large-area nanostructuring of flexible substrates– Continuous roll-to-roll (R2R ) Photo-NIL processes– High volume manufacturing of

    • Antireflective coatings

    • (Super)Hydrophobic patterns

    on flexible substrates

    • Wire-grid polarizers

    Applications– Organic, photo-curable nanoimprint resist

    for inkjet dispensing– Excellent imprint characteristics – Compatibility to various mold materials:

    Ni, Si, OrmoStamp®

    – High stability of the cured patterns– Excellent dry etch resistance

    for pattern transfer – Transparent for UV/vis > 350nm

    Unique Features

    Inkjet printhead Manufacturer Nozzle no. Temperature

    MJ-ABP-01-50 MicroFab 1 25 °C

    Spectra SL-128 FujiFilm Dimatix 128 25 °C

    Spectra SM-128 FujiFilm Dimatix 128 25 °C

    Sapphire QS-256/30 FujiFilm Dimatix 256 25 °C

    Polaris PQ-512/15 FujiFilm Dimatix 512 25 °C

    KM1024 KonicaMinolta 2 x 512 25 °C - 40 °C

    DMP 2831 equipped with DMC-11610 or DMC-11601

    FujiFilm Dimatix 16 25 °C

    Commercial inkjet printheads featuring different nozzle numbers applied for dispensing of mr-UVCur26SF

    (Courtesy of FhG IISB, Germany)

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