First principles simulations of nanoelectronic devices

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First principles simulations of nanoelectronic devices. Jesse Maassen (Supervisor : Prof. Hong Guo) Department of Physics, McGill University, Montreal, QC Canada. Year. Channel length. 2012. 22 nm. 2015. 16 nm. 2018. 11 nm ?. (Source: ITRS 2010). Line of ~ 50 atoms. - PowerPoint PPT Presentation

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December 2, 2011 Ph.D. Thesis Presentation

First principles simulations of nanoelectronic devices

Jesse Maassen

(Supervisor : Prof. Hong Guo)

Department of Physics, McGill University,

Montreal, QC Canada

December 2, 2011 Ph.D. Thesis Presentation

Why first principles theory?

Line of ~ 50 atoms

2012 22 nm

Year Channel length

2015 16 nm

2018 11 nm ?(Source: ITRS 2010)

December 2, 2011 Ph.D. Thesis Presentation

Why first principles theory?

Science Engineering

Atomic structure :

surfaces, chemical bonding, interfaces, dissimilar materials, charge transfer, roughness, variability, …

tunneling, conductance quantization, spin-transport, …

Quantum effects :First principles

December 2, 2011 Ph.D. Thesis Presentation

How to calculate transport properties?

Taylor et al., PRB 63, 245407 (2001)Waldron et al., PRL 97, 226802 (2006)Maassen et al., IEEE (submitted)

December 2, 2011 Ph.D. Thesis Presentation

Applications.

Graphene-metal interface

Localized doping in Si nano-transistors

Dephasing in nano-scale systems

Maassen et al., Appl. Phys. Lett. 97, 142105 (2010); Maassen et al., Nano. Lett. 11,151 (2011)

December 2, 2011 Ph.D. Thesis Presentation

Applications.

Graphene-metal interface

Localized doping in Si nano-transistors

Dephasing in nano-scale systems

Maassen and Guo, preprint to be submitted

December 2, 2011 Ph.D. Thesis Presentation

Applications.

Graphene-metal interface

Localized doping in Si nano-transistors

Dephasing in nano-scale systems

Maassen et al., PRB 80, 125423 (2009)

December 2, 2011 Ph.D. Thesis Presentation

Applications.

Graphene-metal interface

Localized doping in Si nano-transistors

Dephasing in nano-scale systems

Maassen et al., PRB 80, 125423 (2009)

December 2, 2011 Ph.D. Thesis Presentation

Application : Graphene-metal interface

Motivation :

Graphene has interesting properties (i.e., 2D material, zero gap, linear dispersion bands, …).

For electronics, all graphene sheets must be contacted via metal electrodes (source/drain).

How does the graphene/metal interface affect the response of a device?

Theoretical studies exclude accurate treatment of electrodes.

December 2, 2011 Ph.D. Thesis Presentation

Application : Graphene-metal interface

Transport properties :

December 2, 2011 Ph.D. Thesis Presentation

Application : Graphene-metal interface

Atomic structure :

Cu, Ni and Co (111) have in-place lattice constants that almost match that of graphene.

Equilibrium interface structure determined from atomic relaxations.

MetalMetal

eq

Maassen et al., Appl. Phys. Lett. 97, 142105 (2010); Maassen et al., Nano. Lett. 11,151 (2011)

December 2, 2011 Ph.D. Thesis Presentation

Application : Graphene-metal interface

Ni(111) contact :

Linear dispersion bands near Fermi level.

Zero band gap.

States only in the vicinity of K.

December 2, 2011 Ph.D. Thesis Presentation

Application : Graphene-metal interface

Ni(111) contact :

Strong hybridization with metal

Band gap opening

Graphene is spin-polarized

Maassen et al., Nano. Lett. 11, 151 (2011)

: Top-site C(pz): Hollow-site C(pz): Ni(dZ

2)

December 2, 2011 Ph.D. Thesis Presentation

Application : Graphene-metal interface

Ni(111) contact :

Maassen et al., Nano. Lett. 11, 151 (2011)

December 2, 2011 Ph.D. Thesis Presentation

Application : Graphene-metal interface

Ni(111) contact :

Maassen et al., Nano. Lett. 11, 151 (2011)

December 2, 2011 Ph.D. Thesis Presentation

CHANNEL

Application : Localized doping in Si nano-transistors

Motivation :

Leakage current accounts for 60% of energy in transistors.

Two sources : (i) gate tunneling and (ii) source/drain tunneling.

How can highly controlled doping profiles affect leakage current ?

December 2, 2011 Ph.D. Thesis Presentation

Application : Localized doping in Si nano-transistors

Structure: n-p-n and p-n-p. Channel doping: B or P. L = 6.5 nm 15.2 nm Si band gap = 1.11 eV

Technical details regarding random doping, large-scale modeling and predicting accurate semiconductor band gaps can be found in the thesis.

December 2, 2011 Ph.D. Thesis Presentation

Application : Localized doping in Si nano-transistors

GMAX / GMIN ~ 50.

Lowest G with doping in the middle of the channel.

Maassen and Guo, preprint to be submitted

December 2, 2011 Ph.D. Thesis Presentation

Application : Localized doping in Si nano-transistors

Maassen and Guo, preprint to be submitted

December 2, 2011 Ph.D. Thesis Presentation

Application : Localized doping in Si nano-transistors

Maassen and Guo, preprint to be submitted

December 2, 2011 Ph.D. Thesis Presentation

Application : Localized doping in Si nano-transistors

G decreases with L.

Variations in G increase dramatically with L.

Maassen and Guo, preprint to be submitted

December 2, 2011 Ph.D. Thesis Presentation

Application : Localized doping in Si nano-transistors

G decreases with L.

Variations in G increase dramatically with L.

Maassen and Guo, preprint to be submitted

December 2, 2011 Ph.D. Thesis Presentation

Summary

First principles transport theory is a valuable tool for quantitative predictions of nanoelectronics, where atomic/quantum effects are important.

I determined that the effect of metallic contacts (Cu, Ni, Co) can significantly influence device characteristics. I found that the atomic structure of the graphene/metal interface is crucial for a accurate treatment.

My simulations on localized doping profiles demonstrated how leakage current can be substantially reduced in addition to alleviating device variations.

December 2, 2011 Ph.D. Thesis Presentation

Thank you!

Questions ?

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